• 제목/요약/키워드: Pulsed gamma-ray

검색결과 18건 처리시간 0.022초

Measurement of Branching Ratio for broad 27-keV Resonance of $^{19}F(n,g)^{20}F$ Reaction by using Time-of-flight Method with Anti-Compton NaI(Tl) Spectrometer

  • Lee, Sam-Yol
    • 한국방사선학회논문지
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    • 제2권1호
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    • pp.31-34
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    • 2008
  • The neutron capture spectrum for the light nuclide was very useful to study the nuclear structure. In the present study, the capture gamma-ray from the 27-keV resonance of $^{19}F(n,g)^{20}F$ reaction were measured with an anti-Compton NaI(Tl) spectrometer and the 3-MV Pelletron accelerator of the Research Laboratory for Nuclear Reactors at the Tokyo institute of technology. A neutron Time-of-Flight method was adopted with a 1.5 ns pulsed neutron source by the $^7Li(p,n)^7Be$ reaction. In the present experiment, a Teflon(($CF_2$)n) sample was used The sample was disk with a diameter of 90mm. The thickness of sample was determined so that reasonable counting rates could be obtained and the correction was not so large for the self-shielding and multiple scattering of neutrons in the sample, and was 5mm. The primary gamma-ray transitions were compared with previous measurement of Kenny.

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STS304L 캡슐의 펄스형 GTA 용접에서 용접변수들이 용접부 형상에 미치는 영향 (The Effect of Welding Parameters on the Weld Shape in Pulsed GTA Welding of a STS304L Stainless Steel Capsule)

  • 이형근;한현수;손광재
    • Journal of Welding and Joining
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    • 제25권5호
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    • pp.64-71
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    • 2007
  • The aim of this paper is to investigate the effects of welding parameters on the weld shape in seal-welding of STS304L capsule for manufacturing a radioisotope source which is widely used in nondestructive testing of metal structures using gamma ray. Pulsed gas tungsten arc (Pulsed GTA) welding is performed for thin cross sectional area of the capsule. Seven welding parameters including current waveform parameters and arc length etc. are selected as main process parameters using design of experiment. The weld shape such as bead width, penetration depth, weld area, aspect ratio and area rate is investigated to assess the effects of welding parameters. As results, the combination of pulse duty/welding speed largely affects on bead width, penetration depth, area and aspect ratio. Finally, it is concluded that the key parameters are the combination of pulse duty/welding speed, base current and arc length, and their optimal conditions are 50%/1.77mm/s, 6.4A and 1 mm.

A STUDY ON THE RELATIONSHIP BETWEEN PLASMA CHARACTERISTICS AND FILM PROPERTIES FOR MgO BY PULSED DC MAGNETRON SPUTTERING

  • Nam, Kyung H.;Chung, Yun M.;Han, Jeon G.
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2001년도 추계학술발표회 초록집
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    • pp.35-35
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    • 2001
  • agnesium Oxide (MgO) with a NaCI structure is well known to exhibit high secondary electron emission, excellent high temperature chemical stability, high thermal conductance and electrical insulating properties. For these reason MgO films have been widely used for a buffer layer of high $T_c$ superconducting and a protective layer for AC-plasma display panels to improve discharge characteristics and panel lifetime. Up to now MgO films have been synthesized by lE-beam evaporation, Molecular Beam Epitaxy (MBE) and Metalorganic Chemical Vapor Deposition (MOCVD), however there have been some limitations such as low film density and micro-cracks in films. Therefore magnetron sputtering process were emerged as predominant method to synthesis high density MgO films. In previous works, we designed and manufactured unbalanced magnetron source with high power density for the deposition of high quality MgO films. The magnetron discharges were sustained at the pressure of O.lmtorr with power density of $110W/\textrm{cm}^2$ and the maximum deposition rate was measured at $2.8\mu\textrm{m}/min$ for Cu films. In this study, the syntheses of MgO films were carried out by unbalanced magnetron sputtering with various $O_2$ partial pressure and specially target power densities, duty cycles and frequency using pulsed DC power supply. And also we investigated the plasma states with various $O_2$ partial pressure and pulsed DC conditions by Optical Emission Spectroscopy (OES). In order to confirm the relationships between plasma states and film properties such as microstructure and secondary electron emission coefficient were analyzed by X-Ray Diffraction(XRD), Transmission Electron Microscopy(TEM) and ${\gamma}-Focused$ Ion Beam (${\gamma}-FIB$).

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Secondary Electron Emission of ZnO Films

  • Choi, Jinsung;Lee, Sung Kwang;Choi, Joon Ho;Choi, Eun Ha;Jung, Ranju;Kim, Yunki
    • Applied Science and Convergence Technology
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    • 제24권6호
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    • pp.273-277
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    • 2015
  • We investigated secondary electron emission characteristics of ZnO thin films prepared by pulsed laser deposition method with respect to the ambient oxygen pressure and the substrate temperature during the deposition. X-ray diffraction, UV-Vis spectrometry, atomic force microscopy, and ${\gamma}$-FIB were used to examine the structural, optical transmission, surface morphology, and secondary electron emission properties of the films, respectively. The secondary electron emission coefficient of the ZnO films increases as the O/Zn ratio of the films increases which was thought to result from either the ambient oxygen pressure increase or the substrate temperature decrease and as the grain size of the films decreases. It was confirmed that ZnO has better secondary electron emission characteristics than those of MgO, which is currently widely used as a material for PDP protecting layers.

SCM 435 강의 플라즈마 질화처리시 펄스 인자의 영향 (Influence of Pulse Parameters on the Plasma Nitriding of SCM435 Steels)

  • 송동원;이인섭
    • 한국재료학회지
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    • 제11권12호
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    • pp.1063-1067
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    • 2001
  • The effect of the pulse parameters(pulse ratio and frequency) on the characteristics of the nitrided layer in the pulsed plasma nitrified SCM435 Steels was investigated. Material properties of the nitrided layer were analysed by employing optical microscope, scanning electron microscope(SEM), X-ray diffractometer(XRD) and micro-Vickers hardness tester. It was found that both the compound layer thickness and the surface hardness decreased with decreasing of pulse ratios. At high pulse ratio, the compound layer thickness and the surface hardness were rapidly decreased with decreasing frequency compared to lower pulse ratios.

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즉발감마선에 의한 상용전자소자의 피해현상분석 연구 (The Study of Transient Radiation Effects on Commercial Electronic Devices)

  • 오승찬;이남호;이흥호
    • 전기학회논문지
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    • 제61권10호
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    • pp.1448-1453
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    • 2012
  • In this study, we carried out transient radiation test for identify failure situation by a transient radiation effect on operational amplifier devices. This experiments were carried out using a 60 MeV electron beam pulse of the LINAC(Linear Accelerator) facility in the Pohang Accelerator Laboratory. In this test, we has found that a serious failure as a burn-out effect due to overcurrent on the partial electronic devices.

실리콘 에피-웨이퍼 기반의 펄스감마선 검출센서 최적화 연구 (A Parametric Study of Pulsed Gamma-ray Detectors Based on Si Epi-Wafer)

  • 이남호;황영관;정상훈;김종열;조영
    • 한국정보통신학회논문지
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    • 제18권7호
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    • pp.1777-1783
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    • 2014
  • 본 연구에서는 전자장비 내방사화 기술의 새로운 효율적 접근방법인 전원제어형 방호장치에서 핵심 기능을 수행하는 고속 반도체 센서를 개발하고 그 특성을 분석하였다. 먼저, 펄스방사선에 의한 다이오드 내부에서의 생성 전하를 계산한 후 TCAD로 모델링하여 $42{\mu}m$ 진성층의 실리콘 에피텍시 웨이퍼 기반의 고속 신호탐지용 PIN 다이오드 센서를 다양한 구조로 설계하였다. PAL의 Test LINAC의 전자빔 변환 감마방사선 4.88E8 rad(Si)/sec에 대한 실측시험에서 소자의 면적에 비례하는 광감도와 응답속도 증가 결과를 얻었으며 포화특성과 소자의 균일성을 기준으로 2mm직경의 센서를 최적으로 판단되었다. 선정 센서를 대상으로 한 펄스감마선 고출력 범위(2.47E8 rad(Si)/sec~6.21E8 rad(Si)/sec)로 선량률 가변시험에서는 개발한 소자가 시험장치의 고 선량률 영역에서 전원제어 신호처리에 충분한 60mA 이상의 광전류 피크값과 함께 350 ns 이하의 고속 응답특성을 가지는 선형적 센서임을 확인하였다.

펄스감마선에 의한 DC/DC 컨버터의 Latch-up현상에 대한 연구 (The Study of Latch-up)

  • 오승찬;이남호;이흥호
    • 한국정보통신학회:학술대회논문집
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    • 한국정보통신학회 2012년도 춘계학술대회
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    • pp.719-721
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    • 2012
  • 본 시험은 군전자장비의 전원제어부품으로 사용되는 TPS54315소자에 대하여 과도방사선에 따른 과도응답특성인 Upset/Latch-up특성을 평가하기 시험으로 포항가속기 연구소내의 Test LINAC 조사시설을 이용하여 $1.43{\times}10^7$rad(si)/sec~$1.25{\times}10^8$rad(si)/sec 선량률 조건에서의 실측시험을 수행하였다. 시험결과 $1.0{\times}10^8$rad(si)/sec 이후 Latch-up 현상이 확인되었으며 연속펄스 인가 시 Latch-up상태에서 정상상태로 복귀하는 결과를 확인하였다. 또한 이러한 현상은 과도방사선에 의한 광전류가 내부전원 Reset로직을 트리거 시킴으로써 Latch-up상태에서의 전원바이어스를 일시적으로 차단함에 따라 발생된 것으로 본 실험을 통하여 Reset회로가 내장된 소자의 경우 일부 Latch-up현상과 동시에 Reset회로가 트리거 되는 경우 Latch-up상태에서 정상상태로 복귀되는 결과를 확인하였다.

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