Proceedings of the Korean Institute of Navigation and Port Research Conference (한국항해항만학회:학술대회논문집)
- 2000.11a
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- Pages.29-32
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- 2000
A Study on the Etching Characteristics of $CeO_2$ Thin Films using inductively coulped $Cl_2/Ar$ Plasma
유도 결합 플라즈마($Cl_2/Ar$ )를 이용한 $CeO_2$ 박막의 식각 특성 연구
Abstract
Cerium oxide thin film has been proposed as a buffer layer between the ferroelectric film and the Si substrate in Metal-Ferroelectric-Insulator-Silicon (MFIS ) structures for ferroelectric random access memory (FRAM) applications. In this study, CeO