• Journal of the Korean Vacuum Society
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• v.4 no.3
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• pp.319-326
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• 1995

초고진공에서 Si(100)-2X1 기판 위에 Pt를 약 100$\AA$의 두께로 증착한 후 in-situ로 열처리하는 고상에피택셜 성장법으로 PtSi 박막을 형성시켰다. XRD와 XPS 분석 결과 $200^{\circ}C$로 열처리한 시료에서는 Pt3Si, Pt2Si와 PtSi의 상이 섞여 있었으나 50$0^{\circ}C$로 열처리한 시료에서는 PtSi의 단일상만 확인되었으며, 형성된 PtSi 박막은 주상구조와 판상구조의 이중구조를 나타내었다. 기판 온도를 $500^{\circ}C$로 유지하면서 Pt를 증착한 후 $750^{\circ}C$에서 열처리한 경우에는 판상구조를 갖는 양질의 PtSi 박막이 에피택셜 성장되었다. HRTEM분석 결과 에피텍셜 성장된 PtSi와 기판 Si(100)의 계면은 PtSi[110]//Si[110], ptSi(110)//Si(100)의 정합성을 가졌다. 판상구조를 갖는 PtSi상의 에피택셜 방향은 기판과 열처리 온도에는 의존하나 열처리 시간에는 무관한 것으로 나타났다.

• Journal of the Korean Vacuum Society
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• v.16 no.5
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• pp.343-347
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• 2007

Fe thin films exhibited (100) preferential orientation when they were deposited at low deposition rate of $0.1{\AA}/s$ on glass substrates by using facing target sputtering system. The (100) oriented Fe layer induces (100) orientation of Pt layer deposited on it owing to hetero-epitaxial growth. After annealing at $600^{\circ}C$ in $H_2$ atmosphere, FePt films exhibited f.c.t. (001) texture in the whole film caused by inter-diffusion between atoms. We have also confirmed that the homogeneously inter-diffused compositional modulation in the film after the annealing process. Furthermore, annealing process in $Ar+H_2$ atmosphere at $400^{\circ}C$ during Pt deposition was effective for attaining Pt (100) texture. The annealing process during Pt deposition also induced in low annealing temperature and decreased annealing time for attaining the FePt f.c.t. (001) structure.

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.174-174
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• 1999

Pt(001)의 깨끗한 표면은 재배열된 (5x20) 또는 (nxn) 구조를 갖는다. 이러한 재배열된 구조는 소？의 가스를 흡착에 대해서도 (1x1)구조로 다시 재배열되는 재배열인 쉽게 풀리는 준안정적 재배열 구조를 갖는 표면이다. Pt(100) 표면 위에 Ni과 같은 금속을 흡착시키는 경우도 동일하게 표면의 장력을 해소시켜 (1x1) 표면을 만든다. Pt와 Ni과 같은 덩어리 상태에서 Pt와 Ni가 질서있게 교차되어 배열되는 합금이 쉽게 이루어지는 물질들로 잘 알려져 있고, 이 합금은 Pt나 Ni와 동일한 규칙적인 fcc 구조를 갖는다. 따라서 Pt(100) 표면 위에 Ni를 흡착시키는 것은 Nm/Cu(100)과 같은 표면합금이나 Mn/Ag(1000에서 보이는 2층으로 된 표면 합금과 같은 표면 근방에 국한된 질서있는 표면 합금의 가능성이 있다. 또한 Ni/Pt(100)은 Ni과 Pt가 3대 1의 비로 조합될 때 나타나는 Ni3Pt의 층별구조인 표면에 Ni가 채워져 있고, 다음 층에 Ni와 Pt가 50%씩 질서 있게 섞여 있는 형태의 구조 즉 표면 밑 합금이 나타날 수 있는 가능성이 있는 물질계라는 점에서 관심을 갖게 한다. 본 연구는 LEED를 이용하여 Ni/Pt(100) 박막의 층별구조를 확인하고자 한다. PtNi 합금은 ATA(average t-matirx approximation)을 이용한 LEED 분석이 잘 적용되는 물질계로 알려져 있고, 본 연구는 ATA를 적용한 LEED I/V 분석을 통하여 Ni가 성장된 Pt(100) 표면의층별 농도비와 층별 구조를 구하고자 한다. 실험은 기본 압력이 3x10-11torr인 챔버에서 이루어졌으며, 증착시 압력은 5x10 torr이고, 증착은 열증발 방법을 이용하였다. Ni가 증착됨에 따라 (nxn) 재배열 표면에 기인한 extra spot들의 세기는 점차 감소하고 특정 증착량 이상에서부터 이 (nxn)의 spot들이 사라지고 깨끗한 (1x1) 패턴이 나타난다. 계속되는 증착량의 증가에 대해서도 이 (1x1) 형태는 유지되며, 표면의 질서에 따르는 c(2x20 패턴은 보이지 않았다. (1x1) LEED spot를 보임에도 불구하고 덩어리 절단 형태의 구조를 기반으로 한 LEED I/V 분석으로는 잘 맞출수 없었다. 이것은 Ni가 일정 이상 흡착된 경우 그 구조가 덩어리 절단 형태의 fcc(100) 구조와 벗어난 구조를 가지는 것으로 보인다.

• Journal of the Mineralogical Society of Korea
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• v.1 no.1
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• pp.15-19
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• 1988

In the process of re-checking the phase relations of the Pt-Sb system the previously reported Pt4+Sb phase did not occur. Instead, Pt34Sb7 phase with an average chemical composition (wt%) Pt 89.3, Sb 11.4, total 100.7, has been newly found to exist, and the formula Pt34Sb7 has been tentatively assigned to it, It is pale brownish grey to yellowish grey under refloecting microscope and non-bireflectant, VHN100=225 (206-243). X-ray powder patterns are (d(I/Io)): 2.318(100), 2.293(100), 2.110(30), 1.440(50), 1.390(15), 1.283(5), 1.203(70) and 1.192(40)$\AA$. They are indexable on the basis of tertragonal cell with $\alpha$=3.948(3), c=16.85(1)$\AA$. A question whether the tetragonal Pt34Sb7 is the new phase or a polymorph of the cubic Pt4+Sb phase remains unclear and awaits better X-ray diffraction, electron microprobe analysis and DTA for the Pt4+Sb phase. The Pt3Sb phase reported to be of tetragonal symmetry has been confirmed to exist. It is greyish yellow in air and in oil, very weakly bireflectant, and weakly anisotropic. VHN25=216 (183-240). Its X-ray powder data have been successively indexed on a tetragonal cell with $\alpha$=3.9455(7), c=16.959(5)$\AA$.

• Proceedings of the Korean Magnestics Society Conference
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• 2000.05a
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• pp.144-145
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• 2000

• Proceedings of the Korean Magnestics Society Conference
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• 2001.04a
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• pp.102-103
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• 2001

• Bulletin of the Korean Chemical Society
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• v.23 no.3
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• pp.395-399
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• 2002

The voltammetric behavior of spontaneously adsorbing Mo layers on Pt(111) and Pt(100) electrodes has been studied to estimate the number of electrons involved in the electrochemical processes of spontaneously adsorbed Mo and the number of the bloc ked Pt sites for hydrogen adsorption. On Pt(111) and Pt(100) surfaces, the spontaneously adsorbed Mo layers showed redox peaks at 0.10 V and 0.15 V, respectively, and continuous current-potential waves in the conventional hydrogen region. Since the potential range of the Mo redox processes on both surfaces overlapped partially with the potential range of hydrogen adsorption, the variation in the ratio of the total charge of Mo and H ($Q_H$ +$Q_{MO}$) to the hydrogen charge of clean Pt electrode ($Q_H^0$) was analyzed. From the analysis, six electrons were estimated to be involved in the electrochemical processes of the spontaneously adsorbed Mo, and four Pt sites for hydrogen adsorption were calculated to be blocked by one adsorbed Mo atom. Based on these figures and the pH dependence of the Mo redox processes, we have proposed an electrochemical equation for the spontaneously adsorbed Mo. This electrochemical equation led us to conclude that the saturation coverage of the spontaneously adsorbed Mo is 0.25. The coverage of Mo less than 0.25, however, could not be determined voltammetrically due to the convolution of the charges of Mo and H.

• Journal of the Korean Electrochemical Society
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• v.4 no.1
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• pp.14-20
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• 2001

The Langmuir adsorption isotherms of the under-potentially deposited hydrogen (UPD H) and the over-potentially deposited hydrogen (OPD H) at the single crystal Pt(100)/0.5 M $H_2SO_4$ and 0.5 M LiOH aqueous electrolyte interfaces have been studied using the phase-shift method. The phase-shift profile $({-\varphi}\;vs.\;E)$ for the optimum intermediate frequency can be used as a useful method to estimate the Langmuir adsorption isotherm $(\theta\;vs.\;E)$ at the interfaces. The equilibrium constant (K) for the OPD H and the standard free energy $({\Delta}G_{ads})$ of the OPD H at the Pt(100)/0.5M $H_2SO_4$ aqueous electrolyte interface are $1.5\times10^{-4}$ and 21.8 kJ/mol, respectively. At the Pt(100)/0.5 LiOH aqueous electrolyte interface, K transits from 1.9(UPD H) to $6.8\times10^{-6}$(OPD H) depending on the cathode potential (E) and vice versa. Similarly, ${\Delta}G_{ads}$ transits -1.6 kJ/mol (UPD H) to 29.5 kJ/mol (OPD H) depending on E and vice versa. The transition of K and ${\Delta}G_{ads}$ is attributed to the two distinct adsorption sites of the UPD H and OPD H on the Pt(100) surface. The UPD H and the OPD H at the Pt(100) interfaces are the independent processes depending on the H adsorption sites rather than the sequential processes for the cathodic $H_2$ evolution reactions.

• Journal of the Korean Electrochemical Society
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• v.16 no.4
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• pp.211-216
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• 2013

At Pt(111), Pt(100), Pt, and Rh interfaces, the Frumkin adsorption isotherm of underpotentially deposited hydrogen (UPD H) and related electrode kinetic data are determined using the standard Gibbs energy of adsorption. The Temkin adsorption isotherm of UPD H correlating with the Frumkin adsorption isotherm of UPD H is readily determined using the correlation constants between the Temkin and Frumkin or Langmuir adsorption isotherms. At the Pt(111), Pt(100), Pt, and Rh interfaces, the lateral repulsive interaction between the UPD H species is interpreted using the interaction parameter for the Frumkin adsorption isotherm. The lateral repulsive interaction between the UPD H species at the Pt(111), Pt(100), Pt, and Rh interfaces is significantly different from the lateral attractive interaction between the overpotentially deposited hydrogen (OPD H) species at Pt, Ir, and Pt-Ir alloy interfaces.

• Journal of Magnetics
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• v.14 no.4
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• pp.144-146
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• 2009

This study examined the structure and perpendicular magnetization of FePt films grown on Pt/Fe/MgO(100) buffered Si(100) substrates by molecular beam epitaxy. The [Fe(0.17nm)/Pt(0.2nm)]$_N$ multilayers were prepared at room temperature to form a $L1_0$-FePt phase after vacuum annealing. Perpendicular magnetic anisotropy (PMA) was observed in the films after at least 15 repetitions (N = 15) of Fe/Pt deposition and annealing at $300{^{\circ}C}$ for 1 hour. Careful structural analysis of the films was carried out by x-ray diffraction and high-resolution transmission electron microscopy. These results will assist in the development of the low temperature $L1_0$- FePt deposition process, which will be essential for future extremely high density magnetic recording media.