• Title/Summary/Keyword: Pulsed UV(Ultraviolet)

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Behavior of Natural Organic Matter(NOM), Chlorine Residual, and Disinfection By-Products(DBPs) Formation in Pulsed UV Treated Water (Pulsed UV 처리수에서의 자연유기물질, 잔류염소 및 소독부산물 생성 거동)

  • Sohn, Jinsik;Han, Jihee
    • Journal of Korean Society of Water and Wastewater
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    • v.26 no.5
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    • pp.685-692
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    • 2012
  • UV technology is widely used in water and wastewater treatment. Many researches have been conducted on microbial disinfection and micro pollutant reduction with UV treatment. However, the study on NOM with UV has limited because low/medium pressure UV lamp is not sufficient to affect refractory organics such as NOM. Pulsed UV treatment using UV flash lamp can be operated in the pulsed mode with much greater peak intensity. The pulse duration is typically in microseconds, whereas the interval between pulses is in the order of milliseconds. The high intensity of pulsed UV would mineralize NOM itself as well as change the characteristics of NOM. Chlorine demand and DBPs formation is affected on the changed amounts and properties of NOM. The objective of this study is to investigate the effect on NOM, chlorine residual, and chlorinated DBPs formation with pulsed UV treatment.

Behavior of Organic Matter, Chlorine Residual and Disinfection By-Products (DBPs) Formation during UV Treatment of Wastewater Treatment Plant Effluents (하수처리장 방류수의 UV 처리시 유기물질, 잔류염소 및 소독부산물 생성 거동)

  • Han, Jihee;Sohn, Jinsik
    • Journal of Korean Society of Water and Wastewater
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    • v.28 no.1
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    • pp.61-72
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    • 2014
  • Study on effluent organic matter (EfOM) characteristic and removal efficiency is required, because EfOM is important in regard to the stability of effluents reuse, quality issues of artificial recharge and water conservation of aqueous system. UV technology is widely used in wastewater treatment. Many reports have been conducted on microbial disinfection and micro pollutant reduction with UV treatment. However, the study on EfOM with UV has limited because low/medium pressure UV lamp is not sufficient to affect refractory organics. The high intensity of pulsed UV would mineralize EfOM itself as well as change the characteristics of EfOM. Chlorine demand and DBPs formation is affected on the changed amounts and properties of EfOM. The objective of this study is to investigate the effect on EfOM, chlorine residual, and chlorinated DBPs formation with low pressure and pulsed UV treatment. The removal of organic matter through low pressure UV treatment is insignificant effect. Pulsed UV treatment effectively removes/transforms EfOM. As a result, the chlorine consumption is changed and chlorine DBPs formation is decreased. However, excessive UV treatment caused problems of increasing chlorine consumption and generating unknown by-products.

Control of electron concentration and photoluminescence intensity of ZnO thin films using oxygen gas (산소 가스를 이용한 산화아연의 전자 농도와 광발광 세기 조절)

  • Kang, Hong-Seong;Kim, Jae-Won;Lee, Sang-Yeol
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07a
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    • pp.185-187
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    • 2004
  • The electron concentration of ZnO thin film fabricated by pulsed laser deposition was controlled by varying oxygen gas pressure. The electron concentration of ZnO was increased from $10^{17}\;to\;10^{19}/cm^3$ as oxygen gas pressure increased from 20 mTorr to 350 mTorr. Ultraviolet(UV) intensity of photoluminescence of ZnO was controlled, too. UV intensity of ZnO was increased as oxygen gas pressure increased from 20 mTorr to 350 mTorr. The relation between electron concentration and UV intensity was investigated.

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Ultraviolet and green emission property of ZnO thin film grown at various ambient pressure (분위기 산소압 변화에 따른 ZnO 박막의 발광특성 변화)

  • 강정석;심은섭;강홍성;김종훈;이상렬
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.07a
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    • pp.355-357
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    • 2001
  • ZnO thin films were deposited on (001) sapphire substrate at various ambient gas pressure by pulsed laser deposition(PLD). Oxygen was used as ambient gas, and oxygen gas pressure was varied from 1.0${\times}$10$\^$-6/ Torr to 500 mTorr during the film deposition. As oxygen gas pressure increase in the region below critical pressure photoluminescence(PL) intensity in UV and green region increase. As oxygen gas pressure increase in the region above critical pressure photoluminescence(PL) intensity in UV and green region decrease. Each of critical ambient gas Pressures was 350 mTorr for UV emission and 200 mTorr for green emission.

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$^1$Highly-crystalline $sp^3$-bonded 5H-BN prepared by plasma-packets assisted pulsed-laser deposition: a room-temperature UV light-emitter at 225nm

  • Komatsu, Shojiro
    • Proceedings of the Korea Crystallographic Association Conference
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    • 2003.05a
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    • pp.6-6
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    • 2003
  • Highly crystalline 5H-polytypic form of sp3-bonded boron nitride (BN) was grown by pulsed-laser-vaporization of BN, where synchronous reactive-plasma packets assisted the crystal growth in the vapor phase. The structure of the product crystallites (˙5 micrometers) was confirmed by using transmission electron diffraction and electron energy loss spectroscopy. This material proved to have a sharp and dominant band at 225 nm by cathode luminescence at room temperatures and corresponding monochromatic images revealed that they uniformly emitted the ultraviolet light. Considering that cubic BN has already been doped as p- and n- type semiconductors, this material may be applied to the light-emitting devices working at almost the deepest limit of the UV region that is functional without vacuum.

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A Study of $H_{2}O_{2}$ Production and BPA/17${\beta}$-estradiol Removal by Ultrasound and Pulsed UV in the Presence of Various Catalysts (Ultrasound와 Pulsed UV 조사시 $H_{2}O_{2}$ 발생량과 보조제 주입시 bisphenol A, 17${\beta}$-estradiol의 제거에 대한 연구)

  • Han, Jongh-Hun;Lee, Sung-Jae;Yoon, Yeo-Min;Her, Nam-Guk
    • Journal of Korean Society of Water and Wastewater
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    • v.26 no.2
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    • pp.313-319
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    • 2012
  • This study investigated the relative degradation of commonly known endocrine-disrupting compounds such as bisphenol A (BPA) and 17${\beta}$-estradiol (E2) using ultrasound (US) and pulsed ultraviolet (PUV) in water. The removal efficiency of BPA and E2 was determined as a function of generating power and $H_{2}O_{2}$ production. The ultrasound and PUV irradiation of the aqueous solution was performed in 3 L and 90 L stainless reactor at a constant temperature of $20^{\circ}C$ with an applied power of 200 W and 2000 W, respectively. The removal of BPA and E2 by US and PUV varied with catalysts. The experiments were conducted under the following conditions: total operating time, 30 min; initial concentration, 1 uM. In the case of E2 (10 min), % removal was 92.5/95.8/87.6/82.4, while % removal of BPA (10 min) was 62.3/82.3/91.1/67.0/64.3 in various conditions (PUV, $PUV+H_2O_2$, PUV+wire mesh, $PUV+TiO_2$ coated wire mesh), respectively.

A Study of Full Scale PUV/US Hybrid System for Contaminant Treatment in Groundwater (지하수 오염물질 처리를 위한 Full Scale PUV/US Hybrid System 연구)

  • Han, Jonghun;Park, Wonseok;Lee, Jongyeol;Heo, Jiyong;Her, Namguk
    • Journal of Korean Society of Environmental Engineers
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    • v.39 no.10
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    • pp.575-580
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    • 2017
  • Chlorinated hydrocarbons (TCE and PCE), petroleum hydrocarbons (BTEX, PAHs, and TPH), and explosive compounds (TNT, RDX, and HMX) have been detected in underground water countrywide. The overall objective of this study is to evaluate sono-catalytic degradation coupled with the use of PUV in order to understand the fate and transport of a representative selection of non-biodegradable contaminants (i.e., TCE, PCE, BTEX, PAHs, TPH, TNT, RDX, and HMX) in groundwater. Both ultraviolet (UV) and ultrasound (US) systems are used in degrading of organic contaminants and they can thus be applicable simultaneously as an UV/US hybrid system in attempts further to increase the degradation efficiency. Results indicate that synergistic effect of UV/US hybrid system is closely correlated to the enhancement of sono-chemical reactivity with the UV-US interaction of increasing the formation rate of OH by providing additional $H_2O_2$ production through the pyrolysis of water molecules during UV/US hybrid irradiation.

Characteristics Investigation of ZnO-Si-ZnO Multi-layer Thin Films Fabricated by Pulsed Laser Deposition (펄스 레이저 증착법에 의해 제작된 ZnO-Si-ZnO 다층 박막의 특성 연구)

  • 강홍성;강정석;심은섭;방성식;이상렬
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.1
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    • pp.65-69
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    • 2003
  • ZnO-Si-ZnO multi-layer thin films have been deposited by pulsed laser deposition (PLD). And then, the films have been annealed at 300$^{\circ}C$ in oxygen ambient pressure. Peak positions of ultraviolet (UV) and visible region were changed by addition of Si layer. Mobility of the films was improved slightly than ZnO thin film without Si layer. The structural property changed by inserting intermediate Si layer in ZnO thin film. The optical properties and structural properties of ZnO-Si-ZnO multi-layer thin films were characterized by PL(Photoluminescence) and XRB(X-ray diffraction) method, respectively. Electrical properties were measured by van der Pauw Hall measurements

Stimulated Emission with 349-nm Wavelength in GaN/AlGaN MQWs by Optical Pumping

  • Kim, Sung-Bock;Bae, Sung-Bum;Ko, Young-Ho;Kim, Dong Churl;Nam, Eun-Soo
    • Applied Science and Convergence Technology
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    • v.26 no.4
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    • pp.79-85
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    • 2017
  • The crack-free AlGaN template has been successfully grown by using selective area growth with triangular GaN facet. The triangular GaN stripe structure was obtained by vertical growth rate enhanced mode with low growth temperature of $950^{\circ}C$ and high growth pressure of 500 torr. The lateral growth rate enhanced mode of AlGaN for crack-free and flat surface was also investigated. Low pressure of 30 torr and high V/III ratio of 4400 were favorable for lateral growth of AlGaN. It was confirmed that the $4{\mu}m$ -thick $Al_{0.2}Ga_{0.8}N$ was crack-free over entire 2-inch wafer. The dislocation density of $Al_{0.2}Ga_{0.8}N$ was as low as ${\sim}7.6{\times}10^8/cm^2$ measured by cathodoluminescence. Based on the high quality AlGaN with low dislocation density, the ultraviolet laser diode epitaxy with cladding, waveguide and GaN/AlGaN multiple quantum well (MQW) was grown by metalorganic chemical vapor deposition. The stimulated emission at 349 nm with full width at half maximum of 1.8 nm from the MQW was observed through optical pumping experiment with 193 nm KrF laser. We also have fabricated the deep ridge type ultraviolet laser diode (UV-LD) with $5{\mu}m-wide$ and $700{\mu}m-long$ cavity for electrical properties. The turn on voltage was below 5 V and the resistance was ${\sim}55{\Omega}$ at applied voltage of 10 V. The amplified spontaneous emission spectrum of UV-LD was also observed from pulsed current injection.

A Study of Treatment Efficiency of Reflectors for CSOs Disinfection by Pulsed UV (Pulsed UV를 이용한 CSOs 소독시 반사체에 따른 처리효율 연구)

  • Han, Jonghun;Hur, Jiyong;Kim, Kangwook;Lee, Junyoung;Park, Wonseok;Lee, Jongyeol;Her, Namguk
    • Journal of Soil and Groundwater Environment
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    • v.20 no.1
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    • pp.36-40
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    • 2015
  • This study examined the disinfection in combined sewer overflows (CSOs) by pulsed ultraviolet (PUV). The reflectors (stainless steel. mirror, aluminium foil, aluminium (1050), aluminium (6061), aluminium (5052), and aluminium mirror) of PUV irradiation was performed in a 90 L stainless reactor at a constant temperature of $20^{\circ}C$ and an applied power of 4000 W. The reflection efficiency of reflectors were showed 1.00 (aluminium mirror) ~ 1.48 (aluminium foil) does. The case of a rough surface analysis using SEM showed high reflectance, was the case of a smooth surface and a low reflectivity. Pseudo first-order rate constant calculated results, has a higher reflectivity values were more than twice as high compared to the low reflectivity. Affected Total coliforms disinfection time, depending on the type of reflector is considered.