• 한국환경과학회:학술대회논문집
• /
• 한국환경과학회 2008년도 추계학술발표회 발표논문집
• /
• pp.482-487
• /
• 2008

성능이 우수한 다성분계 전극을 개발하기 위하여 Ru를 주 전극성분으로 Pt, Sn, Sb 및 Gd를 보조 전극성분으로 하여 3, 4성분계 전극의 성능과 산화제 생성량 및 전극 표면 분석을 행하여 다음의 결과를 얻었다. 1. 2분 동안 단위 W당 제거된 RhB 농토는 Ru:Sn:Sb=9:1:1 > Ru:Pt:Gd=5:5:1 > Ru:Sn=9:1 > Ru:Sn:Gd=9:1:1 > Ru:Sb:Gd=9:1:1로 나타났다. Ru:Sn:Sb=9:1.1 전극에서 발생하는 free Cl, ClO$_2$ 및 H$_2$O$_2$농도가 다른 전극보다 높은 것으로 나타나 산화제 생성경향과 RhB 분해율과는 상관관계가 있는 것으로 사료되었다. 4성분계 전극 중에서 Ru:Sn:Sb:Gd 전극의 성능이 가장 우수한 것으로 나타났으나 3성분계 전극인 Ru:Sn:Sb=9:1.1 전극보다 성능이 떨어지는 것으로 나타났다. Ru:Sn:Sb=9:1:1 전극에서 생성되는 산화제 농도가 다른 두 종류의 산화제 농도보다 높은 것으로 나타났고 4성분 전극의 경우 Ru:Sn:Sb:Gd 전극의 산화제 농도가 Ru:Sn:Sb:Gd 전극이 높거나 유사한 경우로 나타나 산화제 생성 경향과 RhB분해 능과는 상관관계가 있는 것으로 나타났다. 초기 RhB 분해 속도가 높은 전극의 COD 제거율도 높은 것으로 나타났다. OH 라디칼은 발생하지 않지만 염소계 산화제 농도가 높고 RhB제거율이 높아 Ru를 주 성분으로 한 전극의 RhB분해는 주로 간접 산화작용에 의한 것이며, 개발된 3, 4성분계 산화물 전극은 간접 산화용 전극임을 알 수 있었다. 에칭을 하기 전의 Ti판은 표면이 매끄러운 것으로 나타났으며, 35% 염산으로 에칭한 후의 Ti메쉬는 매우 거친 표면조직을 가지는 것을 관찰할 수 있었다. Ru:Sn:Sb=9:1:1 전극과 Ru:Sn:Sb:Gd 전극의 SEM 사진을 관찰한 결과 두 전극 모두 전극 물질이 균일하게 도포되어 있었으며, 두 전극 모두 열소성을 통해 전극 성분을 코팅할 때 발생하는 "mud crack"이 발생한 것이 관찰되었다 EDX 분석에서 Cl이 관찰되었는데, 전극 성분의 불완전 산화로 인한 비양론적 산화물 때문이며 이는 RhB 분해성능과 관련 있는 것으로 사료되었다.

• 한국재료학회지
• /
• 제9권12호
• /
• pp.1181-1187
• /
• 1999

diol을 기반으로 하는 Sol-Gel 방법으로 PZT (53/47) 1M sol 용액을 만들어 회전 코팅법으로 Pt/Ti/$SiO_2$/Si 기판위에 코팅하였고 한번 코팅으로 최대 0.9${\mu}m $의 PZT막을 얻었다. PZT는 비강유전성 pyrochlore상을 거쳐 강유전성 perovskite상으로 전이하며 따라서 PZT perovskite seed가 상전이에 미치는 영향을 규명하고자 하였다. 0.2${\mu}m $ 이하의 크기를 갖는 1wt% PZT분말을 propanol용액에 분산시켜 PZT sol 용액에 도입하여 seeded PZT 막을 제조하였다. Seeded PZT막을 열처리한 결과 perovskite상의 생성이 촉진되어 상전이 온도가 50$^{\circ}C$정도 낮아졌다.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2001년도 추계학술대회 논문집 Vol.14 No.1
• /
• pp.394-397
• /
• 2001

In this paper, in-situ deposited $Ru/RuO_2$ bottom electrodes have been investigated as new bottom electrodes for PZT thin film capacitor application. As a comparison, structural and electrical properties of PZT thin films on Pt/Ti and $RuO_2$ bottom electrodes are also investigated. The use of $Ru/RuO_2$ hybrid electrodes showed better electrical properties in compression with $RuO_2$ bottom electrode. With increasing Ru electrode thickness, the PZT thin films showed preferred orientation along the (110) direction and and leakage current of PZT thin films were improved. The PZT thin films on Ru (100nm)/$RuO_2$ electrodes exhibited excellent ferroelectric properties such as remant polarization and coercive field of $7.2C/cm^2$ and 46.35 kV/cm, respectively.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2000년도 하계학술대회 논문집
• /
• pp.920-923
• /
• 2000

All solid-state thin film supercapacitor(TFSC) based on $RuO_2$ electrode was fabricated. Ruthenium oxide$(RuO_2)$ thin film was deposited on Pt/Ti/Si subsrate by d.c. magnetron sputtering. LiPON(lithium phosphorus oxynitride) thin film were deposited by r.f. reactive sputtering. X-ray diffraction patterns of $RuO_2$ and LiPON films revealed that crystal structures of both films were amorphous. To decrease resistivity of $RuO_2$ thin film, $RuO_2$ thin film was deposited with $H_2O$ vapor. In order to decide the maximum ionic conductivity, the LiPON films were prepared by various sputtering condition. The maximum ionic conductivity was $9.5\times{10}^7S/cm$. A charge-discharge measurements showed the capacity of $3\times{10-2}\;F/cm^2-\mu{m}$ for the as-fabricated TFSC. The discharging efficiency was decreased after 500 cycles by 40 %.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2001년도 추계학술대회 논문집
• /
• pp.394-397
• /
• 2001

In this paper, in-situ deposited Ru/RuO$_2$ bottom electrodes have been investigated as new bottom electrodes for PZT thin film capacitor application. As a comparison, structural and electrical properties of PZT thin films on Pt/Ti and RuO$_2$ bottom electrodes are also investigated. The use of Ru/RuO$_2$ hybrid electrodes showed better electrical properties in compression with RuO$_2$ bottom electrode. With increasing Ru electrode thickness, the PZT thin films showed preferred orientation along the (110) direction and leakage current of PZT thin films were improved. The PZT thin films on Ru (100nm)/RuO$_2$ electrodes exhibited excellent ferroelectric properties such as remant polarization and coercive field of 7.2 C/$\textrm{cm}^2$ and 46.35 kV/cm, respectively.

• 한국재료학회:학술대회논문집
• /
• 한국재료학회 2003년도 춘계학술발표강연 및 논문개요집
• /
• pp.174-174
• /
• 2003

Highly (111)-oriented PZT [Pb(Zrl-xTix)O3] thin films in the Zr-rich rhombohedral phase-field were successfully fabricated on Pt(111)/Ti/SiO2/Si substrates by combining PLD method with sol-gel process. These highly (111)-oriented films can be used as model systems for polarized Raman scattering study of PZT in the rhombohedral-Phase field because the (111)-direction is the principal off-center axis of the rhombohedral ferroelectricity. For this purpose, we have fabricated PZT films employing two distinctive compositions : one with Zr/Ti = 90/10 (abbreviated as PZT90/10) and the other with Zr/Ti= 60/40 (PZT60/40). The PZT90/10 film belongs to the octahedrally distorted FR(LT) phase with a cell-doubled structure, whereas the PZT60/40 is in the high-temperature FR(HT) phase-field at room temperature. To clearly separate E(TO) phonon modes from Al(TO) modes of the (111)-oriented rhombohedral film, we have suitably devised Z(X,Y)Z and Z(X,X)Z backscattering geometries for E(TO) and Al (TO), respectively. The polarized scattering experiment demonstrated that both types of (111)-oriented rhombohedral films closely followed the Raman selection rule.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2011년도 제40회 동계학술대회 초록집
• /
• pp.70-70
• /
• 2011

차세대 저항 메모리로 활용 가능한 ZnO 박막의 저항 변화 특성을 평가하였다. ZnO 박막은 Pt/Ti/SiO2/Si 기판 위에 스퍼터링 시스템을 이용하여 약 50nm 두께로 증착되었다. 증착된 박막에 전극을 evaporator를 이용하여 패턴닝 함으로써 전극-반도체-전극 구조의 소자를 만들고 전기적 특성을 평가하였다. 비교적 높은 compliance current (이하Icomp)를 설정한 경우 unipolar 저항 변화특성을 나타낸 데 비해 비교적 낮은 Icomp를 설정한 경우 bipolar 저항 변화특성을 나타내었다. 두 서로 다른 저항 변화 특성은 100cycle 이상 안정적으로 재현성 있게 나타났으며 이때의 저항비는 약 $10^3$ 정도를 나타냈다. 본 결과를 바탕으로 필라멘트 이론에 기초한 저항 변화 메커니즘을 설명하는 모델이 제시되었다.

• 센서학회지
• /
• 제27권1호
• /
• pp.1-5
• /
• 2018

Two-dimensional (2D) niobate-based nanosheets have attracted attention as high-k dielectric materials. We synthesized strontiumsubstituted calcium niobate ($Ca_{0.8}Sr_{1.2}Nb_3O_{10}$) nanosheets by a two-step cation exchange process from $KCa_{0.8}Sr_{1.2}Nb_3O_{10}$ ceramic. The $K^+$ ions were exchanged with $H^+$ ions, and then H+ ions were exchanged with tetrabutylammonium ($TBA^+$) cations. The $Ca_{0.8}Sr_{1.2}Nb_3O_{10}$ nanosheets were then exfoliated, decreasing the electrostatic interaction between each niobate layer. Furthermore, $Ca_2Nb_3O_{10}$ nanosheets were synthesized in same process for comparison. Each exfoliated nanosheet shows a single-crystal phase and has a lateral size of over 100 nm. The nanosheets were deposited on a $Pt/Ti/SiO_2/Si$ substrate by the electrophoretic deposition (EPD) method at 40 V, followed by ultraviolet irradiation of the films in order to remove the remaining $TBA^+$ ions. The $Ca_{0.8}Sr_{1.2}Nb_3O_{10}$ thin film exhibited twice the dielectric permittivity (~60) and lower dielectric loss than $Ca_2Nb_3O_{10}$ thin films.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2000년도 하계학술대회 논문집
• /
• pp.873-876
• /
• 2000

Characteristics of piezoelectric thick films prepared by screen printing method were investigated. The piezoelectric thick films were printed using Pb(Mg,Nb)O$_3$-Pb(Zr,Ti)O$_3$system. The lower electrodes were coated with various thickness of Ag-Pd by screen printing to investigate the effect as a diffusion barrier and deposited with Pt by sputtering on Ag-Pd. The ceramic paste was prepared by mixing powder and binder with various ratios using three roll miller. The fabricated thick films were burned out at 650$^{\circ}C$ and sintered at 950$^{\circ}C$ in the O$_2$condition for each 20, 60min after printing with 350mesh screen. The thickness of piezoelectric thick film was 15∼20 $\mu\textrm{m}$ and the Ag-Pd electrode acted as a diffusion barrier above 3 $\mu\textrm{m}$ thickness. When the lower electrode Ag-Pd was 6 $\mu\textrm{m}$ and the piezoelectric thick films were sintered by 2nd step (650$^{\circ}C$/20min and 950$^{\circ}C$/1h) using paste mixed Pb(Mg,Nb)O$_3$-Pb(Zr,Ti)O$_3$$.$ MnO$_2$+ Bi$_2$O$_3$. V$_2$O$\_$5/ and binder in the ratio of 70:30, the remnant polarization of thick film was 9.1 ${\mu}$C /cm$^2$.

• 한국전기전자재료학회논문지
• /
• 제11권10호
• /
• pp.866-870
• /
• 1998

PLZT thin films were fabricated with different Zr/Ti ratios by pulsed laser deposition. PLZT films deposited on Pt/Ti/SiO$_2$/Si substrate. This PLZT thin films of 5000$\AA$ thickness were crystallized at $600^{\circ}C$, $O_2$ pressure 200m Torr. 2/55/45 PLZT thin film showed a maximum dielectric constant value of $\varepsilon$\ulcorner=1550 and dielectric loss was 0.03 at 10kHz. At 2/70/30 PLZT thin film, coercive field and remnant polarization was respectively 19[kV/cm], 8[$\mu$C/$\textrm{cm}^2$]. Raman spectroscopy results showed that the bands of spectra became broader as the amount of Zr mol% increased and two crystal phase coexisted at 2/55/45 PLZT film. Raman spectroscopy was useful for crystal structure analysis of PLZT thin films.