• Title/Summary/Keyword: SI

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Settling of SiC Particlesin the Al-Si/${SiC}_{p}$ Composite Melts (Al-Si/$\{SiC}_{p}$ 복합재료 용탕에서 SiC 입자의 침강)

  • Kim, Jong-Chan;Gwon, Hyeok-Mu
    • Korean Journal of Materials Research
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    • v.7 no.2
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    • pp.145-151
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    • 1997
  • Remelting of $A-Si/SiC_{p}$ composites followed by isothermal holding and solidification, leads ro the settling of Sic particles to the bottom of the mold. With the isothermal holding time for molten $A-Si/SiC_{p}$ composites. the particle free zone increases rapidly up to approximately first 30 minutes of the holding time. Experimental resulls of the particle settling confirm that the larger SIC particles sink faster tlun the sniiller particles. An increase in volume fraction of Sic particles decreases the setrling velocity of the particles.

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Selective chemical vapor deposition of $\beta$-SiC on Si substrate using hexamethyldisilane/HCl/$H_{2}$ gas system (Hexamethyldisilane/HCl/$H_{2}$ gas system을 이용한 Si 기판에서 $\beta$-SiC의 선택적 화학기상증착)

  • 양원재;김성진;정용선;오근호
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.9 no.1
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    • pp.14-19
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    • 1999
  • Using a single precursor of hexamethyldisilane $(Si_{2}(CH_{3})_{6})$, $\beta$-SiC film was successfully deposited on a Si substrate at $1100^{\circ}C$ by a chemical vapor deposition method. Selectivity of SiC deposition on a Si substrate partially covered with a masking material was investigated by introducing HCl gas into hexamethyldisilane/$H_{2}$ gas system during the deposition. The schedule of the precursor and HCl gas flows was modified so that the selectivity of SiC deposition between a Si substrate and a mask material should be improved. It was confirmed that the selectivity of SiC deposition was improved by introducing HCl gas. Also, the pulse gas flow technique was effective to enhance the selectivity.

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High Temeprature Strength Property of Continuous SiC Fiber Reinforced SiC Matrix Composites (SiC 장섬유 강화 SiC 기지 복합재료의 고온강도 특성)

  • Shin, Yun-Seok;Lee, Sang-Pil;Lee, Jin-Kyung;Lee, Joon-Hyun
    • Proceedings of the Korean Society For Composite Materials Conference
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    • 2005.04a
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    • pp.102-105
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    • 2005
  • The mechanical properties of $SiC_f/SiC$ composites reinforced with continuous SiC fiber have been investigated in conjunction with the detailed analysis of their microstructures. Especially, the effect of test temperature on the characterization of $SiC_f/SiC$ composites was examined. In this composite system, a braiding Hi-Nicalon SiC fibric was selected as a reinforcement. $SiC_f/SiC$ composites have been fabricated by the reaction sintering process, using the complex matrix slurry with a constant composition ratio of SiC and C particles. The characterization of $RS-SiC_f/SiC$ composites was investigated by means of SEM, EDS and three point bending test. Based on the mechanical property-microstructure correlation, the high temperature applicability of $RS-SiC_f/SiC$ composites was discussed.

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Cutting Characteristics of SiC-based Ceramic Cutting Tools Part 1: Microstructure and Mechanical Properties of SiC-based Ceramic Cutting Tools (SiC계 세라믹 절삭공구의 절삭특성 평가 Part 1: SiC계 절삭공구의 미세구조와 기계적 특성)

  • Park, June-Seuk;Kim, Kyeug-Jae;Shim, Wan-Hee;Kwon, Won-Tae;Kim, Young-Wook
    • Journal of the Korean Society for Precision Engineering
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    • v.18 no.9
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    • pp.82-88
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    • 2001
  • In order to fulfil the requirements of the various performance profiles of ceramic cutting tools, six different SiC-based ceramics have been fabricated by hot-pressing (SiC--${Si}_3 {N}_4$composites) or by hot-pressing and subsequent annealing (monolithic SiC and SiC-TiC composites). Correlation between the annealing time and the corresponding microstructure and the mechanical properties of resulting ceramics have been investigated. The grain size of both ${Si}_3 {N}_4$and SiC in SiC-${Si}_3 {N}_4$composites increased with the annealing time. Monolithic SiC has the highest hardness, SiC-TiC composite the highest toughness, and the SiC-${Si}_3 {N}_4$composite the highest strength among the ceramics investigated. The hardness of SiC-${Si}_3 {N}_4$composites was relatively independent of the grain size, but dependent on the sintered density. The cutting performance of the newly developed SiC-based ceramic cutting tools will be described in Part 2 of this paper.

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Effect of(Si+C) Content on the Strength of SiC-(Si+C) Sintered Bodies (SiC-(Si+C) 소결체의 강도에 미치는 (Si+C)첨가량의 영향)

  • 김은태;김완덕;최진영;우정인
    • Journal of the Korean Ceramic Society
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    • v.23 no.3
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    • pp.9-14
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    • 1986
  • $\beta$-SiC bonded SiC bodies were prepared from various conditions such as several compositions of(Si+C)/$\alpha$ -SiC ratio and different firing schedules and were respectively investigated compressive strength MOR and mi-crostructure. One firing schedule which produced the specimens that had $\beta$-SiC neck form with the highest strength was selected and experimented by each firing temperature. results obtained are as follows : 1) The amount of (Si+C) for th highest MOR of SiC-(Si+C) sintered body is 20wt% 2) By adding 20wt% content of (Si+C) and heating up to 1, 500 with soaking 3hrs respectively at 1,150$^{\circ}C$ 1,250$^{\circ}C$ 1,350$^{\circ}C$ and 1,400$^{\circ}C$ the highest MOR of fired specimen was resulted and its microstructure of ma-trix was composed of close $\beta$-SiC neck. 3) Microstructure of $\beta$-SiC were different greatly from each other by firing time and/or quantity of adding mix-ture and it was confirmed that they were composed of neck particle-like and heterogeneous texture. 4)$\beta$-SiC synthesis proceed rapidly at the temperature between 1,250$^{\circ}C$ and 1,350$^{\circ}C$ 5) All of the properties of 85 SiC-20(Si+C) specimen improved according to increasing temperature above 1,350$^{\circ}C$.

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Interfacial Characteristics of $\beta$-SiC Film Growth on (100) Si by LPCVD Using MTS (MTS를 사용한 LPCVD 법에 의한 (100)Si 위의 $\beta$-SiC 증착 및 계면특성)

  • 최두진;김준우
    • Journal of the Korean Ceramic Society
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    • v.34 no.8
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    • pp.825-833
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    • 1997
  • Silicon carbide films were deposited by low pressure chemical vapor deposition(LPCVD) using MTS(CH3SICl3) in hydrogen atmosphere on (100) Si substrate. To prevent the unstable interface from being formed on the substrate, the experiments were performed through three deposition processes which were the deposition on 1) as received Si, 2) low temperature grown SiC, and 3) carbonized Si by C2H2. The microstructure of the interface between Si substrates and SiC films was observed by SEM and the adhesion between Si substrates and SiC films was measured through scratch test. The SiC films deposited on the low temperature grown SiC thin films, showed the stable interfacial structures. The interface of the SiC films deposited on carbonized Si, however, was more stable and showed better adhesion than the others. In the case of the low temperature growth process, the optimum condition was 120$0^{\circ}C$ on carbonized Si by 3% C2H2, at 105$0^{\circ}C$, 5 torr, 10 min, showed the most stable interface. As a result of XRD analysis, it was observed that the preferred orientation of (200) plane was increased with Si carbonization. On the basis of the experimental results, the models of defect formation in the process of each deposition were compared.

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Decomposition Behavior of Ferro-Si3N4 for High Temperature Refractory Application (고온 내화물 응용을 위한 질화규소철 (Ferro-Si3N4)의 분해거동)

  • Choi, Do-Mun;Lee, Jin-Seok;Choi, Sung-Churl
    • Journal of the Korean Ceramic Society
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    • v.43 no.9 s.292
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    • pp.582-587
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    • 2006
  • Decomposition behavior of $ferro-Si_3N_4$was investigated with varying temperature and holding time in mud components for high temperature refractory applications. Porosities gradually increased with increasing temperature and holding time due to the carbothermal reduction of $Si_3N_4\;and\;SiO_2$. Silicon monoxide (SiO) as a intermediate resulted from evaporation of $Si_3N_4\;and\;SiO_2$ reacted with C sources to generate needle-like ${\beta}-SiC$ and Fe in $Si_3N_4$ acted as a catalyst in order to enhance growth of SiC grain with the preferred orientation. SiC generation yield increased with increasing holding time, all of the $Si_3N_4\;and\;SiO_2$ affected on SiC formation up to 2h. However, SiC generation was only dependent on residual $SiO_2$ over 2h, because the carbothermal reduction reaction of $Si_3N_4$ was no longer possible at that time.

Structural Study of Interface Layers in Tetragonal-NiSi (010)/Si using Density Functional Theory (밀도범함수를 이용한 정방정계-NiSi (010)/Si 계면 층의 구조 연구)

  • Kim, Dae-Hee;Kim, Dae-Hyun;Seo, Hwa-Il;Kim, Yeong-Cheol
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.5
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    • pp.377-381
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    • 2009
  • Tetragonal-NiSi (010)/Si superstructures were calculated for studying the interface structure using density functional theory, The orthorhombic-NiSi was changed to the tetragonal-NiSi to be matched with the Si surface for epitaxy interface. The eight interface models were produced by the type of the Si surfaces, The tetragonal-NiSi (010)/Si (020)[00-1] superstructure was energetically the most favorable, and the interface thickness of this superstructure was the shortest among the tetragonal-NiSi (010)/Si superstructures. However, in the case of tetragonal-NiSi (010)/Si (010)[00-1] superstructure, it was energetically the most unfavorable, and the interface thickness was the longest. The energies and interface thicknesses of tetragonal-NiSi (010)/Si superstructures were influenced by the coordination number of Ni atoms and the bond length between atoms located at the interface.

The Development of Microstructure in $Si_3N_4$-Bonded SiC Refractory ($Si_3N_4$ 결합 SiC 내화재료에 있어서 생성된 $Si_3N_4$의 미구조 변화)

  • 최덕균;이준근
    • Journal of the Korean Ceramic Society
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    • v.19 no.2
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    • pp.121-126
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    • 1982
  • This paper deals with the $Si_3N_4$-bonded SiC refractory in terms of its microstructure development during nitridation. When mixture of SiC grains and fine Si power is fired under nitrogen atmosphere, an interlocking network of $Si_3N_4$ whiskers is formed by nitridation of Si. It is found that the strength of $Si_3N_4$-bonded SiC refractory is soley due to the physical nature of this interlocking whiskers. At the initial stage of nitridation, $Si_3N_4$ whisker forms in very thin and long shape and, with further nitridation, it becomes thicker with diameters up to 0.35$\mu\textrm{m}$. It is found that the mechanical strength of $Si_3N_4$-bonded SiC refractory depends on the degree of nitridation and the development of microstructure.

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Effect of WSi$_2$ Gate Electrode on Thin Oxide Properties in MOS Device (MOS 소자에서 WSi$_2$ 게이트 전극이 Thin Oxide 성질에 미치는 영향)

  • 박진성;이현우;김갑식;문종하;이은구
    • Journal of the Korean Ceramic Society
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    • v.35 no.3
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    • pp.259-263
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    • 1998
  • WSi2/CVD-Si/SiO2/Si-substrate의 폴리사이드 구조에서 실리콘 증착 POCl3 확산 그리고 WSi2 증착 유무에 따른 Thin oxide 특성을 연구했다 WSi2 막을 증착하지 않은 CVD-Si/SiO2/Si-substrate 구조에서 CVD-Si을 po-lycrystalline-Si으로 증착한 시편이 amorphous-Si을 증착한 시편보다 산화막 불량이 적다 WSi2 를 증착시킨 WSi2/CVD-Si/SiO2./Si-substrate의 구조에서 CVD-Si의 polycrystalline-Si 혹든 amorphous-Si 의 막 증착에 따른 thin oxide의 불량율 차이는 미미하다 산화막 불량은 CVD-Si에 확산시킨 인(P) 증가 즉 면저항(sheet resistance) 감소로 증가한다. Thin oxide의 절연특성은 WSi2 증착으로 저하된다 WSi2 증착으로 산화막 두께는 증가하나 막 특성은 열등해져 산화막 절연성이 떨어진다.

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