• Transactions of the Korean Society of Automotive Engineers
• /
• v.6 no.4
• /
• pp.211-218
• /
• 1998

The purpose of this study is to investigate the reduction rate of NOX according to several parameters(NOX concentration, the flow rate of gas, the additional amount of C2H4, input voltage, input frequency and so in) when NOX is reduced by using PPCP(Pulse-induced Plasma Chemical Process). PPCP is based on the plasma-chemical technology, which induces narrow voltage pulses to binary electrode structure.

• The Transactions of The Korean Institute of Electrical Engineers
• /
• v.61 no.5
• /
• pp.717-720
• /
• 2012

Various types of dielectric-barrier-discharge (DBD) devices have been developed for diverse applications for the last decade. In this study, a flat non-thermal DBD micro plasma source under atmospheric pressure has been developed. The flat-panel type plasma is generated by bipolar pulse voltages, and driving gas is air. In this study, the plasma source was investigated with intensified charge coupled device (ICCD) images and Optical Emission Spectroscopy (OES). The micro discharges are generated on the crossed electrodes. For theoretical analysis, 2-dimensional fluid simulation was performed. The plasma source can be driven in air, and thus the operation cost is low and the range of application is wide.

• Journal of the Korean Vacuum Society
• /
• v.15 no.3
• /
• pp.246-258
• /
• 2006

A circuit model has been developed to analyze characteristics of the PSII(plasma source ion implantation) pulse system with dynamic plasma load. The plasma sheath in front of the immersed planar target biased with a negative-high voltage pulse is assumed to be governed by the dynamic Child-Langmuir sheath model. Target current is self-consistently varied with the applied voltage by using the voltage-controlled current source in the circuit model. Circuit simulations are conducted with Pspice circuit simulator, and simulated pulse currents and voltages on the target are compared and confirmed with experimental results for various voltage pulses and plasma conditions.

• The Transactions of the Korean Institute of Electrical Engineers C
• /
• v.48 no.8
• /
• pp.591-597
• /
• 1999

The propagation characteristics of high power microwave pulse in an air-breakdown environment are examined. The maximum electron density produced by microwave air-breakdown is limited to $10^6cm^{-3}$ by the tail-erosion effect. Inorder to increase the electron density, the scheme using two pulses intersecting at a desired height is considered. Increasing the carrier frequency, it is shown that microwave pulse can be transferred without the serious erosion in the numerical simulation. This result is useful for the above scheme. Also, an experiment is conducted to show the tail-erosion effect and confirm that a rapidly generated lossy plasma can cause spectral breaking and frequency shift of a high-power microwave pulse. The experimental results are presented by comparing the frequency spectrum of an incident pulse with that of the pulse transmitted through a self-induced air-breakdown environment. The experimental results show that the amount of frequency upshift is co-related with the ionization rate, whereas that of frequency downshift is correlated with the energy losses from the pulse in the self-generated plasma.

• Proceedings of the Optical Society of Korea Conference
• /
• 2003.02a
• /
• pp.42-43
• /
• 2003

The nonlinear three-wave interaction is an interesting topic having various applications in nonlinear optics, hydrodynamics, acoustic waves, and plasma physics. The resonant interaction between two laser pulses and a plasma wave plays important roles in plasma heating, laser reflection in the inertial confinement fusion (ICF), plasma wakefield generation, and ultra-intense laser pulse amplification and pulse compression using stimulated Raman backscattering (RBS). (omitted)

• Proceedings of the Korean Vacuum Society Conference
• /
• 2014.02a
• /
• pp.240.2-240.2
• /
• 2014

Characteristics of pulse-discharged plasma in liquid and its biological applications to proteins are investigated by making use of high voltage Marx generator. The Marx generator has been consisted of 5 stages, where each charging capacitor is $0.5{\mu}F$ to generate a high voltage pulse with rising time of $1{\mu}s$. We have applied an input voltage of 6 kV to the each capacitor of $0.5{\mu}F$. The high voltage pulsed plasma has been generated inside a polycarbonate tube by a single-shot operation, where the breakdown voltage is measured to be 7 kV, current of 1.2 kA, and pulse width of ${\sim}1{\mu}s$ between the two electrodes of anode-cathode made of stainless steel, which are immersed into the liquids. For the investigation of the influence of pulsed plasma on biomolcules, we have focused on the amino acids, DNA, proteins, cell and cholesterol.

• Journal of the Korean institute of surface engineering
• /
• v.32 no.3
• /
• pp.385-388
• /
• 1999

Electron field emission properties from various CVD diamond films were studied. Diamond films were synthesized by microwave plasma CVD at 1173K and at 673K substrates temperature and pulse microwave plasma CVD at 1173K. B-doped diamond film was synthesized by microwave plasma CVD at 1173K also. Estimation by SEM, both the non-doped diamond film and B-doped diamond film which were synthesized at 1173K substrate temperature were $2~3\mu\textrm{m}$ in diameter and nucleation densities were $10^{8}{\;}numbers/\textrm{cm}^2$ order. The diamond film synthesized at 673K was $0.2\mu\textrm{m}$ in diameter and nucleation densities was 109 numbers/cm2 order. The diamond film synthesized by pulse microwave plasma CVD at 1173K was $0.2\mu\textrm{m}$ in diameter and nucleation density was $10^{9}{\;}numbers/\textrm{cm}^2$ order either. From the result of electron field emission measurement, electron field emission at $20V/\mu\textrm{m}$ from CVD diamond film synthesized by pulse microwave plasma CVD was $37.3\mu\textrm{A}/\textrm{cm}^2$ and the diamond film showed the best field emission property comparison with other CVD diamond.

• Nuclear Engineering and Technology
• /
• v.55 no.7
• /
• pp.2621-2627
• /
• 2023

In Experimental Advanced Superconducting Tokamak (EAST) experiments, to achieve long pulse and high-power ICRH system operation, a new kind of ICRH antenna has been designed. One of the most critical factors in limiting the operation of long pulse and high power is the intense heat load in the front face of the ICRH antenna, especially the Faraday Screen (FS). Therefore, the cooling channels of FS need to be designed. According to thermal-hydraulic analysis, the FS tubes are divided into several groups to achieve more excellent water cooling capability. The number of series and parallel tubes in one group is chosen as six. This antenna went into service in the spring of 2021, and it is delightful that the temperature distribution of the FS tube is below 400 ℃ in 14.5 s and 1.8 MW ICRH system operation. However, the active water-cooling design was not carried out on the upper and lower plates of FS, which led to severe ablations on that region under long pulse and high power operation, and the temperature is up to 800. Therefore, the upper and lower side plates of the FS were designed with water cooling based on thermal-hydraulic analysis. During the 2022 winter experiments, the temperature of ICRH antenna FS was lower than 400 in the pulse of 200s and the power of 1 MW operation.

• Nuclear Engineering and Technology
• /
• v.54 no.11
• /
• pp.4102-4110
• /
• 2022

Aiming at high-power and long-pulse operation up to 1000 s, some improvements have been made for both 2.45 GHz and 4.6 GHz lower hybrid (LH) systems during the recent 5 years. At first, the guard limiters of the LH antennas with graphite tiles were upgraded to tungsten, the most promising material for plasma facing components in nuclear fusion devices. These new guard limiters can operate at a peak power density of 12.9 MW/m². Strong hot spots were usually observed on the old graphite limiters when 4.6 GHz system operated with power >2.0 MW [B. N. Wan et al., Nucl. Fusion 57 (2017) 102019], leading to a reduction of the maximum power capability. With the new limiters, 4.6 GHz LH system, the main current drive (CD) and electron heating tool for EAST, can be operated with power >2.5 MW routinely. Long-pulse operation up to 100 s with 4.6 GHz LH power of 2.4 MW was achieved in 2021 and the maximal temperature on the guard limiters measured by an infrared (IR) camera was about 540 ℃, much below the permissible value of tungsten material (~1200 ℃). A discharge with a duration of 1056 s was achieved and the 4.6 GHz LH energy injected into the plasma was up to 1.05 GJ. Secondly, the fully-active-multijunction (FAM) launcher of 2.45 GHz system was upgraded to a passive-active-multijunction (PAM), for which the density of optimum coupling was relatively low (below the cut-off value). Good coupling with reflection coefficient ~3% has been achieved with plasma-antenna distance up to 11 cm for the new PAM. Finally, in order to eliminate the effect of ion cyclotron range of frequencies (ICRF) wave on 4.6 GHz LH wave coupling, the location of the ICRF launcher was changed to a port that is located 157.5° toroidally from the 4.6 GHz LH system and is not magnetically connected.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2015.08a
• /
• pp.136.2-136.2
• /
• 2015

반도체 제조는 chip의 성능 향상 및 단가 하락을 위해 지속적으로 pattern size가 nano size로 감소해 왔고, capacitor 용량은 증가해 왔다. 이러한 현상은 contact hole의 aspect ratio를 지속적으로 증가시킨바, 그에 따라 최적의 HARC (high aspect ratio contact)을 확보하는 적합한 dry etch process가 필수적이다. 그러나 HARC dry etch process는 많은 critical plasma properties 에 의존하는 매우 복잡한 공정이다. 따라서, critical plasma properties를 적절히 조절하여 higher aspect ratio, higher etch selectivity, tighter critical dimension control, lower P2ID과 같은 plasma characteristics을 확보하는 것이 요구된다. 현재 critical plasma properties를 제어하기 위해 다양한 plasma etching 방법이 연구 되어왔다. 이 중 plasma를 낮은 kHz의 frequency에서 on/off 하는 pulsed plasma etching technique은 nanoscale semiconductor material의 etch 특성을 효과적으로 향상 시킬 수 있다. 따라서 본 실험에서는 dual-frequency capacitive coupled plasma (DF-CCP)을 사용하여 plasma operation 동안 duty ratio와 pulse frequency와 같은 pulse parameters를 적용하여 plasma의 특성을 각각 제어함으로써 etch selectivity와 uniformity를 향상 시키고자 하였다. Selective SiO2 contact etching을 위해 top electrode에는 60 MHz pulsed RF source power를, bottom electrode에는 2MHz pulse plasma를 인가하여 synchronously pulsed dual-frequency capacitive coupled plasma (DF-CCP)에서의 plasma 특성과 dual pulsed plasma의 sync. pulsing duty ratio의 영향에 따른 etching 특성 등을 연구 진행하였다. 또한 emissive probe를 통해 전자온도, OES를 통한 radical 분석으로 critical Plasma properties를 분석하였고 SEM을 통한 etch 특성분석과 XPS를 통한 표면분석도 함께 진행하였다. 그 결과 60%의 source duty percentage와 50%의 bias duty percentage에서 가장 향상된 etch 특성을 얻을 수 있었다.