• Title/Summary/Keyword: Pulsed Current

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Optimization of Process Parameters for EDM using Taguchi Design (Taguchi법에 의한 방전가공의 공정변수 최적화)

  • Choi, Man Sung
    • Journal of the Semiconductor & Display Technology
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    • v.14 no.4
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    • pp.78-83
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    • 2015
  • The method of electrical discharge machining (EDM), one of the processing methods based on non-traditional manufacturing procedures, is gaining increased popularity, since it does not require cutting tools and allows machining involving hard, brittle, thin and complex geometry. Modern ED machinery is capable of machining geometrically complex or hard material components, that are precise and difficult-to-machine such as heat treated tool steels, composites, super alloys, ceramics, etc. This paper reports the results of an experimental investigation by Taguchi method carried out to study the effects of machining parameters on material surface roughness in electric discharge machining of SM45C. The work material was ED machined with graphite and copper electrodes by varying the pulsed current, voltage and pulse time. Investigations indicate that the surface roughness is strongly depend on pulsed current.

Wear Resistance Properties of Tungsten Carbide/Stainless Steel Composite Materials Prepared by Pulsed Current Sintering

  • Kawakami, Yuji;Tamai, Fujio;Enjoji, Takashi;Takashima, Kazuki;Otsu, Masaaki
    • Proceedings of the Korean Powder Metallurgy Institute Conference
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    • 2006.09a
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    • pp.89-90
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    • 2006
  • Austenitic stainless steel has been used as a corrosion resistance material. However, austenitic stainless steel has poor wear resistance property due to its low hardness. In this investigation, we apply powder composite process to obtain hard layer of Stainless steel. The composite material was fabricated from planetary ball milled SUS316L stainless steel powder and WC powder and then sintered by Pulsed Current Sintering (PCS) method. We also added TiC powder as a hard particle in WC layer. Evaluations of wear properties were performed by pin-on-disk wear testing machine, and a remarkable improvement in wear resistance property was obtained.

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Design of A Probe for Reflection Type Pulsed Eddy Current Testing (반사형 펄스와전류 탐상을 위한 탐촉자 설계)

  • Shin, Young-Kil;Choi, Dong-Myung;Jung, Hee-Sung;Song, Sung-Chul
    • Proceedings of the KIEE Conference
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    • 2007.07a
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    • pp.2036-2037
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    • 2007
  • 반사형 펄스와전류(Pulsed Eddy Current; PEC) 탐상을 위한 여러 가지 탐촉자를 설계하고, 수치해석 방법을 사용하여 신호특성과 두께변화에 대한 만감도를 조사하였다. 구리와 페라이트를 차폐체로 사용한 결과, 구리로 차폐한 여자코일이 페라이트로 차폐한 센서코일보다 안쪽에 있는 것이 두께변화에 더 민감하였고, 페라이트만으로 차폐한 경우에도 여자코일이 안쪽에 있는 것이 더 민감하다는 것을 알 수 있었다. 한편, 두께가 두꺼워지면 펄스신호의 피크치는 감소하며 피크 발생시간이 변화하는 것을 관찰할 수 있었다.

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Numerical Analysis of Through Transmission Pulsed Eddy Current Testing (투과형 펄스와전류 탐상의 수치해석)

  • Shin, Young-Kil;Choi, Dong-Myung;Lee, Chang-Jun
    • Proceedings of the KIEE Conference
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    • 2007.07a
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    • pp.2034-2035
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    • 2007
  • 투과형 펄스와전류(Pulsed Eddy Current; PEC) 탐상을 대상으로 수치해석 방법을 사용하여 펄스와전류 탐상신호를 예측하고, 펄스의 폭이 신호에 미치는 영향을 조사하였다. 그 결과 전도도나 두께가 증가하면 PEC 신호의 최대값이 작아지며 최대값 발생시간이 지연됨을 관찰할 수 있었고, 전도도나 두께를 측정할 때 펄스의 폭이 좁으면 신호의 최대치를 사용하는 것이 유리하고, 펄스의 폭이 넓으면 최대치가 나타나는 시간을 사용하는 것이 판별에 유리하다는 것을 알 수 있었다. 또한, lift-off가 커질수록 PEC 신호의 최대값은 작아지지만, 두 코일 사이의 간격만 일정하면 피검사체가 어디에 위치해도 신호는 거의 동일하며, 같은 두께에서 서로 다른 lift-off 변화는 PEC 신호를 한 점에서 만나게 하는 것을 알 수 있었다.

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Electrical Properties of the (Ba,Sr)TiO$_3$ Thin Films Prepared by PLD (PLD법으로 제작된 (Ba,Sr)TiO$_3$박막의 전기적 특성)

  • 주학림;김성구;마석범;장낙원;박정흠;박창엽
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.11a
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    • pp.125-128
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    • 1999
  • (Ba$_{0.6}$Sr$_{0.4}$)TiO$_3$(BST) thin films were fabricated with different deposition temperature by Pulsed Laser Deposition(PLD). This BST thin films showed a maximum dielectric constant value of $\varepsilon$$_{r}$=~684 and dielectric loss was ~0.01 when substrate temperature was 75$0^{\circ}C$. Charge storage density of BST thin film was 4.733 [$\mu$C/$\textrm{cm}^2$] and estimated charging time was 0.15 nsec. Leakage current density of BST thin film was below 10$^{-7}$ [A/$\textrm{cm}^2$] at 3V. 3V.V.

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Optimizing the Process Parameters of EDM on SCM440 Steel (SCM440강의 방전가공에서 공정변수의 최적화)

  • Choi, Man Sung
    • Journal of the Semiconductor & Display Technology
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    • v.17 no.2
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    • pp.61-66
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    • 2018
  • The objective of this research study is to investigate the optimal process parameters of electrical discharge machining (EDM) on SCM440 steel with copper as a tool electrode. The effect of various process parameters on machining performance is investigated in this study. Modern ED machinery is capable of machining geometrically complex or hard material components, that are precise and difficult-to-machine such as heat treated tool steels, composites, super alloys, ceramics, etc. This paper reports the results of an experimental investigation by Taguchi method carried out to study the effects of machining parameters on material surface roughness in electric discharge machining of SCM440 steel. To predict the optimal condition, the experiments are conducted by using Taguchi's L27 orthogonal array. The work material was ED machined with copper electrodes by varying the pulsed current, pulse on-time, voltage, servo speed and spark speed. Investigations indicate that the surface roughness is strongly depend on pulsed current.

Photovoltaic System using the Stepdown Chopper and Current Source Inverter (강압쵸퍼와 전류형 인버터를 이용한 태양광발전 시스템)

  • 성낙규;이승환;김성남;이훈구;김용주;한경희
    • Proceedings of the KIPE Conference
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    • 1997.07a
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    • pp.370-373
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    • 1997
  • In this paper, we compose of the stepdown chopper and the current source inverter. Because dc side current of the current source inverter pulse with twice frequency of utility, we control that modulation factor of chopper is pulsed twice frequency. Therefore if voltage across the dc reactor equal to zero, it tis decreased. And we control modulation factor of the chopper to operate at maximum power point around of solar cell.

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Fabrication of $(Pb,La)TiO_3$ Thin Films by Pulsed Laser Ablation (레이저 어블레이션에 의한 $(Pb,La)TiO_3$ 박막의 제작)

  • Park, Jeong-Heum;Kim, Joon-Han;Lee, Sang-Yeol;Park, Chong-Woo;Park, Chang-Yub
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.11 no.2
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    • pp.133-137
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    • 1998
  • $(Pb_{0.72}La_{0.28})Ti_{0.93}O_3(PLT(28))$ thin films were fabricated by pulsed laser deposition. PLT films deposited on $Pt/Ti/SiO_2/Si$ at $600^{\circ}C$ had a preferred orientation in (111) plane and at $550^{\circ}C$ had a (100) preferred orientation. We found that (111) preferred oriented films had well grown normal to substrate surface. This PLT(28) thin films of $1{\mu}m$ thickness had dielectric properties of ${\varepsilon}_r$=1300, dielectric $loss{\fallingdotseq}0.03 $. and had charge storage density of 10 [${\mu}C/cm^2$] and leakage current density of less than $10^{-6}[A/cm^2]$ at 100[kV/cm]. These results indicated that the PLT(28) thin films fabricated by pulsed laser deposition are suitable for DRAM capacitor application.

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DESIGN AND TEST RESULTS ON A 45-KV PULSED POWER MODULATOR FOR A 1.5-MW MAGNETRON APPLICATION OF KSTAR LHCD

  • Jang, Sung-Duck;Son, Yoon-Gyu;Oh, Jong-Seok;Bae, Young-Soon;Cho, Moo-Hyun;NamKung, Won
    • Nuclear Engineering and Technology
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    • v.38 no.8
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    • pp.785-792
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    • 2006
  • The microwave heating system of KSTAR consists of ECH and LHCD. ECH and LHCD offer the benefits ofa reliable operation at the start of plasma formation and a non-inductive current drive durable steady state operation, respectively. LHCD uses a C-band microwave system with a frequency of 5 GHz. A pulsed power modulator with a power of 3.6 MW, $4{\mu}S$, 200 pps is required to drive the high-powered magnetron. The development of a pulse modulator with 1:4 pulse transformers is the focus of the research in this study. The peak power handling capability is 3.6 MW (45 kV, 90 A at load side with a pulse width of $4{\mu}S$). This paper describes the system overview and test results of the pulsed modulator. In particular, a simulated waveform is compared with the tested waveform.

150 kJ Compact Capacitive Pulsed Power System for an Electrothermal Chemical Gun

  • Lee, Byung-Ha;Kim, Jin-Sung;Kim, Seong-Ho;Lee, Young-Hyun;Yang, Kyung-Seung
    • Journal of Electrical Engineering and Technology
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    • v.7 no.6
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    • pp.971-976
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    • 2012
  • A 150 kJ compact capacitive pulsed power system (CCPPS) capable of delivering electrical energy into an electrothermal chemical (ETC) gun on a vehicle has been studied. The CCPPS provides pulsed electrical energy into a capillary plasma injector which generates plasma of tens of thousands $^{\circ}K$ in temperature and has a nonlinear resistance depending on the current. The design requirements of the CCPPS are as follows: the maximum power of 250 MW, the pulse width of about 0.6 ms, the volume of no more than 0.5 cubic meter, the efficiency of energy transfer over 80 % and the repetition rate of 4~5 times per minute. The constructed CCPPS is composed of four 37.5 kJ capacitor bank modules in parallel to make a trapezoid pulse shape and to satisfy the design requirements. Each module is designed to achieve high reliability, safety, efficiency and energy density to endure severe operating conditions. The results of the performance test on the CCPPS using a 120 mm ETC gun are described.