• Journal of the Korean Ceramic Society
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• v.34 no.1
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• pp.79-87
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• 1997

Anti-reflective and anti-static double layered films were prepared on the VDT panel by sol-gel spin-coating method. Their electrical, opticla, and mechanical properties were investigated. The outer SiO2 film with low re-fractive index was coated over the inner ATO(Antimony-doped Tin Oxide)-SiO2 film which was prepared by mixing ATO sol with SiO2 at molar ratio of 68:32 to satisfy the interference condition of double layers. The heat treatment was conducted at 45$0^{\circ}C$ for 30 min where residual organics were completely removed. The sheet resistance of ATO single layer showed the minimum value of 6$\times$107$\Omega$/$\square$ at 3 mol% addition of Sb and that of SiO2/ATO-SiO2 increased slightly with increasing SiO2 mol% up to 30 mol%, and then increased steeply to the value of 3$\times$108$\Omega$/$\square$ at 32 mol%. The reflectance of double layered films was about 0.64% at the wavelength of 550nm and the transmittance increased about 3.20%. The hardness of double layered films was almost the same as that of uncoated VDT panel, 471.4kg.f/mm2.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.7 no.3
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• pp.418-427
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• 1997

The effect of $La_2O_3$ as a dopant on the microstructure structure, crystal structure and electrical properties was studied. $0.05Pb(Sn_{0.5}Sb_{0.5})O_3＋0.11PbTiO_3＋0.84PbZroO_3＋0.4Wt%MnO_2$ (=0.05PSS ＋0.11PT＋0.84PZ+0.4wt%$MnO_2$) systems doped with 0, 0.1, 0.3, 0.5, 0.7, 1, 3, 5 mole% $La_2O_3$ were fabricated and investigated sintering density, crystal structure and micro-structure. The sintered 0.05PSS＋0.11PT＋0.84PZ+0.4wt%$MnO_2$ system doped with $La_2O_3$showed sintering density of the range of 7.683 g/㎤ of 0 mole% doping to 7.815 g/㎤ of 0 mole% doping. The average grain sizes in the range of 0 to 5 mole% $La_2O_3$were decreased from 9.0 $\mu\textrm{m}$ to 1.3 $\mu\textrm{m}$. X-ray diffraction investigation of sintered bodies showed that solid solutions were formed between 0.05PSS＋0.11PT＋0.84PZ+0.4wt%$MnO_2$ system and $La_2O_3$ in the range of 0 to 1 mole% but second phases were formed in case of 3, 5 mole%. Dielectric constants at 1 kHz were increased with 0 to 3 mlole% $La_2O_3$ before and after poling at the condition of 5 $KV_{DC}$/mm at $120^{\circ}C$ or $140^{\circ}C$ during 20 minutes. All Dielectric losses at 1 kHz were less than 1%, Curie temperatures were $208^{\circ}C$, $183^{\circ}C$, $152^{\circ}C$ and $127^{\circ}C$ at 0, 0.5, 1, 3 mole% $La_2O_3$ respectively. The values of $K_p$ were increased from 0 to 3 mole% $La_2O_3$ after poling at condition of 5 $KV_{DC}$mm at the condition of $120^{\circ}C$ or $140^{\circ}C$. The case of 0.7 mole% $La_2O_3$doped 0.05PSS＋0.11PT＋0.84PZ+0.4wt%$MnO_2$ system showed $K_p$ of 14.5% by poling at $140^{\circ}C$ during 20 minutes.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.135-135
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• 2010

In Mn-Ge equilibrium phase diagram, many Mn-Ge intermetallic phases can be formed with difference structures and magnetic properties. The MnGe has the cubic structure and antiferromagnetic(AFM) with Neel temperature of 197 K. The calculation predicted that the $MnGe_2$ with $Al_2Cu$-type is hard to separate between the paramagnetic(PM) states and the AFM states because this compound displays PM and AFM configuration swith similar energy. Mn-doped Ge showed the FM with Currie temperature of 285 K for bulk samples and 116 K for thin films. In addition, the $Mn_5Ge_3$ compound has hexagonal structure and FM with Curie temperature around 296K. The $Mn_{11}Ge_8$ compound has the orthorhombic structure and Tc is low at 274 K and spin flopping transition is near to 140 K. While the bulk $Mn_3Ge_2$ exhibited tetragonal structure ($a=5.745{\AA}$;$c=13.89{\AA}$) with the FM near to 300K and AFM below 150K. However, amorphous $Mn_3Ge_2$ ($a-Mn_3Ge_2$) was reported to show spin glass behavior with spin-glass transition temperature (Tg) of 53 K. In addition, the transition of crystalline $Mn_3Ge_2$ shifts under high pressure. At the atmospheric pressure, $Mn_3Ge_2$ undergoes the magnetic phase transition from AFM to FM at 158 K. The pressure dependence of the phase transition in $Mn_3Ge_2$ has been determined up to 1 GPa. The transition was found to occur at 1 GPa and 155 K with dT/dP=-0.3K/0.1 GPa. Here report that Ferromagnetic $Mn_3Ge_2$ thin films were successfully grown on GaAs(001) and GaSb(001) substrates using molecular beam epitaxy. Our result revealed that the substrate facilitates to modify magnetic and electrical properties due to tensile/compressive strain effect. The spin-flopping transition around 145 K remained for samples grown on GaSb(001) while it completely disappeared for samples grown on GaAs(001). The antiferromagnetism below 145K changed to ferromagnetism and remained upto 327K. The saturation magnetization was found to be 1.32 and $0.23\;{\mu}B/Mn$ at 5 K for samples grown on GaAs(001) and GaSb(001), respectively.

• Journal of the Korean Chemical Society
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• v.29 no.2
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• pp.172-177
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• 1985

The semiconducting property of Sb-doped tin oxide thin film electrode was investigated and the electrocatalytic effect of this electrode for $SO_2$ (or sulfite, bisulfite ions) oxidation reaction was studied under various conditions. The anodic oxidation of $SO_2$ at tin oxide thin film electrode commenced at lower potential with increasing pH, and good electrocatalytic effect was shown of $SO_3^=$ oxidation in basic solution. In the acidic solutions the electrocatalytic effect of platinum-or palladium-incorporated tin oxide electrode was found to be due to the sites of Pt or Pd exposed on the electrode surface. The electrocatalytic effect of tin oxide electrode was distinctive from that of Pt-or Pd-containing electrodes.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.276.1-276.1
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• 2016

본 연구에서는 차세대 유연 투명 히터 (Flexible and transparent heater) 제작을 위한 ATO 나노입자-은 네트워크 하이브리드 투명 전극의 특성을 연구하였다. 최적화된 은 네트워크 (Self-assembled Ag network) 투명 전극 상에 20-30 nm의 직경을 가지는 ATO (Sb-doped $SnO_2$) 나노입자를 스프레이 방식으로 상압, 상온에서 코팅하여 인쇄형 ATO-은 네트워크 하이브리드 투명 전극을 구현하였다. 스프레이로 코팅된 투명 ATO 나노 입자는 은 네트워크 전극의 빈 공간을 매워 줌으로써 은 네트워크 간의 연결성 및 표면 조도를 낮춰주어 유연 투명 히터 작동 시 전류의 집중 현상을 막아줄 수 있다. ATO-은 네트워크 하이브리드 투명 전극의 최적화를 위해 스프레이 횟수에 따른 하이브리드 투명 전극의 전기적, 광학적, 표면 특성을 분석하였으며, 최적의 조건에서 14 Ohm/square의 면저항과 66%의 투과도를 가지는 하이브리드 투명 전극을 구현하였다. 또한 FESEM 분석을 통해 ATO-은 네트워크 하이브리드 전극의 표면 및 계면 구조를 연구하고 ATO 코팅이 은 네트워크 전극의 특성에 미치는 영향을 규명하였다. 최적화된 ATO-은 네트워크 하이브리드 투명 전극을 이용하여 유연 투명 히터를 제작하고 전압에 따른 히터의 온도의 변화를 측정하여 차세대 유연 투명 히터용 투명 전극으로 인쇄기반 ATO-은 네트워크 하이브리드 투명 전극의 가능성을 확인하였다.

• Journal of the Korean Institute of Telematics and Electronics
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• v.25 no.4
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• pp.422-429
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• 1988

The photoconductive multilayer of Se-As(hole blocking layer)/Se-As-Te (photoconductive layer) /Se-As (layer for supporiting hole transport)/Se-As(layer or controlling total capacitance)/Sb2S3(electron blocking layer) was fabricated and its electrical and optical properties were investigated. The photoconductive multilayer is made of evaporated a-Se as the base material, doped with As and Te to prevent the crystallization of a-Se and to enhance red sensitivity, respectively. The multilayer with good image reproducibility has the following deposition condition. The first layer has the thickness of 250\ulcornerat the deposition rate of 250\ulcornersec. The second layer has the thickness of 800\ulcornerat the deposition rate of 250\ulcornersec. The third layer has the thickness of 125\ulcornerat the deposition rate of 250\ulcornersec. The fourth layer has the thickness of 1700\ulcornerunder the Ar gas ambient of 50x10**-3torr. The image pick-up tube, employing this multilayer demonstrates the following characteristics. The photosensitivity is 0.8, the resolution limit is above 300TV line, and the decay lag is about 7%. And spectral response convers the whole visible range. Therfore the application to color TV camera is expected.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2010.06a
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• pp.324-324
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• 2010

최근에는 압전체의 환경오염 문제의 해결 및 가격경쟁력을 갖추기 위해서 비납계 압전체에 대한 연구가 활발히 진행되고 있다. (Na,K)$NbO_3$ 계는 페로브스카이트 구조를 가지는 비납계 세라믹스로 현재 가장 많이 연구되고 있는 물질 중의 하나이다. 본 연구에서는 압전성이 우수한 $(Na_{0.44}K_{0.52}Li_{0.04})(Nb_{0.9}Ta_{0.04}Sb_{0.06})O_3$ 조성에 CuO, $Cu_2O$ 등의 Cu 산화물을 첨가하였을 때의 전기기계결합계수, 기계적품질계수, 비유전율, 압전전하상수, 문극-전계 이력곡선 (P-E hysteresis curve) 등을 변화를 평가하고자 하였다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.153-153
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• 2008

최근 투명전극물질이 LCD, 박막태양전지, smart window, 유기발광소자 등에 폭넓게 이용됨에 따라 그 수요가 급격이 늘어나고 있다. 이러한 투명전극 물질로는 Al : ZnO, Ga : ZnO, $MgIn_2O_4$, $AgSbO_3$, $InGaZnO_4$, ITO, Zn:ITO 등이 있으며 이중 ITO 계 산화물은 우수한 전기적 특성을 바탕으로 이미 상용화 되어있는 상태이다. 그러나 ITO 계 산화물은 indium 의 희소성과 높은 가격 때문에 폭 넓은 분야의 상용화가 어려운 실정이며, 수소 플라즈마 분위기에 화학적으로 불안정한 특성은 Si 박막태양전지 응용에 큰 문제가 되고 있다. 이에 본 연구는 박막태양전지용 ITO 계 투명전극의 indium양을 줄이면서 화학적으로 안정하고, 전기적 특성이 향상된 박막을 제조하기 위해 combinatorial sputter를 이용하여 Zn의 도핑량을 연속적으로 변화시킨 ITO 박막을 제조하였다. 또한 광학적 전기적 특성의 향상을 위해 vacuum, $H_2$, $O_2$ 분위기에서 열처리 후 각 박막의 특성 변화를 관찰하였다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.29 no.11
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• pp.671-675
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• 2016

Skutterudite materials show PGEC (phonon glass electron crystal) characteristics which is an optimal strategy for designing high performance thermoelectric materials. Now two methods are in parallel to control thermal conductivity of skutterudites, a rattler-atoms doping method and a process for nanostructured bulk materials. Amount of rattler atoms in p-type skutterudite are depends on a Fe/Co ratio of matrix, and the optimal Fe/Co ratio has been reported about from 3:1 to 3.5:0.5 in $R(Fe,Co)_4Sb_{12}$ structure. In this paper, our discussion for rattler doping research was concentrated on double-rattler systems and DD-doped systems in p-type skutterudites. A melt spinning precess combined with high energy ball milling were suggested as a strategy for nanostructured bulk materials with PGEC (phonon glass electron crystal) characteristics in p-type skutterudites.

• Korean Journal of Materials Research
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• v.9 no.5
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• pp.533-537
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• 1999

ATO(Sb doped $SnO_2$) thin films whose thicknesses were 600, 1100 and $2100\AA$ were prepared by DC magnetron sputtering method. They showed the lowest resistivity at DC sputtering power 0.24kW and had lower resistivity with increasing thickness. The power dependence of resistivity among ATO thin films was also different with thickness. The increase of carrier concentration in ATO thin films was responsible for the decrease of resistivity with thickness increase. ATO thin films which were prepared at 30sccm oxygen flow rate showed a great change of sheet resistance under 1M HCl solution. The investigation of SAM(Scanning Auger Microprobe) revealed that oxygen atomic percentage on the surface of ATO thin films was changed. The decrease of sheet resistance also occurred when ATO thin films, prepared at 30sccm oxygen flow rate, were exposed to air for a long period of time. For this reason, it was considered that the desorption of oxygen on ATO surface was accelerated by HCl.