A Study of Nickel Silicide Formed on SOI Substrate with Different Deposited Ni/Co Thicknesses for Nanoscale CMOSFET (나노급 CMOSFET을 위한 SOI 기판에서의 Ni/Co 증착 두께에 따른 Nickel silicide 특성 분석)
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- Proceedings of the IEEK Conference
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- 2005.11a
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- pp.619-622
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- 2005