• 제목/요약/키워드: RF Frequency

검색결과 2,186건 처리시간 0.036초

고주파 임피던스를 이용한 곡류의 함수율 측정에 관한 연구 (I) - 곡류의 전기적 특성 구명 - (Measurement of Grain Moisture Content using RF Impedance (I) - Electrical Properties of Grain -)

  • 김기복;노상하
    • Journal of Biosystems Engineering
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    • 제24권2호
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    • pp.123-134
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    • 1999
  • The electrical properties such as dielectric constant, dielectric loss factor and AC conductivity of grain were presented to measure the moisture content of grain using RF impedance. At frequency ranging from 1 to 10MHz and room temperature, $20^{\circ}C$, vector network analyzer(HP4195) and coaxial type sample holder were used to analyze the electrical properties of paddy(11∼24%w.b.), brown rice(11∼18%w.b.), barley(11∼21%w.b.) and wheat(11∼23%w.b.) depending on the moisture content, frequency and bulk density. The dielectric constant and AC conductivity of grain samples increased with moisture content and bulk density. The dielectric constants decreased with frequency and could be expressed as function of the moisture density(decimal moisture $content{\times}bulk$ density).

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RF magnetron sputtering으로 제작한 ZnO/sapphire 압전 변환기의 전기적인 특성에 관한 연구 (Electrical properties of ZnO/sapphire piezo-electric transducer by RF magnetron sputtering)

  • 이종덕;정규원;고상춘;송준태
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1995년도 춘계학술대회 논문집
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    • pp.22-25
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    • 1995
  • In this paper, the physical characteristics of piezoelectric transducer which generates acoustic weve at microwave frequency were theoretically analized. We found that increasing electrode thickness is showed large distorthion on bandwidth. ZnO thin film were desposited by RF magnetron sputtering method. considering the sputtering parameters. Thickness of the desposited ZnO was 3.9 $\mu\textrm{m}$. In this experiment, we get that resistivity is 12.196${\times}$109 [cm$\Omega$], that resonance frequency is 827.47MHz Measuring insertion loss, we ascertained to possibility of transducer application for microwave frequency.

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Implementation of Platform System for IEEE 802.15.4 Low Rate WPAN

  • Park, Joo-Ho;Kang, Young-Jin;Kim, Jae-Young
    • 한국정보기술응용학회:학술대회논문집
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    • 한국정보기술응용학회 2005년도 6th 2005 International Conference on Computers, Communications and System
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    • pp.191-194
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    • 2005
  • In this paper the platform system for IEEE 802.15.4 Low Rate WPAN is designed and fabricated. IEEE 802.15.4 Low Rate WP AN system serves the functions and realization of home-area network. According to the IEEE 802.15.4 standard, there are two modes, One is BPSK modulation in 868/915MHz frequency band. The other is O-QPSK modulation in 2.45GHz frequency band. In this paper we implemented the platform system mounted in one PCB board in 868/915MHz frequency band of IEEE 802.15.4 Low Rate WPAN system. We measured that the platform system which consists of digital part and RF part has good performance. Also RF part is realized by design and fabrication of the RF transceiver IC. The key issue is to make the platform system which provides the function of Low Rate WPAN system to meet the requirement of IEEE 802.15.4 standards.

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Radio Frequency Multi-Hollow Cathode 플라즈마 시스템을 이용한 대면적 블랙 실리콘 태양전지에 관한 연구 (A Study on Large Area Black Silicon Solar Cell Using Radio-Frequency Multi-Hollow cathode Plasma System)

  • 유진수;임동건;양계준;이준신
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제52권11호
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    • pp.496-500
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    • 2003
  • A low-cost, large area, random, maskless texturing scheme independent of crystal orientation is expected to significantly impact terrestrial photovoltaic technology. We investigated silicon surface microstructures formed by reactive ion etching (RIE) in Multi-Hollow cathode system. Desirable texturing effect has been achieved when radio-frequency (rf) power of about 20 Watt per one hollow cathode glow is applied for our RF Multi-Hollow cathode system. The black silicon etched surface shows almost zero reflectance in the visible region as well as in near IR region. The etched silicon surface is covered by columnar microstructures with diameters from 50 to 100 nm and depth of about 500 nm. We have successfully achieved 11.7% efficiency of mono-crystalline silicon solar cell and 10.2% multi-crystalline silicon solar cell.

저속 WPAN 시스템 구현을 위한 플랫폼 설계 (Implementation of Platform for Low Rate WPAN System)

  • 박주호;김명종;김재영
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2006년도 하계종합학술대회
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    • pp.133-134
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    • 2006
  • In this paper the platform system for IEEE 802.15.4 Low Rate WPAN is designed and fabricated. IEEE 802.15.4 Low Rate WPAN system serves the functions and realization of home-area network. According to the IEEE 802.15.4 standard, there are two modes, One is BPSK modulation in 868/915MHz frequency band. The other is O-QPSK modulation in 2.45GHz frequency band. In this paper we implemented the platform system mounted in one PCB board in 868/915MHz frequency band of IEEE 802.15.4 Low Rate WPAN system. We measured that the platform system which consists of digital part and RF part has good performance. Also RF part is realized by design and fabrication of the RF transceiver IC. The key issue is to make the platform system which provides the function of Low Rate WPAN system to meet the requirement of IEEE 802.15.4 standards.

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A MB-OFDM UWB 0.18-μm CMOS RF Front-End Receiver

  • Kim, Chang-Wan
    • Journal of electromagnetic engineering and science
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    • 제8권1호
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    • pp.34-39
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    • 2008
  • An RF front-end dual-conversion receiver for $3{\sim}5\;GHz$ MB-OFDM UWB systems is implemented in $0.18\;{\mu}m$ CMOS technology. The receiver includes a two-stage UWB LNA, an RF mixer, an IF I/Q mixer, and a frequency synthesizer. The proposed receiver adopts the dual-conversion architecture to mitigate the burden of design of the frequency synthesizer. Accordingly, the proposed frequency synthesizer generates four LO tones from only one VCO. The receiver front-end achieves power gain of 16.3 to 21 dB, NF of 7 to 7.6 dB over $3{\sim}5\;GHz$, and IIP3 of -21 dBm, while consuming 190 mW from a 1.8 V supply.

무전극 형광램프의 페라이트 특성변화에 따른 전자계 분포 (Electromagnetic Field Distribution of Electrodeless Fluorescent Lamps)

  • 김광수;이영환;조주웅;최용성;박대희
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제53권2호
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    • pp.79-82
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    • 2004
  • The RF inductive discharge or inductively coupled plasma (ICP) continues to attract growing attention as an effective plasma source in many industrial applications, the best known of which are plasma processing and lighting technicology. Although most practical ICP operate at 13.56 [MHz]and 2.65 [MHz], the trend to reduce the operating frequency is clearly recognizable from recent ICP developments. In an electrodeless fluorescent lamp, the use of a lower operating frequency simplifies and reduces cost of rf matching systems and rf generators and can eliminate capacitive coupling between the inductor coil and plasma, which could be a strong factor in wall erosion and plasma contamination. In this study, the configuration of ferrite and fixture which operates at the frequency of 2.65[MHz]was discussed as functions of the ferrite thickness and distance by using the electromagnetic simulation software (Maxwell 2D).

CMOS Direct-Conversion RF Front-End Design for 5-GHz WLAN

  • Oh, Nam-Jin
    • Journal of electromagnetic engineering and science
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    • 제8권3호
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    • pp.114-118
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    • 2008
  • Direct-conversion RF front-end for 5-GHz WLAN is implemented in $0.18-{\mu}m$ CMOS technology. The front-end consists of a low noise amplifier, and low flicker noise down-conversion mixers. For the mixer, an inductor is included to resonate out parasitic tail capacitances in the transconductance stage at the operating frequency, thereby improves the flicker noise performance of the mixer, and the overall noise performance of the front-end. The receiver RF front-end has 6.5 dB noise figure, - 13 dBm input IP3, and voltage conversion gain of 20 dB with the power consumption of 30 mW.

Q-band 빔 리드 Single ended 믹서 (Q-band Beam-Lead Single-ended Mixer)

  • 이창훈;한석태
    • 전자공학회논문지A
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    • 제31A권1호
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    • pp.26-32
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    • 1994
  • In this paper, using the newly developed GaAs Schottky beam-lead diode made by Marconi company, we have developed and evaluated the waveguide type single-ended mixer at Q-band. The various components of the mixer were separately designed and optimized using the Super-Compact software. These studies included the design of the step waveguide impedance transformer and the RF-choke filter, and the optimization of a high and low impedance for the RF-choke filter. Moreover, this RF-choke filter pattern included a section to reject the second harmonic frequency of the RF signal. Finally, this Q-band mixer with 1.4GHz/400MHz IF frequency exhibits an average conversion loss of 5.3 dB over 33-50GHz bandwidth.

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듀얼 Freuqency가 인가된 자화된 ICP에서, RF 바이어스 파워가 플라즈마의 밀도에 미치는 영향

  • 김혁;이우현;박완재;황기웅
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.486-486
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    • 2012
  • 반도체 식각 공정에서 이온의 플럭스와 충돌 에너지를 각각 조절하고자 Dual frequency RF source가 사용된다. 듀얼 freuqnecy RF가 인가된 Capacitively coupled plasma (CCP) 의 경우, 기판에 걸린 Low freuqency (LF) RF 소스에 의하여 이온의 에너지를 조절하고, High frequency (HF) 소스를 조절하여 이온의 플럭스를 조절하는 것이 일반적이다. 그러나 LF의 세기가 증가함에 따라서, 플라즈마의 밀도가 오히려 감소하는 문제점이 있었다. 이 경우, 약한 자장을 플라즈마에 걸어줌으로써 밀도가 감소되는 문제를 해결할 수 있다고 알려져 왔다. Inductively coupled plasma (ICP) 에서는 HF를 안테나에 가하여 이온의 플럭스를 조절하고, LF를 기판에 가하여 이온의 충돌 에너지를 조절하는 것이 일반적인데, 위와 동일한 문제가 이 경우에도 발생하는 것을 확인 하였다. CCP와 마찬가지로, 바이어스에 걸린 파워의 세기가 증가함에 따라서 플라즈마의 밀도가 감소하고 전자의 온도가 증가하는 현상을 확인하였다. 또한 이때에도, 약한 자장을 걸어줌으로써 플라즈마의 밀도가 감소하지 않고 유지될 수 있으며, 전자의 온도 또한 유지될 수 있음을 발견하였다.

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