Characterization of $HfO_2 /SiON$ stack structure for gate dielectrics
(ALD를 이용한 극박막 $HfO_2 /SiON$ stack structure의 특성 평가)
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- Proceedings of the International Microelectronics And Packaging Society Conference
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- 2002.11a
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- pp.115-121
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- 2002