• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
• /
• pp.658-658
• /
• 2013

Graphene is an attractive material for various device applications due to great electrical properties and chemical properties. However, lack of band gap is significant hurdle of graphene for future electrical device applications. In the past few years, several methods have been attempted to open and tune a band gap of graphene. For example, researchers try to fabricate graphene nanoribbon (GNR) using various templates or unzip the carbon nanotubes itself. However, these methods generate small driving currents or transconductances because of the large amount of scattering source at edge of GNRs. At 2009, Bai et al. introduced graphene nanomesh (GNM) structures which can open the band gap of large area graphene at room temperature with high current. However, this method is complex and only small area is possible. For practical applications, it needs more simple and large scale process. Herein, we introduce a photosensitive graphene device fabrication using CdSe QD coated nano-porous graphene (NPG). In our experiment, NPG was fabricated by thin film anodic aluminum oxide (AAO) film as an etching mask. First of all, we transfer the AAO on the graphene. And then, we etch the graphene using O2 reactive ion etching (RIE). Finally, we fabricate graphene device thorough photolithography process. We can control the length of NPG neckwidth from AAO pore widening time and RIE etching time. And we can increase size of NPG as large as 2 $cm^2$. Thin CdSe QD layer was deposited by spin coatingprocess. We carried out NPG structure by using field emission scanning electron microscopy (FE-SEM). And device measurements were done by Keithley 4200 SCS with 532 nm laser beam (5 mW) irradiation.

• 한국안광학회지
• /
• 제7권2호
• /
• pp.155-161
• /
• 2002

전도성 혹은 비전도성 지지체에서 전기변색이 가능한 수 nm에서 수액 nm 두께의 금속 니켈 박막 형성에 대한 연구를 수행하였다. 광학렌즈나 혹은 LCD에 사용되는 ITO, 실리콘 웨이퍼에 박막 형성에 대한 연구는 다양한 두께의 니켈 박막은 자체로서의 응용 가능성 뿐 아니라, 광전기화학 소자, 특히 선글라스로 대변되는 변색 소자에의 응용 가능성이 아주 크다. 이러한 소자들은 나노 기술 응용과 양자점의 응용 등으로 경박단소형의 렌즈나 전지, 유리 그리고 태양 선지 등에 응용이 가능하다. 전기화학적으로 니켈 금속을 ITO 유리위에 코팅한 후, AFM, XRD을 이용하여 미세구조를 확인하고, 순환전압전류법, 시간대전류법, 임피던스를 이용하여 이들의 전기화학적 박막 특성을 조사하였다.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
• /
• pp.213-213
• /
• 2012

It has been known that quantum confinement effect of CdSe nanocrystal was observed by increasing the number of deposition cycle using successive ionic layer adsorption and reaction (SILAR) method. Here, we report on thermally-induced quantum confinement effect of CdSe at the given cycle number using spin-coating technology. A cation precursor solution containing $0.3\;M\;Cd(NO_3)_2{\cdot}4H_2O$ is spun onto a $TiO_2$ nanoparticulate film, which is followed by spinning an anion precursor solution containing $0.3\;M\;Na_2\;SeSO_3$ to complete one cycle. The cycle is repeated up to 10 cycles, where the spin-coated $TiO_2$ film at each cycle is heated at temperature ranging from $100^{\circ}C$ to $250^{\circ}C$. The CdSe-sensitized $TiO_2$ nanostructured film is contacted with polysulfide redox electrolyte to construct photoelectrochemical solar cell. Photovoltaic performance is significantly dependent on the heat-treatment temperature. Incident photon-to-current conversion efficiency (IPCE) increases with increasing temperature, where the onset of the absorption increases from 600 nm for the $100^{\circ}C$- to 700 nm for the $150^{\circ}C$- and to 800 nm for the $200^{\circ}C$- and the $250^{\circ}C$-heat treatment. This is an indicative of quantum size effect. According to Tauc plot, the band gap energy decreases from 2.09 eV to 1.93 eV and to 1.76 eV as the temperature increases from $100^{\circ}C$ to $150^{\circ}C$ and to $200^{\circ}C$ (also $250^{\circ}C$), respectively. In addition, the size of CdSe increases gradually from 4.4 nm to 12.8 nm as the temperature increases from $100^{\circ}C$ to $250^{\circ}C$. From the differential thermogravimetric analysis, the increased size in CdSe by increasing the temperature at the same deposition condition is found to be attributed to the increase in energy for crystallization with $dH=240cal/^{\circ}C$. Due to the thermally induced quantum confinement effect, the conversion efficiency is substantially improved from 0.48% to 1.8% with increasing the heat-treatment temperature from $100^{\circ}C$ to $200^{\circ}C$.

• 전기화학회지
• /
• 제18권1호
• /
• pp.38-44
• /
• 2015

본 총설은 다공성의 메조포러스 이산화티타늄 박막을 기반으로 하는 양자점-감응 태양 전지의 최근 발전 과정에 대해 정리하였다. 나노스케일의 무기물 양자점이 가지는 본질적 특성에 기반하고 다양한 양자점 구성 물질을 이용하여, 용액-공정 기반의 다양한 3세대 박막 태양전지를 만들 수 있었다. 양자점 감응제는 준비하는 방법에 따라 크게 2가지로 나눌 수 있는데, 첫 번째는 콜로이드 형태로 용액상에서 준비한 다음 $TiO_2$ 표면에 붙이는 것이고 두 번째는 양자점 전구체가 녹아있는 화학조를 이용하여 직접 $TiO_2$ 표면에 성장시키는 것이다. 폴리썰파이드 전해질을 사용하여, 콜로이드 양자점 감응제의 경우는 최근 들어 정밀한 조성 조절을 통하여 전체 광전 변환효율이 ~7%에 이르렀고 화학조 침전법을 이용하여 준비된 대표적 감응제인 CdS/CdSe는 ~5%의 효율을 보이고 있다. 앞으로는 지금까지 보고된 양자점 감응제의 뛰어난 광전류 생성 능력을 유지하면서, 새로운 정공 전달체의 개발 및 계면 조절을 통한 개방 전압과 채움 상수의 개선을 통한 효율 증가 및 안정성에 관한 체계적 연구가 필요한 상황이다.

• 한국산학기술학회논문지
• /
• 제19권6호
• /
• pp.646-651
• /
• 2018

최근 태양전지의 Donor/Acceptor 계면에 그래핀 양자점을 완충 층으로 삽입하여 광 전환 효율을 향상시킨 많은 연구 결과들이 보고되었다. 그래핀 양자점은 그래핀 단일 층이 여러 겹 쌓여서 구성된 수 나노미터 크기의 물질로, 양자 제한 효과에 의한 밴드갭 조절이 가능하다는 장점을 가지고 있다. 하지만 대부분의 그래핀 양자점을 활용한 연구에서 레이저 분쇄나 수열 처리 등과 같은 복잡하고 접근성이 떨어지는 용액 공정들이 박막 형성에 사용되고 있다. 본 연구에서는 Indium tin oxide(ITO)/$TiO_2$/Poly(3-hexylthiophene)(P3HT)/Al 구조로 구성된 태양전지의 Donor/Acceptor 계면에 그래핀 양자점을 단순한 초음파 처리를 통해 용매에 분산시켜 박막 공정에 사용하였음에도 불구하고, 단락 전류를 $1.26{\times}10^{-5}A/cm^2$에서 $7.46{\times}10^{-5}A/cm^2$으로, 곡선인자(Fill factor)를 0.27에서 0.42로 향상된 결과를 확인하였다. 이러한 결과를 트랜지스터 구조의 소자를 활용한 전기적 성질 확인과 순환 전압-전류법을 통한 에너지 레벨 분석 및 가시광 흡수 스펙트럼 분석 등을 통하여 고찰하였다. 본 연구 결과를 통해 그래핀 양자점 용액 공정이 복잡한 처리 공정 없이도, 보다 폭넓게 활용 가능할 것으로 예상된다.

• Bulletin of the Korean Chemical Society
• /
• 제32권1호
• /
• pp.263-272
• /
• 2011

Highly luminescent and monodisperse InP quantum dots (QDs) were prepared by a non-organometallic approach in a non-coordinating solvent. Fatty acids with well-defined chain lengths as the ligand, a non coordinating solvent, and a thorough degassing process are all important factors for the formation of high quality InP QDs. By varying the molar concentration of indium to ligand, QDs of different size were prepared and their absorption and emission behaviors studied. By spin-coating a colloidal solution of InP QD onto a silicon wafer, InP QD thin films were obtained. The thickness of the thin films cured at 60 and $200^{\circ}C$ were nearly identical (approximately 860 nm), whereas at $300^{\circ}C$, the thickness of the thin film was found to be 760 nm. Different contrast regions (A, B, C) were observed in the TEM images, which were found to be unreacted precursors, InP QDs, and indium-rich phases, respectively, through EDX analysis. The optical properties of the thin films were measured at three different curing temperatures (60, 200, $300^{\circ}C$), which showed a blue shift with an increase in temperature. It was proposed that this blue shift may be due to a decrease in the core diameter of the InP QD by oxidation, as confirmed by the XPS studies. Oxidation also passivates the QD surface by reducing the amount of P dangling bonds, thereby increasing luminescence intensity. The dielectric properties of the thin films were also investigated by capacitance-voltage (C-V) measurements in a metal-insulator-semiconductor (MIS) device. At 60 and $300^{\circ}C$, negative flat band shifts (${\Delta}V_{fb}$) were observed, which were explained by the presence of P dangling bonds on the InP QD surface. At $300^{\circ}C$, clockwise hysteresis was observed due to trapping and detrapping of positive charges on the thin film, which was explained by proposing the existence of deep energy levels due to the indium-rich phases.

• JSTS:Journal of Semiconductor Technology and Science
• /
• 제1권1호
• /
• pp.40-49
• /
• 2001

We have developed a repeatable process of forming uniform, small-size and high-density self-assembled Si nano-crystals. The Si nano-crystals were fabricated in a conventional LPCVD (low pressure chemical vapor deposition) reactor at $620^{\circ}c$ for 15 sec. The nano-crystals were spherical shaped with about 4.5 nm in diameter and density of $5{\times}l0^{11}/$\textrm{cm}^2$. More uniform dots were fabricated on nitride film than on oxide film. To take advantage of the above-mentioned characteristics of nitride film while keeping the high interface quality between the tunneling dielectrics and the Si substrate, nitride-oxide tunneling dielectrics is proposed in n-channel device. For the first time, the single electron effect at room temperature, which shows a saturation of threshold voltage in a range of gate voltages with a periodicity of ${\Delta}Ｖ_{GS}\;{\approx}\;1.7{\;}V$, corresponding to single and multiple electron storage is reported. The feasibility of p-channel nano-crystal memory with thin oxide in direct tunneling regime is demonstrated. The programming mechanisms of p-channel nano-crystal memory were investigated by charge separation technique. For small gate programming voltage, hole tunneling component from inversion layer is dominant. However, valence band electron tunneling component from the valence band in the nano-crystal becomes dominant for large gate voltage. Finally, the comparison of retention between programmed holes and electrons shows that holes have longer retention time.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2011년도 제40회 동계학술대회 초록집
• /
• pp.379-379
• /
• 2011

본 연구에서는 황화납(PbS)을 감응 물질로 하는 양자점 감응형 태양전지를 제작하고 효율을 측정해보았다. 기판에 진공증착을 통해 seed layer를 형성하고 수열합성법으로 산화아연(ZnO) 나노선 어레이를 기른 후 SILAR(Successive ionic layer adsorption and reaction)법으로 PbS 양자점을 합성하였고, 농도와 cycle에 따른 특성의 변화를 주사전자현미경(SEM), X-선 회절, UV-visible spectrometer를 통해 확인하였다. SILAR법을 통해 PbS가 ZnO 나노선 위에 film 형태로 균일하게 성장한 것을 확인할 수 있었고, 이렇게 합성한 물질을 직접 태양전지로 제작하여 그 효율을 측정하였다. 또한 co-sensitizer 물질로 CdS를 합성하여 두 물질의 감응 물질로서의 성능을 확인하였다. PbS는 비교적 작은 밴드갭을 가지며 양자 제한 효과가 커 밴드갭 조절이 용이하며 여러 종류의 태양전지에서 이용되고 있다. 이러한 PbS를 감응 물질로 하는 양자점 감응형 태양전지 제작을 통해 태양전지에의 적용 가능성을 살펴보고 그러기 위해 필요한 부분들을 모색해보았다.

• Safety and Health at Work
• /
• 제12권3호
• /
• pp.403-415
• /
• 2021

Background: This study aimed to assess the possibility of benzene exposure in workers of a Korean semiconductor manufacturing company by reviewing the issued patents. Methods: A systematic patent search was conducted with the Google "Advanced Patent Search" engine using the keywords "semiconductor" and "benzene" combined with all of the words accessed on January 24, 2016. Results: As a result of the search, we reviewed 75 patent documents filed by a Korean semiconductor manufacturing company from 1994 to 2010. From 22 patents, we found that benzene could have been used as one of the carbon sources in chemical vapor deposition for capacitor; as diamond-like carbon for solar cell, graphene formation, or etching for transition metal thin film; and as a solvent for dielectric film, silicon oxide layer, nanomaterials, photoresist, rise for immersion lithography, electrophotography, and quantum dot ink. Conclusion: Considering the date of patent filing, it is possible that workers in the chemical vapor deposition, immersion lithography, and graphene formation processes could be exposed to benzene from 1996 to 2010.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2009년도 제38회 동계학술대회 초록집
• /
• pp.37-37
• /
• 2010

Silicate-silsesquioxane or siloxane-silsesquioxane hybrid thin films are strong candidates as matrix materials for ultra low dielectric constant (low-k) thin films. We synthesized the silicate-silsesquioxane hybrid resins from tetraethoxyorthosilicate (TEOS) and methyltrimethoxysilane (MTMS) through hydrolysis and condensation polymerization by changing their molar ratios ([TEOS]:[MTMS] = 7:3, 5:5, and 3:7), spin-coating on Si(100) wafers. In the case of [TEOS]:[MTMS] 7:3, the dielectric permittivity value of the resultant thin film was measured at 4.30, exceeding that of the thermal oxide (3.9). This high value was thought to be due to Si-OH groups inside the film and more extensive studies were performed in terms of electronic, ionic, and orientational polarizations using Debye equation. The relationship between the mechanical properties and the synthetic conditions of the silicate-silsesquioxane precursors was also investigated. The synthetic conditions of the low-k films have to be chosen to meet both the low orientational polarization and high mechanical properties requirements. In addition, we have investigated a new solution-based approach to the synthesis of semiconducting chalcogenide films for use in thin-film transistor (TFT) devices, in an attempt to develop a simple and robust solution process for the synthesis of inorganic semiconductors. Our material design strategy is to use a sol-gel reaction to carry out the deposition of a spin-coated CdS film, which can then be converted to a xerogel material. These devices were found to exhibit n-channel TFT characteristics with an excellent field-effect mobility (a saturation mobility of ${\sim}\;48\;cm^2V^{-1}s^{-1}$) and low voltage operation (< 5 V). These results show that these semiconducting thin film materials can be used in low-cost and high-performance printable electronics.