• Title/Summary/Keyword: Pt/$TiO_2$

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The Surface Image Properties of BST Thin Film by Depositing Conditions (코팅 조건에 따른 BST 박막의 표면 이미지 특성)

  • Hong, Kyung-Jin;Ki, Hyun-Cheol;Ooh, Soo-Hong;Cho, Jae-Cheol
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.05b
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    • pp.107-110
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    • 2002
  • The optical memory devices of BST thin films to composite $(Ba_{0.7}\;Sr_{0.3})TiO_{3}$ using sol-gel method were fabricated by changing of the depositing layer number on $Pt/Ti/SiO_{2}/Si$ substrate. The structural properties of optical memory devices to be ferroelectric was investigated by fractal analysis and 3-dimension image processing. The thickness of BST thin films at each coating numbers 3, 4 and 5 times was $2500[\AA]$, $3500[\AA]$ and $3800[\AA]$. BST thin films exhibited the most pronounced grain growth. The surface morphology image was roughness with coating numbers. The thin films increasing with coating numbers shows a more textured and complex configuration.

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The Dielectric Characteristics of BST Thin Film Devices (BST 박막 소자의 유전특성)

  • 홍경진;민용기;신훈규;조재철
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.07a
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    • pp.660-663
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    • 2001
  • The devices of BST thin films to composite (Ba$\_$0.7/ Sr$\_$0.3/)TiO$_3$using sol-gel method were fabricated by changing of the depositing layer number on Pt/Ti/SiO$_2$/Si substrate. The thin film capacitor to be ferroelectric devices was investigated by structural and electrical properties. The thickness of BST thin films at each coating numbers 3, 4 and 5 times was 2500[${\AA}$], 3500[${\AA}$], 3800[${\AA}$]. The dielectric factor of thin film when the coating numbers were 3, 4 and 5 times was 190, 400 and 460 on frequency 1[MHz]. The dielectric loss of BST thin film was linearly increased by increasing of the specimen area.

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Dielectric properties of ZrTiO4 thin films deposited by DC magnetron reactive sputtering

  • Kim, Taeseok;Park, Byungwoo;Hong, Kug-Sun
    • Journal of Korean Vacuum Science & Technology
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    • v.3 no.2
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    • pp.130-133
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    • 1999
  • Paraelectric ZrTiO4 thin films were synthesized on a Si(100) substrate using DC magnetron reactive sputtering. Films deposited above-400$^{\circ}C$ exhibited crystalline characteristics. The dielectric constants ($\varepsilon$) and dielectric losses (tan$\delta$) of as-deposited and annealed films were measured in the 1 MHz range using a Pt upper electrode and a phosphorous-doped si bottom electrode. Preliminary data showed that as the deposition temperature increased, the dielectric losses decreased while the dielectric constants did not change significantly. similar trends for dielectric losses were observed when the as-deposited samples were annealed at 800$^{\circ}C$. The reduction of dielectric losses at high-deposition temperatures and post annealing correlated well with the x-ray diffraction peak widths.

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Chemical Solution Deposition of PZT/Oxide Electrode Thin Film Capacitors and Their Micro-patterning by using SAM

  • Suzuki, Hisao
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07b
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    • pp.907-912
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    • 2005
  • Micro-patterns of $Pb(Zr_{0.53}Ti_{0.47})O_3$, PZT, thin films with a MPB composition were deposited on $Pt/Ti/SiO_2/Si$ substrate from molecular-designed PZT precursor solution by using self-assembledmonolayer(SAM) as a template. This method includes deposition of SAM followed by the optical etching by exposing the SAM to the UV-light, leading to the patterned SAM as a selective deposition template. The pattern of SAM was formed by irradiating UV-light to the SAM on a substrate and/or patterned PZT thin film through a metal mask for the selective deposition of patterned PZT or lanthanum nickel oxide (LNO) precursor films from alkoxide-based precursor solutions. As a result, patterned ferroelectric PZT and PZT/LNO thin film capacitors with good electrical properties in micrometer size could be successfully deposited.

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Dielectric properties of $Bi_{3.25}La_{0.75}Ti_3O_{12}$ thin films with Bi contents (Bi 첨가량에 따른 BLT 박막의 유전특성)

  • 김경태;김창일;강동희;심일운
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07a
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    • pp.371-374
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    • 2002
  • Bismuth lanthanum titanate thin films with excess Bi contents were prepared onto Pt/Ti/$SiO_2$/Si substrate by metalorganic decomposition (MOD) technique. The structure and morphology of the films were analyzed using X-ray diffraction (XRD) and atomic force microscopy (AFM), respectively. From the XRD analysis, BLT thin films show polycrystalline structure and the layered-perovskite phase was obtained over 10% excess of Bi contents. As a result of ferroelectric characteristics related to the Bi content of the BLT thin film, the remanent polarization and dielectric constant decreased with increasing over Bi content of 10 % excess. The BLT film with Bi content of 10% excess was measured to have a dielectric constant of n9 and dielectric loss of 1.85[%]. The BLT thin films showed little polarization fatigue test up to 3.5 x $10^{9}$ bipolar switching cycling.

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Preparation and Properties of Sol-Gel Processed Lead Lanthanum Titanate Thin

  • Kim, Hyun-Hoo;Lee, Jung-Geun
    • Transactions on Electrical and Electronic Materials
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    • v.1 no.1
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    • pp.17-21
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    • 2000
  • In order to investigate the dependence of a content in lead lanthanum titanate (PLT) films and heat treatment, sol-gel process has been used. Four types of PLT thin films with the chemical formula, Pb$\_$1-x/ La$\_$x/Ti$\_$1-x/4/O$_3$(X=18, 21, 24 and 28 mole %) have been fabricated on Pt/Ti/SiO$_2$/Si multi-layers and ITO/glass substrates, The post-annealing temperature in the range of 400~700 $\^{C}$ is applied for the formation of perovskite structure in PLT films. The structureal, electrical and optical properties of PLT film with the addition of La content are estimated. The films orientation and surface structure of films are studied by XRD (X-ray diffraction) and SEM(scanning electron microscopy). The P-E hysteresis loop become narrower with increasing La content. The average transmittance of the films is about 80%.

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Dielectric properties of Eu-doped PZT thin films (Eu 첨가에 따른 PZT 박막의 유전 특성)

  • Son, Young-Hoon;Kim, Kyeong-Tae;Kim, Chang-Il;Chang, Eui-Goo;Lee, Byoung-Ki
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.11a
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    • pp.155-158
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    • 2002
  • Eu-doped lead zirconium titanate $Pb_{1.1}(Zr_{0.3}Ti_{0.7})O_{3}$ thin films on the Pt/Ti/$SiO_2$/Si substrates prepared by a metalorganic decomposition (MOD) method. The effect on the structural and electrical properties of the films measured according to Eu content. Eu-doping altered significantly the dielectric and ferroelectric properties. The remanent polarization and coercive field decreased with increasing the concentration of Eu content. The dielectric constant and dielectric loss of the film decreased with increasing Eu contents. The 3 mol% of Eu-doped PZT thin film showed large remanent polarization and the fatigue characteristic of the film did not change up to $10^9$ switching cycles.

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Ferroelectirc Properties of Eu-doped PZT Thin Films (Eu 첨가에 따른 PZT 박막의 강유전 특성)

  • 김창일;손영훈;김경태;김동표;이병기
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.7
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    • pp.611-615
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    • 2003
  • Eu-doped lead zirconate titanate(Pb$\sub$1.1/(Zr$\sub$0.6/Ti$\sub$0.4/)O$_3$; PZT) thin films on the Pt/Ti/SiO$_2$/Si substrates prepared by a sol-gel method. The effect on structural and electrical properties of PZT thin films measured according to the Eu content. Eu-doping altered significantly dielectric and ferroelectric properties. The remanent polarization and the coercive field decreased with the increasing Eu content. The dielectric constant and the dielectric loss of PZT thin films decreased with the increasing Eu content. The 0.5 mol% of Eu-doped PZT thin film showed improved fatigue characteristic comparing to the undoped PZT thin film.

The Structure and Dielectric Properties of BST Thin Films Using Fractal Process (프렉탈 처리를 이용한 BST 박막의 구조 및 유전적특성)

  • 기현철;박지순;이우기;민용기;김태성
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.43-46
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    • 2000
  • In this study, (Ba, Sr)$TiO_3$ (BST) ceramics thin films were prepared by Sol-Gel method. BST solution was made and spin-coated on Pt/$TiO_2$/Si substrate at 4000 [rpm] for 10 seconds. Coated specimens were dried at 150[$^{\circ}C$] for 5 minutes. Coating process was repeated 3 times and then sintered at 750[$^{\circ}C$] for 30 minutes. Structure and electrical characteristics of specimen was analyzed by Fractal Process. Thickness of BST ceramics thin films are about 2800[$\AA$]. Dielectric constant and loss of thin films was little decreased at 1[kHz]~1[MHz]. Dielectric constant and loss to frequency were 250 and 0.02 in BST3. The property of leakage current as the relation between the current and the voltage was that change of the leakage current was stable when the applied voltage was 0~3[V].

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Temperature Dependence of the Electric-field-induced Strains in PMN-based Relaxor Ferroelectrics (PMN계 완화형 강유전체에서 전왜특성의 온도 의존성)

  • Park, Jae-Hwan;Hong, Guk-Seon;Park, Sun-Ja
    • Korean Journal of Materials Research
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    • v.6 no.4
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    • pp.349-356
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    • 1996
  • 완화형 강유전체의 가장 대표적인 PMN계에서 첨가제의 종류와 함량, 측정온도, 인가 전계의형태 등의 변화에 따른 전계인가 변화특성을 광법위하게 조사하였다. Columbite precursor법에의해 분말을 준비하고 고상소결방법에 의하여 모든 시편을 제조하였다. 순수한 PMN에 첨가제로서 PbTiO3와 Pb(Zr, Ti)O3를 첨가한 경우에 완전한 perovskite 구조의 고용체가 형성되었음을 알 수 있었다. T$\varepsilon$max이상에서는 변위의 이력이 크게 발생하는 강유전체의 거동을 보여주었다. 양방향으로 전계를 인가하여 변위를 이용하면 발생 strain은 실온 근방에서 온도에 대하여 안정적이지만 단방향 전계에 따른 변위는 온도에 따라 크기가 변한다는 것을 알 수 있었고 유전상수가 큰 경우가 전왜의 크기 또한 큰 것을 알 수 있었다. 0.9MN-0.1PT와 0.8PMN-0.2PZT의 경우 최대가 되는 온도는 유전율이 최대가 되는 온도보다 더 낮은 온도에서 나타났다.

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