• Title/Summary/Keyword: Process Chamber

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Experimental Study of Frost Heaving using Temperature Controlled Triaxial Cell (투명 온도제어형 삼축셀을 이용한 흙의 동상 실내실험)

  • Ryu, Byung-Hyun;Jin, Hyun-Woo;Lee, Jangguen
    • Journal of the Korean GEO-environmental Society
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    • v.17 no.6
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    • pp.23-31
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    • 2016
  • Nowadays abnormal coldness happens frequently in Korea and frost heaving causes unexpected ground deformation which results in severe problems for structures such as roadway, railroad and cutoff slope. 'Frost heave' as one of the primary phenomenon is considered to be an important factor together with 'adfreeze bond-strength' and 'creep deformation' for structural design process in permafrost area. Therefore, the fundamental study for frost heave has to be preceded for design of geo-structures in cold region. While various experimental apparatuses have been developed, there still exist a certain level of limitation to evaluate the frost-heave characteristics as design parameters. There are no standard testing method and criteria for analyzing frost heaving in Korea because temperature controlled testing apparatuses including a freezing chamber are expensive. In this paper, a new standard freezing and thawing testing apparatus is introduced, which simulates various freezing and thawing conditions in a soil specimen by using a temperature controlled triaxial cell. Frost heaving tests were performed to assess the new testing apparatus and experimental procedure to evaluate frost heaving for soils is proposed.

Abberant Root Morphology in the Permanent First Molars : Case Reports (제1대구치에서 관찰되는 비정형적 치근형태에 대한 증례보고)

  • Lee, Eunkyoung;Kim, Youngjin;Kim, Hyunjung;Nam, Soonhyeun
    • Journal of the korean academy of Pediatric Dentistry
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    • v.42 no.2
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    • pp.172-179
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    • 2015
  • The developmental mechanism of root formation is a complex process. Hereditary and environmental factors may affect the morphology of the developing root. A total of 12 cases was presented with permanent first molars with abberant root morphology. Clinically, these teeth appeared as a normal crown. However, radiographically, the root was slender, twisted and characterized by irregular lengths. In addition, root trunk length was shorter and pulp chamber was obliterated. In these cases, periapical radiolucency and loss of lamina dura were often observed. In 6 cases, an abnormal root of the primary second molars were also present, as well as root malformation of permanent first molars. In 3 cases, permanent central incisors also had a dysmorphic crown. These cases almost all had medical history, such as premature birth, brain infection or congenital heart disease in infants. The present paper describes cases of permanent first molars with an abnormal root that are rarely reported in literature. This case may intensify the variation in the permanent first molar and is intended to reinforce the clinician's awareness of rare morphology of the roots.

The surface kinetic properties between $BCl_3/Cl_2$/Ar plasma and $Al_2O_3$ thin film

  • Yang, Xue;Kim, Dong-Pyo;Um, Doo-Seung;Kim, Chang-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.169-169
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    • 2008
  • To keep pace with scaling trends of CMOS technologies, high-k metal oxides are to be introduced. Due to their high permittivity, high-k materials can achieve the required capacitance with stacks of higher physical thickness to reduce the leakage current through the scaled gate oxide, which make it become much more promising materials to instead of $SiO_2$. As further studying on high-k, an understanding of the relation between the etch characteristics of high-k dielectric materials and plasma properties is required for the low damaged removal process to match standard processing procedure. There are some reports on the dry etching of different high-k materials in ICP and ECR plasma with various plasma parameters, such as different gas combinations ($Cl_2$, $Cl_2/BCl_3$, $Cl_2$/Ar, $SF_6$/Ar, and $CH_4/H_2$/Ar etc). Understanding of the complex behavior of particles at surfaces requires detailed knowledge of both macroscopic and microscopic processes that take place; also certain processes depend critically on temperature and gas pressure. The choice of $BCl_3$ as the chemically active gas results from the fact that it is widely used for the etching o the materials covered by the native oxides due to the effective extraction of oxygen in the form of $BCl_xO_y$ compounds. In this study, the surface reactions and the etch rate of $Al_2O_3$ films in $BCl_3/Cl_2$/Ar plasma were investigated in an inductively coupled plasma(ICP) reactor in terms of the gas mixing ratio, RF power, DC bias and chamber pressure. The variations of relative volume densities for the particles were measured with optical emission spectroscopy (OES). The surface imagination was measured by AFM and SEM. The chemical states of film was investigated using X-ray photoelectron spectroscopy (XPS), which confirmed the existence of nonvolatile etch byproducts.

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A Study of Process factors on the Recycling of Reactive Metal Scraps in Plasma Arc Remelting (Plasma Arc Remelting에서 활성 금속 Scrap 재활용에 미치는 공정인자의 연구)

  • Jung, Jae-Young;Sohn, Ho-Sang
    • Resources Recycling
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    • v.26 no.6
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    • pp.3-9
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    • 2017
  • In this study, plasma arc remelting behaviors according to arc current, arc voltage, and types of plasma gas were investigated using Kroll processed Ti sponges as anode. In the discharge pressure range of vacuum pump ($200{\sim}300kgf/cm^2$), the arc voltage did not vary greatly with the increase of discharge pressure at a given arc length. This means that the pressure in the vacuum chamber during operation hardly changes and the atmospheric pressure maintains. Under various conditions of arc currents (700~900A), the arc voltage slightly increased with arc current. The effects of anode materials and operational variables on the arc length-arc voltage relationship were compared with the results in previous studies. When the atmospheric gas changed from argon to helium, double effect of improvement on the output of the steady state was observed. The increase of output in the plasma arc device was accompanied by an increase in the melting rate of the Ti sponge and the quality of the ingot surface was also improved. The plasma arc remelting of the new scrap titanium and the old scrap zirconium alloy could result in the fabrication of an ingot with high surface quality.

Pressurization Characteristics of Piezoelectric-Hydraulic Pump Adopting a Ball-Thin Plate Spring Type Check Valve (볼-박판 스프링 형 체크밸브가 적용된 압전유압펌프의 가압 특성)

  • Hwang, Yong-Ha;Hwang, Jai-Hyuk;Bae, Jae-Sung
    • Journal of Aerospace System Engineering
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    • v.12 no.2
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    • pp.7-14
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    • 2018
  • In this study, a new check valve was studied to improve the load pressure of a brake system with a small piezoelectric-hydraulic pump. During the pressurization process, the steady-state pressure at the load is affected by the ratio of the cross-sectional area of the check valve the chamber pressure and load pressure. Since the flow path cover of the check valve is made wider than the cross-sectional area of the output flow to prevent backflow, a method of reducing the area ratio is proposed for a higher load pressure by mounting an additional mass to a thin plate spring type check valve. To identify the effect of mounting an additional mass to the existing check valve on the load pressure, a simple brake system with a small piezoelectric-hydraulic pump was modeled using a commercial code AMESim. The AMESim modeling was verified by comparing the simulation results with the experimental results of the pump the existing check valve. The additional mass was added to the verified AMESim modeling and higher load pressure was able to be obtained through simulation. The 35% performance improvement in load pressure identified by carrying out pressurization test of the brake system after adopting the new check valve the small piezoelectric-hydraulic pump.

A Comparative Study on Degradation of BTEX Vapor by O3/UV, TiO2/UV, and O3/TiO2/UV System with Operating Conditions (운전조건에 따른 O3/UV, TiO2/UV 및 O3/TiO2/UV 시스템의 BTEX 증기처리에 관한 비교 연구)

  • Kim, Kyoung-Jin;Park, Ok-Hyun
    • Journal of Korean Society for Atmospheric Environment
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    • v.24 no.1
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    • pp.91-99
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    • 2008
  • A multilayer tower-type photoreactor, in which $TiO_2$-coated glass-tubes were installed, was used to measure the vapor-phase BTEX removal efficiencies by ozone oxidation ($O_3$/UV), photocatalytic oxidation ($TiO_2$/UV) and the combination of ozone and photocatalytic oxidation ($O_3/TiO_2$/UV) process, respectively. The experiments were conducted under various relative humidities, temperatures, ozone concentrations, gas flow rates and BTEX concentrations. As a result, the BTEX removal efficiency and the oxidation rate by $O_3/TiO_2$/UV system were highest, compared to $O_3$/UV and $TiO_2$/UV system. The $O_3/TiO_2$/UV system accelerated the low oxidation rate of low-concentration organic compounds and removed organic compounds to a large extent in a fixed volume of reactor in a short time. Therefore, $O_3/TiO_2$/UV system as a superimposed oxidation technology was developed to efficiently and economically treat refractory VOCs. Also, this study demonstrated feasibility of a technology to scale up a photoreactor from lab-scale to pilot-scale, which uses (i) a separated light-source chamber and a light distribution system, (ii) catalyst fixing to glass-tube media, and (iii) unit connection in series and/or parallel. The experimental results from $O_3/TiO_2$/UV system showed that (i) the highest BTEX removal efficiencies were obtained under relative humidity ranging from 50 to 55% and temperature ranging from 40 to $50^{\circ}C$, and (ii) the removal efficiencies linearly increased with ozone dosage and decreased with gas flow rate. When applying Langmuir-Hinshelwood model to $TiO_2$/UV and $O_3/TiO_2$/UV system, reaction rate constant for $O_3/TiO_2$/UV system was larger than that for $TiO_2$/UV system, however, it was found that adsorption constant for $O_3/TiO_2$/UV system was smaller than that for $TiO_2$/UV system due to competitive adsorption between organics and ozone.

Fabrication of Large Area Transmission Electro-Absorption Modulator with High Uniformity Backside Etching

  • Lee, Soo Kyung;Na, Byung Hoon;Choi, Hee Ju;Ju, Gun Wu;Jeon, Jin Myeong;Cho, Yong Chul;Park, Yong Hwa;Park, Chang Young;Lee, Yong Tak
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.220-220
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    • 2013
  • Surface-normal transmission electro-absorption modulator (EAM) are attractive for high-definition (HD) three-dimensional (3D) imaging application due to its features such as small system volume and simple epitaxial structure [1,2]. However, EAM in order to be used for HD 3D imaging system requires uniform modulation performance over large area. To achieve highly uniform modulation performance of EAM at the operating wavelength of 850 nm, it is extremely important to remove the GaAs substrate over large area since GaAs material has high absorption coefficient below 870 nm which corresponds to band-edge energy of GaAs (1.424 eV). In this study, we propose and experimentally demonstrate a transmission EAM in which highly selective backside etching methods which include lapping, dry etching and wet etching is carried out to remove the GaAs substrate for achieving highly uniform modulation performance. First, lapping process on GaAs substrate was carried out for different lapping speeds (5 rpm, 7 rpm, 10 rpm) and the thickness was measured over different areas of surface. For a lapping speed of 5 rpm, a highly uniform surface over a large area ($2{\times}1\;mm^2$) was obtained. Second, optimization of inductive coupled plasma-reactive ion etching (ICP-RIE) was carried out to achieve anisotropy and high etch rate. The dry etching carried out using a gas mixture of SiCl4 and Ar, each having a flow rate of 10 sccm and 40 sccm, respectively with an RF power of 50 W, ICP power of 400 W and chamber pressure of 2 mTorr was the optimum etching condition. Last, the rest of GaAs substrate was successfully removed by highly selective backside wet etching with pH adjusted solution of citric acid and hydrogen peroxide. Citric acid/hydrogen peroxide etching solution having a volume ratio of 5:1 was the best etching condition which provides not only high selectivity of 235:1 between GaAs and AlAs but also good etching profile [3]. The fabricated transmission EAM array have an amplitude modulation of more than 50% at the bias voltage of -9 V and maintains high uniformity of >90% over large area ($2{\times}1\;mm^2$). These results show that the fabricated transmission EAM with substrate removed is an excellent candidate to be used as an optical shutter for HD 3D imaging application.

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Development of Induction Brazing System for Sealing Instrumentation Feedthrough Part of Nuclear Fuel Test Rig (핵연료조사리그 계장선 통과부위의 밀봉을 위한 유도 브레이징 시스템 개발)

  • Hong, Jintae;Kim, Ka-Hye;Heo, Sung-Ho;Ahn, Sung-Ho;Joung, Chang-Young;Son, Kwang-Jae;Jung, Yang-Il
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.37 no.12
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    • pp.1573-1579
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    • 2013
  • To test the performance of nuclear fuels, coolant needs to be circulated through the test rig installed in the test loop. Because the pressure and temperature of the coolant is 15.5 MPa and $300^{\circ}C$ respectively, coolant sealing is one of the most important processes in fabricating a nuclear fuel test rig. In particular, 15 instrumentation cables installed in a test rig pass through the pressure boundary, and brazing is generally applied as a sealing method. In this study, an induction brazing system has been developed using a high frequency induction heater including a vacuum chamber. For application in the nuclear field, BNi2 should be used as a paste, and optimal process variables for Ni brazing have been found by several case studies. The performance and soundness of the brazed components has been verified by a tensile test, cross section test, and sealing performance test.

An Analysis on Curriculum for Occupational Purpose of the Business Korean Language Curriculum between South Korea and China (한·중 직업교육 중심 비즈니스 한국어 교육 연구)

  • Li, Zhangpei;Park, Changun
    • Asia-pacific Journal of Multimedia Services Convergent with Art, Humanities, and Sociology
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    • v.9 no.2
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    • pp.153-161
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    • 2019
  • The purpose of this study to examine the status of Korean language education, and to examine the future direction between with korean and China. The Korean language course organized by the European Union Chamber of Commerce and Industry, which selects and conducts consignment companies through annual competition every year since 2002, In order to these goals and needs, it is imperative to develop a curriculum that enhances job skills. As Korean language education, a point that is necessary to clarify terms more clearly, which 'vocational education purpose' is widely used in the term of 'business education'. With all languages education, Korean language education is not meant to teach Korean to foreigners, but it is a process by which learners can apply Korean language learned in classroom to various situations, while outside the classroom through teaching and learning. Otherwise, the curriculum in the four-year college Korean language department in China, which is lacking in acquiring the ability to achieve the Korean language education goals and social needs. Korean language education in China is one of foreign language education and it is different from foreign language education such as English education as Minor Languages education.

Study on the Scan Field of Modified Octupole and Quadrupole Deflector in a Microcolumn (마이크로칼럼에서 변형된 4중극 디플렉터와 8중극 디플렉터의 스캔 영역 비교)

  • Kim, Young Chul;Kim, Ho-Seob;Ahn, Seong Joon;Oh, Tae-Sik;Kim, Dae-Wook
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.19 no.11
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    • pp.1-7
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    • 2018
  • In a microcolumn, a miniaturized electrostatic deflector is often adopted to scan an electron beam. Usually, a double octupole deflector is used because it can avoid excessive spherical aberrations by controlling the electron beam path close to the optical axis of the objective lens and has a wide scan field. Studies on microcolumns have been performed to improve the low throughput of an electron column through multiple column applications. On the other hand, as the number of microcolumns increases, the number of wires connected to the components of the microcolumn increases. This will result in practical problems during the process of connecting the wires to electronic controllers outside of the vacuum chamber. To reduce this problem, modified quadrupole and octupole deflectors were examined through simulation analysis by selecting an ultraminiaturized microcolumn with the Einzel lens eliminated. The modified deflectors were designed changing the size of each electrode of the conventional Si octupole deflector. The variations of the scan field and electric field strength were studied by changing the size of active electrodes to which the deflection voltage was to be applied. The scan field increased linearly with increasing deflection voltage. The scan field of the quadrupole deflector and the electric field strength at the center were calculated to be approximately 1.3 ~ 2.0 times larger than those of the octupole deflector depending on the electrode size.