• 한국표면공학회지
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• 제41권5호
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• pp.220-225
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• 2008

In this study, two kinds of Fe-based bulk metallic glasses (BMG) powder were built-up through atmospheric plasma spray (APS) technique. The microstructure of two coatings was analyzed through X-ray diffraction, scanning electron microscopy and transmission electron microscopy. Crystallization and oxidation in coatings were affected by chemical composition and initial powder size. Then, both of them influenced the tribological property.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 춘계학술대회 논문집 센서 박막재료 반도체재료 기술교육
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• pp.82-85
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• 2002

In recent years, the tantalum nitride(TaN) thin-film has been developed for the electronic resistor and capacitor. In this papers, this study presents the surface profile and sheet-resistance property relationship of reactive-sputtered TaN thin film resistor processed by buffer of Ti and Cr on alumina substrate. The TCR properties of the TaN films were discussed in terms of reactive gas ratio, ratio of nitrogen, crystallization and thin films surface morphology due to annealing temperature. It is clear that the TaN thin-films resistor electrical properties are low TCR related with it's buffer layer condition. Ti buffer layer thin film resistor having a good thermal stability and lower TCR properties then Cr buffer expected for the application to the dielectric material of passive component.

• 한국세라믹학회지
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• 제33권12호
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• pp.1380-1386
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• 1996

The effects of urea addition and reaction conditions were examined in the prepareation of zirconia coated SiC whiskers through surface precipitation taking place during high-temperature aging of Zr(SO4)2 solutions containing the whiskers. More dense zirconia-hydrate was precipitated on the surfaces of the whiskers in the presence of urea. The ratio of the concentration of Zr(SO4)2 to the amount of added whiskers was the most important factor to confine the precipitation of zirconia-hydrate only at the surfaces of the whiskers The from of the coating layers was unchanged after heat-treatment leading to the dehydration and crystallization of the layers.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2015년도 추계학술대회 논문집
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• pp.278-279
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• 2015

CIGS 전구체는 각각 DC와 RF power로 셀레늄(Se)이 포함된 CuSe 타겟과 $(In,Ga)Se_2$ 타겟을 이용하여 스퍼터링 기법으로 증착한 후에 고속결정화 특성을 위해 전자빔을 조사하였다. 전자빔의 가속 전자의 강도(DC power)는 2.5~3.5keV로 조정하고 조사시간은 300초, RF power는 200W로 고정하였다. SEM image에서 전구체의 두께가 가속 전자의 강도에 따라 100~200nm의 손실됨을 확인할 수 있었다. XRD data 결과에서 3keV에서 조사된 샘플에서 가장 높은 (112) 피크의 특정 배양성을 보여 높은 결정화특성을 나타내었다. 조성비간의 변화를 보기 위해 XRF data 분석결과 전구체와 샘플간의 조성비의 차이는 그리 크지 않으나 I/III 족 비가 3 keV에서 가장 이상적인 비율이라 알려져 있는 1.0을 보였다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2012년도 추계총회 및 학술대회 논문집
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• pp.194-195
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• 2012

대향 타겟 스퍼터링법 (Facing Targets Sputtering)을 이용하여 저온 공정에서 ZnO 박막을 증착하였다. 이 실험에서 두 개의 타겟의 거리를 70nm로 고정하고 박막의 증착두께를 150nm로 정하였다. 인가전압을 변수로 하였을 경우 ZnO 박막의 방향성과 결정성을 XRD로 측정하고 분석하였고 OES로 플라즈마 진단을 하였다. 그 결과 인가전압의 증가에 따라 결정성은 증가하였다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2014년도 추계학술대회 논문집
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• pp.162-163
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• 2014

Aluminum anodizing is a technique that can be formed pores well aligned various diameters. We were prepared CNFs using the polymer as carbon source using the AAO as a template. CNFs can be heat treated at $1400^{\circ}C$ and became soft carbon. It showed electrochemical behavior by Crystallization. In this experiment, I was observing the behavior as a anode material for LIC of CNFs having different diameters.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2014년도 추계학술대회 논문집
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• pp.117-117
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• 2014

Thin $ZrO_2/Al_2O_3$ films were deposited on a tool steel substrate using Zr and Al cathodes in a cathodic arc plasma deposition system (CAPD), and then oxidized at $600-900^{\circ}C$ in air for up to 50 h. They effectively suppressed the oxidation of the substrate up to $800^{\circ}C$ by acting as a barrier layer against the outward diffusion of the substrate elements and inward diffusion of oxygen. However, rapid oxidation occurred at $900^{\circ}C$ due mainly to the increased diffusion and subsequent oxidation of steel as well as the crystallization of amorphous $Al_2O__3$.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1997년도 하계학술대회 논문집 C
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• pp.1588-1590
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• 1997

The viewing angle characteristics of amorphous(a)-twisted nematic(TN)-liquid crystal display (LCD) on poly(vinyl)cinnamate (PVC) surfaces with photo polymerrization were investigated. It was found that the threshold voltage increases with increasing the polymerization of PVC surfaces. That the domain size of a-TN-LCD is affected by the surface crystallization with increasing the photo polymerization of the photo-alignment film. We observed that the viewing angle of a-TN-LCD increased with increasing the photo polymerization on PVC surfaces. Finally, we consider that the viewing angle of a-TN-LCD on PVC surfaces is large compared to a-TN-LCD on polyimide(PI) surface.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1994년도 하계학술대회 논문집 C
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• pp.1239-1242
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• 1994

We have characterized XeCl excimer-laser-induced crystallization of thin amorphous silicon films deposited by PECVD (${\alpha}-Si:H$) and LPCVD(${\alpha}-Si$). The electrical and optical properties and surface roughness of crystallized thin films have been measured. The dc conductivities, crystallinity and surface roughness of the films increased as the laser energy density and shot density were increased. Also, we have investigated the effects of 2-step annealing employing SPC and ELA. The properties of 2-step annealed films were better than those of films annealed by ELA only.

• 한국표면공학회지
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• 제25권6호
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• pp.293-298
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• 1992

Various vanadium-oxide thin films were deposited by e-beam and thermal evaporation of V2O5, V2O3, and VO2 powders. Films with thickness of $2000\AA$ were subjected to annealing at $300^{\circ}C$~$450^{\circ}C$ in N2 atmosphere for the crystallization and desification purposes. For the films deposited from V2O5 and VO2 sources, sources, Magneli (VnO2n-1$ 4\leq$ $n\leq$ 8) and VO2 phase appeared at $300^{\circ}C$, respectively, but VO2 phase also transformed into Magneli phase at $450^{\circ}C$ by severe reduction. On the contrary, VO2/VO mixed phases resulted from congruent evaporation of V2O3 unchanged after the same annealing treatment due to the balanced reduction and oxidation of VO2 and VO whcih have different equilibrium O2 pressures. It is suggested that the annealing in the controlled oxidation atmosphere or the deposition using mixed oxide sources are necessary to get the film containing VO2 phase.