• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.658-658
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• 2013

Graphene is an attractive material for various device applications due to great electrical properties and chemical properties. However, lack of band gap is significant hurdle of graphene for future electrical device applications. In the past few years, several methods have been attempted to open and tune a band gap of graphene. For example, researchers try to fabricate graphene nanoribbon (GNR) using various templates or unzip the carbon nanotubes itself. However, these methods generate small driving currents or transconductances because of the large amount of scattering source at edge of GNRs. At 2009, Bai et al. introduced graphene nanomesh (GNM) structures which can open the band gap of large area graphene at room temperature with high current. However, this method is complex and only small area is possible. For practical applications, it needs more simple and large scale process. Herein, we introduce a photosensitive graphene device fabrication using CdSe QD coated nano-porous graphene (NPG). In our experiment, NPG was fabricated by thin film anodic aluminum oxide (AAO) film as an etching mask. First of all, we transfer the AAO on the graphene. And then, we etch the graphene using O2 reactive ion etching (RIE). Finally, we fabricate graphene device thorough photolithography process. We can control the length of NPG neckwidth from AAO pore widening time and RIE etching time. And we can increase size of NPG as large as 2 $cm^2$. Thin CdSe QD layer was deposited by spin coatingprocess. We carried out NPG structure by using field emission scanning electron microscopy (FE-SEM). And device measurements were done by Keithley 4200 SCS with 532 nm laser beam (5 mW) irradiation.

• Korean Journal of Optics and Photonics
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• v.16 no.2
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• pp.113-120
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• 2005

Luminous efficiency and uniformity in a LCD-BLU are mainly determined by fine scattering patterns formed on the light guide panel. We propose a novel fabrication method of 3-dimensional scattered patterns based on anisotropic etching of silicon wafers. Micro-pyramid patterns with 70.5 degree apex-angle and micro-prism patterns with 109.4 degree apex-angle can be self-constructed by the wet, anisotropic etching of (100) and (110) silicon wafers, respectively, and those patterns are easily duplicated by the PDMS replica process. Experimental results on spatial and angular distributions of irradiation from the light guide panel with the micro-pyramid patterns were very consistent with the calculation results. Surface roughness of the silicon-based micro-patterns is free from any artificial defects since the micro-patterns are inherently formed with silicon crystal surfaces. Therefore, we expect that the silicon based micro-patterning process makes it possible to fabricate perfect 3-dimensional micro-structures with crystal surface and apex angles, which may guarantee mass-reproduction of the light guide panels in LCD-BLU.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.15 no.10
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• pp.5919-5924
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• 2014

Accumulated dross adhered to the cutting support degrades the cutting accuracy and aggravates the working environment by reducing the efficiency of the dust collector. Furthermore, the cutting machine and product can be damaged by the scattering of molten metal. In this study, an attempt was made to increase the productivity of steel cutting process and improve the working environment by dross control. The dross adhesion characteristics were invested by a cutting experiment and the design concept for a dross removal machine was devised. Finally, a cutting support cleaning system and its operating algorithm were developed. The applicability of the developed system was examined and verified by a long-term field test after installation of the plasma arc cutting system of a shipyard.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.7 no.5
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• pp.811-816
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• 2006

The single layered magnetic thin films with anisotropic magnetoresistance behavior have advantage on micro integration due to their low cost in manufacturing. Although the conventional MCo (M=Cu, Ag) amorphous ribbons using a rapid solidification process have showed appropriate for magnetic property for bulk devices, they are not appropriate for micro-scale devices due to their brittleness. We prepared the thermal evaporated 100 nm-thick $Cu_{1-x}Co_x\;and\;Ag_{1-x}Co_x(x=0.1{\sim}0.7)$ films on silicon wafers and investigated the magnetic property of the as-depo films such as magnetization and magnetoresistance ratio. We confirmed that the maximum MR ratio of 1.4 and 2.6% at the external field of 0.5 Tesla in $CuCo_{30},\;AgCo_{40}$ films, respectively. Our result implies that AMR may be slightly less than those of the conventional CuCo and AgCo ribbons due to surface scattering, but their AMR ratio be enough for micro-scale application with easy integration compatibility for the process without surface oxidation.

• Journal of the Korea institute for structural maintenance and inspection
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• v.24 no.1
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• pp.142-147
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• 2020

This study investigates the effects of moisture content on diffuse ultrasound to be applied for the evaluation of micro-structural damage in concrete subjected to various environmental conditions. We monitored diffuse wave parameters for concrete samples in process of water saturation for 5 days. Dried samples were immersed in a water bath, and the change of moisture content in concrete were estimated by measuring the change of mass. For the diffuse wave analysis, a frequency range of 500 kHz, which represents a scattering regime of ultrasound in concrete, was selected. The test results reveal that the ultrasonic diffusivity slightly changed, and the ultrasonic dissipation significantly increased by approximately 120% in the process of water saturation. Therefore, the moisture content in concrete should be considered for the evaluation of micro-structural damage using diffuse wave techniques.

• Journal of the Computational Structural Engineering Institute of Korea
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• v.32 no.3
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• pp.141-147
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• 2019

In this paper, a systematic beam splitter design for multi-beam forming is proposed. The objective of this research is to a design beam splitter that splits and focuses scattering microwaves into intense beams in multiple directions. It is difficult to split multi-beam to non-specific directions with theoretical approaches. Therefore, instead of using transformation optics(TO), which is a widely used process for controlling electromagnetic wave propagation, we used a systematic design process called the phase field design method to obtain an optimal topological structure of beam splitter. The objective function is to maximize the norm of electric field of the target areas of each direction. To avoid island structure and obtain the structure in one body, volume constraint is added to the optimization problem by using augmented Lagrangian. Target frequency is set to X-band 10GHz. The optimal beam splitter performed well in multi-beam forming and the transported electric energy of target areas improved. A frequency dependency test was conducted in the X-band to determine effective frequency range.

• Journal of the Semiconductor & Display Technology
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• v.21 no.1
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• pp.95-102
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• 2022

Since the organic light-emitting diodes (OLEDs) have been widely investigated as next-generation displays, it has been successfully commercialized as a flexible and rollable display. However, there is still wide room and demand to improve the device characteristics such as power efficiency and lifetime. To solve this issue, there has been a wide research effort, and among them, the internal and the external light extraction techniques have been attracted in this research field by its fascinating characteristic of material independence. In this study, a micro-nano composite structured external light extraction layer was demonstrated. A reactive ion etching (RIE) process was performed on the surfaces of hexagonally packed hemisphere micro-lens array (MLA) and randomly distributed sphere diffusing films to form micro-nano composite structures. Random nanostructures of different sizes were fabricated by controlling the processing time of the O₂ / CHF₃ plasma. The fabricated device using a micro-nano composite external light extraction layer showed 1.38X improved external quantum efficiency compared to the reference device. The results prove that the external light extraction efficiency is improved by applying the micro-nano composite structure on conventional MLA fabricated through a simple process.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.386-386
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• 2012

For white light emitting diode (LED) applications, it has been reported that Y3Al5O12:Ce3+ (YAG:Ce) in nano-sized phosphor performs better than it does in micro-sized particles. This is because nano-sized YAG:Ce can reduce internal light scattering when coated onto a blue LED surface. Recently, there have been many reports on the synthesis of nano-sized YAG particles using bottom-up method, such as co-precipitation method, sol-gel process, hydrothermal method, solvothermal method, and glycothermal method. However, there has been no report using top-down method. Top-down method has advantages than bottom-up method, such as large scale production and easy control of doping concentration and particle size. Therefore, in this study, nano-sized YAG:Ce phosphors were synthesized by a high energy beads milling process with varying beads size, milling time and milling steps. The beads milling process was performed by Laboratory Mill MINICER with ZrO2 beads. The phase identity and morphology of nano-sized YAG:Ce were characterized by X-ray powder diffraction (XRD) and field-emission scanning electron microscopy (FESEM), respectively. By controlling beads size, milling time and milling steps, we synthesized a size-tunable and uniform nano-sized YAG:Ce phosphors which average diameters were 100, 85 and 40 nm, respectively. After milling, there was no impurity and all of the peaks were in good agreement with YAG (JCPDS No. 33-0040). Luminescence and quantum efficiency (QE) of nano-sized YAG:Ce phosphors were measured by fluorescence spectrometer and QE measuring instrument, respectively. The synthesized YAG:Ce absorbed light efficiently in the visible region of 400-500 nm, and showed single broadband emission peaked at 550 nm with 50% of QE. As a result, by considering above results, high energy beads milling process could be a facile and reproducible synthesis method for nano-sized YAG:Ce phosphors.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.642-642
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• 2013

Graphene, two dimensional single layer of carbon atoms, has tremendous attention due to its superior property such as high electron mobility, high thermal conductivity and optical transparency. Especially, chemical vapor deposition (CVD) grown graphene has been used as a promising material for high quality and large-scale graphene film. Unfortunately, although CVD-grown graphene has strong advantages, application of the CVD-grown graphene is limited due to ineffective transfer process that delivers the graphene onto a desired substrate by using polymer support layer such as PMMA(polymethyl methacrylate). The transferred CVD-grown graphene has serious drawback due to remaining polymeric residues generated during transfer process, which induces the poor physical and electrical characteristics by a p-doping effect and impurity scattering. To solve such issue incurred during polymer transfer process of CVD-grown graphene, various approaches including thermal annealing, chemical cleaning, mechanical cleaning have been tried but were not successful in getting rid of polymeric residues. On the other hand, lithographical patterning of graphene is an essential step in any form of microelectronic processing and most of conventional lithographic techniques employ photoresist for the definition of graphene patterns on substrates. But, application of photoresist is undesirable because of the presence of residual polymers that contaminate the graphene surface consistent with the effects generated during transfer process. Therefore, in order to fully utilize the excellent properties of CVD-grown graphene, new approach of transfer and patterning techniques which can avoid polymeric residue problem needs to be developed. In this work, we carried out transfer and patterning process simultaneously with no polymeric residue by using a metal etch mask. The patterned thin gold layer was deposited on CVD-grown graphene instead of photoresists in order to make much cleaner and smoother surface and then transferred onto a desired substrate with PMMA, which does not directly contact with graphene surface. We compare the surface properties and patterning morphology of graphene by scanning electron microscopy (SEM), atomic force microscopy(AFM) and Raman spectroscopy. Comparison with the effect of residual polymer and metal on performance of graphene FET will be discussed.

• KOREAN JOURNAL OF CROP SCIENCE
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• v.55 no.2
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• pp.165-176
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• 2010

Soybean seeds contain many biologically active secondary metabolites, such as proteins, saponins, isoflavones, phytic acids, trypsin inhibitors and phytosterols. Among them, saponins in soybeans have attracted considerable interest because of their health benefits. Soyasaponin A and B are the most abundant types of saponins found in soybeans along with soyasapogenol (aglycone), which is a precursor of soyasaponin. The main purpose of this experiment was to determine the concentration of soyasapogenol in soybean seeds and sprouts as a function of seed size, usage, seed coat color and seed cotyledon color. The 79 Korean soybean varieties were cultivated at Yesan of Chungnam in 2006 for the analysis of soyasapogenol using HPLC with Evaporative Light Scattering Detection (ELSD). The total average concentration of soyasapogenol was $1313.52{\mu}g\;g^{-1}$ in soybean seeds and $1377.22{\mu}g\;g^{-1}$ in soybean sprouts. Soybean sprouts were about 5% higher than soybean seeds in average total soyasapogenol concentration. In the process of sprouting, the average soyasapogenol A content decreased by approximately 1.6%, but soyasapogenol B and total soyasapogenol increased by 8.31% and 4.88%, based on the content of soybean seeds. When classified according to the size of seeds, the total soyasapogenol concentration of soybean seeds were not significantly different (p<0.05) On average, small soybean seeds were increased by as much as $103.14{\mu}g\;g^{-1}$ in sprouting process. As a function of the use of the seeds, The total soyasapogenol in soybean seeds were significantly different (p<0.05). While, the soybean sprouts were not significant different (p<0.05). Altogether, sprout soybean seeds show the greatest change in content during the germination process. When seeds with different coat colors were compared, the total soyasapogenol concentration of soybean with yellow seed coats ($1357.30\mu g\;g^{1}$) was slightly higher than that of soybean with black ($1260.30{\mu}g\;g^{-1}$) or brown ($1263.62{\mu}g\;g^{-1}$) seed coats. For the color of the cotyledon, the total soyasapogenol concentration was significantly increased in green cotyledon during the germination and seedling process. The results of this study suggest the functional characteristics of soybeans through quantitative analysis of soyasapogenol. In addition, the concentration of soyasapogenol exhibited a change during the germination process, which was evaluated by the nutritional value of the soybean sprouts.