• 한국세라믹학회지
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• 제40권8호
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• pp.739-745
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• 2003

In $N_{x}$ films were deposited on soda-lime glass without substrate heating by reactive dc magnetron sputtering using indium (In) metal target. Depositions were carried out under various total gas pressures ( $P_{tot}$) of mixture gases (Ar+$N_2$ or He+$N_2$). He gas was introduced to $N_2$ gas in order to enhance the reactivity of nitrogen on film surface by the "penning ionization". Plasma impedance decreased greatly when 20% or more introduced the $N_2$ gas. This is due to the In $N_{x}$ layers formed on target surface because a secondary electron emission rate of InN is small compared with In metal. XRD patterns of the films revealed that <001> preferred oriented polycrystalline In $N_{x}$ films, where the crystallinity of the films was improved with decrease of $P_{tot}$ and with increase of $N_2$ flow ratio. The improvement of the crystallinity and stoichimetry of the In $N_{x}$ films were considered to be caused by an increase in the activated nitrogen radicals and also by an increase in the kinetic energy of sputtered In atoms arriving at growing film surface, which should enhance the chemical reaction and surface migration on the growing film surface, respectively. Furthermore, the films deposited using mixture gases of He+$N_2$ showed higher crystallinity compared with the film deposited by the mixture gases of Ar+$N_2$.$.EX>.

• Journal of Microbiology and Biotechnology
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• 제16권2호
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• pp.226-231
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• 2006

Several white-rot fungi are able to produce extracellular lignin-degrading enzymes such as manganese peroxidase (MnP), lignin peroxidase (LiP), and laccase. In order to enhance the production of laccase and MnP using Trametes versicolor KCTC 16781 in suspension culture, the effects of major medium ingredients, such as carbon and nitrogen sources, on the production of the enzymes were investigated. The decolorization mechanism in terms of biodegradation and biosorption was also investigated. Among the carbon sources used, glucose showed the highest potential for the production of laccase and MnP. Ammonium tartrate was a good nitrogen source for the enzyme production. No significant difference in the laccase production was observed, when glucose concentration was varied between 5 g/l and 30 g/l. As the concentration of nitrogen source increased, a lower MnP activity was observed. The optimal C/N ratio was 25 for the production of laccase and MnP. When the concentrations of glucose and ammonium tartrate were simultaneously increased, the laccase and MnP activities increased dramatically. The maximum laccase and MnP activities were 33.7 U/ml at 72 h and 475 U/ml at 96 h, respectively, in the optimal condition. In this condition, over 90% decolorization efficiency was observed.

• Journal of Microbiology and Biotechnology
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• 제26권2호
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• pp.326-336
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• 2016

Saccharomyces cerevisiae is one of the most employed cell factories for the production of bioproducts. Although monomeric hexose sugars constitute the preferential carbon source, this yeast can grow on a wide variety of nitrogen sources that are catabolized through central nitrogen metabolism (CNM). To evaluate the effects of internal perturbations on nitrogen utilization, we characterized strains deleted or overexpressed in GLT1, encoding for one of the key enzymes of the CNM node, the glutamate synthase. These strains, together with the parental strain as control, have been cultivated in minimal medium formulated with ammonium sulfate, glutamate, or glutamine as nitrogen source. Growth kinetics, together with the determination of protein content, viability, and reactive oxygen species (ROS) accumulation at the single cell level, revealed that GLT1 modulations do not significantly influence the cellular physiology, whereas the nitrogen source does. As important exceptions, GLT1 deletion negatively affected the scavenging activity of glutamate against ROS accumulation, when cells were treated with H₂O₂, whereas Glt1p overproduction led to lower viability in glutamine medium. Overall, this confirms the robustness of the CNM node against internal perturbations, but, at the same time, highlights its plasticity in respect to the environment. Considering that side-stream protein-rich waste materials are emerging as substrates to be used in an integrated biorefinery, these results underline the importance of preliminarily evaluating the best nitrogen source not only for media formulation, but also for the overall economics of the process.

• 한국재료학회지
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• 제10권1호
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• pp.29-33
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• 2000

비정질 WNx 박막이 반응성 스퍼터링법으로 제조되었다. 비정질 형성을 위한 질소의 농도범위는 10~40at%이었다. 비정질 W(sub)67N(sub)33 박막은 1273K에서 1분 동안 급속 열처리되어 저항이 낮은 등축정의 $\alpha$-텅스텐 상과 과잉의 질소로 변태되었다. 이러한 박막의 저항은 순수한 텅스텐 박막과 유사하였다. $\alpha$-텅스텐 상으로부터 방출된 과잉의 질소는 $\alpha$-텅스텐/다결정 실리콘의 계면에 편석되었다. 편석된 질소는 Si$_3$N$_4$나노 결정으로 균일한 확산 장벽층을 형성시켰고, 저항이 높은 텅스텐 실리사이드의 반응을 억제하였다.

• E2M - 전기 전자와 첨단 소재
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• 제8권2호
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• pp.196-203
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• 1995

We presented Tungsten and Tungsten Nitride thin films deposited by RF and DC sputtering. It deposited at various conditions that determining the resistivity and sheet resistivity by stabilizing the basic theory. We investigated properties of the resistivity and sheet resistivity of these films under various conditions, temperature of substrate, flow rate of the argon gas and content of nitrogen from nitrogen-argon mixtures. As the temperature of substrate increased and the flow rate of the argon gas decreased, the resistivities of these films reduced by structural transformation. We found that these resistivities were depend on the temperature of substrate, flow rate and electric power. Very highly resistive tungsten films obtained at 10W RF power. On the contrary, we found that films deposited by DC sputtering, from which very lowly resistive tungsten films were obtained. Tungsten nitride thin films deposited by reactive DC sputtering and the resistivities of these films increased as the content of nitrogen gas increased from nitrogen-argon mixture. And also we found the results show very good agreement, compared with experimental data.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.96-97
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• 2012

In nitride and oxide film deposition, sputtered metals react with nitrogen or oxygen gas in a vacuum chamber to form metal nitride or oxide films on a substrate. The physical properties of sputtered films (metals, oxides, and nitrides) are strongly influenced by magnetron plasma density during the deposition process. Typical target power densities on the magnetron during the deposition process are ~ (5-30) W/cm2, which gives a relatively low plasma density. The main challenge in reactive sputtering is the ability to generate a stable, arc free discharge at high plasma densities. Arcs occur due to formation of an insulating layer on the target surface caused by the re-deposition effect. One current method of generating an arc free discharge is to use the commercially available Pinnacle Plus+ Pulsed DC plasma generator manufactured by Advanced Energy Inc. This plasma generator uses a positive voltage pulse between negative pulses to attract electrons and discharge the target surface, thus preventing arc formation. However, this method can only generate low density plasma and therefore cannot allow full control of film properties. Also, after long runs ~ (1-3) hours, depends on duty cycle the stability of the reactive process is reduced due to increased probability of arc formation. Between 1995 and 1999, a new way of magnetron sputtering called HIPIMS (highly ionized pulse impulse magnetron sputtering) was developed. The main idea of this approach is to apply short ${\sim}(50-100){\mu}s$ high power pulses with a target power densities during the pulse between ~ (1-3) kW/cm2. These high power pulses generate high-density magnetron plasma that can significantly improve and control film properties. From the beginning, HIPIMS method has been applied to reactive sputtering processes for deposition of conductive and nonconductive films. However, commercially available HIPIMS plasma generators have not been able to create a stable, arc-free discharge in most reactive magnetron sputtering processes. HIPIMS plasma generators have been successfully used in reactive sputtering of nitrides for hard coating applications and for Al2O3 films. But until now there has been no HIPIMS data presented on reactive sputtering in cluster tools for semiconductors and MEMs applications. In this presentation, a new method of generating an arc free discharge for reactive HIPIMS using the new Cyprium plasma generator from Zpulser LLC will be introduced. Data (or evidence) will be presented showing that arc formation in reactive HIPIMS can be controlled without applying a positive voltage pulse between high power pulses. Arc-free reactive HIPIMS processes for sputtering AlN, TiO2, TiN and Si3N4 on the Applied Materials ENDURA 200 mm cluster tool will be presented. A direct comparison of the properties of films sputtered with the Advanced Energy Pinnacle Plus + plasma generator and the Zpulser Cyprium plasma generator will be presented.

• 대한한의학회지
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• 제20권2호
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• pp.177-186
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• 1999

Okbyungpoongsan(OBPS) has long been known to have anti-allergic effect. In order to evaluate the influence on innate and specific immune response, the effects of OBPS on vascular permeability. hypersensitivities and phagocytic functions were measured. As the results, OBPS increased phagocytic activity of peritoneal macrophages in vitro and in vivo. But OBPS depressed formation of reactive oxygen intermediates(ROI) in vitro and in vivo, while the drug enhanced generation macrophages. Foot pad swelling in the mouse and contact hypersensitivity against dinitroflouorobenzene were decreased. OBPS had no effect on NK cells. But OBPS decreased vascular permeability induced by histamine without statistical significance. These results demonstrate that OBPS suppresses hypersensitivity reactions without affecting phagocytic functions and formation of ROI from macrophages. It also means that OBPS acts as a effective inducer to synthesis of nitric oxide which is effective for the infectious disease while it does damage to tissue less as it suppresses ROI, So we can conclude that OBPS could be used for the treatment of the disease related with immune function.

• 한국의류학회지
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• 제24권3호
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• pp.385-392
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• 2000

The adsorption ability of dyes on chitin, a natural polymer was investigated for decolorization of dye wastewater. Chitin was manufactured in lab by decalcification in dilute aqueous HCI solution and deproteination in dilute aqueous NaOH solution with shrimp shells. Absorbance of residue solution of dyebaths after dye adsorptions of chitin were measured in varieties of dye concentration and dipping periods. Four kinds of dyestuffs were used, C.I.Acid Blue 29. C.I.Direct Blue 6, C.I.Reactive Orange 12 and C.I.Basic Red 18. When chtin 1g was dipped in 0.05% of dyebath with stirring, maximum adsorption ratio of each kind of dyes was exhibited as 91.6% for C.I.Acid Blue 29, 95% for C.I.Direct Blue 6, 58.2% for C.I.Reactive Orange 13 and 75.8% for C.I.Basic Red 19. It shows that chitin has better adsorption abilities of ionic dyes of acid, direct and basic dye than non-ionic reactive dye. And chitin has better adsorption abilities of anionic acid direct dyes than cationic basic dye because of the presence of nitrogen atoms. All kinds of dyestuffs used showed speedy absorption effects by chitin, so chitin can absorb much amount of dyes in 5 mimutes reach to equilibrium of adsorption in 2 hours after dipping. Basic dye was absorbed the most speedily in 5 minutes, although maximum adsorption ratio is not high. That reason can be thought that chitin surface is essentially negatively charged due to polar funtional groups.

• Carbon letters
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• 제13권4호
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• pp.212-220
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• 2012

Orange peel (OP) exhibits a sorption capacity towards anionic dyes such as reactive blue 19 (RB19). Cetyltrimethylammonium bromide (CTAB) as a cationic surfactant was used to modify the surface nature of OP to enhance its adsorption capacity for anionic dyes from an aqueous solution. Four adsorbents were investigated: the OP, sodium hydroxide-treated OP (SOP), CTAB-modified OP and CTAB-modified SOP. The physical and chemical properties of these sorbents were determined using nitrogen adsorption at 77 K and by scanning electron microscope and Fourier transform infrared spectroscopy techniques. The adsorption of the RB19 dye was assessed with these sorbents at different solution pH levels and temperatures. The effect of the contact time was considered to determine the order and rate constants of the adsorption process. The adsorption data were analyzed considering the Freundlich, Langmuir, Elovich and Tempkin models. The adsorption of RB19 by the assessed sorbents is of the chemisorption type following pseudo-first-order kinetics. CTAB modification brought about a significant increase in RB19 adsorption, which was ascribed to the grafting of the sorbent with a cationic surfactant.

• 한국광학회지
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• 제11권1호
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• pp.13-18
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• 2000

Si(100) 위에 RF 스퍼터링법으로 SiOxNy 박막을 제작하였다. 제작 조건은 반응 가스 비율에 따른 증착율과 RF 출력으로 하였다. XRD, XPS, n&k analyzer 그리고 FTIR로 SiOxNy 박막의 특성을 조사하였다. XRD 측정결과 ${SiO_x}{N_y}$ 박막은 비정질이었으며, XPS와 n&k analyzer 측정 결과 ${SiO_x}{N_y}$ 박막의 질소성분이 증가할수록 굴절률은 증가함을 알 수 있었다.