• The Journal of the Institute of Internet, Broadcasting and Communication
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• v.22 no.6
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• pp.31-36
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• 2022

In this paper, we present the design, manufacture and test results of Backend unit for SAR(Synthetic Aperture Radar) that can be applied on a small satellite. The Backend unit for SAR was designed with a control/storage board, TRX(transmission and receiving) board and a power supply board as a single unit in consideration of the applying of a small satellite. The control/storage board uses RFSoC to generate wideband chirp signal, generate operating timings, and perform control and calculations for SAR operation. The TRX board is designed to convert the wideband chirp signal generated by the control/storage board to the operating frequency of X-band by up-converting the frequency. Since small size, light weight, and low cost are important consideration for small satellite, MIL/Industrial grade components were appropriately applied and the at the same time it was designed to ensure mission life through the radiation test, analysis and space environment tests.

• The Journal of the Institute of Internet, Broadcasting and Communication
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• v.23 no.5
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• pp.103-108
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• 2023

In this paper, a performance enhancement study of an AESA antenna that can be applied to a seeker that serves as the eye of a missile was conducted, and the performance of the antenna was verified through actual measurement. When designing an AESA antenna, the optimization of the active reflection coefficient must be considered during transmission due to the mutual coupling between radiators that inevitably occurs, and the selection of a radiator that can overcome the space limitation of the seeker with a small size/light weight is an important design consideration. Accordingly, optimization in terms of electrical performance and low-profile structure is required through research on array antennas for application to the AESA structure. The radiator designed and measured in this paper was designed as an SFN that can satisfy the low-profile structure while enhancing the performance of a general vivaldi antenna. Through this paper, it was confirmed that SFN has the same broadband characteristics as general vivaldi antennas and has optimized characteristics required for AESA antennas. The structure optimized through simulation confirmed the pattern characteristics and active reflection coefficient characteristics through the fabrication of actual proto-type antennas.

• KOREAN JOURNAL OF CROP SCIENCE
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• v.54 no.4
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• pp.390-396
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• 2009

To select optimal shade material in paddy soil, growth characteristics and ginsenoside contents were investigated in new cultivar, 'Cheonpoong' of three-year-old ginseng cultured under three kinds of shade materials such as three-layered blue and one-layered black PE (polyethylene) net (TBPN), blue PE sheet (BPSS), and aluminium-coated PE sheet (APSS). The order of light transmission ratio and air temperature by shade materials were BPSS > APSS > TBSB among three shade materials. Average soil water tension in PDC and IDC was 64 mbar (absolute soil moisture, 25%) and 123 mbar (absolute soil moisture, 17%), respectively, and soil water tension in IDC was changed more distinctly than that of PDC by season and shade materials. Yield in PDC was distinctly decreased more than that in IDC because of the increase of discolored-leaf and rusted-root ratio. BPSS and TBPN among three shade materials were the most effective on the increase of yield in PDC and IDC, respectively. Ratio of rusty-colored root showed not significant difference by drainage class and shade materials. Contents of panaxatriol ginsenoside (Rg1, Re and Rf) were decreased in PDC, while it of panaxadiol ginsenoside (Rb1, Rc and Rd) were increased in IDC. Total ginsenoside contents of IDC was distinctly higher than that of PDC, and BPSS showed the highest contents among three shade materials regardless of poorly and imperfectly drainage class.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.100-101
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• 2012

The plasma damage free and room temperature processedthin film deposition technology is essential for realization of various next generation organic microelectronic devices such as flexible AMOLED display, flexible OLED lighting, and organic photovoltaic cells because characteristics of fragile organic materials in the plasma process and low glass transition temperatures (Tg) of polymer substrate. In case of directly deposition of metal oxide thin films (including transparent conductive oxide (TCO) and amorphous oxide semiconductor (AOS)) on the organic layers, plasma damages against to the organic materials is fatal. This damage is believed to be originated mainly from high energy energetic particles during the sputtering process such as negative oxygen ions, reflected neutrals by reflection of plasma background gas at the target surface, sputtered atoms, bulk plasma ions, and secondary electrons. To solve this problem, we developed the NBAS (Neutral Beam Assisted Sputtering) process as a plasma damage free and room temperature processed sputtering technology. As a result, electro-optical properties of NBAS processed ITO thin film showed resistivity of $4.0{\times}10^{-4}{\Omega}{\cdot}m$ and high transmittance (>90% at 550 nm) with nano- crystalline structure at room temperature process. Furthermore, in the experiment result of directly deposition of TCO top anode on the inverted structure OLED cell, it is verified that NBAS TCO deposition process does not damages to the underlying organic layers. In case of deposition of transparent conductive oxide (TCO) thin film on the plastic polymer substrate, the room temperature processed sputtering coating of high quality TCO thin film is required. During the sputtering process with higher density plasma, the energetic particles contribute self supplying of activation & crystallization energy without any additional heating and post-annealing and forminga high quality TCO thin film. However, negative oxygen ions which generated from sputteringtarget surface by electron attachment are accelerated to high energy by induced cathode self-bias. Thus the high energy negative oxygen ions can lead to critical physical bombardment damages to forming oxide thin film and this effect does not recover in room temperature process without post thermal annealing. To salve the inherent limitation of plasma sputtering, we have been developed the Magnetic Field Shielded Sputtering (MFSS) process as the high quality oxide thin film deposition process at room temperature. The MFSS process is effectively eliminate or suppress the negative oxygen ions bombardment damage by the plasma limiter which composed permanent magnet array. As a result, electro-optical properties of MFSS processed ITO thin film (resistivity $3.9{\times}10^{-4}{\Omega}{\cdot}cm$, transmittance 95% at 550 nm) have approachedthose of a high temperature DC magnetron sputtering (DMS) ITO thin film were. Also, AOS (a-IGZO) TFTs fabricated by MFSS process without higher temperature post annealing showed very comparable electrical performance with those by DMS process with $400^{\circ}C$ post annealing. They are important to note that the bombardment of a negative oxygen ion which is accelerated by dc self-bias during rf sputtering could degrade the electrical performance of ITO electrodes and a-IGZO TFTs. Finally, we found that reduction of damage from the high energy negative oxygen ions bombardment drives improvement of crystalline structure in the ITO thin film and suppression of the sub-gab states in a-IGZO semiconductor thin film. For realization of organic flexible electronic devices based on plastic substrates, gas barrier coatings are required to prevent the permeation of water and oxygen because organic materials are highly susceptible to water and oxygen. In particular, high efficiency flexible AMOLEDs needs an extremely low water vapor transition rate (WVTR) of $1{\times}10^{-6}gm^{-2}day^{-1}$. The key factor in high quality inorganic gas barrier formation for achieving the very low WVTR required (under ${\sim}10^{-6}gm^{-2}day^{-1}$) is the suppression of nano-sized defect sites and gas diffusion pathways among the grain boundaries. For formation of high quality single inorganic gas barrier layer, we developed high density nano-structured Al2O3 single gas barrier layer usinga NBAS process. The NBAS process can continuously change crystalline structures from an amorphous phase to a nano- crystalline phase with various grain sizes in a single inorganic thin film. As a result, the water vapor transmission rates (WVTR) of the NBAS processed $Al_2O_3$ gas barrier film have improved order of magnitude compared with that of conventional $Al_2O_3$ layers made by the RF magnetron sputteringprocess under the same sputtering conditions; the WVTR of the NBAS processed $Al_2O_3$ gas barrier film was about $5{\times}10^{-6}g/m^2/day$ by just single layer.

• The Journal of The Korea Institute of Intelligent Transport Systems
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• v.7 no.3
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• pp.62-73
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• 2008

In this paper, domestic standard revision plan of dynamic frequency method which is used both in unmanned automatic toll collection system and manned collection system of the express highway is presented. For such ETCS, the infrared rays (870 nm) of active frequency method and the frequency integrated method (5.8 GHz) are adopted and extended to be operated to the all around the Toll Gate. This standardization plan is based on inter connection reference model between OSI (Open System Interconnection) in process of ITS short range radio communication standardization of 5.8 GHz bandwidth to support traffic information and control system service, and the derived revision plan by starting from physical layer which support interoperability for multiple access between RSE (Road Side Equipment) and OBE (On Board Equipment), in which is categorized into physical layer, data link layer, and application layer. In case of radiation power, existing standard is divided by class1 (within 10 m) and Class2 (within 100 m) according to transmission lengthwhile it is operated with just single standard 'Class1' because of notification of Ministry of Information and Communication in 2004. In the case of the limitation value of incident power in communication area, considering operation plan of ETCS that is on actuality operation the measurements are reflected to the standard. In other wort this paper proposed the improvement standard of incident power, pseudo response in the communication area and radiated power in order to secure stability and compatibility among operator systems about the needed part on ETCS operation.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.23 no.2
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• pp.251-257
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• 2012

Human body communication means transmitting and receiving data through human body medium or through free space along with the human body skin. Electric field distribution around the human body between the transmitter and the receiver were calculated at five different frequencies with 5 MHz interval between 10 MHz and 30 MHz. Commercial electromagnetic simulation tool was used for the calculation of E-field distributions applying the Korean standard male model including 29 different kinds of human tissues. After calculating specific absorption rate(SAR) values on back of the hand, it was compared with International Commission on Non-Ionizing Radiation Protection(ICNIRP) human protection guideline. While conductivities(${\sigma}$) and relative permittivities(${\varepsilon}_r$) of the human tissues for each frequency were input as the analyzing parameters, electric field intensities near both hands were integrated along the integral line between the nearby electrodes for the calculation of the transmitting and receiving voltages whose ratio was defined as channel loss. The calculated channel losses were about ($75{\pm}1$) dB and showed nearly flat response all through the evaluated frequencies.

• Journal of the Microelectronics and Packaging Society
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• v.24 no.3
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• pp.71-76
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• 2017

The electrical behavior and flexibility of the screen printed Ag circuits were investigated with infrared radiation sintering times and sintering temperatures. Electrical resistivity and radio frequency characteristics were evaluated by using the 4 point probe measurement and the network analyzer by using cascade's probe system, respectively. Electrical resistivity and radio frequency characteristics means that the direct current resistance and signal transmission properties of the printed Ag circuit. Flexibility of the screen printed Ag circuit was evaluated by measuring of electrical behavior during IPC sliding test. Failure mode of the Ag printed circuits was observed by using field emission scanning electron microscope and optical microscope. Electrical resistivity of the Ag circuits screen printed on Pl substrate was rapidly decreased with increasing sintering temperature and durations. The lowest electrical resistivity of Ag printed circuit was up to $3.8{\mu}{\Omega}{\cdot}cm$ at $250^{\circ}C$ for 45 min. The crack length arisen within the printed Ag circuit after $10{\times}10^4$ sliding numbers was 10 times longer than that of after $2.5{\times}10^4$ sliding numbers. Measured insertion loss and calculated insertion loss were in good agreements each other. Insertion loss of the printed Ag circuit was increased with increasing the number of sliding cycle.

• Korean Journal of Materials Research
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• v.20 no.6
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• pp.289-293
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• 2010

Silicon quantum dots (Si QDs) in a superlattice for high efficiency tandem solar cells were fabricated by magnetron rf sputtering and their characteristics were investigated. SiC/$Si_{1-x}C_x$ superlattices were deposited by co-sputtering of Si and C targets and annealed at $1000^{\circ}C$ for 20 minutes in a nitrogen atmosphere. The Si QDs in Si-rich layers were verified by transmission electron microscopy (TEM) and X-ray diffraction. The size of the QDs was observed to be 3-6 nm through high resolution TEM. Some crystal Si and -SiC peaks were clearly observed in the grazing incident X-ray diffractogram. Raman spectroscopy in the annealed sample showed a sharp peak at $516\;cm^{-1}$ which is an indication of Si QDs. Based on the Raman shift the size of the QD was estimated to be 4-6 nm. The volume fraction of Si crystals was calculated to be about 33%. The change of the FT-IR absorption spectrum from a Gaussian shape to a Lorentzian shape also confirmed the phase transition from an amorphous phase before annealing to a crystalline phase after annealing. The optical absorption coefficient also decreased, but the optical band gap increased from 1.5 eV to 2.1 eV after annealing. Therefore, it is expected that the optical energy gap of the QDs can be controlled with growth and annealing conditions.

• Korean Journal of Materials Research
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• v.20 no.11
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• pp.586-591
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• 2010

Solar cells have been more intensely studied as part of the effort to find alternatives to fossil fuels as power sources. The progression of the first two generations of solar cells has seen a sacrifice of higher efficiency for more economic use of materials. The use of a single junction makes both these types of cells lose power in two major ways: by the non-absorption of incident light of energy below the band gap; and by the dissipation by heat loss of light energy in excess of the band gap. Therefore, multi junction solar cells have been proposed as a solution to this problem. However, the $1^{st}$ and $2^{nd}$ generation solar cells have efficiency limits because a photon makes just one electron-hole pair. Fabrication of all-silicon tandem cells using an Si quantum dot superlattice structure (QD SLS) is one possible suggestion. In this study, an $SiO_x$ matrix system was investigated and analyzed for potential use as an all-silicon multi-junction solar cell. Si quantum dots with a super lattice structure (Si QD SLS) were prepared by alternating deposition of Si rich oxide (SRO; $SiO_x$ (x = 0.8, 1.12)) and $SiO_2$ layers using RF magnetron co-sputtering and subsequent annealing at temperatures between 800 and $1,100^{\circ}C$ under nitrogen ambient. Annealing temperatures and times affected the formation of Si QDs in the SRO film. Fourier transform infrared spectroscopy (FTIR) spectra and x-ray photoelectron spectroscopy (XPS) revealed that nanocrystalline Si QDs started to precipitate after annealing at $1,100^{\circ}C$ for one hour. Transmission electron microscopy (TEM) images clearly showed SRO/$SiO_2$ SLS and Si QDs formation in each 4, 6, and 8 nm SRO layer after annealing at $1,100^{\circ}C$ for two hours. The systematic investigation of precipitation behavior of Si QDs in $SiO_2$ matrices is presented.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.399-399
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• 2013

Metal silicides는 Si 기반의microelectronic devices의 interconnect와 contact 물질 등에 사용하기 위하여 그 형성 mechanism과 전기적 특성에 대한 연구가 많이 이루어지고 있다. 이 중 Rare-earth(RE) silicides는 저온에서 silicides를 형성하고, n-type Si과 낮은 Schottky Barrier contact (~0.3 eV)을 이룬다. 또한 낮은 resistivity와 Si과의 작은 lattice mismatch, 그리고 epitaxial growth의 가능성, 높은 thermal stability 등의 장점을 갖고 있다. RE silicides 중 ytterbium silicide는 가장 낮은 electric work function을 갖고 있어 n-channel schottky barrier MOSFETs의 source/drain으로 주목받고 있다. 또한 Silicon 기반의 CMOSFETs의 성능 향상 한계로 인하여 germanium 기반의 소자에 대한 연구가 이루어져 왔다. Ge 기반 FETs 제작을 위해서는 낮은 source/drain series/contact resistances의 contact을 형성해야 한다. 본 연구에서는 저접촉 저항 contact material로서 ytterbium germanide의 가능성에 대해 고찰하고자 하였다. HRTEM과 EDS를 이용하여 ytterbium germanide의 미세구조 분석과 면저항 및 Schottky Barrier Heights 등의 전기적 특성 분석을 진행하였다. Low doped n-type Ge (100) wafer를 1%의 hydrofluoric (HF) acid solution에 세정하여 native oxide layer를 제거하고, 고진공에서 RF sputtering 법을 이용하여 ytterbium 30 nm를 먼저 증착하고, 그 위에 ytterbium의 oxidation을 방지하기 위한 capping layer로 100 nm 두께의 TiN을 증착하였다. 증착 후, rapid thermal anneal (RTA)을 이용하여 N2 분위기에서 $300{\sim}700^{\circ}C$에서 각각 1분간 열처리하여 ytterbium germanides를 형성하였다. Ytterbium germanide의 미세구조 분석은 transmission electron microscopy (JEM-2100F)을 이용하였다. 면 저항 측정을 위해 sulfuric acid와 hydrogen peroxide solution (H2SO4:H2O2=6:1)에서 strip을 진행하여 TiN과 unreacted Yb을 제거하였고, 4-point probe를 통하여 측정하였다. Yb germanides의 면저항은 열처리 온도 증가에 따라 감소하다 증가하는 경향을 보이고, $400{\sim}500^{\circ}C$에서 가장 작은 면저항을 나타내었다. HRTEM 분석 결과, deposition 과정에서 Yb과 Si의 intermixing이 일어나 amorphous layer가 존재하였고, 열처리 온도가 증가하면서 diffusion이 더 활발히 일어나 amorphous layer의 두께가 증가하였다. $350^{\circ}C$ 열처리 샘플에서 germanide/Ge interface에서 epitaxial 구조의 crystalline Yb germanide가 형성되었고, EDS 측정 및 diffraction pattern을 통하여 안정상인 YbGe2-X phase임을 확인하였다. 이러한 epitaxial growth는 면저항의 감소를 가져왔으며, 열처리 온도가 증가하면서 epitaxial layer가 증가하다가 고온에서 polycrystalline 구조의 Yb germanide가 형성되어 면저항의 증가를 가져왔다. Schottky Barrier Heights 측정 결과 또한 면저항 경향과 동일하게 열처리 증가에 따라 감소하다가 고온에서 다시 증가하였다.