• Proceedings of the IEEK Conference
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• 2005.11a
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• pp.921-924
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• 2005

We report low conversion loss and high LO to RF isolation 94 GHz MMIC resistive mixers based on 0.1 ${\mu}m$ InGaAs/InAlAs/GaAs metamorphic HEMT technology. The fabricated resistive mixers applied a one-stage amplifier on RF port of the mixer. By using the one-stage amplifier, we obtained the decrement of conversion loss and the increment of LO to RF isolation. So, we can obtain higher performances than conventional resistive mixers. The modified mixer shows excellent conversion loss of 6.7 dB at a LO power of 10 dBm. We also observed an extremely high isolation characteristic from the MMICs exhibiting the LO-RF isolation of 21 ${\pm}$ 0.5dB in a frequency range of 93.7${\sim}$ 94.3 GHz. The low conversion loss and high LO-RF isolation characteristics of the MMIC modified resistive mixers are mainly attributed to the performance of the MHEMTs exhibiting a maximum transconductance of 654 mS/mm, a current gain cut-off frequency of 173 GHz and a maximum oscillation frequency of 271 GHz.

• Proceedings of the KIEE Conference
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• 2007.04c
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• pp.29-33
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• 2007

In this paper, time-varying parameter of passive telemetry RF sensor system is estimated using RLS(Rescursive $\leq$* Square) algorithm. In order to overcome the problems such as power limits and complication that general RF sensor system including IC chip has, the principle of inductive coupling is applied to model sensor system The model parameter is rearranged for applying RLS algorithm based on mathematical model to the derived model using inductive coupling principle. Time variant parameter of rearranged model is estimated using forgetting factor, and in case measured data is contaminated by noise and modelling error, the performance of RLS algorithm characterized by the convergence of squared error sum is verified by simulation.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07b
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• pp.1123-1126
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• 2003

In this paper, the emission properties of electrodeless fluorescent lamp were discussed using the inductively coupled plasma. To transmit the electromagnetic energy into the chamber, a RF power of 13.56MHz was applied to the antenna and considering the Ar gas pressure and the RF electric power change, the emission spectrum, Ar- I line, luminance were investigated. At this time the input parameter for ICP RF plama, Ar gas pressure and RF power were applied in the range of $10{\sim}60m$ Torr, $10{\sim}300W$ respectively.

• Korean Journal of Materials Research
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• v.16 no.8
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• pp.461-465
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• 2006

Chromium (Cr) films were deposited on plain carbon steel sheets by DC and RF magnetron sputtering as well as by electroplating. Effects of DC or RF sputtering power on the deposition rate and properties such as, hardness, surface roughness and corrosion-resistance of the Cr films were investigated. X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microcopy (SEM) analyses were performed to investigate the crystal structure, surface roughness, thickness of the Cr films. Salt fog tests were used to evaluate the corrosion resistance of the samples. The deposition rate, hardness, and surface roughness of the Cr film deposited by either DC or RF sputtering increase with the increase of sputtering power but the adhesion strength is nearly independent of the sputtering power. The deposition rate, hardness, and adhesion strength of the Cr film deposited by DC sputtering are higher than those of the Cr film deposited by RF sputtering, but RF sputtering offers smoother surface and higher corrosion-resistance. The sputter-deposited Cr film is harder and has a smoother surface than the electroplated one. The sputter-deposited Cr film also has higher corrosion-resistance than the electroplated one, which may be attributed to the smoother surface of the sputter-deposited film.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.214-215
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• 2008

Zinc-oxide(ZnO) films were deposited on PC(polycarboanate) and PES(polyethersulphone) substrates by using RF(radio-frequency)sputter with various rf sputtering Power at a room temperature. The effects of rf sputtering Power on the structural and optical properties of ZnO films were investigated by using atomic force microscopy, X-ray diffraction, and UV spectrophotometer. The most excellent structural and properties of a ZnO film are obtained in the condition of an rf-power of 150 W. This film shows larger Grain size and lower surface roughness and a higher optical transmittance of over 80 % in the visible range than other films deposited in the different conditions of rf- power. Regardless of substrate types, The presence of a strong diffraction peak indicates that films have a (0 0 2) preferred orientation associated with the hexagonal phase.

• Korean Journal of Microbiology
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• v.25 no.1
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• pp.34-39
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• 1987

To study the replication process of the single-stranded DNA parvovirus KBSH-isolated from normal human cell cultures-in actively dividing embryonic swine kidney cells, amount of the synthesized viral hemagglutination (HA) antigen and the overall rate of viral double-stranded replicative form(RF) DNA synthesis were wxamined. The initiation of viral RF KNA synthesis and the decrease of host DNA synthesis rate in viral infected cells occurred almost same time at 15-16 hour post infection(PI). And the release of viral HA antigen to media followed at 24 hour PI, concurrently the overall rate of viral RF DNA synthesis reaching its maximum. Evidence is presented which indicates that successful performance of viral RF DNA replication requires proteins synthesized in viral infected cells at 10-14 hour PI.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.169-170
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• 2007

In this paper we report upon an investigation into the effect of sputter pressure and RF power on the electrical properties of Gallium doped zinc oxide (GZO) film. GZO films were deposited on glass substrate without substrate temperature by RF magnetron sputtering from a ZnO target mixed with 5 wt% $Ga_2O_3$. Argon gas pressure and RF power were in the range of 1~11 mTorr, and 50~100 W, respectively. However, the resistivity of the film was strongly influenced by the sputter pressure and RF power. We were able to achieve as low as $1.5{\times}10^{-3}\;{\Omega}cm$, without substrate temperature.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.07b
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• pp.939-942
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• 2004

Al doped Zinc Oxide(ZnO:Al) films, which is widely used as a transparent conductor in optoelectronic devices such as solar cell, liquid crystal display, plasma display panel, thermal heater, and other sensors were Prepared by using the capacitively coupled RF magnetron sputtering method. In this paper the effect of RF discharge power on the electrical, optical and structural properties were investigated experimentally. The results show that the structural and electrical properties of the film are highly affected by the variation of RF discharge power. The optimum growth conditions were obtained for films doped with 2 wt% of $Al_2O_3$ and 200 W in RF discharge power, which exhibit a resistivity of $10.4{\times}10^{-4}{\Omega}-cm$ associated with a transmittance of 89.66 % for 1000nm in films thickness in the wavelength range of the visible spectrum.

• Proceedings of the Korean Institute of Navigation and Port Research Conference
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• 2022.11a
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• pp.390-391
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• 2022

Recently, SpaceX, private enterprise dealing in space development company, has reported a plan for launching of low earth orbit satellites via Starlink Business, and launched 900 satellites until now. Concretely, it plans tp operate Ku/Ka band satellite, and launch 7,518 of V band satellites for broadband communication. Therefore, wireless communication service for ship will be provided, and various solutions will be offered through the low earth orbit satellites. In this work, we investigated RF characteristics of coplanar waveguide employing periodic 3D coupling structures, and examined its potential for a development of marine radio communication FISoC (fully-integrated system on chip) semiconductor device.

• Journal of the Korean Vacuum Society
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• v.4 no.2
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• pp.201-209
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• 1995

고밀도 helicon wave 플라즈마의 특성 및 이온 에너지 분포에 관하여 연구하였다. Helicon wave에 의하여 고밀도의 플라즈마를 형성시키는 helicon mode와 capacitive field가 지배적이어서 electrostatic 방전이 되어 저밀도의 플라즈마를 형성시키는 low mode가 존재하는 것을 관찰하였다. rf modulation된 플라즈마 전위가 이온 에너지 분석기를 통하여 얻어지는 이온 에너지 분포에 미치는 영향을 이론 및 실험적으로 관찰하였다. 이온 에너지 분포의 분석을 통하여 low mode에서는 플라즈마 전위가 rf 주파수로 Vp-p의 크기로 modulation되는 것을 확인하였다. Helicon mode에서는 inductive field가 capacitive field보다 우세하기 때문에 플라즈마 전위의 rf modulation은 일어나지 않았다.