Reduce of Etching Damage of PZT Thiin Films in $Cl_{2}/CF_{4}$ Plasma with addition of Ar and $O_2$
($Cl_{2}/CF_{4}$ 플라즈마에 Ar,$O_2$ 첨가에 따른 PZT 박막의 식각 손상 효과)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2001.11a
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- pp.21-25
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- 2001