• 제목/요약/키워드: Probe current

검색결과 568건 처리시간 0.026초

차세대 리소그래피 빛샘 발생을 위한 플라스마 집속 장치의 제작과 아르곤 아크 플라스마의 발생에 따른 회로 분석 및 전기 광학적 특성 연구 (Fabrication of the Plasma Focus Device for Advanced Lithography Light Source and Its Electro Optical Characteristics in Argon Arc Plasma)

  • 이수범;문민욱;오필용;송기백;임정은;홍영준;이원주;최은하
    • 한국진공학회지
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    • 제15권4호
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    • pp.380-386
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    • 2006
  • 본 연구에서는 극자외선 (Extreme Ultra Violet) 리소그래피의 빛샘원 발생을 위한 플라스 마 집속장치 (Plasma Focus Device)를 설계, 제작하였으며, 이를 이용하여 단펄스 집속 플라스마의 전류, 전압 방전 특성 및 장비의 저항, 인덕턴스의 중요 기초 연구를 수행하였다. 전압, 전류는 C-dot probe 와 B-dot probe를 이용하여 측정하였다. Anode 전극에 1.5, 2, 2.5, 3 kV의 전압을 인가하고 Diode chamber 내의 Ar 기체압력을 1 mTorr-100 Torr 로 변화시켰을 때 발생되는 전압, 전류는 300 mTorr 에서 가장 큰 값을 보였으며, 이때 측정된 LC 공진에 의한 전류 파형으로부터 계산된 시스템 내의 인덕턴스와 임피던스값은 각각 73 nH, $35 m{\Omega}$ 였다. 300 mTorr, 2.5 kV 일 때 Emission spectroscopy를 이용하여 계산한 단펄스 집속 Ar 플라스마내의 전자온도는 Local Thermodynamic Equilibrium(LTE) 가정으로부터 T=13600 K 이었고 이온밀도 및 이온화율은 각각 $N_i = 8.25{\times}10^{15}/ cc,\;{\delta}= 77.8%$ 이었다.

Role of Magnetic Field Configuration in a Performance of Extended Magnetron Sputtering System with a Cylindrical Cathode

  • Chun, Hui-Gon;Sochugov, Nikolay S.;You, Yong-Zoo;Soloviv, Andrew A.;Zakharov, Alexander N,
    • 반도체디스플레이기술학회지
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    • 제2권3호
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    • pp.19-23
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    • 2003
  • Extended unbalanced magnetron sputtering system based on the cylindrical magnetron with a rotating cathode was developed. The unbalanced configuration of magnetic field was realized by means of additional lines of permanent magnets, placed along both sides of a 89 mm outer diameter and 600 mm long cylindrical cathode. The performance of the unbalanced magnetron was assessed in terms of the ion current density and the ion-to-atom ratio incident at the substrate. Furthermore, the paper presents the comparison of the internal plasma parameters, such as the electron temperature, electron density, plasma and floating potentials, measured by a Langmuir probe in various positions from the cathode, for conventional and unbalanced constructions of the cylindrical magnetron. The plasma density and ion current density are about 3-5 times higher than those of conventional one, in the unbalanced magnetron in a 0.24 Pa Ar atmosphere with a DC cathode power of 3 kW.

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내부확산법으로 제조된 $Nb_3Sn$ 초전도 선재의 임계전류 및 n-값의 자장, 변이 의존성 (Field and Strain Dependence of the Critical Current and the n-value for an Internal-tin Processed $Nb_3Sn$ Strand)

  • 오상준;최희경;이철희;김기만
    • Progress in Superconductivity
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    • 제9권2호
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    • pp.152-156
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    • 2008
  • Detailed field and strain dependence of the critical current and the n-value for an internal-tin processed $Nb_3Sn$ strand have been measured. Both the compressive and tensile strain is applied reversibly using Walter spiral probe made of BeCu up to 0.73 %. There is a correlation between the critical current and the n-value for the $Nb_3Sn$ strand studied in this work and the field dependence of the n-value is in agreement with a recent empirical formula. It was further shown that the critical current can be reasonably well fitted by the scaling law based on strong-coupling theory of superconductivity using the relation between the critical current and the n-value.

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트위스트 피치를 고려한 Bi-2223 선재 제작과 AC 손실 측정 및 분석 (Fabrication, AC Loss Measurement and Analysis of Bi-2223 Conductors with Respect to Various Twist Pitch)

  • 장미혜;추용;임준형;주진호;고태국
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제49권11호
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    • pp.589-595
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    • 2000
  • In this papre, AC losses of Bi-2223 tapes with different twist pitch of superconducting core were fabricated, measured and analyzed. These samples produced by a powder-in-tube method are multi-filamentary tape with Ag matrix. Also, it's produced by non-twist and different twist pitch(8, 10, 13, 30, 50, 70 mn). The critical current measurement was carried out under the environment in Liquid nitrogen and in zero field by 4-probe method. And the AC loss measurement was carried out under the environment of applied time-varying transport current by transport method. From experiment, the critical current is larger non-twist than twisted filament. And, the AC loss by Norris equation is higher non-twisted tape than 13mm twisted tape. Also, it is confirmed that of AC loss of tape having non-twist pitch larger than those having differnet twist pitch.

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대향전극 스퍼트 시스템의 방전특성에 관한 연구 (A Study on the Discharge Characteristics of Facing Taget Sputtering System)

  • 이종호;이규철;남용수;이태식
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1993년도 추계학술대회 논문집
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    • pp.128-130
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    • 1993
  • This paper presents the discharge characteristics of FTS system under verious discharge condition. E1ectron temperature and electron density are studied by double probe method. The Characteristics of discharge occurrence vol-tage and discharge current are significantly affected by magnetic flux density. And the best TiN thin film is obtained at 700[Vl, 400[gauss] and 1.0[mtorr].

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구리 안정화재가 있는 YBCO 박막형 초전도 선재의 과전류 통전 특성 (Over-current characteristics of YBCO coated conductors having Cu stabilizer)

  • 임성우;두호익;김혜림;현옥배;손송호;임지현;황시돌;오성용;한병성
    • 한국초전도ㆍ저온공학회논문지
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    • 제10권1호
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    • pp.10-14
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    • 2008
  • Differently from BSCCO tapes which are fabricated by powder-in-tube method, the coated conductors are made by the evaporation of YBCO on metal substrate. Due to this structural merit, although the coated conductors are generally used for large current transportation, they are expected to be favorable to the purpose of the fault current limitation as well. In this study, using YBCO coated conductor having copper stabilizer formed by plating technique(produced by Superpower Co.), we investigated the over-current characteristics of the coated conductor. The coated conductors had 85 A $I_c$ and 90 K $T_c$. The resistance of the conductor was 0.93 $m{\Omega}/cm$ at 300 K and 0.17 $m{\Omega}/cm$ at the temperature right above $T_c$. To the coated conductors, we applied the voltages of the range from 150 $V_{rms}$ to 230 $V_{rms}$ and measured the V-I curves using four probe method. From the results, we could analyze the electric behavior of the coated conductor in flux flow state. As the current exceed $I_c$, the currents were distributed into the superconductor and metal stabilizer. The amounts of the currents shared through both current paths were calculated under the assumption that the ,Joule heating was perfectly eliminated by $LN_2$ surrounding the conductor. Finally, the condition for the stable current flowing state which does not affect the conductor was established from the analysis on the over-current characteristics.

서브 마이크로 구조를 가진 실리콘 표면의 마찰 특성 연구 (Study on Frictional Characteristics of Sub-micro Structured Silicon Surfaces)

  • 한지희;한규범;장동영;안효석
    • Tribology and Lubricants
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    • 제33권3호
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    • pp.92-97
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    • 2017
  • The understanding of the friction characteristics of micro-textured surface is of great importance to enhance the tribological properties of nano- and micro-devices. We fabricate rectangular patterns with submicron-scale structures on a Si wafer surface with various pitches and heights by using a focused ion beam (FIB). In addition, we fabricate tilted rectangular patterns to identify the influence of the tilt angle ($45^{\circ}$ and $135^{\circ}$) on friction behaviour. We perform the friction test using lateral force microscopy (LFM) employing a colloidal probe. We fabricate the colloidal probe by attaching a $10{\pm}1-{\mu}m$-diameter borosilicate glass sphere to a tipless silicon cantilever by using a ultraviolet cure adhesive. The applied normal loads range between 200 nN and 1100 nN and the sliding speed was set to $12{\mu}m/s$. The test results show that the friction behavior varied depending on the pitch, height, and tilt angle of the microstructure. The friction forces were relatively lower for narrower and deeper pitches. The comparison of friction force between the sub-micro-structured surfaces and the original Si surface indicate an improvement of the friction property at a low load range. The current study provides a better understanding of the influence of pitch, height, and tilt angle of the microstructure on their tribological properties, enabling the design of sub-micro- and micro-structured Si surfaces to improve their mechanical durability.

Turning STEP-NC(ISO14649) 정보를 기반한 접촉식 OMM(On-Machine Measurement) Inspection planning에 대한 연구 (A Study on the Tactile Inspection Planning for OMM based on Turning STEP-NC information (ISO14649))

  • 임충일
    • 한국경영과학회:학술대회논문집
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    • 한국경영과학회/대한산업공학회 2003년도 춘계공동학술대회
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    • pp.208-216
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    • 2003
  • ISO 14649 (data model for STEP-NC) is a new interface scheme or language for CAD-CAM-CNC chain under established by ISO TC184 SCI. Up to this point, the new language is mainly made for milling and turning, and other processes such as EDM will be completed in the future. Upon completion, it will be used as the international standard language for e-manufacturing paradigm by replacing the old machine-level language, so called M&G code used since 1950's. With the rich information contents included in the new language, various intelligent functions can be made by the CNC as the CNC knows what-to-make and how-to-make. In particular, On-Machine Inspection required for quality assurance in the machine level, can be done based on the information of feature­based tolerance graph. Previously, On-Machine inspection has been investigated mainly for milling operation, and only a few researches were made for turning operation without addressing the data model. In this thesis, we present a feature-based on-machine inspection process by the 4 Tasks: 1) proposing a new schema for STEP-NC data model, 2) converting the conventional tolerance scheme into that of STEP-NC, 3) modifying the tolerance graph such that the tolerance can be effectively measured by the touch probe on the machine, and 4) generating collision-free tool path for actual measurement. Task 1 is required for the incorporation of the presented method in the ISO 14649, whose current version does not much include the detailed schema for tolerance. Based on the presented schema, the tolerance represented in the conventional drafting can be changed to that of STEP-NC (Task 2). A special emphasis was given to Task 3 to make the represented tolerance accurately measurable by the touch probe on the machine even if the part setup is changed. Finally, Task 4 is converting the result of Task into the motion of touch probe. The developed schema and algorithms were illustrated by several examples including that of ISO 14649 Part 12.

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