• Title/Summary/Keyword: Scattering bars

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Scattering Bar Optical Proximity Correction to Suppress Overlap Error and Side-lobe in Semiconductor Lithography Process (Overlap Margin 확보 및 Side-lobe 억제를 위한 Scattering Bar Optical Proximity Correction)

  • 이흥주
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.4 no.1
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    • pp.22-26
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    • 2003
  • Overlap Errors and side-lobes have been simultaneously solved by the rule-based correction using the rules extracted from test patterns. Lithography process parameters affecting attPSM lithography process have been determined by the fitting method to the real process data. The correction using scattering bars has been compared to the Cr shield method. The optimal insertion rule of the scattering bal's has made it possible to suppress the side-lobes and to enhance DOF at the same time. Therefore, in this paper, the solution to both side-lobe and overlap Error has been proposed using rule-based confection. Compared to the existing Cr shield method, the proposed rule-based correction with scattering bars can reduce the process complexity and time for mask production.

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Enhancement of Pattern Fidelity for Metal Layer in Attenuated PSM Lithography by OPC

  • Lee Hoong Joo;Lee Jun Ha
    • Proceedings of the IEEK Conference
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    • 2004.08c
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    • pp.784-786
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    • 2004
  • Overlap errors and side-lobes can be simultaneously solved by the rule-based correction using scattering bars with the rules extracted from test patterns. Process parameters affecting the attPSM lithography simulation have been determined by the fitting method to the process data. Overlap errors have been solved applying the correction rules to the metal patterns overlapped with contact/via. Moreover, the optimal insertion rule of the scattering bars has made it possible to suppress the side-lobes and to get additional pattern fidelity at the same time.

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OPC Technique in The AttPSM Lithography Process Using Scattering Bars (Scattering Bar를 이용한 AttPSM Lithography 공정에서의 OPC)

  • 이미영;이홍주
    • Proceedings of the KAIS Fall Conference
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    • 2002.11a
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    • pp.201-204
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    • 2002
  • Overlay margin 확보를 위한 oversizing과, design rule checking, jog filtering를 통하여 side-lobe를 추출하였다. 이렇게 추출한 side-lobe를 extent하고, Cr pattern을 정의하여 side-lobe 현상을 해결할 수 있었다. 하지만 이 방법은 mask제조 공정이 복잡하므로 Cr shield방식의 단점인 복잡한 mask제작공정과 구조를 단순화하기 위하여 scattering bar를 이용하였다. 따라서, scattering bar를 삽입하기 위한 rule을 생성하여 metal layer에 적용하고 aerial image simulation을 통해 side-lobe 현상이 억제되었음을 확인하였다. 그리고 앞에서와는 반대로 background clear의 경우에 발생하는 side-lobe에 scattering bar를 적용하여 억제됨을 확인하였다.

Correction Simulation for Metal Patterns on Attenuated Phase-shifting Lithography

  • Lee, Hoong-Joo;Lee, Jun-Ha
    • Transactions on Electrical and Electronic Materials
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    • v.5 no.3
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    • pp.104-108
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    • 2004
  • Problems of overlap errors and side-lobe printing by the design rule reduction in the lithography process using attenuated phase-shifting masks(attPSM) have been serious. Overlap errors and side-lobes can be simultaneously solved by the rule-based correction using scattering bars with the rules extracted from test patterns. Process parameters affecting the attPSM lithography simulation have been determined by the fitting method to the process data. Overlap errors have been solved applying the correction rules to the metal patterns overlapped with contact/via. Moreover, the optimal insertion rule of the scattering bars has made it possible to suppress the side-lobes and to get additional pattern fidelity at the same time.

감쇄위상변위마스크를 사용하는 메탈레이어 리토그라피공정의 오버레이 보정

  • 이우희;이준하;이흥주
    • Proceedings of the Korean Society Of Semiconductor Equipment Technology
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    • 2004.05a
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    • pp.159-162
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    • 2004
  • Problems of overlap errors and sidelobe printing by the design rule reduction in the lithography process using attenuated phase-shifting masks(attPSM) have been serious. Overlap errors and sidelobes can be simultaneously solved by the rule-based correction using scattering bars with the rules extracted from test patterns. Process parameters affecting the attPSM lithography simulation have been determined by the fitting method to the process data. Overlap errors have been solved applying the correction rules to the metal patterns overlapped with contact/via. Moreover, the optimal insertion rule of the scattering bars has made it possible to suppress the sidelobes and to get additional pattern fidelity at the same time.

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Homogeneity of Microstructure and Mechanical Properties of Ultrafine Grained OFHC Cu Bars Processed by ECAP (ECAP 가공에 의해 제조된 초미세립 OFHC Cu 봉재의 미세조직 및 기계적 특성의 균질성)

  • Ji, Jung Hoon;Park, Lee-Ju;Kim, Hyung Won;Hwang, Si Woo;Lee, Chong Soo;Park, Kyung Tae
    • Korean Journal of Metals and Materials
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    • v.49 no.6
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    • pp.474-487
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    • 2011
  • Bars of OFHC Cu with the diameter of 45 mm were processed by equal channel angular pressing up to 16 passes via route $B_c$, and homogeneity of their microstructures and mechanical properties was examined at every four passes which develop the equiaxed ultrafine grains. In general, overall hardness, yield strength and tensile strength increased by 3, 7, and 2 times respectively compared with those of unECAPed sample. Cross-sectional hardness exhibited a concentric distribution. Hardness was the highest at the center of bar and it decreased gradually from center to surface. After 16 passes, overall hardness decreased due to recovery and partial recrystallization. Regardless of the number of passage, yield strength and tensile strength were quite uniform at all positions, but elongation showed some degree of scattering. At 4 passes, coarse and ultrafine grains coexisted at all positions. After 4 passes, uniform equiaxed ultrafine grains were obtained at the center, while uniform elongated ultrafine grains were manifested at the upper half position. At the lower half position, grains were equiaxed but its size were inhomogeneous. It was found that inhomogeneity of grain morphology and grain size distribution at different positions are to be attributed to scattering in elongation but they did not affect strength. The present results reveal the high potential of practical application of equal channel angular pressing on fabrication of large-sized ultrafine grained bars with quite homogeneous mechanical properties.

A SCATTERING MECHANISM IN OYSTER FARM BY POLARIMETRIC AND JERS-l DATA

  • Lee Seung-Kuk;Won Joong Sun
    • Proceedings of the KSRS Conference
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    • 2005.10a
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    • pp.538-541
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    • 2005
  • Tidal flats develop along the south coast ofthe Korean peninsula. These areas are famous for sea farming. Specially, strong and coherent radar backscattering signals are observed over oyster sea farms that consist of artificial structures. Tide height in oyster farm is possible to measure by using interferometric phase and intensity of SAR data. It is assumed that the radar signals from oyster farm could be considered as double-bouncing returns by vertical and horizontal bars. But, detailed backscattering mechanism and polarimetric characteristics in oyster farm had not been well studied. We could not demonstrate whether the assumption is correct or not and exactly understand what the properties of back scattering were in oyster farm without full polarimetric data. The results of AIRSAR L-band POLSAR data, experiments in laboratory and JERS-l images are discussed. We carried out an experiment simulating a target structure using vector network analyser (Y.N.A.) in an anechoic chamber at Niigata University. Radar returns from vertical poles are stronger than those from horizontal poles by 10.5 dB. Single bounce components were as strong as double bounce components and more sensitive to antenna look direction. Double bounce components show quasi-linear relation with height of vertical poles. As black absorber replaced AI-plate in bottom surface, double bounce in vertical pole decreased. It is observed that not all oyster farms are characterized by double bounced scattering in AIRSAR data. The image intensity of the double bounce dominant oyster farm was investigated with respect to that of oyster farm dominated by single bounce in JERS-l SAR data. The image intensity model results in a correlation coefficient (R2 ) of 0.78 in double bounce dominant area while that of 0.54 in single bouncing dominant area. This shows that double bounce dominant area should be selected for water height measurement using In8AR technique.

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Tension Test of Hybrid Bars with Carbon and Glass Fibers (탄소와 유리 섬유로 제작된 하이브리드 바의 섬유 배치에 따른 인장성능 실험)

  • You Young Jun;Park Ji-Sun;Park Young-Hwan;You Young-Chan;Kim Keung-Hwan;Kim Hyeong-Yeol
    • Proceedings of the Korea Concrete Institute Conference
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    • 2005.05b
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    • pp.325-328
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    • 2005
  • Fiber Reinforced Polymers are recognized as the alternative materials for solving the problem due to the excellent corrosion-resistant property, light-weight and higher strength than steel. Glass fiber is superior to other fibers from the economical point of view but the mechanical property is not. For this reason, researches to improve the mechanical property of glass fiber reinforced polymer rebar has been conducted and it emerged as a solution to make the bar as a hybrid type with carbon fibers. This paper presents results of experimental program to investigate the scattering effectiveness of carbon fibers in glass FRP bar.

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The Use of Lens Shielding Device(L.S.D.) for a Conjunctival Lymphoma

  • Cho Hyun Sang;Ju Sang Gyu;Song Ki Won;Park Young Hwan
    • The Journal of Korean Society for Radiation Therapy
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    • v.9 no.1
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    • pp.40-45
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    • 1997
  • When therapeutic irradiation is indicated for the orbital tumors, the greatest concern is the risk of radiation-induced cataract. Conjunctival lymphoma is one of the good examples. We would like to report the procedure of the lens shielding device(L.S.D) and the result of irradiated dose to the lens. L.S.D. consistes of two parts : load alloy to attenuate electron beam, and dental acryl which completely covers the lead alloy to avoid discomfort of cornea from contacting directly with cerrobend and side scattering by cerrobend. And for easy location and removal, side bars were made on each side. Radiation doses were meaured with TLD(TLD 3500 Hawshaw). Markus chamber in a polystyrene phantom. The phantom was irradiated with 9MeV electron beams from Clinac 2100C with $6{\times}6cm$ electron cone. The relative dose at 6mm depth where the lens is located was $4.2\%$ with TLD and $5.1\%$ with Markus chamber clinically when 2600 cGy are irradiated to the eyeball, the mapinary dose to the lens will be 109 cGy or 132 cGy, which will significently reduce the cataract.

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High Heat-load Slits for the PLS Multi-pole Wiggler (포항방사광가속기의 다극 위글러용 고 열량부하 슬릿)

  • Gil, K.H.;Kim, C.K.;Chung, C.W.
    • Journal of the Korean Vacuum Society
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    • v.16 no.1
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    • pp.46-51
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    • 2007
  • The HFMX((High Flux Macromolecular X-ray crystallography) beamline at Pohang Accelerator Laboratory uses beams from a multi-pole wiggler. Two horizontal and vertical slits relevant to high heat-load are installed at its front-end. In order to treat high heat-load with reducing beam scattering, the horizontal slit has two Glidcop blocks with a grazing incidence angle of $10^{\circ}$ of a grazing-incidence knife-edge configuration. The blocks adjust the slit gap by being translated along guides by two actuating bars, respectively. Water flowing through holes, drilled along the actuating bars, cools the heat-load of both blocks. The vortical slit has the same structure as the horizontal slit except its installation direction with respect to the vacuum chamber and its grazing incidence angle. By virtue of a pair of blocks translating on guides, no alignment between both blocks is required and the installed slits show stable operating performance. The cooling performance of the two slits has been also shown to be acceptable. In this paper, the detailed explanation for the design of the two slits is presented and their operating performance is discussed.