• Title/Summary/Keyword: S.korea

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Study of Quotations From Western Media in Disaster Report: Focusing on Covid-19 Outbreak

  • Hyun Ban
    • International Journal of Advanced Culture Technology
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    • v.12 no.2
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    • pp.1-6
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    • 2024
  • The Covid 19 pandemic officially broke out in Jan 2020 and ended in Mar.2023, following the WHO, claiming 7 million lives. For the three years, while the world made concerted effort to fight against the deadly virus, South Korea was praised as a model country in that the country effectively contained the spread of the virus. Given this, the paper aims to figure out how South Korea's story was quoted by looking at six editorials in the New York Times and the Washington Post. For this aim, we have analyzed linguistic expressions within White (2003)'s appraisal theory and then conducted a key word frequency analysis. The analysis results as follows: first South Korea's story was quoted to criticize the U.S. government of its wrong management to the Covid-19, also giving some lessons to the world; second, both newspapers attribute the South Korea's success to its swift and rapid response to the pandemic; and third, the Washington Post showed more positive attitude to South Korea than the New York Times by quoting the country's success more frequently with more positive words in evaluating the country's responses to the pandemic while both newspapers showed negative attitudes to the U.S. government to the issue. Thus, it can be concluded that linguistic expressions in quotations are effectively used in showing the newspapers' attitude toward South Korea and the U.S.

A Power Analysis Attack Countermeasure Not Using Masked Table for S-box of AES, ARIA and SEED (마스킹 테이블을 사용하지 않는 AES, ARIA, SEED S-box의 전력 분석 대응 기법)

  • Han, Dong-Guk;Kim, Hee-Seok;Song, Ho-Geun;Lee, Ho-Sang;Hong, Seok-Hie
    • Journal of the Korea Institute of Information Security & Cryptology
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    • v.21 no.2
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    • pp.149-156
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    • 2011
  • In the recent years, power analysis attacks were widely investigated, and so various countermeasures have been proposed. In the case of block ciphers, masking methods that blind the intermediate values in the en/decryption computations are well-known among these countermeasures. But the cost of non-linear part is extremely high in the masking method of block cipher, and so the countermeasure for S-box must be efficiently constructed in the case of AES, ARIA and SEED. Existing countermeasures for S-box use the masked S-box table to require 256 bytes RAM corresponding to one S-box. But, the usage of the these countermeasures is not adequate in the lightweight security devices having the small size of RAM. In this paper, we propose the new countermeasure not using the masked S-box table to make up for this weak point. Also, the new countermeasure reduces time-complexity as well as the usage of RAM because this does not consume the time for generating masked S-box table.

The Preferred Orientation of CdSe and CdS Thin Films on the AlOx and SiO2 Templates (AlOx와 SiO2 형판위 CdSe와 CdS 박막의 우선방위(Preferred Orientation) 특성)

  • Lee, Young-Gun;Chang, Ki-Seog
    • Journal of the Korea Institute of Military Science and Technology
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    • v.15 no.4
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    • pp.502-506
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    • 2012
  • In order to find the structural characteristics of the thin films of group II-VI semiconductor compounds compared with those of powder materials, films were made of 4 powders of ZnS, CdS, CdSe, and CdTe(Aldrich), each with 99.99 % purity. For the ZnS/CdS multi-layers, the ZnS layer was coated over the CdS layer on an $AlO_x$ membrane, which served as a protective layer within a vacuum at the average speed of 1 ${\AA}$/sec. After studying the structures of the group II-VI semiconductor thin films by using X-ray spectroscopy, we found that the ZnS, ZnS/CdS, CdS, and CdSe films were hexagonal and exhibited some degree of preferred orientation. Also, the particles of the thin films of II-VI semiconductor compounds proved to be more homogeneous in size compared to those of the powder materials. These results were further verified through scanning electron microscopy(SEM), EDX analysis, and powder and thin film X-ray diffraction.