Effect of CH4 Concentration on the Dielectric Properties of SiOC(-H) Film Deposited by PECVD |
Shin, Dong-Hee
(Dept. of Materials Science and Engineering, Korea University)
Kim, Jong-Hoon (Dept. of Materials Science and Engineering, Korea University) Lim, Dae-Soon (Dept. of Materials Science and Engineering, Korea University) Kim, Chan-Bae (Preceding Process Division, Hynix Semiconductor Inc) |
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