• 한국결정성장학회지
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• 제7권2호
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• pp.341-348
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• 1997

2원동시 RF magnetron 방법을 이용하여 조건별(sputtering gas압력, buffer충 유무 및 etching여부 등)로 제작된 Pt/co 인공격자 다층막 ([$Pt10.7\AA/Co2.8{\AA}{\times}{12}$])의 구조정보에 대하여 알아보았다. 다층막 구조평가는 X선 회절측정을 이용하여 행하였으며 구조에 대한 정보를 보다 면밀하게 평가하기 위해서 다층막 모델을 제작하여 얻어진 결과를 실험결과와 비교분석 하였다. 제작된 다층막 구조모델의 계산결과를 실측치와 비교하면 peak의 위치나 회절강도가 상당히 일치하였으며 이것은 구조모델이 실제의 Pt/Co 인공격자 다층막구조를 잘 반영하고 있음을 알 수 있었다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2010년도 하계학술대회 논문집
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• pp.214-214
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• 2010

The 0.65Pb($Mg_{1/3}Nb_{2/3})O_3-0.35PbTiO_3$ (PMN-PT) thin films with $La_{0.5}Sr_{0.5}CoO_{3-\delta}$ (LSCO) bottom electrodes were grown on $CeO_2$/YSZ/Si(001), Pt/$TiO_2$/Si and $SrTiO_3$ (STO) substrates using conventional pulsed laser deposition (PLD) at a substrate temperature of $550^{\circ}C$. Since generally the crystallographic orientation of the bottom electrode induces the orientation of the films deposited on it, it allows us to observe the influence of the PMN-PT film orientation on the electrical properties. Phi scan done on PMN-PT/LSCO thin films shows epitaxial behavior of the films grown on sto substrates and $CeO_2$/YSZ buffered Si(001) substrates, and (110) texture on Pt/$TiO_2$/Si substrates. Polarization-electricfield (P-E) measurement shows good hysteresis behavior of PMN-PT films with remnant polarization of 18.2, 8.8, and $4.4{\mu}C/cm^2$ on $CeO_2$/YSZ/Si, Pt/TiO2/Si and STO substrates respectively.

• 한국재료학회지
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• 제24권12호
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• pp.694-699
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• 2014

We report the chemical vapor deposition growth characteristics of graphene on various catalytic metal substrates such as Ni, Fe, Ag, Au, and Pt. 50-nm-thick metal films were deposited on $SiO_2/Si$ substrates using dc magnetron sputtering. Graphene was synthesized on the metal/$SiO_2$/Si substrates with $CH_4$ gas (1 SCCM) diluted in mixed gases of 10% $H_2$ and 90 % Ar (99 SCCM) using inductively-coupled plasma chemical vapor deposition (ICP-CVD). The highest quality of graphene film was achieved on Ni and Fe substrates at $900^{\circ}C$ and 500 W of ICP power. Ni substrate seemed to be the best catalytic material among the tested materials for graphene growth because it required the lowest growth temperature ($600^{\circ}C$) as well as showing a low ICP power of 200W. Graphene films were successfully grown on Ag, Au, and Pt substrates as well. Graphene was formed on Pt substrate within 2 sec, while graphene film was achieved on Ni substrate over a period of 5 min of growth. These results can be understood as showing the direct CVD growth of graphene with a highly efficient catalytic reaction on the Pt surface.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1998년도 추계학술대회 논문집 학회본부 C
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• pp.801-803
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• 1998

We investigated Pt and $RuO_2$ as a bottom electrode and PZT thin film for ferroelectric applications. XRD examination shows that a mixed phase of (111) and (200) Pt peak for the temperature ranged from RT to $200^{\circ}C$, and a preferred (111) orientation for the substrate temperature of $300^{\circ}C$. From the XRD and AFM results, we recommend the substrate temperature of $300^{\circ}C$, 80 W for the Pt bottom electrode growth. From the study of an oxygen partial pressure from 0 to 50%, we learned that only Ru metal was grown with $0{\sim}5%$, a mixed phase of Ru and $RuO_2$ for $10{\sim}40%$, pure $RuO_2$ at 50%. Having optimized the bottom electrode growth conditions, we employed two step process in PZT film capacitor: PZT film growth at the low substrate temperature of $300^{\circ}C$ and then post RTA anneal treatments. PZT films were randomly oriented on $RuO_2$ and (110) preferentially oriented on Pt electrode. Leakage current density of PZT film demonstrated two to three orders higher for $RuO_2$ bottom electrode. From C-V results we observed a dielectric constant of PZT film higher than 1200. This paper presents the optimized process conditions of the bottom electrodes and properties of PZT thin films on these electrodes.

• 한국자기학회지
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• 제15권1호
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• pp.21-24
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• 2005

강자성, 초거대자기저항체인 $La_{0.67}Sr_{0.33}MnO_{3}$ 타겟을 이용하여 248nm의 파장을 갖는 KrF 엑시머 레이저를 사용한 PLD법으로 박막으 제작하고, 강유전체 물질인 $PbZr_{0.52}Ti_{0.48}O_{3}$ 물질을 spin coating 방법으로 제조하였다. Pt 기관(111)위에 125 mtorr의 산소분압으로 증착한 rhombohedral 구조를 갖는 LSMO 박막을 증착하고 그 위에 PZT 물질을 증착한 결과 LSMO, PZT en 물질 모두 단일상으로 [111]방향으로서의 성장하였음을 알 수 있었다. AFM(atomic force micrscope) data 및 SEM(scanning electron microscope) data를 바탕으로 매우 균질한 박막을 얻었음을 알 수 있었으며, 이때의 자기적 성질 및 전기적 성질은 각각 강자성적인 성질 및 강유전체적인 성향을 나타내었다. 이러한 결과를 가지고 박막증착에 있어서 서로간의 결정구조가 미치는 영향과 다른 경향에 대한 조절이 가능함을 알 수 있었다.

• JSTS:Journal of Semiconductor Technology and Science
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• 제7권3호
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• pp.161-165
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• 2007

In this paper, mesoporous Pt on micro pillars Pt electrode is newly designed, fabricated, and characterized on silicon substrate for non-enzymatic electrochemical sensor micro-chip integrated with CMOS readout circuitry. The fabricated micro/nano Pt electrode has cylindrical hexangular arrayed nano Pt pores with a diameter of 3.2 nm which is formed on top of the micro pillars Pt electrode with approximately $6{\mu}m$ in diameter, $6{\mu}m$ in space, and $50{\mu}m$ in height. The measured current responses of the fabricated plane Pt, mesoporous Pt, and mesoporous Pt on the micro pillar Pt electrodes are approximately $9.9nA/mm^2,\;6.72{\mu}A/mm^2,\;and\;7.67{\mu}A/mm^2$ in 10mM glucose solution with 0.1M phosphate buffered saline (PBS) solution, respectively. In addition, the measured current responses of the fabricated plane Pt, mesoporous Pt, and mesoporous Pt on the micro pillar Pt electrodes are approximately $0.15{\mu}A/mm^2,\;0.56{\mu}A/mm^2,\;and\;0.74{\mu}A/mm^2$ in 0.1mM ascorbic acid (AA) solution with 0.1M phosphate buffered saline (PBS) solution, respectively. This experimental results show that the proposed micro/nano Pt electrode is highly sensitive and promising for CMOS integrated non-enzymatic electrochemical sensor applications. Since the micro-pillar Pt electrode can also be utilized with a micro-fluidic mixer in the sensor chip, the sensor chip can be much smaller, cheaper, and easier to be fabricated.

• 한국에너지공학회:학술대회논문집
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• 한국에너지공학회 1992년도 학술발표회 초록집
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• pp.39-40
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• 1992

This paper dealt with the manufacturing of binary alloy catalyst and showed simple electrochemical method for determing catalytic activity of oxygen reduction in acid or alkaline electrolyte. The catalyst was prepared by impregnating transition metal salts on platinum or silver particles adsorbed before on carbon paper substrate. The electrochemical characteristics of the catalysts was investigated with carbon paper electrode or PTFE-boned porous electrode and then cathodic current densities and tafel slopes were compared. As a result, of all binary catalysts utilized in this work, Pt-Fe, Pt-Mo showed better oxygen reduction activity than pure platinum catalyst in acid electrolyte and Ag-Fe, Ag-Pt, and Ag-Ni-Bi-Ti catalyst did than pure silver catalyst in alkaline electrolyte. The current density of Pt-Fe electrode in acid electrolyte was one and half times higher than that of Pt electrode(~500mA/$\textrm{cm}^2$ at 0.7VvsNHE).

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.29-29
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• 2008

Platinum Thin films were deposited on $Al_2O_3$ by Rf magnetic Sputtering. The physical and electrical characteristics of these films were analyzed under various deposition conditions(Ar gas pressure, input power, substrate temperature.) and annealing condition. The deposition rate was increased with increasing the input power but not increased linear. In the other factor, The Pt thin films property was associated with resistance. so lower resistance had more and more good Pt thin films condition. For the purpose of this study, we will get the best Pt thin film characteristics.

• 한국정밀공학회지
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• 제33권8호
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• pp.691-695
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• 2016

This paper covers the investigation of the microscale behavior of Pt nanostrucures fabricated by atomic layer deposition (ALD) at elevated temperature. Nanoparticles are fabricated at up to 70 ALD cycles, while congruent porous nanostructures are observed at > 90 ALD cycles. The areal density of the ALD Pt nanostructure on top of the SiO2 substrate was as high as 98% even after annealing at $450^{\circ}C$ for 1hr. The sheet resistance of the ALD Pt nanostructure dramatically increased when the areal density of the nanostructure decreased below 85 - 89% due to coarsening at elevated temperature.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 추계학술대회 논문집
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• pp.358-361
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• 1999

This paper describes on the fabrication and characteristics of hot-film type micro-flowsensors integrated with Pt-RTD\`s and micro-heater on the Si substrate, in which MgO thin-films were used as medium layer in order to improve adhesion of Pt thin-films to SiO$_2$ layer The MgO layer improved adhesion of Pt thin-films to SiO$_2$` layer without any chemical reactions to Pt thin-films under high as gas flow rate and its conductivity increased due to increase of heat-loss from sensor to external. Output voltage was 82 mV at N2 flow rate of 2000 sccm/min, heating power of 1.2W. The respons time was about 100 msec when input flow was step-input