• 제목/요약/키워드: Pure-oxygen

검색결과 391건 처리시간 0.029초

수소와 산소를 이용한 가스터빈의 구동에 관한 실험 연구 (An Experimental Study about the Running of a Gas Turbine by using Hydrogen and Oxygen)

  • 강진성;오병수
    • 한국수소및신에너지학회논문집
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    • 제8권1호
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    • pp.5-10
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    • 1997
  • Because of environmental pollution and reserve limitations of fossil fuels, several alternative energies have been developing. One of them, the hydrogen is researched as a highly probable solution. In this study pure hydrogen gas and oxygen gas are burned in combustor to reduce the emission, and a gas turbine is used. Cooling water around the combustor recovers the cooling heat loss to useful work by being expanded from liquid to vapor, being injected into the combustor and making pressure rise with working fluid to get more turbine power. Because pure hydrogen and oxygen are used, there is no carbonic emission such as CO, $CO_2$, HC nor $NO_x$, and $SO_x$. The power is obtained by turbine system, which makes lower noise and vibration than any reciprocating engine. Running of a turbine is searched under various conditions of hydrogen flow rate and water injection rate. Maximum speed of the turbine is obtained when the combustion reaches steady state. It is enable to determine the optimum rate between hydrogen flow and water injection which makes turbine run maximum speed.

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RF 마그네트론 스퍼터링에 의한 NiO 박막 증착시 산소 유량비가 박막의 결정 배향성에 미치는 영향 (Effects of Oxygen Flow Ratio on the Crystallographic Orientation of NiO Thin Films Deposited by RE Magnetron Sputtering)

  • 류현욱;최광표;노효섭;박용주;박진성
    • 한국세라믹학회지
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    • 제41권2호
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    • pp.106-110
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    • 2004
  • NiO 산화물 타겟을 이용한 RF 마그네트론 스퍼터로 상온에서 Si(100) 기판 위에 NiO 박막을 증착시켜, 스퍼터 가스의 산소 유량비가 NiO 박막의 결정 배향성과 표면 형상에 미치는 영향을 조사하였다. Ar 가스에서 증착된 NiO 박막은 높은결정화도와 (100)면의 우선 배향성을 나타내었으나, $O_2$ 가스에서 증착된 경우에는 (111)면의 우선 배향성을 보였으며 그 증착속도도 감소하였다. 스퍼터 가스의 $O_2$ 함량에 따른 NiO 박막의 결정성과 우선배향성 변화에 대한 요인을 고찰하였으며, 박막의 표면 형상과 거칠기의 변화를 조사하였다.

가돌리니아 첨가 이산화우라늄의 점결함 모델에 의한 산소포텐샬 연구 (Defect Model for the Oxygen Potential of Urania doped wit Gadolinia)

  • Park, Kwang-Heon;Kim, Jang-Wook
    • Nuclear Engineering and Technology
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    • 제23권3호
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    • pp.321-327
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    • 1991
  • 가돌리니아 첨가 우라니아에 대한 점결함 모델이 순수 우라니아의 점결함구조를 바탕으로 하여 개발되었다. Gd 도펀트는 금속이온자리에 -1 유효전하를 지니고, 주위의 산소침입형을 밀어내어 산소침입형의 자리를 감소시킨다. 산소 공공 농도가 증가하면 Gd 도펀트는 산소공공과 집합체를 형성하게 된다. 이 점결함 모델은 Gd 도펀트의 양의 증가에 따른 산소포텐샬의 증가와 산소 대금추비율이 2일때 급속한 산소포텐샬 변화를 설명하여, 현존하는 실험값과 좋은 일치를 보였다.

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Structural Properties of TiO₂ Films Grown by Pulsed Laser Deposition

  • 윤하섭;김성규;임훙선
    • Bulletin of the Korean Chemical Society
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    • 제18권6호
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    • pp.640-643
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    • 1997
  • Pure titanium dioxide $(TiO_2)$ films were prepared by pulsed laser deposition on a single crystal Si(100) substrate. We have investigated the growth of crystalline titanium dioxide films with respect to substrate temperature and ambient oxygen pressure. The structural properties of the films were analyzed by X-ray diffraction. We found that the anatase as well as the rutile phases could be formed from the original rutile phase of the target $TiO_2$. At 0.75 torr of ambient oxygen pressure, the structure of $TiO_2$ film was amorphous at room temperature, anatase between 300 and 600 ℃, a mixture of anatase and rutile between 700 and 800 ℃, and only rutile at 900 ℃ and above. However, at a low ambient oxygen pressure, the rutile phase became dominant; the only rutile phase was obtained at the ambient oxygen pressure of 0.01 torr and the substrate temperature of 800 ℃. Therefore, the film structures were largely influenced by substrate temperature and ambient oxygen pressure.

Ar/CF4 유도결합 플라즈마를 이용한 BET 박막의 식각 메카니즘 (Etching Mechanism Of Bi4-xEuxTiO12 (BET) Thin films Using Ar/CF4 Inductively Coupled Plasma)

  • 임규태;김경태;김동표;김창일
    • 한국전기전자재료학회논문지
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    • 제16권4호
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    • pp.298-303
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    • 2003
  • Bi$_4$-$_{x}$EU$_{x}$Ti$_3$O$_{12}$ (BET) thin films were etched by inductively coupled CF$_4$/Ar plasma. We obtained the maximum etch rate of 78 nm/min at the gas mixing ratio of CF$_4$(10%)/Ar(90%). The variation of volume density for F and Ar atoms are measured by the optical emission spectroscopy. As CF$_4$increased in CF$_4$/Ar plasma, the emission intensities of F increase, but Ar atoms decrease, which confirms our suggestion that emission intensity is proportional to the volume density of atoms. From X-ray photoelectron spectroscopy, the intensities of the Bi-O, the Eu-O and the Ti-O peaks are changed. By pure Ar plasma, intensity peak of the oxygen-metal (O-M : TiO$_2$, Bi$_2$O$_3$, Eu$_2$O$_3$) bond was seemed to disappear while the intensity of pure oxygen peak showed an opposite tendency. After the BET thin films was etched by CF$_4$/Ar plasma, the peak intensity of O-M bond increase slowly, but more quickly than that of peak belonged to pure oxygen atoms due to the decrease of Ar ion bombardment. Scanning electron microscopy was used to investigate etching Profile. The Profile of etched BET thin film was over 85$^{\circ}$./TEX>.

Recent Trend of Ultra-Pure Water Producing Equipment

  • Motomura, Yoshito
    • 한국막학회:학술대회논문집
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    • 한국막학회 1996년도 제4회 하계분리막 Workshop (초순수 제조와 막분리 공정)
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    • pp.121-147
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    • 1996
  • Since 1980, the water quality of ultra-pure water has been rapidly improved, and presently ultra-pore water producing equipment for 64Mbit is in operation. Table 1 shows the degree of integration of DRM and required water quality exlmple. The requirements of the ultra-pure water for 64Mbit are resistivity: 18.2 MQ/cm or higher, number of particulates: 1 pc/ml or less (0.05 $\mu$m or larger). bacteria count: 0.1 pc/l or less. TOC (Total Organic Carbon, index of organic snbstance) : 1ppb or less, dissolved oxygen: 5ppb or less, silica: 0.5ppb or less, heavy metal ions: 5ppb or less. The effect of metals on the silicon wafer has been well known, and recently it has been reported that the existence of organic substance in ultra-pure water is closely related to the device defect, drawing attention. It is reported that if organic substance sticks to the natural oxidation film, the oxide film remaims on the organic substance attachment in the hydrofluoric acid treatment (removal of natural oxidation film). The organic substance forms film on the silicon wafer, and harmful elements such as metals and N.P.S., components contained in the organic substance and the bad effect due to the generatinn of silicon carbide cannot be forgotten. In order to remove various impurities in raw water, many technological develoments (membrane, ion exchange, TOC removal, piping material, microanalysis, etc.) have been made with ultra-pure water producing equipment and put to practical use. In this paper, technologies put to practical use in recent ultra-pure vater producing equimeut are introduced.

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산소 전극 시스템에 사용되는 polysulfone막에 대한 연구 (Study of Polysulfone Membrane for Membrane-covered Oxygen Probe System)

  • 홍석인;김현준;박희영;김태진;정용섭
    • 공업화학
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    • 제7권5호
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    • pp.877-887
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    • 1996
  • 산소 전극 시스템에 사용되는 합성막은 산소에 대해 선택적인 투과를 해야 하며, 화학적으로 불활성이고 또한 우수한 기계적 강도를 가져야 한다. 본 실험에서는 산소 전극에 적합한 막 제조에 목표를 두고, 열적 안정성과 기계적 강도가 우수한 polysulfone을 막 재료로 선택하였다. 막 제조시 용매로서 THF, NMP 그리고 methylene chrolide를 사용하여, 용매에 따른 막의 특성 변화를 조사하였다. PSf막을 통한 산소와 질소의 투과도 계수는 각각 가압법과 전기화학적 방법으로 측정하였으며, 가압법에 의해 측정한 산소의 투과도 계수가 약 20% 큰 값을 나타내었다. 가압법에 의한 투과 실험 결과, 공급부의 압력이 증가함에 따라 산소와 질소의 투과도 계수는 약간 감소하였으며, 이러한 거동은 유리상 고분자막을 통한 기체의 투과에서 일반적으로 나타난다. 한편 용매로서 methylene chrolide를 사용한 PSf막의 고분자 함량을 변화시켜 실험한 결과, 큰 차이를 나타내지 않았다. 산소 전극에의 PSf막의 밀착 문제를 완화하고자 막의 유연성을 향상시키기 위해 가소제로서 TCP를 첨가하여 막을 제조 하였으며, 가소제를 소량 첨가했을 때, 투과 특성에는 큰 영향을 미치지 않고, 막의 유연성이 증가됨을 알 수 있었다. 본 실험에서 제조한 PSf막의 산소 전극에의 사용 가능성을 조사하기 위해 PSf막을 산소 전극에 설치하여 실험하였다. -0.3~-1.0V에서 전류의 변화가 plateu를 나타내었으며, 산소 분압과 전류의 상관계수가 0.99949로서 PSf막을 산소전극에 적절하게 사용할 수 있으리라 생각된다.

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Polycarbonate/Metal Salt 막의 산소분리특성에 미치는 비용매와 금속염 농도의 영향 (Effect of Nonsolvent and Metal Salt Concentration on Oxygen Separation Performances of Polycarbonate/Metal Salt Membrane)

  • 서상훈;이우태
    • 한국산업융합학회 논문집
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    • 제4권1호
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    • pp.61-69
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    • 2001
  • Polycarbonate(PC) membranes for oxygen enrichment from air were prepared by the wet phase inversion method. In order to improve oxygen separation performances of the PC membrane, the effect of the added ethanol(nonsolvent) and $CuCl_2$(metal salt) concentration in the casting solution on morphology, oxygen permeability ami $O_2/N_2$ separation factor of the membrane was studied. In addition, tensile strength and elongation at break of the membrane were investigated. An asymmetric membrane with a dense top layer and a porous sublayer was obtained. The thickness of the dense top layer decreased with increasing amount of nonsolvent additive. Compared with pure PC membrane without additive(metal salt), the oxygen permeability and $O_2/N_2$ separation factor of the $PC/CuCl_2$ membrane are significantly improved. The oxygen permeability and $O_2/N_2$ separation factor is $5.25{\times}10^{-9}cm^3(STP){\cdot}cm/cm^2{\cdot}sec{\cdot}cmHg$ and 4.5, respectively. This improvement might be due to good interaction between metal salt and oxygen.

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V2O5/TiO2 촉매의 선택적 환원촉매반응에서 격자산소의 역할 (The Role of Lattice Oxygen in the Selective Catalytic Reduction of NOx on V2O5/TiO2 Catalysts)

  • 하헌필;최희락
    • 한국재료학회지
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    • 제16권5호
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    • pp.323-328
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    • 2006
  • In situ electrical conductivity measurements on $V_2O_5WO_3/TiO_2$ catalysts were carried out at between 100 and $300^{\circ}C$ under pure oxygen, NO and $NH_3$ to investigate the reaction mechanism for ammonia SCR (selective catalytic reduction) de NOX. The electrical conductivity of catalysts changed irregularly with supply of NO. It was, however, found that the electrical conductivity change with ammonia supply was regular and the increase of electrical conductivity was mainly caused by reduction of the labile surface oxygen. The electrical conductivity change of catalysts showed close relationship with the conversion rate of NOx. Variation of conversion rate in atmosphere without gaseous oxygen also showed that labile lattice oxygen is indispensable in the initial stage of the de NOx reaction. These results suggest that liable lattice oxygen acts decisive role in the de NOx mechanism. They also support that de NOx reaction occurs through the Eley?Rideal type mechanism. The amount of labile oxygen can be estimated from the measurement of electrical conductivity change for catalysts with ammonia supply. This suggests that measurement of the change can be used as a measure of the de NOx performance.

다양한 산소분압에 따른 용융 Ag-Sn 및 Ag-Cu 합금의 표면장력 (Surface Tension of Molten Ag-Sn and Au-Cu Alloys at Different Oxygen Partial Pressures)

  • 민순기;이준호
    • 한국재료학회지
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    • 제19권1호
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    • pp.13-17
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    • 2009
  • A semi-empirical method to estimate the surface tension of molten alloys at different oxygen partial pressures is suggested in this study. The surface tension of molten Ag-Sn and Ag-Cu alloys were calculated using the Butler equation with the surface tension value of pure substance at a given oxygen partial pressure. The oxygen partial pressure ranges were $2.86{\times}10^{-12}$$1.24{\times}10^{-9}$ Pa for the Ag-Sn system and $2.27{\times}10^{-11}$$5.68{\times}10^{-4}$ Pa for the Ag-Cu system. In this calculation, the interactions of the adsorbed oxygen with other metallic constituents were ignored. The calculated results of the Ag-Sn alloys were in reasonable accordance with the experimental data within a difference of 8%. For the Ag-Cu alloy system at a higher oxygen partial pressure, the surface tension initially decreased but showed a minimum at $X_{Ag}$ = 0.05 to increase as the silver content increased. This behavior appears to be related to the oxygen adsorption and the corresponding surface segregation of the constituent with a lower surface tension. Nevertheless, the calculated results of the Ag-Cu alloys with the present model were in good agreement with the experimental data within a difference of 10%.