• Title/Summary/Keyword: Pump Coating

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Determination of Biogenic Amines using an Amperometric Biosensor with a Carbon Nanotube Electrode and Enzyme Reactor (Carbon Nanotube 전극과 효소반응기로 구성된 Amperometric Biosensor를 이용한 Biogenic Amines 검출)

  • Kim, Jong-Won;Jeon, Yeon-Hee;Kim, Mee-Ra
    • Journal of the East Asian Society of Dietary Life
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    • v.20 no.5
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    • pp.735-742
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    • 2010
  • Biogenic amines are synthesized by microbial decarboxylation for the putrefaction or fermentation of foods containing protein. Although biogenic amines such as histamine, tyramine, and putrescine are required for many physiological functions in humans and animals, consumption of high amounts of biogenic amines can cause toxicological effects, including serious gastrointestinal, cutaneous, hemodynamic, and neurological symptoms. In this study, a novel amperometric biosensor wasdeveloped to detect biogenic amines. The biosensor consisted of a working electrode, a reference electrode, a counter electrode, an enzyme reactor with immobilized diamine oxidase, an injector, a peristaltic pump and a potentiostat. A working electrode was fabricated with a glassy carbon electrode (GCE) by coating functionalized multi-walled carbon nanotubes (MWCNT-$NH_2$) and by electrodepositing Prussian blue (PB) to enhance electrical conductivity. A sensor system with PB/MWCNT-$NH_2$/GCE showed linearity in the range of $0.5 {\mu}M{\sim}100 {\mu}M$ hydrogen peroxide with a detection limit of $0.5 {\mu}M$. The responses for tyramine, 2-phenylethylamine, and tryptamine were 95%, 75%, and 70% compared to that of histamine, respectively. These results imply that the biosensor system can be applied to the quantitative measurement of biogenic amines.

The Development of High Pressure Long Distance Fire-fighting Hose with Phosphorescent Performance (축광 성능을 갖는 고압용 장거리 호스 개발에 관한 연구)

  • Han, Yong-Taek;Na, Byung-Gyun;Choi, Jin-Seong;Min, Se-Hong
    • Fire Science and Engineering
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    • v.31 no.5
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    • pp.63-69
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    • 2017
  • This study describes the development of a long-distance hose for ultra-high pressure operation, which can be used in conjunction with an ultra-high pressure pump and can be effectively applied to the fire suppression of high-rise buildings and a long, large tunnels. Also, it has phosphorescent properties, which can help to secure the withdrawal route of the fire-fighters when they are threatened by the fire. We developed an ultra-high pressure hose aiming at a pressure of 3 MPa and a flow rate of 2000 lpm and developed an ultra-high pressure fire hose that can withstand this very high pressure by using a double jacket, triple polyurethane coating and warf (Wp) of 52. In order to ensure the performance of the developed ultra-high pressure hose, its structure, appearance, leakage at high pressure, length and elongation were inspected by a certified certification agency, who also subjected it to a peeling test, friction test, breaking pressure test and free fall test. Also, it was studied in addition to the luminescent high-pressure hose for fire-fighting. In the phosphorescence test, the luminance measurement value was more than the reference value of the luminance test after 40 minutes, which confirmed that its performance was satisfactory for fire-fighting products. In the future, if such an ultra-high pressure fire hose were commercialized and applied in the field, it could contribute to securing improved fire suppression and safer exit from fires, as compared to the fire hoses currently used in the suppression of fires in skyscraper buildings and long tunnels.

Dry etching of polycarbonate using O2/SF6, O2/N2 and O2/CH4 plasmas (O2/SF6, O2/N2와 O2/CH4 플라즈마를 이용한 폴리카보네이트 건식 식각)

  • Joo, Y.W.;Park, Y.H.;Noh, H.S.;Kim, J.K.;Lee, S.H.;Cho, G.S.;Song, H.J.;Jeon, M.H.;Lee, J.W.
    • Journal of the Korean Vacuum Society
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    • v.17 no.1
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    • pp.16-22
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    • 2008
  • We studied plasma etching of polycarbonate in $O_2/SF_6$, $O_2/N_2$ and $O_2/CH_4$. A capacitively coupled plasma system was employed for the research. For patterning, we used a photolithography method with UV exposure after coating a photoresist on the polycarbonate. Main variables in the experiment were the mixing ratio of $O_2$ and other gases, and RF chuck power. Especially, we used only a mechanical pump for in order to operate the system. The chamber pressure was fixed at 100 mTorr. All of surface profilometry, atomic force microscopy and scanning electron microscopy were used for characterization of the etched polycarbonate samples. According to the results, $O_2/SF_6$ plasmas gave the higher etch rate of the polycarbonate than pure $O_2$ and $SF_6$ plasmas. For example, with maintaining 100W RF chuck power and 100 mTorr chamber pressure, 20 sccm $O_2$ plasma provided about $0.4{\mu}m$/min of polycarbonate etch rate and 20 sccm $SF_6$ produced only $0.2{\mu}m$/min. However, the mixed plasma of 60 % $O_2$ and 40 % $SF_6$ gas flow rate generated about $0.56{\mu}m$ with even low -DC bias induced compared to that of $O_2$. More addition of $SF_6$ to the mixture reduced etch of polycarbonate. The surface roughness of etched polycarbonate was roughed about 3 times worse measured by atomic force microscopy. However examination with scanning electron microscopy indicated that the surface was comparable to that of photoresist. Increase of RF chuck power raised -DC bias on the chuck and etch rate of polycarbonate almost linearly. The etch selectivity of polycarbonate to photoresist was about 1:1. The meaning of these results was that the simple capacitively coupled plasma system can be used to make a microstructure on polymer with $O_2/SF_6$ plasmas. This result can be applied to plasma processing of other polymers.