• Title/Summary/Keyword: Power Mask

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60 MHz/2 MHz Dual-Frequency Capacitive Coupled Plasma에서 Pulse-Time Modulation을 이용한 $SiO_2$의 식각특성

  • Kim, Hoe-Jun;Jeon, Min-Hwan;Yang, Gyeong-Chae;Yeom, Geun-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.307-307
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    • 2013
  • 초고집적 회로에 적용되는 반도체 소자의critical dimension (CD)이 수 nano 사이즈로 줄어들고 있기 때문에, 다양한 물질의 식각을 할 때, 건식식각의 중요성이 더 강조되고 있다. 특히 $SiO_2$와 같은 유전체 물질을 식각할 때, plasma process induced damages (P2IDs)가 관찰되어 왔고, 이러한 P2IDs를 줄이기 위해, pulsed-time modulation plasma가 광범위하게 연구되어 왔다. Pulsed plasma는 정기적으로 radio frequency (RF) power on과 off를 반복하여 rf power가 off된 동안, 평균전자 온도를 낮춤으로써, 웨이퍼로 입사되는 전하 축적을 효과적으로 줄일 수 있다. 또한 fluorocarbon plasmas를 사용하여 $SiO_2$를 식각하기 위해 Dual-Frequency Capacitive coupled plasma (DF-CCP)도 널리 연구되어 왔는데, 이것은 기존의 방법과는 다르게 plasma 밀도와 ion bombardment energy를 독립적으로 조절 가능하다는 장점이 있어서 미세 패턴을 식각할 때 효과적이다. 본 연구에서는 Source power에는 60 MHz pulsed radio frequency (RF)를, bias power에는 2 MHz continuous wave (CW) rf power가 사용된 system에서 Ar/$C_4$ F8/$O_2$ 가스 조합으로, amorphous carbon layer (ACL)가 hard mask로 사용된 $SiO_2$를 식각했다. 그리고 source pulse의 duty ratio와 pulse frequency의 효과에 따른 $SiO_2$의 식각특성을 연구하였다. 그 결과, duty ratio의 감소에 따라 $SiO_2$, ACL의 etch rate이 감소했지만, $SiO_2$/ACL의 etch selectivity는 증가하였다. 반면에 pulse frequency의 변화에 따른 두 물질의 etch selectivity는 크게 변화가 없었다. 그 이유는 pulse 조건인 duty ratio의 감소가 전자 온도 및 전자 에너지를 낮춰 $C_2F8$가스의 분해를 감소시켰으며, 이로 인해 식각된 $SiO_2$의 surface와 sidewall에 fluorocarbon polymer의 형성이 증가하였기 때문이다. 또한 duty ratio의 감소에 따라 etch selectivity뿐만 아니라 etch profile까지 향상되는 것을 확인할 수 있었다.

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Multi-Core Fiber Based Fiber Bragg Gratings for Ground Based Instruments

  • Min, Seong-Sik;Lindley, Emma;Leon-Saval, Sergio;Lawrence, Jon;Bland-Hawthorn, Joss
    • The Bulletin of The Korean Astronomical Society
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    • v.40 no.1
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    • pp.53.2-53.2
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    • 2015
  • Fiber Bragg gratings (FBGs) are the most compact and reliable method of suppressing atmospheric emission lines in the infrared for ground-based telescopes. It has been proved that real FBGs based filters were able to eliminate 63 bright sky lines with minimal interline losses in 2011 (GNOSIS). Inscribing FBGs on multi-core fibers offers advantages. Compared to arrays of individual SMFs, the multi-core fiber Bragg grating (MCFBG) is greatly reduced in size, resistant to damage, simple to fabricate, and easy to taper into a photonics lantern (PRAXIS). Multi-mode fibers should be used and the number of modes has to be large enough to capture a sufficient amount of light from the telescope. However, the fiber Bragg gratings can only be inscribed in the single-mode fiber. A photonic lantern bi-directionally converts multi-mode to single-mode. The number of cores in MCFBGs corresponds to the mode. For a writing system consisting of a single ultra-violet (UV) laser and phase mask, the standard writing method is insufficient to produce uniform MCFBGs due to the spatial variations of the field at each core within the fiber. Most significant technical challenges are consequences of the side-on illumination of the fiber. Firstly, the fiber cladding acts as a cylindrical lens, narrowing the incident beam as it passes through the air-cladding interface. Consequently, cores receive reduced or zero illumination, while the focusing induces variations in the power at those that are exposed. The second effect is the shadowing of the furthest cores by the cores nearest to the light source. Due to a higher refractive index of cores than the cladding, diffraction occurs at each core-cladding interface as well as cores absorb the light. As a result, any core that is located directly behind another in the beam path is underexposed or exposed to a distorted interference pattern from what phase mask originally generates. Technologies are discussed to overcome the problems and recent experimental results are presented as well as simulation results.

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A Study on the Costume Play Fashion (코스튬플레이 패션에 대한 연구)

  • 이은영;백천의
    • Journal of the Korea Fashion and Costume Design Association
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    • v.3 no.2
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    • pp.75-86
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    • 2001
  • The article is alms to investigate the characteristics, the originality, and the interest of fashion design of costume play, which is recently specifically popularized among young fashion mania. The influence of commercialization power of the Disneyland and the animation characters of Japanese caricatures makes the costume play to be one of the main new generation culture. Since the costume play just begins at this moment, the full understanding of the costume play is hard because of the small amount of the materials and happenings of the phenomena. However it reveals the design trends and creativity of the new generation. As the investigation of costume play fashion and the types of costume play, the following results are obtained. 1. The originality of the costume play is thought to be induced from the mask which is used against the ghost in primitive ages, the fancy parade of halloween festival, commercial advertisements of Disneyland, the Japanese caricatures, and the animation games. 2. The distinctive characteristics of Korean costume play shows the massive behaviour, which is different from the individualized costume play in Japan. This facts show the parts of the interest culture of the persons who has the equal interest. The costume play is applied as the sound showing culture, in which the young generation express and enjoy themselves by"kki" - the passion of young energy. 3. The boom of costume play introduce the increased number of costume play shop, pro model, and designer. It also introduce the interest of the new fashion design for the young generations. Thus it is expected the new fashion infra structure in near future.ar future.

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Metal Gate Electrode in SiC MOSFET (SiC MOSFET 소자에서 금속 게이트 전극의 이용)

  • Bahng, W.;Song, G.H.;Kim, N.K.;Kim, S.C.;Seo, K.S.;Kim, H.W.;Kim, E.D.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07a
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    • pp.358-361
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    • 2002
  • Self-aligned MOSFETS using a polysilicon gate are widely fabricated in silicon technology. The polysilicon layer acts as a mask for the source and drain implants and does as gate electrode in the final product. However, the usage of polysilicon gate as a self-aligned mask is restricted in fabricating SiC MOSFETS since the following processes such as dopant activation, ohmic contacts are done at the very high temperature to attack the stability of the polysilicon layer. A metal instead of polysilicon can be used as a gate material and even can be used for ohmic contact to source region of SiC MOSFETS, which may reduce the number of the fabrication processes. Co-formation process of metal-source/drain ohmic contact and gate has been examined in the 4H-SiC based vertical power MOSFET At low bias region (<20V), increment of leakage current after RTA was detected. However, the amount of leakage current increment was less than a few tens of ph. The interface trap densities calculated from high-low frequency C-V curves do not show any difference between w/ RTA and w/o RTA. From the C-V characteristic curves, equivalent oxide thickness was calculated. The calculated thickness was 55 and 62nm for w/o RTA and w/ RTA, respectively. During the annealing, oxidation and silicidation of Ni can be occurred. Even though refractory nature of Ni, 950$^{\circ}C$ is high enough to oxidize it. Ni reacts with silicon and oxygen from SiO$_2$ 1ayer and form Ni-silicide and Ni-oxide, respectively. These extra layers result in the change of capacitance of whole oxide layer and the leakage current

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Assessment of Plastic Deformation in Al6061 Alloy using Acoustic Nonlinearity of Laser-Generated Surface Wave (레이저 여기 표면파의 음향비선형성을 이용한 Al6061 합금의 소성변형 평가)

  • Kim, Chung-Seok;Nam, Tae-Hyung;Choi, Sung-Ho;Jhang, Kyung-Young
    • Journal of the Korean Society for Nondestructive Testing
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    • v.32 no.1
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    • pp.20-26
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    • 2012
  • The objective of this study is to assess plastic deformation in aluminium alloy by acoustic nonlinearity of laser-generated surface waves. A line-arrayed laser beam made by high-power pulsed laser and mask slits is utilized to generate the narrowband surface wave and the frequency characteristics of laser-generated surface waves are controlled by varying the slit opening width and slit interval of mask slits. Various degrees of tensile deformation were induced by interrupting the tensile tests so as to obtain aluminum specimens with different degrees of plastic deformation. The experimental results show that the acoustic nonlinear parameter of a laser-generated surface wave increased with the level of tensile deformation and it has a good correlation with the results of micro-Vickers hardness test and electron backscatter diffraction (EBSD) test. Consequently, acoustic nonlinearity of laser-generated surface wave could be potential to characterize plastic deformation of aluminum alloy.

An Integrated Mach-Zehnder Interferometric Sensor based on Rib Waveguides (Rib 도파로 기반 집적 마흐젠더 간섭계 센서)

  • Choo, Sung-Joong;Park, Jung-Ho;Shin, Hyun-Joon
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.47 no.4
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    • pp.20-25
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    • 2010
  • An integrated Mach-Zehnder interferometric sensor operating at 632.8 nm was designed and fabricated by the technology of planar rib waveguides. Rib waveguide based on silica system ($SiO_2-SiO_xN_y-SiO_2$) was geometrically designed to have single mode operation and high sensitivity. It was structured by semiconductor fabrication processes such as thin film deposition, photolithography, and RIE (Reactive Ion Etching). With the power observation, propagation loss measurement by cut-back method showed about 4.82 dB/cm for rib waveguides. Additionally the chromium mask process for an etch stop was employed to solve the core damaging problem in patterning the sensing zone on the chip. Refractive index measurement of water/ethanol mixture with this device finally showed a sensitivity of about $\pi$/($4.04{\times}10^{-3}$).

An Advanced Contrast Enhancement Using Partially Overlapped Sub-Block Histogram Equalization (서브블록 히스토그램 등화기법을 이용한 개선된 콘트래스트 강화 알고리즘)

  • Kim, Joung-Youn;Kim, Lee-Sup;Hwang, Seung-Ho
    • Journal of the Korean Institute of Telematics and Electronics S
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    • v.36S no.12
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    • pp.58-66
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    • 1999
  • In this paper, an advanced histogram equalization algorithm for contrast enhancement is presented. Histogram equalization is the most popular algorithm. Global histogram equalization is simple and fast, but its contrast enhancement power is relatively low. Local histogram equalization, on the other hand, can enhance overall contrast more effectively, but the complexity of computation required is very high. In this paper, a low pass filter type mask is used to get a sub-block histogram equalization function to more simply produce the high contrast. The low pass filter type mask is realized by partially overlapped sub-block histogram equalization (POSHE). With the proposed method. the computation overhead is reduced by a factor of about one hundred compared to that of local histogram equalization while still achieving high contrast.

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Transparent Oxide Thin Film Transistors with Transparent ZTO Channel and ZTO/Ag/ZTO Source/Drain Electrodes

  • Choi, Yoon-Young;Choi, Kwang-Hyuk;Kim, Han-Ki
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.127-127
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    • 2011
  • We investigate the transparent TFTs using a transparent ZnSnO3 (ZTO)/Ag/ZTO multilayer electrode as S/D electrodes with low resistivity of $3.24{\times}10^{-5}$ ohm-cm, and high transparency of 86.29% in ZTO based TFTs. The Transparent TFTs (TTFTs) are prepared on glass substrate coated 100 nm of ITO thin film. On atomic layer deposited $Al_2\;O_3$, 50 nm ZTO layer is deposited by RF magnetron sputtering through a shadow mask for channel layer using ZTO target with 1 : 1 molar ratio of ZnO : $SnO_2$. The power of 100W, the working pressure of 2mTorr, and the gas flow of Ar 20 sccm during the ZTO deposition. After channel layer deposition, a ZTO (35 nm)/Ag (12 nm)/ZTO(35 nm) multilayer is deposited by DC/RF magnetron sputtering to form transparent S/D electrodes which are patterned through the shadow mask. Devices are annealed in air at 300$^{\circ}C$ for 30 min following ZTO deposition. Using UV/Visible spectrometer, the optical transmittances of the TTFT using ZTO/Ag/ ZTO multilayer electrodes are compared with TFT using Mo electrode. The structural properties of ZTO based TTFT with ZTO/Ag/ZTO multilayer electrodes are analyzed by high resolution transmission electron microscopy (HREM) and X-ray photoelectron spectroscopy (XPS). The transfer and output characterization of ZTO TTFTs are examined by a customized probe station with HP4145B system in are.

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Proposal and Analysis of Distributed Reflector-Laser Diode Integrated with an Electroabsorption Modulator

  • Kwon, Oh Kee;Beak, Yong Soon;Chung, Yun C.;Park, Hyung-Moo
    • ETRI Journal
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    • v.35 no.3
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    • pp.459-468
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    • 2013
  • A novel integrated laser, that is, a distributed reflector laser diode integrated with an electroabsorption modulator, is proposed to improve the output efficiency, single-mode stability, and chirp. The proposed laser can be realized using the selective metalorganic vapor phase epitaxy technique (that is, control of the width of the insulating mask), and its fabrication process is almost the same as the conventional electroabsorption modulated laser (EML) process except for the asymmetric coupling coefficient structure along the cavity. For our analysis, an accurate time-domain transfer-matrix-based laser model is developed. Based on this model, we perform steady-state and large-signal analyses. The performances of the proposed laser, such as the output power, extinction ratio, and chirp, are compared with those of the EML. Under 10-Gbps NRZ modulation, we can obtain a 30% higher output power and about 50% lower chirp than the conventional EML. In particular, the simulation results show that the chirp provided by the proposed laser can appear to have a longer wavelength side at the leading edge of the pulse and a shorter wavelength side at the falling edge.

A study on fabrication and characterization of coupling optical switch (결합형 광 스위치 제작 및 특성 연구)

  • 강기성;소대화
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1995.11a
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    • pp.351-356
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    • 1995
  • A optical switch which on the LiNbO$_3$substrate is fabricated by using proton exchange method and self-alignet method. The annealing at 400[$^{\circ}C$] was carried out to control waveguide width and depth. A self-aligned method, which doesn\`t need the additional mask precesses, was applied to simplify the fabrication processes and to maximize efficiency of electric field application. The depths of the two annealed optical waveguides, which were measured by using ${\alpha}$-step, ware 1.435[K${\AA}$] and 1,380[K${\AA}$]. Using ${\alpha}$-step facility, we examined that the width of waveguides is increased from 5[$\mu\textrm{m}$] to 6.45[$\mu\textrm{m}$] and 6.3[$\mu\textrm{m}$] due to the annealing effects. The process of proton exchange was done at 400[$^{\circ}C$] for 60[min] and annealing process was done at 400[$^{\circ}C$] for 60[min]. The high speed optical modulator has very good figures of merits: the measured voltage of the input waveguide power is 3.5[V], the voltage of the coupling waveguide power is 3.9[mV], and -29.5[dB] crosstalk and 8[V] switching voltage were achieved.

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