• 제목/요약/키워드: Radical density

검색결과 314건 처리시간 0.028초

$BCl_3/Cl_2/Ar$ 고밀도 플라즈마에 의한 $(Ba, Sr)TiO_3$ 박막의 식각 메커니즘 연구 (A Study on the Etching Mechanism of $(Ba, Sr)TiO_3$ thin Film by High Density $BCl_3/Cl_2/Ar$ Plasma)

  • 김승범;김창일
    • 대한전자공학회논문지SD
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    • 제37권11호
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    • pp.18-24
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    • 2000
  • (Ba,Sr)$TiO_3$ 박막은 ULSI-DRAM 즉 1-4 Gbit급 DRAM용 셀(cell) 커패시터의 새로운 유전물질로 각광받고 있다. 본 연구에서는 ICP 장비에서 $BCl_3/Cl_2/Ar$ 플라즈마로 (Ba,Sr)$TiO_3$ 박막을 식각하였다. 이때 RF power/dc bias voltage는 600W/-250V, 반응로의 압력은 10mTorr 이었다. $Cl_2/(Cl_2+Ar)$은 0.2로 고정하였고, $BCl_3$ 가스를 첨가하면서 (Ba,Sr)$TiO_3$ 박막을 식각하였다. $BCl_3$ 가스를 10% 첨가하였을 때, $480{\AA}/min$으로 (Ba,Sr)$TiO_3$ 박막은 가장 높은 식각 속도를 나타내었다. $Cl_2/Ar$가스에 $BCl_3$의 첨가 비에 따른 Cl, BCl 및 B의 라디칼 밀도를 optical emission spectroscopy(OES)에 의해 구하였다. $BCl_3$를 10% 첨가하였을 때 Cl의 라디칼 밀도가 가장 높았다. (Ba,Sr)$TiO_3$ 박막의 표면반응을 규명하기 위하여 XPS 분석을 수행한 결과 이온 bombardment 식각이 Ba-O 결합을 파괴하고 Ba와 Cl의 결합형태인 $BaCl_2$을 제거하기 위하여 필요하다. Sr과 Cl의 결합의 양은 많지 않고, Sr은 주로 물리적인 스퍼터링에 의하여 제거된다. Ti와 Cl은 화학적으로 반응하여 $TiCl_4$ 결합형태로 용이하게 제거된다. 식각후 단면사진을 SEM을 통해 본 결과 식각단면이 약 65~70$^{\circ}$ 정도였다.

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고밀도 $CF_{4}/Ar$ 플라즈마에서 $YMnO_3$ 박막의 식각 매카니즘 (Etching Mechanism of $YMnO_3$ Thin Films in High Density $CF_{4}/Ar$ Plasma)

  • 이철인;김동표;김창일
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 춘계학술대회 논문집 반도체재료
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    • pp.12-16
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    • 2001
  • We investigated the etching characteristics of $YMnO_3$ thin films in high-density plasma etching system. In this study. $YMnO_3$ thin films were etched with $CF_{4}/Ar$ gas chemistries in inductively coupled plasma (ICP). Etch rates of $YMnO_3$ were measured according to gas mixing ratios. The maximum etch rate of $YMnO_3$ is 18 nm/min at $CF_{4}/(CF_{4}+Ar)$ of 20%. In optical emission spectroscopy (OES) analysis, F radical and Ar* ions in plasma at various gas chemistries decreased with increasing $CF_4$ content. Chemical states of $YMnO_3$ films exposed in plasma were investigated with x-ray photoelectron spectroscopy (XPS) and secondary ion mass spectrometry (SIMS). There is a chemical reaction between metal (Y, Mn) and F and metal-fluorides were removed effectively by Ar ion sputtering. $YF_x$, $MnF_x$ such as YF, $YF_2$, $YF_3$ and $MnF_3$ Were detected using SIMS analysis. The etch slope is about $65^{\circ}C$ and free of residues.

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산화막 식각 기구 연구를 위한 QMF Ion Beam 장치의 제작 (QMF Ion Beam System Development for Oxide Etching Mechanism Study)

  • 주정훈
    • 한국표면공학회지
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    • 제37권4호
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    • pp.220-225
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    • 2004
  • A new ion beam extraction system is designed using a simple ion mass filter and a micro mass balance and a QMS based detecting system. A quadrupole Mass Filter is used for selective ion beam formation from inductively coupled high density plasma sources with appropriate electrostatic lens and final analyzing QMS. Also a quartz crystal microbalance is set between a QMF and a QMS to measure the etching and polymerization rate of the mass selected ion beam. An inductively coupled plasma was used as a ion/radical source which had an electron temperature of 4-8 eV and electron density of $4${\times}$10^{11}$#/㎤. A computer interfaced system through 12bit AD-DA board can control the pass ion mass of the qmf by setting RF/DC voltage ratio applied to the quadrupoles so that time modulation of pass ion's mass is possible. So the direct measurements of ion - surface chemistry can be possible in a resolution of $1\AA$/sec based on the qcm's sensitivity. A full set of driving software and hardware setting is successfully carried out to get fundamental plasma information of the ICP source and analysed $Ar^{+}$ beam was detected at the $2^{nd}$ QMS.

Functional Properties of Modified Low Density Lipoprotein and Degradation of Modified LDL by Human Monocyte-Macrophages

  • Kim, Tae-Woong;Park, Jae-Hoon;Park, Young-June;Son, Heung-Soon;Yang, Ki-Sook
    • 한국식품영양과학회지
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    • 제24권3호
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    • pp.362-370
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    • 1995
  • Human plasma low density lipoprotein(LDL) is the main carrier for cholesterol, and recent studies suggest the normal LDL can be readily oxidized by free radical and not interact with LDL receptor. Lipoprotein pariticles are consisted of lipid andprotein, and fatty acids of lipoproteins are prone to oxidation. LDL particles readily undergo oxidative modification by copper. From the results, oxidized LDL altered its biological properties. A marked increase in the electrophoretic mobility of LDl on agarose gel indicated that negative surface charge of the LDL particles was increased. Also, the results from the HPLC showed that oxidized LDL was degraded into several polypeptides nonenzymatically. Degradation tests which measured the amount of 5-IAF labelled oxidized LDL were carried out by monocyte and hepatocyte cell culture. Hepatocyte cell culture of modified LDL did not show consistent pattern. However, binding rate of modified LDL with HMDM(human monocyte derived macrophage) was enhanced with oxidation, but was retarded by addition of antioxidants(hyaluronic acid, vitamin A, vitamin E). Also comparisons of oxidized-LDL, acetyl-LDL and MDA-LDL showed significant differences in the chemical properteis and binding affinity to HMDM. Thus, modificaition of normal LDL altered its biological properties.

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Novel reforming of pyrolized fuel oil by electron beam radiation for pitch production

  • Jung, Jin-Young;Park, Mi-Seon;Kim, Min Il;Lee, Young-Seak
    • Carbon letters
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    • 제15권4호
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    • pp.262-267
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    • 2014
  • Pyrolized fuel oil (PFO) was reformed by novel electron beam (E-beam) radiation, and the elemental composition, chemical bonds, average molecular weight, solubility, softening point, yields, and density of the modified patches were characterized. These properties of modified pitch were dependent on the reforming method (heat or E-beam radiation treatment) and absorbed dose. Aromaticity ($F_a$), average molecular weight, solubility, softening point, and density increased in proportion to the absorbed dose of E-beam radiation, with the exception of the highest absorbed dose, due to modification by free radical polymerization and the powerful energy intensity of E-beam treatment. The H/C ratio and yield exhibited the opposite trend for the same reason. These results indicate that novel E-beam radiation reforming is suitable for the preparation of aromatic pitch with a high ${\beta}$-resin content.

야콘잎 분말을 첨가한 쿠키의 품질특성 (Quality Characteristics of Cookies Containing Yacon (Smallanthus sonchifolius) Leaf Powder)

  • 심은아;권용민;이진실
    • 한국식생활문화학회지
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    • 제27권1호
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    • pp.82-88
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    • 2012
  • In this study, the effects of yacon (Smallanthus sonchifolius) leaf on the quality characteristics of cookies were examined. In order to investigate its effects, four different amounts (0%: Control, Y-0.5, Y-1.0, Y-1.5) of yacon leaf powder were added to the cookie dough. Among the physicochemical and sensory characteristics, the density and pH of the dough, spread factor, color value, firmness, consumer acceptability, and Pearson's correlation coefficients were measured. Although there was no significant difference in pH of the doughs among the groups, density significantly decreased with increasing amount of yacon leaf powder (p<0.05). While the L, a, b values, and hardness decreased significantly, DPPH free radical scavenging activity increased significantly as the content of yacon leaf powder increased (p<0.05). Overall acceptability, appearance, taste, and texture between the control and Y-0.5 groups showed no significant differences. This study suggests the possibility of yacon leaf as an ingredient that increases the functionality of cookies.

$BCl_3/N_2$ 유도결합 플라즈마로 식각된 PZT 박막의 식각 특성 (Dry etching properties of PZT thin films in $BCl_3/N_2$ plasma)

  • 구성모;김경태;김창일
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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    • pp.183-186
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    • 2004
  • The dry etch behavior of PZT thin films was investigated in $BCl_3/N_2$ plasma. The experiments were carried out with measuring etch rates and selectivities of PZT to $SiO_2$ as a function of gas concentration and input rf power, chamber pressure. The maximum etch rate was 126 nm/min when 30% $N_2$ was added to $BCl_3$ chemistry. Also, as input rf power increases, the etch rate of PZT thin films was increased. Langmuir probe measurement showed the noticeable influence of $BCl_3/N_2$ mixing ratio on electron temperature and electron density as input rf power increased. The variation of Cl radical density as plasma parameters changed was examined by Optical Emission Spectroscopy (OES) analysis. According to X-ray diffraction (XRD) analysis, PZT thin films were damaged in plasma and an increase in (100), (200) and (111) phases showed the improvement in structure of the PZT thin films after the $O_2$ annealing process.

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초임계 대마종자 추출물의 화장품 효능과 경피흡수증진 효과 (Cosmetic Efficacy of Supercritical Cannabis sativa Seed Extracts and Enhancement of Skin Permeation)

  • 이광원;박신성;박수인;신문삼
    • 문화기술의 융합
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    • 제7권4호
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    • pp.683-691
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    • 2021
  • 본 연구의 목적은 온도조건 별로 밀도요동 초임계 유체를 이용하여 추출한 대마종자 추출물의 수율 측정과 생리활성능을 평가하고, 리포좀 제형으로 난용성 추출물의 용해를 가능하게 하여 경피투과도를 증진시키는 데 있다. 수율 측정 결과, 60℃로 추출한 대마종자가 가장 높게 나타났고, 항산화 실험에서 total polyphenol content assay, DPPH radical scavenging assay, ABTS+ radical scavenging assay 결과, 최고농도에서 45℃ 추출물의 폴리페놀 함량과 radical 소거능이 가장 크게 나타났다. 항균실험 결과, P ropionibacteium acnes 균주에서만 clear zone이 나타났다. 추출물을 3차 정제수에 용해시킨 제형보다 리포좀으로 캡슐화한 제형에서 particle size의 감소와 zeta potential의 절댓값 증가를 확인하여 제형 안정성을 확인하였고, 경피투과도의 증진 또한 확인하였다. 이러한 실험결과를 바탕으로 난용성인 초임계 대마종자 추출물을 화장품의 기능성 천연물 소재로써 활용 가능성을 확인하였다.

Effects of Atmospheric Pressure Microwave Plasma on Surface of SUS304 Stainless Steel

  • Shin, H.K.;Kwon, H.C.;Kang, S.K.;Kim, H.Y.;Lee, J.K.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.268-268
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    • 2012
  • Atmospheric pressure microwave induced plasmas are used to excite and ionize chemical species for elemental analysis, for plasma reforming, and for plasma surface treatment. Microwave plasma differs significantly from other plasmas and has several interesting properties. For example, the electron density is higher in microwave plasma than in radio-frequency (RF) or direct current (DC) plasma. Several types of radical species with high density are generated under high electron density, so the reactivity of microwave plasma is expected to be very high [1]. Therefore, useful applications of atmospheric pressure microwave plasmas are expected. The surface characteristics of SUS304 stainless steel are investigated before and after surface modification by microwave plasma under atmospheric pressure conditions. The plasma device was operated by power sources with microwave frequency. We used a device based on a coaxial transmission line resonator (CTLR). The atmospheric pressure plasma jet (APPJ) in the case of microwave frequency (880 MHz) used Ar as plasma gas [2]. Typical microwave Pw was 3-10 W. To determine the optimal processing conditions, the surface treatment experiments were performed using various values of Pw (3-10 W), treatment time (5-120 s), and ratios of mixture gas (hydrogen peroxide). Torch-to-sample distance was fixed at the plasma edge point. Plasma treatment of a stainless steel plate significantly affected the wettability, contact angle (CA), and free energy (mJ/$m^2$) of the SUS304 surface. CA and ${\gamma}$ were analyzed. The optimal surface modification parameters to modify were a power of 10 W, a treatment time of 45 s, and a hydrogen peroxide content of 0.6 wt% [3]. Under these processing conditions, a CA of just $9.8^{\circ}$ was obtained. As CA decreased, wettability increased; i.e. the surface changed from hydrophobic to hydrophilic. From these results, 10 W power and 45 s treatment time are the best values to minimize CA and maximize ${\gamma}$.

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$SiO_x(x{\le}2)$ 플레이트의 표면 결함 분포가 화학 소염에 미치는 영향 (Effects of Surface Defect Distribution of $SiO_x(x{\le}2)$ Plates on Chemical Quenching)

  • 김규태;권세진
    • 한국연소학회:학술대회논문집
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    • 한국연소학회 2005년도 제31회 KOSCO SYMPOSIUM 논문집
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    • pp.328-336
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    • 2005
  • Effects of surface defect distribution on flame instability during flame-surface interaction are experimentally investigated. To examine the chemical quenching phenomenon, we prepared thermally grown silicon oxide plates with well-defined defect density. Ion implantation was used to control the number of defects, i.e. oxygen vacancies. In an attempt to preferentially remove the oxygen atoms from silicon dioxide surface, argon ions with low energy level from 3keV to 5keV were irradiated at the incident angle of $60^{\circ}C$. Compositional and structural modification of $SiO_2$ induced by low-energy $Ar^+$ ion irradiation has been characterized by Atomic Force Microscopy (AFM) and X-ray Photoelectron Spectroscopy (XPS). The analysis shows that as the ion energy increases, the number of structural defect also increases and non-stoichiometric condition of $SiO_x(x{\le}2)$ plates is enhanced. From the quenching distance measurements, we found out that when the surface temperature is under $300^{\circ}C$, the quenching distance decreases on account of reduced heat loss; as the surface temperature increases over $300^{\circ}C$, however, quenching distance increases despite reduced heat loss effect. Such aberrant behavior is caused by heterogeneous chemical reaction between active radicals and surface defect sites. The higher defect density, the larger quenching distance. This results means that chemical quenching is governed by radical adsorption and can be parameterized by the oxygen vacancy density on the surface.

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