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Development of a Circuit Model for the Dynamic Plasma Load in a PSII Pulse System  

Chung, K.J. (Department of Nuclear Engineering, Seoul National University)
Choe, J.M. (Department of Nuclear Engineering, Seoul National University)
Hwang, H.D. (Department of Electrical Engineering, Hanyang University)
Kim, G.H. (Department of Nuclear Engineering, Seoul National University)
Ko, K.C. (Department of Electrical Engineering, Hanyang University)
Hwang, Y.S. (Department of Nuclear Engineering, Seoul National University)
Publication Information
Journal of the Korean Vacuum Society / v.15, no.3, 2006 , pp. 246-258 More about this Journal
Abstract
A circuit model has been developed to analyze characteristics of the PSII(plasma source ion implantation) pulse system with dynamic plasma load. The plasma sheath in front of the immersed planar target biased with a negative-high voltage pulse is assumed to be governed by the dynamic Child-Langmuir sheath model. Target current is self-consistently varied with the applied voltage by using the voltage-controlled current source in the circuit model. Circuit simulations are conducted with Pspice circuit simulator, and simulated pulse currents and voltages on the target are compared and confirmed with experimental results for various voltage pulses and plasma conditions.
Keywords
Plasma sheath; Pulse system; Circuit model;
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