• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.181-183
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• 2009

Comparative study of the dependence of the firing voltage of MgSrO and MgCaO protective layers on chemical composition was carried out. It was observed that the firing voltage increases when CaO/MgO or SrO/MgO ratio increases.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.25 no.5
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• pp.381-386
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• 2012

To study encapsulation method for large-area organic light emitting diodes (OLEDs), red emitting OLEDs were fabricated, on which $Alq_3$ as organic buffer layer and LiF and Al as inorganic protective layers were deposited to protect the damage of OLED by epoxy. And then the OLEDs were attached to flat glass by printing method using epoxy. The basic structure of OLED doped with rubrene of 1 vol.% as emitting layer is ITO(150 nm) / 2-TNATA(50 nm) / ${\alpha}$-NPD(30 nm) / $Alq_3$:Rubrene(30 nm) / $Alq_3$(30 nm) / LiF(0.7 nm) / Al(100 nm). In case of depositing $Alq_3$, LiF and Al and then attaching of flat glass onto OLED, current density, luminance, efficiency and driving voltage were not changed and lifetime was increased according to thickness of Al as inorganic protective layers. The lifetime of OLED/$Alq_3$/LiF/Al_4/glass structure was 139 hours increased by 15.8 times more than bare OLED of 8.8 hours and 1.6 times more than edge sealed OLED of 54.5 hours.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.109-109
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• 2010

최근 AC-PDP에서 MgO Protective Layer 위에 별도의 기능막(Functional Layer)을 사용하고 있는데, 이 기능막인 MgO 나노 입자는 장시간 구동시 AC_PDP panel내에서 plasma 방전에 의하여 MgO Protective Layer와 기능막이 방전 공간에 형성 된 이온에 의해 Sputtering 또는 재 증착 될 수 있다. 본 실험에서는 조성이 다른 기능막이 적용된 AC-PDP Test panel을 제작하여 장시간 구동 후 기능막인 두 가지 다른 MgO 나노 입자의 재형성된 형태를 주사 전자 현미경(Scanning Electron Microscope)을 통해 Surface Profile 및 구조의 변화를 분석하고, 또한 음극선 분광 분석(Cathodoluminascence)을 통하여 방전 영역과 비방전 영역의 delay time, 방전전압 및 효율 등의 전기 광학적 특성과의 관계를 분석하고자 한다.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.18 no.2
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• pp.38-43
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• 2019

Electrochemical etching is a popular process to apply metal patterning in various industries. In this study, the electrochemical etching using a patterned copper layer was proposed to fabricate multilayered structures. The process consists of electrodeposition, laser patterning, and electrochemical etching, and a repetition of this process enables the production of multilayered structures. In the fabrication of a multilayered structure, an etch factor that reflects the etched depth and pattern size should be considered. Hence, the etch factor in the electrochemical etching process using the copper layer was calculated. After the repetition process of electrochemical etching using copper layers, the surface characteristics of the workpiece were analyzed by EDS analysis and surface profilometer. As a result, multilayered structures with various shapes were successfully fabricated via electrochemical etching using copper layers.

• Membrane Journal
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• v.31 no.6
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• pp.417-425
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• 2021

As the demand for high-capacity batteries increases, there has been growing researches on the lithium metal anode with a capacity (3,860 mAh/g) of higher than that of conventional one and a low electrochemical potential (-3.040 V). In this study, using the anatase phased TiO₂ nanoparticles synthesized by hydrothermal synthesis, a PVdF-HFP/TiO₂ organic/inorganic composite material was designed and used as an interfacial protective layer for a Li metal anode. As-formed organic/inorganic-lithium composite thin film was confirmed through the crystalline structure and morphological analyses. In addition, the electrochemical test (cycle stability and voltage profile) confirmed that the protective layer of PVdF-HFP/TiO₂ composite (10 wt% TiO₂ and 1.1 ㎛ film thickness) contributed to the enhanced electrochemical performance of the lithium metal anode (Colombic efficiency retention: 90% for 77 cycles). Based on comparative test with the untreated lithium electrode, it was confirmed that our protective layer plays an important role to stabilize/improve the EC performance of the lithium metal negative electrode.

• Journal of Sensor Science and Technology
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• v.9 no.5
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• pp.389-395
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• 2000

In this paper, we propose the formation of an $Al_2O_3$ pre-layer using a protective Si-oxide layer and Al layer. Deposition of a thin film layer of aluminum onto a Si surface covered with a thin Si-oxide layer and annealing at $800^{\circ}C$ led to the growth of epitaxial $Al_2O_3$ layer on Si(111). And ${\gamma}-Al_2O_3$ layer was grown on the $Al_2O_3$ per-layer. Etching of the Si substrate by $N_2O$ gas could be avoided in the initial growth stage by the $Al_2O_3$ pre-layer. It was confirmed that the $Al_2O_3$ pre-layer was effective in improving the surface morphology of the very thin ${\gamma}-Al_2O_3$ films.

• 한국정보디스플레이학회:학술대회논문집
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• 2005.07b
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• pp.1207-1210
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• 2005

The MgO protective layer provides protection from the discharge, lowers the discharge voltage and prolongs the AC-PDP lifetime. We have investigated the characteristics of degradation of MgO protective layer, which correlates to the image-sticking[1] and the lifetime in AC-PDP. The degraded MgO have been changed the surface morphology of MgO. It was found that panel lifetime depended on degradation of MgO protective.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.07a
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• pp.890-893
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• 2001

Two-layer self bonding insulating tape consists of butyl rubber(IIR ; Isobutylene-isoprene rubber) adhesive layer and polyethylene protective film. Butyl rubber have inherent characteristics such as resistance to corrosion and water, low temperature flexibility, excellent electrical insulating properties also resistance to environmental effect such as ozone and ultraviolet. Polyethylene film was used for the purpose of good insulating properties and resistance to ozone and ultraviolet. The tape was manufactured using extrusion and calender method.

• Proceedings of the Materials Research Society of Korea Conference
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• 2002.05a
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• pp.70-70
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• 2002

• Journal of Hydrogen and New Energy
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• v.20 no.2
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• pp.116-124
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• 2009

We investigated the influences of cobalt coating deposited by DC electroplating on the ferritic stainless steel, STS 430, as a protective layer on a metallic interconnect for SOFC applications. Cobalt coated STS 430 revealed a uniform and denser-packing oxide surface and a reduced growth rate of $Cr_2O_3$ scales after oxidation at $800^{\circ}C$in air. Cobalt coating layer was oxidized to $CoCo_2O_4$ and Co containing mixed oxide spinels such as $Co_2CrO_4$, $CoCr_2O_4$, and $CoCrFeO_4$. The area specific resistance value of Co coated sample was $0.020\;{\Omega}cm^2$ lower than that of uncoated at $800^{\circ}C$ in air during 500 h. After 1000 h oxidation, cobalt oxide coating layer suppressed chromium outward diffusion.