• Transactions on Electrical and Electronic Materials
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• v.11 no.5
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• pp.222-225
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• 2010

The preparation of tin oxide thin films by atomic layer deposition (ALD), using a tetrakis (ethylmethylamino) tin precursor, and the effects of a seed layer on film growth were examined. The average growth rate of tin oxide films was approximately 1.2 to 1.4 A/cycle from $50^{\circ}C$ to $150^{\circ}C$. The rate rapidly decreased at the substrate temperature at $200^{\circ}C$. A seed effect was not observed in the crystal growth of tin oxide. However, crystallinity and the growth of seed material were detected by XPS after thermal annealing. ALD-grown seeded tin oxide thin films, as-deposited and after thermal annealing, were characterized by X-ray diffraction, atomic force microscopy and XPS.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.11a
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• pp.128-128
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• 2009

The effect of seed layer on the preparation of tin oxide thin film by ALD using tetrakis(ethylmethylamino) tin precursor was examined. The average growth rate of tin oxide film is about 1.4 A/cycle from $50^{\circ}C$ to $150^{\circ}C$. The rate rapidly decreases at the substrate temperature at $200^{\circ}C$. The seed effect was not observed in crystal growth of thin oxide. However, the crystalline growth of seed material in tin oxide was detected by thermal annealing. ALD-grown seeded tin oxide thin film after thermal annealed was characterized by ellipsometry, XRD, AFM and XPS.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.32 no.6
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• pp.522-527
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• 2019

In order to fabricate high-quality SiC substrates for power electronic devices, various single crystal growing methods were prepared. These include the physical vapor transport (PVT) and top seeded solution growth (TSSG) methods. All the suggested SiC growth methods generally use induction-heating furnaces. The temperature distribution in this system can be easily adjusted by changing the hot-zone design. Moreover, precise temperature control in the induction-heating furnace is favorably required to grow a high-quality crystal. Therefore, in this study, we analyzed the heat transfer in these furnaces to grow SiC crystals. As the growth temperature of SiC crystals is very high, we evaluated the effect of radiation heat transfer on the temperature distribution in induction-heating furnaces. Based on our simulation results, a heat transfer strategy that controls the radiation heat transfer was suggested to obtain the optimal temperature distribution in the PVT and TSSG methods.

• Korean Journal of Crystallography
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• v.14 no.2
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• pp.73-78
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• 2003

(Ba/sub 1-x/Sr/sub x/)TiO₃ (BST, 0.4< x <0.65) single crystals were successfully grown by the TSSG (Top-Seeded Solution Growth) method, using a commercial [100] SrTiO₃ or as-grown [100] BST single crystals as seed crystals. To obtain the BST single crystals with various compositions x, the Ba/sr molar ratios in the solutions were systematically controlled while the Ti ion content among all cations was fixed at 67 mol%. A linear regression curve between their x values and the molar ratios of Sr/(Ba + Sr) in the solutions could be obtained, which in turn could used to select the initial composition to produce BST crystal with an aimed x value. In addition, the isothermal growth was found more effective for obtaining a compositional uniformity than a slow cooling process.

• Korean Journal of Crystallography
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• v.4 no.1
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• pp.42-48
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• 1993

KTP(KTiOPO4) single crystals were grown by the TSSG(top seeded solution growth) method using the Ksp401s flux. A heat-pipe based growing furnace was used, and the temperature stability and the homogenity of the growing solution in the platinum crucible were within the level of It 0.5℃ and ±0.9℃, respectively. The effects of some operating variables such as operating temperature range, initial cooling rate, forced stirring, reuse of the flux were investigated. As the initial cooling rate was decreased to the degree of 0.1℃/hr and some proper stirring effect by the crystal rotation was introduced to the present experimental condition, bigger and better crystals without inclusion grew. A single crystal with the maximum sixte of 44 ×39 ×17mm3 was obtained and showed the SHG conversion efficiency of 21.39) even without the anti-refilection coating.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.23 no.6
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• pp.291-295
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• 2013

Surface chemical modification via air and hydrogen heat treatment was found to relieve the aggregation of nanodiamond (ND) seed particles and lead to a significantly enhanced nucleation density for ultrananocrystalline diamond (UNCD) film growth. After heat treatment in air and hydrogen, modification of surface functionalities and increase in the zeta potential were observed. Mean size of the ND aggregates was also dramatically reduced from ${\sim}2{\mu}m$ to ~55 nm. Si surface seeded with ND particles heat-treated at $600^{\circ}C$ in hydrogen produced a much higher nucleation density of ${\sim}2.7{\times}10^{11}cm^{-2}$ compared to untreated ND seeds.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.29 no.6
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• pp.239-244
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• 2019

Two hydrogenation surface modifications, namely hydrogen atmosphere heat treatment and hydrogen plasma treatment, were found to lead to improved dispersion of nanodiamond (ND) seed particles and enhanced nucleation density for deposition of smooth ultrananocrystalline diamond (UNCD) film. After hydrogenation, the C-O and O-H surface functionalities on the surface of nanodiamond particles were converted to the C-H surface functionalities, and the Zeta potential was increased. As the degree of dispersion was improved, the size of nanodiamond aggregates decreased significantly and nucleation density increased dramatically. After hydrogen heat treatment at 600℃, average size of ND particles was greatly reduced from 3.5 ㎛ to 34.5 nm and a very high nucleation of ~3.9 × 10¹¹ nuclei/㎠ was obtained for the seeded Si surface.

• Broadcasting and Media Magazine
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• v.6 no.1
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• pp.78-87
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• 2001

Seven kinds of most representative photorefractive crystals expected to contribute to the realization of the volume holographic storage were reviewed The growth conditions and problems for highly homogeneous optical qualities of the following crystals depending on the growth methods were discussed;(1) $LiNbO_3$ and $Bi_2SiO_{20}$ by Czochralski method (2) $Bi_{12}TiO_{20}$, $KNbO_3$ and $BaTiO_3$ by top seeded solution growth and (3) $(Sr_{1-x}Ba_{x})Nb_{2}O_{6}$ and $(K_{1-y}Na_y)_{2A-2}(Sr_{1-x}Ba_x)_{2-A}Nb_2O_6$ by Stepanov method, And then the figure of merits for the estimation of phororefractive materials on performances, such as $Q_1$, $Q_2$ and sensitivity, were discussed.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2018.06a
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• pp.113-113
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• 2018

환경 친화형 전기자동차, 하이브리드 자동차, 전철 등에서는 고내압 및 소형으로 전력손실을 감소시킬 수 있는 파워 디바이스가 필수이다. 최근, 실리콘 카바이드(SiC, silcon carbide)는 기존 실리콘(Si)보다 스위칭 손실의 저감 및 고온환경에서의 동작 특성이 우수하여, 차세대 저 손실 전력반도체 재료로서 기대를 받고 있다. 용액 성장 법에서 고품질 SiC 결정을 만들 수 있다. 그러나 늦은 성장 속도 때문에 SiC의 양산을 어렵게 하고 있다. 현재까지 성장 속도 향상을 위한 Si용매에 Cr을 첨가하여 탄소 용해도를 높이는 방법이 사용되고 안정된 성장을 위한 Si-Cr용매에 Al를 첨가하는 등 다양한 금속을 첨가하는 방법이 이용되고 있다. 선행 연구에서는 다양한 용매인 탄소 용해도를 실측하고 특히 큰 탄소 용해도를 보인 것은 Co이었다. 본 연구에서는 $Si_{0.6}Cr_{0.4}$원료와 Co를 첨가한 $Si_{0.56}Cr_{0.4}Co_{0.04}$의 용매에 의한 SiC용액 성장을 실시하고 결정 성장 속도 및 표면 상태의 변화를 검토했다. on-axis 4H-SiC(000-1)을 사용한 Top-seeded solution growth(TSSG)법과 원자 비율로 $Si_{0.6}Cr_{0.4}$와 $Si_{0.56}Cr_{0.4}Co_{0.04}$의 용매를 이용하여 SiC 용액 성장을 실시했다. Ar가스에서 저항 가열로 내를 치환 후에 $1800^{\circ}C$까지 가열하고 종자화 후에 120분간 유지하고 결정 성장을 실시했다. 냉각 후에 성장의 표면에 남은 용매를 $HF+HNO_3$에서 제거했다. 광학 현미경을 이용하여 결정면과 두께를 관찰 측정했다. Co를 첨가한 $Si_{0.56}Cr_{0.4}Co_{0.04}$의 경우는 $Si_{0.6}Cr_{0.4}$의 경우보다 결정 성장 속도가 향상됐다. 또한 $Si_{0.6}Cr_{0.4}$보다 step-flow의 성장을 나타낸 결정의 표면이 전반적으로 관찰됐으며 안정된 결정성장을 나타냈다. 본 연구에서 실시한 연구 방법과 결과는 고품질 및 고속의 SiC 용액성장을 위한 매우 유용한 자료로 활용 될 수 있을 것으로 판단한다.

• Journal of the Korean institute of surface engineering
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• v.53 no.5
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• pp.241-248
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• 2020

The change of the deposition behavior of diamond through a pretreatment process of the base metal prior to diamond deposition using HFCVD was investigated. To improve the specific surface area of the base material, sanding was performed using sandblasting first, and chemical etching treatment was performed to further improve the uniform specific surface area. Chemical etching was performed by immersing the base material in HCl solutions with various etching time. Thereafter, seeding was performed by immersing the sanded and etched base material in a diamond seeding solution. Diamond deposition according to all pretreatment conditions was performed under the same conditions. Methane was used as the carbon source and hydrogen was used as the reaction gas. The most optimal conditions were found by analyzing the improvement of the specific surface area and uniformity, and the optimal diamond seeding solution concentration and immersion time were also obtained for the diamond particle seeding method. As a result, the sandblasted base material was immersed in 20% HCl for 60 minutes at 100 ℃ and chemically etched, and then immersed in a diamond seeding solution of 5 g/L and seeded using ultrasonic waves for 30 minutes. It was possible to obtain optimized economical diamond film growth rates.