• 한국분말재료학회지
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• 제16권6호
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• pp.416-423
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• 2009

Diamond/SiC composites are appropriate candidate materials for heat conduction as well as high temperature abrasive materials because they do not form liquid phase at high temperature. Diamond/SiC composite consists of diamond particles embedded in a SiC binding matrix. SiC is a hard material with strong covalent bonds having similar structure and thermal expansion with diamond. Interfacial reaction plays an important role in diamond/SiC composites. Diamond/SiC composites were fabricated by high temperature and high pressure (HPHT) sintering with different diamond content, single diamond particle size and bi-modal diamond particle size, and also the effects of composition of diamond and silicon on microstructure, mechanical properties and thermal properties of diamond/SiC composite were investigated. The critical factors influencing the dynamics of reaction between diamond and silicon, such as graphitization process and phase composition, were characterized. Key factor to enhance mechanical and thermal properties of diamond/SiC composites is to keep strong interfacial bonding at diamond/SiC composites and homogeneous dispersion of diamond particles in SiC matrix.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 춘계학술대회 논문집 센서 박막재료 반도체재료 기술교육
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• pp.7-11
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• 2002

In this study, Au thin films were etched with a $Cl_2/Ar$ gas combination in an in an inductively coupled plasma. The etch properties were measured for different gas mixing ratios of $Cl_2/(Cl_2+Ar)$ while the other process conditions were fixed at rf power (700 W), dc bias voltage (150 V), and chamber pressure (15 mTorr). The highest etch rate of the Au thin film was 3500 $\AA/min$ and the selectivity of Au to $SiO_2$ was 4.38 at a $Cl_2/(Cl_2+Ar)$ gas mixing ratio of 0.2. The surface reaction of the etched Au thin films was investigated using x-ray photoelectron spectroscopy (XPS) analysis. There is Au-Cl bonding by chemical reaction between Cl and Au. During the etching of Au thin films in $Cl_2/Ar$ plasma, Au-Cl bond is formed, and these products can be removed by the physical bombardment of Ar ions. In addition, Optical emission spectroscopy (OES) were investigated to analyze radical density of Cl and Ar in plasma. The profile of etched Au investigated with scanning electron microscopy (SEM).

• 한국항해항만학회:학술대회논문집
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• 한국항해항만학회 2000년도 추계학술대회논문집
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• pp.29-32
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• 2000

Cerium oxide thin film has been proposed as a buffer layer between the ferroelectric film and the Si substrate in Metal-Ferroelectric-Insulator-Silicon (MFIS ) structures for ferroelectric random access memory (FRAM) applications. In this study, CeO$_2$thin films were etched with Cl$_2$/Ar gas combination in an inductively coupled plasma (ICP). The highest etch rate of CeO$_2$film is 230 $\AA$/min at Cl$_2$/(Cl$_2$+Ar) gas mixing ratio of 0.2. This result confirms that CeO$_2$thin film is dominantly etched by Ar ions bombardment and is assisted by chemical reaction of Cl radicals. The selectivity of CeO$_2$to YMnO$_3$was 1.83. As a XPS analysis, the surface of etched CeO$_2$thin films was existed in Ce-Cl bond by chemical reaction between Ce and Cl. The results of XPS analysis were confirmed by SIMS analysis. The existence of Ce-Cl bonding was proven at 176.15 (a.m.u.).

• 대한화학회지
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• 제27권1호
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• pp.1-8
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• 1983

단일양성자성용매(메탄올, 에탄올, 1-프로판올)와 단일반양성자성용매(아세톤, 아세토니트릴, 아세토페논, 니트로벤젠) 및 이성분혼합용매계(메탄올-아세톤, 메탄올-아세토니트릴, 메탄올-벤젠)에서 염화나프탈렌술포닐과 피리딘의 친핵성치환반응에 미치는 용매효과를 전기전도도법으로 연구하였다. 단일양성자성용매의 반응속도상수는 유전상수가 큰 쪽에서 크게 관측되었고 반양성자성 용매의 반응속도상수는 유전상수가 큰 쪽에서 작게 나타났다. 아세토니트릴은 유전상수가 큰 반양성자성용매인데도 다른 반양성자성용매들보다 속도상수가 크게 관측되었다. 본 친핵성치환반응에서 용매효과는 ${\pi}^{\ast}$가 중요하고 염소이온의 이탈효과보다 수소결합형성이 전이상태를 안정화시키는데 기여함을 알 수 있었다.

• Bulletin of the Korean Chemical Society
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• 제34권12호
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• pp.3559-3564
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• 2013

Alumina particles were grafted onto the surface of manganese oxide particles via the coprecipitation process using surfactant and cosurfactant. The phase of Mn/Al salts (Phase I) and the phase of precipitation agent (Phase II) were prepared in aqueous surfactant solution, separately. Phase II was added into Phase I and the reaction was performed to form the precursors of composites through hydrogen bonding between $Mn(OH)_2$ and $Al(OH)_3$ prepared by the reaction of Mn/Al salts with the precipitation agent. The alumina-grafted manganese oxide particles were obtained as a final product after calcination. The concentrations of Al salt and surfactant were varied to investigate their effects on the formation and the crystallinity of composites. In addition, the crystal structure of products could be controlled by changing the calcination temperature. Through thermal analyses, it was found that the thermal stability of manganese oxide was improved by the introduction of alumina on its surface.

• 한국도로학회논문집
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• 제16권4호
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• pp.21-33
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• 2014

PURPOSES: The purpose of this study was to break away from the workforce method using cold-mix asphalt mixtures and has a constant quality and has develop repair materials of pre-production asphalt-precast types. METHODS: The selection of the repair material was determined as the results obtained through physical properties of materials and the field applicability. In case of repair materials, values obtained through Marshall stability test & the dynamic stability test & retained stability test as well as the site conditions was considered. In case of adhesive, test results were obtained through examination of the bond strength(tensile, shear) and the field applicability of the adhesive was examined through combined specimens to simulate field applications. RESULTS : According to the results of laboratory tests, in the case of repair materials, Marshall stability and dynamic stability, retained stability of cold-mix reaction type asphalt mixture is the highest. In the case of adhesive, two-component epoxy-urea has a very high bonding strength(tensile, shear) was most excellent. According to the results of field tests, when epoxy-urea was excellent workability. Also, the repair body through actual mock-up test did not occur large deformation and fracture after 12 months. CONCLUSIONS : A suitable repair material is cold-mix reaction type mixture of asphalt-precast, a suitable adhesive is a two-component epoxy-urea.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 추계학술대회 논문집 Vol.14 No.1
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• pp.217-220
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• 2001

The possibility of cerium dioxide $(CeO_2)$ thin films as insulators of metal erroelectric insulator semiconductor (MFIS) structures have been studied. The etching $CeO_2$ thin films have been perfonned in an inductively coupled $Cl_{2}/CF_{4}/Ar$ plasma. The high etch rate of the $CeO_2$ thin film was $250\AA /m$ at a 10 % addition of $Cl_2$ into the $Ar(80)/CF_{4}(20)$. The surface reaction of the etched $CeO_2$ thin films was investigated using X-ray photoelectron spectroscopy (XPS) analysis. There are Ce-Cl and Ce-F bonding by chemical reaction between Cl, F and Ce. These products can be removed by the physical bombardment of incident Ar ions.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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• pp.108-108
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• 2011

Organometallic complexes containing unpaired spins, such as metalloporphyrin or metallophthalocyanine, have extensively studied with increasing interests of their promising model systems in spintronic applications. Additionally, the use of these complexes as an acceptor molecule in chemical sensors has recently received great attentions. In this presentation, we have investigated adsorption of nitric oxide (NO) molecules at Co-porphyrin molecules on Au(111) surfaces with scanning tunneling microscopy and spectroscopy at low temperature. At the location of Co atom in Co-porphyrin molecules, we could observe a Kondo resonance state near Fermi energy in density of states (DOS) before exposing NO molecules and the Kondo resonance state was disappeared after NO exposing because the electronic spin structure of Co-porphyrin were modified by forming a cobalt-NO bonding. Furthermore, we could locally control the chemical reaction of NO dissociations from NO-CoTPP by electron injections via STM probe. After dissociation of NO molecules, the Kondo resonance state was recovered in density of state. With a help of density functional theory (DFT) calculations, we could understand that the modified electronic structures for NO-Co-porphyrin could be occurred by metal-ligand hybridization and the dissociation mechanisms of NO can be explained in terms of the resonant tunneling process via molecular orbitals.

• Bulletin of the Korean Chemical Society
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• 제35권2호
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• pp.581-586
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• 2014

The most stable adsorption structures and their corresponding energies of 4-pyridone, 4-hydroxypyridine, 2-pyridone and 2-hydroxypyridine have been investigated by Density Functional Theory (DFT) calculation and high-resolution photoemission spectroscopy (HRPES). We confirmed that between the two reaction centers of 4- and 2-pyridone, only O atom of carbonyl functional group can act as a Lewis base while both the two reaction centers of 4- and 2-hydroxypyridine (tautomers of 4- and 2-pyridone) can successfully function as a Lewis base. On the other hand, owing to their molecular structures, there is a remarkable difference between the adsorption structures of 4- and 2-hydroxypyridine. Through the analysis of the N 1s and O 1s core level spectra obtained using HRPES, we also could corroborate that two different adducts coexist on the surface at room temperature due to their activation energy investigating the coverage dependent variation of bonding configurations when these molecules are adsorbed on the Ge(100) surface.

• Macromolecular Research
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• 제12권5호
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• pp.534-539
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• 2004

Two biopolymers, silk fibroin (SF) and chitosan, were conjugated by tyrosinase (EC 1.14.18.1), a polyphenolic oxidase, to improve their physicochemical properties, such as their thermal properties and morphological stabilities in organic solvents. The crosslinking between SF and chitosan took place mainly through Michael addition reactions. A main reaction between the amino groups in chitosan and o-quinone, the oxidation product of the tyrosyl residue in SF, was confirmed by UV spectroscopy. Measurements of viscosity and light scattering indicated that the crosslinked SF/chitosan conjugate was compact: it had a smaller particle size because of tight bonding forces between the SF and chitosan molecular chains. Thermal decomposition of SF/chitosan conjugates crosslinked by tyrosinase occurred at higher temperatures. The adhesiveness of the SF/chitosan conjugates decreased steadily as the crosslinking reaction progressed. We propose that this new crosslinking method be used for the preparation of silk fibroin/chitosan conjugates using tyrosinase. We expect that SF/chitosan conjugates crosslinked by tyrosinase can be used preferentially in biomedical applications because of its unique properties and non-toxicity.