Scattering Bar Optical Proximity Correction to Suppress Overlap Error and Side-lobe in Semiconductor Lithography Process (Overlap Margin 확보 및 Side-lobe 억제를 위한 Scattering Bar Optical Proximity Correction)
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- Journal of the Korea Academia-Industrial cooperation Society
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- v.4 no.1
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- pp.22-26
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- 2003