• Proceedings of the KIEE Conference
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• 1999.07e
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• pp.2236-2238
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• 1999

This paper deals with the surface glow discharge characteristics and some physical properties of MgO thin films prepared by RF unbalanced magnetron sputtering(UBMS) in surface discharge type AC PDP. The minimum discharge voltage is obtained for the sample of substrate holder bias voltage -10V. The main factors that improves the discharge characteristics by applied bias voltage is considered to be due to the morphology changes or crystal structure of the MgO thin film by ion bombardment during deposition process Moreover, the anti-sputtering characteristics of MgO thin film by UBMS is more excellent than that of balanced magnetron sputtering(BMS) and E-beam evaporation method.

• Proceedings of the KIEE Conference
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• 2000.07c
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• pp.2032-2034
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• 2000

The performance of ac plasma display panels (PDP) is influenced strongly by the surface glow discharge characteristics on the MgO thin films. This paper deals with the surface slew discharge characteristics and some physical properties of MgO thin films prepared by reactive RF planar unbalanced magnetron sputtering in connection with ac PDP. The samples prepared with the do bias voltage of -10V showed lower discharge voltage and lower erosion rate by ion bombardment than those samples prepared by conventional magnetron sputtering or E-beam evaporation. The main factor that improves the discharge characteristics by bias voltage is considered to be due to the morphology changes or crystal structure of the MgO thin film by ion bombardment during deposition process.

• KIEE International Transactions on Electrophysics and Applications
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• v.11C no.4
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• pp.107-112
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• 2001

Laser Thomson scattering measurements of electrom temperature and density in a neutral loop discharge (NLD) plasma were performed in order to reveal the electron behavior around the neutral loop (NL). The experimental results were examined by using a simulation model that included effects of a three dimensional electromagnetic field with spatial decay of the RF electric field, and the limitation of the spatial extent of the electron motion and collision effect. From the experiments and modeling of the electron behavior, it was found that NLD plasma posses the electron temeprature $T_{e}$ and density ne peaks around the NL is essential for the formation of plasma. Also, the optimum condition of plasma production could be simply estimated by the calculation of $U_{av}$ and $F_{0}$././.

• Proceedings of the KIEE Conference
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• 1995.07c
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• pp.1401-1403
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• 1995

This paper investigates the light output characteristics of an electrodeless H-discharge lamp. The existing cylindrical fluorescent lamps were wound around with an induction coil of varying size, and were driven by RF power. The light output and the luminous efficacy were measured according to variations of the induction coil gap and the lamp power, respectively. The experimental results show that the luminous efficacy of the lamp is as much as existing electrodeless lamps and the luminous efficacy of lamps are high between 10W and 20W. Theoretical analyses using computer simulation show that the circuit matching is easier in the external coil configuration than in the internal one, and that the current and the power distributions near the coil are shower in t.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.149-149
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• 2012

We introduce Helicon discharge plasma source and Laser Thomson scattering system recently finished an installation in KRISS. Laser Thomson scattering method is promising for diagnostics in Helicon plasma because a measurement by electrical probe typically used has significant errors due to the gyromotion of electrons induced by high magnetic field. However, we found that LTS is affected by magnetic field so that we applied the normalization method for processing data and the results show a clear Maxwellian distribution at various conditions of magnetic field and RF power at low energy part without distortion.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.121.1-121.1
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• 2014

Recently, much attention has been given to plasma production under liquid and its applications [1]. However, most of plasma production techniques reported so far utilize high voltage dc, ac, rf or microwave power [2], where damage to discharge electrodes and small discharge volume are remained issues. As an alternative of plasma production method under liquid, we have proposed pulsed microwave excited plasma using slot antenna, where damage to the slot electrode can be minimized and plasma volume can be increased. We have also reported improvement of treatment efficiency with use of reduced-pressure condition during the discharge [3]. To realize low pressure conditions in liquid, various alternative technique can be considered. One possible technique is simultaneous injection of microwave power and ultrasonic wave. Ultrasonic wave induces pressure fluctuation with the wave propagation and is so far used for cavitation production in the water. We propose utilization of reduced pressure induced by ultrasonic cavitation for improvement of the plasma production. Correlation between the plasma production and the ultrasonic power will be discussed.

• Proceedings of the KIEE Conference
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• 1999.11d
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• pp.1096-1098
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• 1999

The performance of as plasma display panels (PDP) is influenced strongly by the surface glow discharge characteristics on the MgO thin films. This paper deals with the optimum preparation conditions of MgO Protecting layer by RF unbalanced magnetron sputtering(UBMS) in surface discharge type AC PDP. The samples prepared with the do bias voltage of -10V showed lower discharge voltage, lower erosion rate as a consequence of ion bombardment, higher optic transparency and higher crack resistance in annealing process than those samples prepared by conventional magnetron sputtering or E-beam eraporation.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.58 no.11
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• pp.2236-2241
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• 2009

In this study, the electron behavior was investigated numerically in order to obtain guidelines for design and operation of a new plasma source by a magnetic neutral loop discharge (NLD). The optimum plasma production was investigated by using a 3-dimensional simulation model which enables the electron behavior calculation from source region to downstream region. The results showed that the high-density plasma produced around the magnetic neutral loop (NL) is transferred from the NL region to the downstream region along magnetic force lines. Also the avaraged electron energy is increased with the normalized RF electric field (F), which can be used to characterize the plasma production efficiency of NLD system. Considering the relation between F and plasma production, in-depth plasma control can be achieved at a given specific process condition.

• Korean Journal of Materials Research
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• v.28 no.3
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• pp.159-165
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• 2018

In order to increase the efficiency of the sputtering method widely used in thin film fabrication, a dc sputtering apparatus which supplies both high frequency and magnetic field from the outside was fabricated, and cobalt thin film was fabricated using this apparatus. The apparatus can independently control the applied voltage, the target-substrate distance, and the target current, which are important parameters in the sputtering method, so that a stable glow discharge is obtained even at a low gas pressure of $10^{-3}$ Torr. The fabrication conditions using the sputtering method were mainly performed in $Ar+O_2$ mixed gas containing about 0.6 % oxygen gas under various Ar gas pressures of 1 to 30 mTorr. The microstructure of Co thin films deposited using this apparatus was examined by electron diffraction pattern and X-ray techniques. The magnetic properties were investigated by measuring the magnetization curves. The microstructure and magnetic properties of Co thin films depend on the discharge gas pressure. The thin film fabricated at high gas pressure showed a columnar structure containing a large amount of the third phase in the boundary region and the thin film formed at low gas pressure showed little or no columnar structure. The coercivity in the plane was slightly larger than that in the latter case.

• Carbon letters
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• v.12 no.1
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• pp.16-20
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• 2011

Commercial PAN fibers were thermally stabilized at 220 or $240^{\circ}C$ for 30 min. Those fibers were further stabilized using radio-frequency (RF) capacitive plasma discharge during 5 or 15 min. From Fourier transform infrared spectroscopy results, it was observed that an additional plasma treatment led to further stabilization of PAN fibers. After stabilization, carbonization was performed to investigate the final tensile properties of the fabricated carbon fibers (CFs). The results revealed that a combination of thermal and plasma treatment is a possible stabilization process for manufacturing CFs. Morphology of CFs was investigated using scanning electron microscopy. The morphology shows that the plasma stabilization performed by the RF large gap plasma discharge may damage the surface of the CF, so it is necessary to select a proper process condition to minimize the damage.