• 제목/요약/키워드: RF Magnetron Sputtering

검색결과 1,633건 처리시간 0.023초

Properties of ZnO:Ga thin films deposited by RF magnetron sputtering under various RF power

  • Kim, Deok Kyu;Kim, Hong Bae
    • Applied Science and Convergence Technology
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    • 제24권6호
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    • pp.242-244
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    • 2015

  • ZnO:Ga thin films were deposited by RF magnetron sputtering technique from ZnO (3 wt.% $Ga_2O_3$) target onto glass substrates under various RF power. The influence of RF power on the structural, electrical, and optical properties of ZnO:Ga thin films was investigated by X-ray diffraction, atomic force microscopy, Hall method and optical transmission spectroscopy. As the RF power increases from 50 to 110W, the crystallinity is deteriorated, the root main square surface roughness is decreased and the sheet resistance is increased. The increase of sheet resistance is caused by decreasing carrier concentration due to interstitial Ga ion. All films are transparent up to 80% in the visible wavelength range and the adsorption edge is a red-shift with increasing RF power.

  • https://doi.org/10.5757/ASCT.2015.24.6.242 인용 PDF KSCI

RF 마그네트론 스퍼터링을 이용한 태양전지용 질화 실리콘 반사방지막 (Anti-reflection Coating of Silicon Nitride Film for Solar Cell by RF Magnetron Sputtering)

  • 최균;최의석;황진하;이수홍
    • 한국세라믹학회지
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    • 제44권10호
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    • pp.585-588
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    • 2007

  • Silicon nitride films for an anti-reflection coating were deposited on silicon via RF magnetron sputtering using a $Si_3N4$ target. The best result was obtained at the sputtering condition of 340 W RF power, 5 mtorr Ar atmosphere, $100^{\circ}C$ substrate temperature. The films showed 7.9% reflectance minimum with 2.35 refractive index. 0.21 absorption coefficient at 66.6 nm thickness. The surface morphology showed a smooth and dense film with good adhesion to silicon surface.

  • https://doi.org/10.4191/KCERS.2007.44.1.585 인용 PDF KSCI