• KIEE International Transactions on Electrophysics and Applications
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• 제2C권6호
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• pp.304-308
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• 2002

We demonstrate a simple pulsed $CO_2$ laser with millisecond long pulse duration in a tube at a low pressure of less than 30 Torr. The novel power supply for our laser system switches the voltage of the AC power line (60Hz) directly. The power supply doesn't need elements such as a rectifier bridge, energy-storage capacitors, or a current-limiting resistor in the discharge circuit. To control the laser output power, the pulse repetition rate is adjusted up to 60Hz and the firing angle of SCR(Silicon Controlled Rectifier) gate is varied from 30。 to 150。. A ZCS (Zero Crossing Switch) circuit and a PIC one-chip microprocessor are used to control precisely the gate signal of the SCR. The maximum laser output of 35 W is obtained at a total pressure of 18 Torr, a pulse repetition rate of 60 Hz, and a SCR gate firing angle of 90。 . In addition, the resulting laser pulse width is approximately 3㎳(FWHM). This is a relatively long pulse width, compared with other repetitively pulsed $CO_2$ lasers.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2005년도 제36회 하계학술대회 논문집 B
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• pp.1530-1533
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• 2005

Total 12 units of high power klystron-modulator systems as microwave source is under operation for 2.5-GeV electron linear accelerator in Pohang Light Source(PLS) linac. RF power and beam power of klystron are precisely measured for the effective control of electron beam. A precise measurement and measurement equipment with good response characteristics are required for this. Input power of klystron is calculated from the applied voltage and the current on its cathode. Tiny measurement error severely effects RF output power value of klystron. Therefore, special care is needed to measure precise beam voltage. Capacitive voltage divider(CVD) unit is intended for the measurement of beam voltage of 400 kV generated from the pulsed klystron-modulator system. Main parameter to determine the standard capacitance in the high arm of CVD is dielectric constant of insulation oil. Therefore CVD should be designed to have a minimum capacitance variation due to voltage, frequency and temperature in the measurement range. This paper will discuss the analysis of capacitive voltage divider for a pulsed high-voltage measurement, and the empirical relations between capacitance and oil temperature variation.

• Journal of Welding and Joining
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• 제9권1호
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• pp.32-39
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• 1991

A 200W pulsed Nd: YAG laser for fine welding was developed. The important laser parameters such as laser peak power, average power, pulse width, and pulse energy for welding were studied. In order to obtain the sufficient laser power density for welding, thermal lensing effects were analyzed and a laser resonator with laser beam divergence was designed. The power supply unit was designed to support up to 7kW input. The pulse control unit was developed using a GTO thyristor and could control over 100kW input power to obtain 3.5kW peak power laser. Also due to the GTO thyristor the pulse width could be varied continuously from 0.1 to 20 msec and maximum repetition rate was as high as 300pps.

• 전력전자학회:학술대회논문집
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• 전력전자학회 2003년도 춘계전력전자학술대회 논문집(1)
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• pp.264-268
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• 2003

This paper describes a high voltage high power DC power supply which has the ability of pulsed mode operation. The power supply Is constructed with several series connected power converters based on modified multilevel converters. The modified multilevel converters are suitable for the protection of frequent output short-circuit. The output dc power of the proposed converter can be disconnected from the load within several hundred microseconds at the instant of short-circuit fault. The rising time of the dc load voltage is as small as several hundred microseconds, and there is no overshoot of the do voltage because the dc output capacitors keep undischarged state. Analysis, simulations, and experiments are carried out to Investigate the operation and usefulness of the proposed scheme.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.307-307
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• 2013

초고집적 회로에 적용되는 반도체 소자의critical dimension (CD)이 수 nano 사이즈로 줄어들고 있기 때문에, 다양한 물질의 식각을 할 때, 건식식각의 중요성이 더 강조되고 있다. 특히 $SiO_2$와 같은 유전체 물질을 식각할 때, plasma process induced damages (P2IDs)가 관찰되어 왔고, 이러한 P2IDs를 줄이기 위해, pulsed-time modulation plasma가 광범위하게 연구되어 왔다. Pulsed plasma는 정기적으로 radio frequency (RF) power on과 off를 반복하여 rf power가 off된 동안, 평균전자 온도를 낮춤으로써, 웨이퍼로 입사되는 전하 축적을 효과적으로 줄일 수 있다. 또한 fluorocarbon plasmas를 사용하여 $SiO_2$를 식각하기 위해 Dual-Frequency Capacitive coupled plasma (DF-CCP)도 널리 연구되어 왔는데, 이것은 기존의 방법과는 다르게 plasma 밀도와 ion bombardment energy를 독립적으로 조절 가능하다는 장점이 있어서 미세 패턴을 식각할 때 효과적이다. 본 연구에서는 Source power에는 60 MHz pulsed radio frequency (RF)를, bias power에는 2 MHz continuous wave (CW) rf power가 사용된 system에서 Ar/$C_4$ F8/$O_2$ 가스 조합으로, amorphous carbon layer (ACL)가 hard mask로 사용된 $SiO_2$를 식각했다. 그리고 source pulse의 duty ratio와 pulse frequency의 효과에 따른 $SiO_2$의 식각특성을 연구하였다. 그 결과, duty ratio의 감소에 따라 $SiO_2$, ACL의 etch rate이 감소했지만, $SiO_2$/ACL의 etch selectivity는 증가하였다. 반면에 pulse frequency의 변화에 따른 두 물질의 etch selectivity는 크게 변화가 없었다. 그 이유는 pulse 조건인 duty ratio의 감소가 전자 온도 및 전자 에너지를 낮춰 $C_2F8$가스의 분해를 감소시켰으며, 이로 인해 식각된 $SiO_2$의 surface와 sidewall에 fluorocarbon polymer의 형성이 증가하였기 때문이다. 또한 duty ratio의 감소에 따라 etch selectivity뿐만 아니라 etch profile까지 향상되는 것을 확인할 수 있었다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2007년도 추계학술대회 논문집
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• pp.109-111
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• 2007

Pulsed DC 마그네트론 스퍼터링 장치를 이용하여 Polymer 및 Glass 기판 위에 $SiN_{\chi}$ (Silicon Nitride) 박막을 합성 시키고 이들의 구조적, 광학적 특성을 조사하였다. 막두께는 100 nm로 고정하였으며, power mode 및 질소 가스 유량비를 변수로 합성하였다.

• 한국표면공학회지
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• 제44권5호
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• pp.179-184
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• 2011

This work investigated the effect of duty cycle and pulse frequency on the microstructures and properties of titanium nitride thin films deposited by asymmetric bipolar pulsed DC sputtering system. Oscilloscope traces of the I-V waveforms indicate high power and high current density outputs during the asymmetric bipolar pulsed mode. The grain size decreases with decreasing duty cycle. The duty cycle has a strong influence not only on the microstructural properties but also on the mechanical properties of titanium nitride films. Comparing with the continuous DC sputtering, the titanium nitride films prepared by pulsed DC asymmetric bipolar process exhibit better properties.

• 한국표면공학회지
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• 제47권2호
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• pp.86-92
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• 2014

The purpose of this comparative study was to investigate the properties of chromium nitride coatings deposited by asymmetric bipolar pulsed DC sputtering and DC sputtering system. Oscilloscope traces of the I-V waveforms indicate high power and high current density outputs during the asymmetric bipolar pulsed mode. The grain size decreases with decreasing duty cycle. The duty cycle has a strong influence not only on the microstructural properties but also on the mechanical properties of chromium nitride coatings. Comparing with the continuous DC sputtering, the chromium nitride coatings prepared by pulsed DC asymmetric bipolar process also exhibit better surface roughness.

• 한국조명전기설비학회:학술대회논문집
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• 한국조명전기설비학회 1999년도 학술대회논문집-국제 전기방전 및 플라즈마 심포지엄 Proceedings of 1999 KIIEE Annual Conference-International Symposium of Electrical Discharge and Plasma
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• pp.23-28
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• 1999

The manufactured pulsed power system with 500kA current is described in this paper. The capacitor bank, control cabinent, dec charging unit, closing switch and dumping box, cable system etc. employed with the system components are described. Especially the development of the inverse pinch switch controlled by gas puffing enabled the generation of the very high voltage and current.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1999년도 하계학술대회 논문집 E
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• pp.2179-2181
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• 1999

This paper describes the composition technology of pulsed power system with high current. The capacitor bank, control cabinet, dc charging unit, closing switch and cable system etc. employed with the system components are described. Especially the development of the inverse pinch switch enabled the generation of the very high current.