• 대한전기학회:학술대회논문집
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• 대한전기학회 1998년도 하계학술대회 논문집 C
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• pp.911-914
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• 1998

This paper presents an algorithm that evaluates the transfer capability of composite power systems using probabilistic approaches. The reliability indices calculated by using probabilistic method are expected maximal flow, expected transfer capability margin, and expected power not supplied. In this paper, a successive linear programming technique is used to evaluate transfer capability named maximal flow. Physical constraints considered in the maximal flow problem are the limits of toad voltage, line overloading, and real & reactive power generation. Numerical results on IEEE RTS show that the proposed algorithm is effective and useful.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2009년도 춘계학술발표대회
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• pp.19.1-19.1
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• 2009

Phase change random access memory (PRAM)은 large sensing signal margin, fast programming speed, low operation voltage, high speed operation, good data retention, high scalability등을 가지는 가장 유망한 차세대 비휘발성 메모리이다. 현재 PRAM용 상변화 재료로는 주로 Ge2Sb2Te5가 사용되고 있지만 reset 전류가 높고 reliability 가 좋지 않아서 새로운 상변화 물질 연구가 필요하다. AgInSbTe (AIST)는 GST와 더불어 열에 의한 가역적 상변화를 하는 소재로 광기록 매체에서는 기록 속도가 빠르고 동작 특성이 우수하다는 특징이 있다. 본 연구에서는 XRD, 비저항측정등을 통해 온도에 따른 AIST의 물성 및 결정화 특성을 분석하고 나노 소자제작을 통해 그 전기적 특성을 평가하였다.

• 대한전기학회논문지:전력기술부문A
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• 제54권12호
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• pp.567-572
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• 2005

This paper presents a scheme to design optimal placement of phase-shifting transformers for power system congestion problems. A good design of phase-shifting transformers placement can improve total transfer capability in interconnected systems. In order to find the optimal placement of phase-shifting transformers, the power flows of the interesting transmission lines are evaluated using sequential quadratic programming technique. This algorithm considers power balance equations and security constraints such as voltage magnitudes and transmission line capacities. The proposed scheme is tested in 10 machines 39 buses and IEEE 57 buses systems. Test result shows that the proposed method can find the optimal placement of phase-shifting transformers to solver power system congestion problems.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2007년도 제38회 하계학술대회
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• pp.335-336
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• 2007

A new current-programmed pixel circuit for activematrix organic light emitting diodes (AMOLEDs), based on Organic TFTs (OTFTs), is proposed and verified by SPICE simulations. The simulation results show that the proposed pixel circuit, which is a current mirror structure consisting of five Organic TFTs and one capacitor, has reliable linear characteristics between input current and output OLED current. Also, the threshold voltage degradation of Organic TFTs due to long time operation stress is well compensated to reliable values.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2004년도 추계학술대회 논문집 전력기술부문
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• pp.169-171
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• 2004

Available transfer capability(ATC) is an important indicator of the usable amount of transmission capacity accessible by several parties for commercial trading in power transaction activities. This paper deals with an application of optimization technique for available transfer capability(ATC) calculation and analyzes the results of ATC by considering several constraints. Sequential quadratic programming(SQP) is used to calculate the ATC problem with state-steady security constraints. The proposed method is applied to 10 machines 39 buses model systems to show its effectiveness.

• JSTS:Journal of Semiconductor Technology and Science
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• 제8권2호
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• pp.128-133
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• 2008

Phase-change random access memory (PRAM) chip cell phase of amorphous state is rapidly changed to crystal state above 160 Celsius degree within several seconds during Infrared (IR) reflow. Thus, on-board programming method is considered for PRAM chip programming. We demonstrated the functional 512Mb PRAM with 90nm technology using several novel core circuits, such as metal-2 line based global row decoding scheme, PN-diode cells based BL discharge (BLDIS) scheme, and PMOS switch based column decoding scheme. The reverse-state standby current of each PRAM cell is near 10 pA range. The total leak current of 512Mb PRAM chip in standby mode on discharging state can be more than 5 mA. Thus in the proposed BLDIS control, all bitlines (BLs) are in floating state in standby mode, then in active mode, the activated BLs are discharged to low level in the early timing of the active period by the short pulse BLDIS control timing operation. In the conventional sense amplifier, the simultaneous switching activation timing operation invokes the large coupling noise between the VSAREF node and the inner amplification nodes of the sense amplifiers. The coupling noise at VSAREF degrades the sensing voltage margin of the conventional sense amplifier. The merit of the proposed sense amplifier is almost removing the coupling noise at VSAREF from sharing with other sense amplifiers.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제49권1호
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• pp.1-7
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• 2000

The SNOSFET memory devices with ultrathin ONO(tunnel oxide-nitride-blocking oxide) gate dielectric were fabricated using n-well CMOS process and investigated its characteristics. The thicknesses of tunnel oxide, nitride and blocking oxide were $23{\AA},\; 53{\AA}\; and\; 33{\AA}$, respectively. Auger analysis shows that the ONO layer is made up of $SiO_2(upper layer of blocking oxide)/O-rich\; SiO_x\N\_y$. It clearly shows that the converting layer with $SiO_x\N\_y(lower layer of blocking oxide)/N-rich SiO_x\N\_y(nitride)/O-rich SiO_x\N\_y(tunnel oxide)$. It clearly shows that the converting layer with $SiO_x\N\_y$ phase exists near the interface between the blocking oxide and nitride. The programming condition of +8 V, 20 ms, -8 V, 50 ms is determined and data retention over 10 years is obtained. Under the condition of 8 V programming, it was confirmed that the modified Fowler-Nordheim tunneling id dominant charge transport mechanism. The programmed threshold voltage is distributed less than 0.1 V so that the reading error of memory stated can be minimized. An $8\times8$ NAND type flash EEPROM with SONOSFET memory cell was designed and simulated with the extracted SPICE parameters. The sufficient read cell current was obtained and the upper limit of $V_{TH}$ for write state was over 2V.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.427-427
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• 2012

Ferroelectric-gate field effect transistor based memory using a nanowire as a conducting channel offers exceptional advantages over conventional memory devices, like small cell size, low-voltage operation, low power consumption, fast programming/erase speed and non-volatility. We successfully fabricated ferroelectric nonvolatile memory devices using both n-type and p-type Si nanowires coated with organic ferroelectric poly(vinylidene fluoride-trifluoroethylene) [P(VDF-TrFE)] via a low temperature fabrication process. The devices performance was carefully characterized in terms of their electrical transport, retention time and endurance test. Our p-type Si NW ferroelectric memory devices exhibit excellent memory characteristics with a large modulation in channel conductance between ON and OFF states exceeding $10^5$; long retention time of over $5{\times}10^4$ sec and high endurance of over 105 programming cycles while maintaining ON/OFF ratio higher $10^3$. This result offers a viable way to fabricate a high performance high-density nonvolatile memory device using a low temperature fabrication processing technique, which makes it suitable for flexible electronics.

• 한국정보전자통신기술학회논문지
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• 제10권6호
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• pp.558-569
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• 2017

본 논문에서는 MCU 내장형 1.5V 단일전원 256Kb EEPROM IP는 배터리 응용을 위해 설계되었다. 기존의 body-potential 바이어싱 회로를 사용하는 cross-coupled VPP (Boosted Voltage) 전하펌프회로는 erase와 program 모드에서 빠져나올 때 5V cross-coupled PMOS 소자에 8.53V의 고전압이 걸리면서 junction breakdown이나 gate oxide breakdown에 의해 소자가 파괴될 수 있다. 그래서 본 논문에서는 cross-coupled 전하펌프회로의 출력 노드는 VDD로 프리차징시키는 동시에 펌핑 노드들을 각 펌핑 단의 입력전압으로 프리차징하므로 5V PMOS 소자에 5.5V 이상의 고전압이 걸리지 않도록 하므로 breakdown이 일어나는 것을 방지하였다. 한편 256Kb을 erase하거나 program하는 시간을 줄이기 위해 all erase, even program, odd program과 all program 모드를 지원하고 있다. 또한 cell disturb 테스트 시간을 줄이기 위해 cell disturb 테스트 모드를 이용하여 256Kb EEPROM 셀의 disturb를 한꺼번에 인가하므로 disturb 테스트 시간을 줄였다. 마지막으로 이 논문에서는 erase-verify-read 모드에서 40ns의 cycle 시간을 만족하기 위해 CG disable 시간이 빠른 CG 구동회로는 새롭게 제안되었다.

• JSTS:Journal of Semiconductor Technology and Science
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• 제17권2호
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• pp.167-173
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• 2017

In this paper, the characterization of the vertical position of trapped charges in the charge-trap flash (CTF) memory is performed in the novel CTF memory cell with gate-all-around structure using technology computer-aided design (TCAD) simulation. In the CTF memories, injected charges are not stored in the conductive poly-crystalline silicon layer in the trapping layer such as silicon nitride. Thus, a reliable technique for exactly locating the trapped charges is required for making up an accurate macro-models for CTF memory cells. When a programming operation is performed initially, the injected charges are trapped near the interface between tunneling oxide and trapping nitride layers. However, as the program voltage gets higher and a larger threshold voltage shift is resulted, additional charges are trapped near the blocking oxide interface. Intrinsic properties of nitride including trap density and effective capture cross-sectional area substantially affect the position of charge centroid. By exactly locating the charge centroid from the charge distribution in programmed cells under various operation conditions, the relation between charge centroid and program operation condition is closely investigated.