• Journal of the Microelectronics and Packaging Society
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• v.20 no.2
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• pp.23-28
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• 2013

Microlens array as basic element of the optical system have been fabricated with various focal length (mainly with long focal length) depending on the purpose of application. In this paper, the microlens arrays were fabricated for observing fluorescent images within sol-gel. Though the fluorescent signal is very low, the microlens array can help obtaining clear images through extracting the fluorescent light from sol-gel. We fabricated microlens arrays with short focal length, which can extract the light using photoresist thermal reflow method. In the experiment, the diameter of microlens decreased after thermal reflow because the solvent within the photoresist was vaporized. Therefore, to compensate the shape error by this reduction, microlens diameter in photomask was altered and spin-coat recipe of photoresist were modified.

• Journal of the Korean Vacuum Society
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• v.6 no.3
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• pp.206-212
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• 1997

The reflow characteristics of copper, which is expected to be used as interconnection materials in the next generation semiconductor devices, were investigated. Copper films were deposited on hole and trench patterns by metal organic chemical vapor deposition and annealed in nitrogen and oxygen ambient with the annealing temperatures ranging from $350^{\circ}C$ to $550^{\circ}C$. Copper films were not reflowed into the patterns upon the annealing in nitrogen ambient, but reflowed at the annealing temperature higher than $450^{\circ}C$ in oxygen ambient. It is considered that the reflow takes place as the heat generated by the oxidation of copper liquefies the copper film partly and the liquid copper fills the patterns for minimizing the surface energy and the potential energy. Upon the annealing in oxygen ambient, the copper oxide whose thickness was less than 300$\AA$ formed at the surface of an agglomerate and the resistivity of copper film increased drastically at an annealing temperature of $550^{\circ}C$ due to the copper agglomeration.

• Journal of the Korean institute of surface engineering
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• v.36 no.5
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• pp.373-378
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• 2003

With increasing environmental concerns, application of lead-free solder and fluxless soldering process have been taken attention from the electronic packaging industry. Plasma treatment is one of the soldering methods for the fluxless soldering, and it can prevent environmental pollution cased by flux. On this study fluxless soldering process under $Ar-H_2$plasma using lead free solders such as Sn-3.5 wt%Ag, Sn-3.5 wt%Ag-0.7 wt%Cu and Sn-37%Pb for a reference was investigated. As the plasma reflow has higher soldering temperature than normal air reflow, the effects of UBM(Under Bump Metallization) thickness on the interfacial reaction and bonding strength can be critical. Experimental results showed in case of the thin UBM, Au(20 nm)/Cu(0.3 $\mu\textrm{m}$)/Ni(0.4 $\mu\textrm{m}$)/Al(0.4 $\mu\textrm{m}$), shear strength of the soldered joint was relatively low as 19-27㎫, and it's caused by the crack observed along the bonded interface. The crack was believed to be produced by the exhaustion of the thin UBM-layer due to the excessive reaction with solder under plasma. However, in case of thick UBM, Au(20 nm)/Cu(4 $\mu\textrm{m}$)/Ni(4 $\mu\textrm{m}$)/Al(0.4 $\mu\textrm{m}$), the bonded interface was sound without any crack and shear strength gives 32∼42㎫. Thus, by increasing UBM thickness in this study the shear strength can be improved to 50∼70%. Fluxed reflow soldering under hot air was also carried out for a reference, and the shear strength was 48∼52㎫. Consequently the fluxless soldering with plasma showed around 65∼80% as those of fluxed air reflow, and the possibility of the $Ar-H_2$ plasma reflow was evaluated.

• Journal of the Korean Vacuum Society
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• v.4 no.S1
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• pp.102-107
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• 1995

We review the copper CVD line, via fill properties, and CMP line resistance. With CVD, trenches and vias with high aspect ratio(above 3) can be filled completely. Sputtering-reflow technique, a new method to filling copper into lines, is also reviewed to compare the CVD process.

• Proceedings of the KWS Conference
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• 2003.11a
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• pp.80-82
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• 2003

• Journal of Welding and Joining
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• v.19 no.5
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• pp.520-525
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• 2001

The Sn-Pb eutectic solder bump formation ($150\mu\textrm{m}$ diameter, $250\mu\textrm{m}$ pitch) by electroplating was studied for flip chip package fabrication. The effect of current density and plating time on Sn-Pb deposit was investigated. The morphology and composition of plated solder surface was examined by scanning electron microscopy. The plating thickness increased wish increasing time. The plating rate became constant at limiting current density. After the characteristics of Sn-Pb plating were investigated, Sn-Pb solder bumps were fabricated in optimal condition of $7A/dm^$. 4hr. Ball shear test after reflow was performed to measure adhesion strength between solder bump and UBM (Under Bump Metallurgy). The shear strength of Sn-Pb bump after reflow was higher than that of before reflow.

• Journal of the Korean Society for Precision Engineering
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• v.32 no.3
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• pp.299-305
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• 2015

In this paper, we propose a simple and low-cost fabrication method of polymer microlens using solvent-vapor-assisted reflow (SVAR). Metal molds for replication of polymer were fabricated using micro milling and the cylindrical shape of polymer was imprinted using hot-embossing process. The cylindrical shape of polymer was changed to hemispherical lens shape by SVAR. The characteristics of fabricated microlens were evaluated according to the condition of SVAR such as temperature and time. The focal length of polymer microlens could be controlled more easily in low-temperature and long-time condition than in high-temperature and short-time condition. That is, the level of concentrated light to focal point could be improved through the control of temperature and time. Also, we confirmed that toluene was more appropriate solvent than acetone in fabrication of PMMA polymer microlens using SVAR.

• Transactions of Materials Processing
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• v.16 no.8
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• pp.596-602
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• 2007

LGP (Light Guiding Plate) of LCD-BLU (Liquid Crystal Display - Back Light Unit) is one of the major components that affect the product quality of LCD. The optical patterns of LGP(2.2") molds are fabricated by three different methods, namely, (1) laser ablation, (2) chemical etching and (3) LiGA-reflow, respectively. The characteristics of surface patterns and roughnesses of molds and injection molded parts were compared to evaluate the optical characteristics. The optical patterns of injection molded LGP with mold fabricated by LiGA - reflow method showed the best geometric structure. The surface roughness (Ra) of LGP#s with molds fabricated by (1) laser ablation: $Ra={\sim}31nm$, (2) chemical etching: $Ra={\sim}22nm$, and (3) LiGA-reflow: $Ra={\sim}4nm$.

• Korea-Australia Rheology Journal
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• v.19 no.3
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• pp.171-176
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• 2007

LCD-BLU (Liquid Crystal Display-Back Light Unit) of medium size is usually manufactured by forming numerous dots with $50{\sim}300\;{\mu}m$ in diameter by etching process and V-grove shape with $50\;{\mu}m$ in height by mechanical cutting process. However, the surface of the etched dots is very rough due to the characteristics of the etching process and V-cutting needs rather high cost. Instead of existing optical pattern made by etching and mechanical cutting, 3-dimensional continuous micro-lens of $200\;{\mu}m$ in diameter was applied in the present study. The continuous micro-lens pattern fabricated by modified LIGA with thermal reflow process was tested to this new optical design of LGP. The manufacturing process using LIGA-reflow is made up of three stages as follows: (i) the stage of lithography, (ii) the stage of thermal reflow process and (iii) the stage of electroplating. The continuous micro-lens patterned LGP was fabricated with injection molding and its test results showed the possibility of commercial use in the future.

• Journal of the Optical Society of Korea
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• v.18 no.1
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• pp.71-77
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• 2014

We present design and fabrication of a multi-focusing microlens array (MLA) using a thermal reflow method. To obtain multi-focusing properties with different numerical apertures at the elemental lens of the MLA, double-cylinder photoresist (PR) structures with different diameters were made within the guiding pattern with both photolithographic and partial developing processes. Due to the base PR layer supporting the thermal reflow process and the guiding structure, the thermally reflowed PR structure had different radii of curvatures with lens shapes that could be precisely modeled by the initial volume of the double-cylinder PR structures. Using the PR template, the hexagonally packed multi-focusing MLA was made via the replica molding method, which showed four different focal lengths of 0.9 mm, 1.1 mm, 1.6 mm, and 2.5 mm, and four different numerical apertures of 0.1799, 0.2783, 0.3973, and 0.4775.