• Journal of Electrical Engineering and Technology
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• 제13권2호
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• pp.886-891
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• 2018

Colloid silica using as abrasive for polishing sapphire has been extensively studied, which mechanism has also been deeply discussed. However, by the requirement of application enlargement and cost reduction, some new problems appear such as silica service life time, particle diameter mixing, etc. In this paper, several influences of colloid silica usage on sapphire CMP are examined. Results show particle diameter and concentration, pH value, service life time, particle diameter mixing heavily influence removal rate. Further analysis discloses there are two main effect aspects which are quantity of hydroxyl group, contact area for abrasive density stacking between abrasive and sapphire. Based on the discussions, a dynamic process of sapphire polishing is proposed.

• 펄프종이기술
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• 제33권3호
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• pp.24-28
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• 2001

The utilization of wastepaper as a papermaking raw material is everlastingly required for the environmental protection of earth. However the recycling of wastepaper for this purpose cause another problem such as the increasing of the load of wastewater treatment, lower strength properties of paper, and poor printability, etc. The interest in the development of the environmentally friendly deinking technology is increased continuously. Thus, our research team have tried to apply the ozone to the deinking of white ledger and ONP, and obtained the positive results which can be considered as an alternative method for the conventional deinking method. The purpose of this study is to investigate the mechanism of ozone deinking. Styrene acrylate and polystyrene were treated with ozone and measured the change of molecular weight with the GPC. The molecular weight distribution obtained with GPC showed only slight increase by the ozone treatment, and gel formation by the polymerization was observed. Therefore the removal of ink particles with ozone treatment seems to be facilitated by the increase of the brittleness and decrease of adhesive property.

• 한국식품저장유통학회지
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• 제6권1호
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• pp.66-70
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• 1999

The mechanism of natural removal of astringency and seasonal changes of tannin substance in sweet persimmon(Fuyu) and astrigent persimmon(Chungdo Bansi)were investigated. Tannin productivity of astringent persimmon fruit was higher than that of sweet perimmon fruit during growth. In the reactivity of tannin to acetaldehyde, it was observed that tannin from sweet persimmon have a milder chemical properties than that from astrigent persimmon. The threshold value of astringency on sweet persimmon tannin was higher than that of astrigent persimmon tannin. Tannin substances from sweet persimmon distributed mainly in lower molecular weight range at harvest stage, but those from astrigent persimmon distributed mainly in higher molecular weight range. Therefore, the natural removal of astringency was related to difference of tannin productivity, threshold value of astringency, reactivity and qualitative difference of tanni.

• 한국항해항만학회:학술대회논문집
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• 한국항해항만학회 2007년도 추계학술대회 및 제23회 정기총회
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• pp.200-201
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• 2007

The present study was conducted in three fields at Namhae to examine the removal efficiency of organic free, heavy metal immobilized sediment on Cochlodinium polykrikoidesand and on sea water quality. The present study results concluded that removal efficiency was depends on the initial number of red tide cells. There was no drastic change in the sea water quality after sediment spray. For the comparison of effectiveness of betonite, zeolite and lime were mixed with sediment did not show any marked difference in removal. Finally, the present study evaluated 50g/$m^{2}$ sediment is sufficient to remove 100% cells density, even though various environmental factors are interfering the mechanism.

• 환경위생공학
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• 제11권2호
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• pp.65-73
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• 1996

The objective of this study is to investigate the removal efficiency of volitile organic compounds in soil, and the mechanism of desorption by bench scale microwave heating, Silt soil used for experiment and was impregnated with toluene, tetrachloroethylene, o-xylene and p-dichlorobenzene and the microwave treatment was conducted in a modified domestic microwave oven : 2450MHz, 700W. According to the results of the research the removal efficiency was improved with increasing water contents and the soil temperature appeared to plateau period extending to 2-3minutes corresponds to the temperature a which steam distillation was expected. The value of removal rate constant (k) were calculated on dry and moisty silt soil, respectively, which showed linear with increasing microwave heating time. Therefore, addition of a certain amount of water to the contaminated soil can efficiently enhance the ability of the soil to absorb microwave energy and promote the evaporation of the volitile contaminants.

• 한국공작기계학회:학술대회논문집
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• 한국공작기계학회 2003년도 추계학술대회
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• pp.324-328
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• 2003

The Magnetoeheological fluid has the properties that it's viscosity has dramastic changed under some magnetic fields therefore, Magnetorhlogical fluids has been used for micro polishing of the micro part( for example, a aspherical surface in a micro lens). The polishing process may appears as follows. A part rotating on the spindle is brought into contact with an Magnetorhological finshing(MRF) fluids which is set in motion by the moving wall. In the region where the part and the MRF fulid ate brought into contact, the applied magnetic field creates the conditions necessary for the material removal from the part surface. The material removal takes place in a certain region contacting the surface of the part which can be called the polishing spot or zone. The polishing mechanism of the material removal in the contact zone is considered as a process governed by the particularities of the Bingham flow in the contact zone. Resonable calculated and experimental magnitudes of the material removal rate f3r glass polishing lends support the validity of the approach.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2003년도 춘계학술대회 논문집
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• pp.1840-1843
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• 2003

The Magnetorheological fluid has the properties that its viscosity has drastic changed under some magnetic fields therefore, Magnetorheological fluids has been used for micro polishing of the micro part( for example, a aspherical surface in a micro lens). The polishing process may appears as follows. A part rotating on the spindle is brought into contact with an Magnetorheological finishing(MRF) fluids which is set in motion by the moving wall. In the region where the part and the MRF fluid ate brought into contact, the applied magnetic field creates the conditions necessary for the material removal from the part surface. The material removal takes place in a certain region contacting the surface of the part which can be called the polishing spot or zone. The polishing mechanism of the material removal in the contact zone is considered as a process governed by the particularities of the Bingham flow in the contact zone. Resonable calculated and experimental magnitudes of the material removal rate for glass polishing lends support the validity of the approach.

• 한국정밀공학회지
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• 제21권7호
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• pp.46-52
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• 2004

The Magnetorheological fluid has the properties that its viscosity has drastic changed under some magnetic fields therefore, Magnetorheological fluids has been used fur micro polishing of the micro part(for example, a spherical surface in a micro lens). The polishing process may appears as follows. A part rotating on the spindle is brought into contact with an Magnetorheological finishing(MRF) fluids which is set in motion by the moving wall. In the region where the part and the MRF fluid are brought into contact, the applied magnetic field creates the conditions necessary for the material removal from the part surface. The material removal takes place in a certain region contacting the surface of the part which can be called the polishing spot or zone. The polishing mechanism of the material removal in the contact zone is considered as a process governed by the particularities of the Bingham flow in the contact zone. Resonable calculated and experimental magnitudes of the material removal rate for glass polishing lends support the validity of the approach.

• 한국정밀공학회지
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• 제21권11호
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• pp.46-52
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• 2004

CMP (Chemical-Mechanical Polishing) is a process in which both chemical and mechanical mechanisms act simultaneously to produce the planarized wafer. CMP process is an extensive usage and continuing high growth rates in the semiconductor industry. The understanding of the process, however, is much slower. The nature of material removal from the wafer is still undefined and ambiguous. Material removal rate according to the slurry flow rate is also undefined and ambiguous. Thus, in this study, the basic mechanism of material removal rate as slurry flow rate is defined in terms of energy supply and energy loss.

• 청정기술
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• 제16권4호
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• pp.258-264
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• 2010

본 연구에서는 제강전기로 슬래그를 해양복토제로 활용하기 위한 인제거 특성실험을 실시하였다. 제강전기로 슬래그의 $PO_4{^-}-P$ 제거 특성에 관한 시험 결과, 슬래그 내의 CaO는 $Ca^{2+}$와 $OH^-$로 이온화됨에 따라 $PO_4{^-}-P$와 반응하여 HAP를 형성함으로써 용액 중에 존재하는 $PO_4{^-}-P$를 효과적으로 제거하는 것으로 나타났다. 연속반응기를 통한 해수 내 $PO_4{^-}-P$의 지속적인 유업에 대한 제거특성을 확인한 결과, 칼럼 내 $PO_4{^-}-P$ 농도는 반응 3일 이후 급격히 감소하여 10일 이후에는 0.5 ppm 이하로 나타났다. 실제 연안해역의 저질을 이용한 제강전기로 해양복토제 적용실험 결과, 반응 25일 후 $PO_4{^-}-P$ 발생량을 93~98% 저감시키는 것으로 나타났다. 이러한 결과를 바탕으로 제강전기로 슬래그를 해양복토제로 활용할 경우 $PO_4{^-}-P$ 제거 및 억제효과가 있으며, 파쇄선별 등 별도의 추가공정 없이 적은 량으로도 사용 가능할 것으로 판단된다.