• Restorative Dentistry and Endodontics
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• v.19 no.2
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• pp.611-620
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• 1994

The purpose of this study was to evaluate the effect of post space preparation on apical sealing according to the methods and time of gutta percha removal. Forty six extracted single rooted teeth were selected for this study. Forty teeth were used as experimental groups and six teeth as control groups. Forty teeth were routinely prepared by step-back method and obturated with gutta percha cones and zinc oxide-eugenol cement using lateral condensation. All obturated teeth were divided into 4 groups of 10 teeth each. In each group of 1, 2, 3, heated plugger, gate glidden drill and chloroform and K-file were used respectively for post space preparation by removing the gutta percha immediately after obturation. In group 4, post space were prepared with gate glidden drill one week after obturation. In all experimental groups, the post space were prepared so that 4mm of apical gutta percha remained. After post space preparation, apical leakage were measured with electrochemical method for 28 days and analyzed statistically. The following results were obtained ; 1. No statistically significant differences in apical leakage were occured among the experimental groups using heated plugger, gate glidden drill and chloroform and K-file to remove the gutta percha immediately after obturation. 2. No significant difference in apical leakage was found between the teeth prepared post space immediately after obturation and those prepared 1 week after obturation. 3. In all experimental groups, the apical leakage was increased with time passage regardless of the post space preparation time and the gutta percha removal techniques.

• The Journal of the Korean dental association
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• v.55 no.8
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• pp.542-555
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• 2017

1. Diagnosis Diagnosis of Crack, Direct pulp capping 2. Access opening Find the calcified canal orifice Removal of dentin shelf Obtaining the MB2 canal (MB2, MB3, DB2) 3. Perforation repair during endodontic treatment 4. Removal of the separated files 5. Open apex treatment 6. Void removal on CWT procedure 7. Re-endodontic treatment Removal of restorative material filled in pulp chamber Post removal Identification and removal of residual gutta-perch 8. Surgical endodontic treatment In each case will overview how to use a dental microscope.

• Environmental Engineering Research
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• v.22 no.4
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• pp.377-383
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• 2017

A tube-type ceramic membrane for microfiltration was developed, and the membrane module comprised of three membranes was also applied to biological carbon and nitrogen removal processes for post-treatment. Manufacturing the microfiltration membrane was successful with the structure and boundary of the coated and support layers within the membrane module clearly observable. Total kjeldahl nitrogen removal from effluent was additionally achieved through the elimination of solids containing organic nitrogen by use of the ceramic membrane module. Removal of suspended solids and colloidal substances were noticeably improved after membrane filtration, and the filtration function of the ceramic membrane could also easily be recovered by physical cleaning. By using the ceramic membrane module, the system showed average removals of organics, nitrogen, and solids up to 98%, 80% and 99.9%, respectively. Thus, this microfiltration system appears to be an alternative and flexible option for existing biological nutrient removal processes suffering from poor settling performance due to the use of a clarifier.

• Journal of Korean Society of Water and Wastewater
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• v.31 no.4
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• pp.273-279
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• 2017

Optimal processes to remove chromaticity at E water treatment plant(WTP) mainly caused by algae of E lake in Jeju island were investigated based on lab-tests of chlorine and ozone oxidation. 42.9% of chromaticity of filtered water was removed by chlorine oxidation under pH 7.0~8.0, dose of 1.0 mg/L with contact time of 30~60 min. On the other hand, chromaticity removal was 71.4% when post-ozone dose of 0.9~1.9 mg/L and pH 9.0, while it was increased to 86.7% under post-ozone dose of 3.1~7.3 mg/L and pH 9.0. However, there was no significant chromaticity removal efficiency increase when ozone doses were higher than 5.0 mg/L regardless of feeding point(i.e., pre-ozonation and post-ozonation) and pHs(i.e., 7.0 and 9.0.) under the experimental conditions. Based on the results, chlorine oxidation using existing chlorination facilities at the WTP is recommended for lower chromaticity while ozone oxidation is recommended for higher chromaticity by installing new ozone feeding facilities.

• Journal of Korean Society of Water and Wastewater
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• v.21 no.4
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• pp.445-452
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• 2007

This study was carried out to examine effect of post-chlorine dosage reduction by ozonation and GAC process in the field plant for 3years in the "G" water purification plant in Seoul. And it is to compare GAC with BAC process in removal effects of TOC, THMs, THMFP, $UV_{254}$. As a result, chlorine dosage of ozonation and GAC(=BAC) is less demand than GAC. Seasonal reduction of chlorine demand is from about 37% to 59% with BAC, and from 24 to 46% with GAC. Higher reduction in BAC could be achieved. The efficiency of chlorine demand reduction with ozonation was depending on the organic carbon removal. $UV_{254}$ concentration is less about 0.13~0.74L/mg.m in BAC than GAC. Therefore, the combination of ozonation and GAC was more effective in reducing post-chlorine than the single GAC. TOC was also monitored, and results show that a linear relationship between TOC and chlorine demand is appropriate under each treatment process. It means that removal of organic matter(TOC) from finished water is necessary to reduce post-chlorine dosage in clear well and to minimize order of chlorine in distribution systems.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.537-537
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• 2008

Copper (Cu) has been widely used for interconnection structure in intergrated circuits because of its properties such as a low resistance and high resistance to electromigration compared with aluminuim. Damascene processing for the interconnection structure utilizes 2-steps chemical mechanical polishing(CMP). After polishing, the removal of abrasive particles on the surfaces becomes as important as the polishing process. In the paper, buffing process for the removal of colloidal silica from polished Cu wafer was proposed and demonstrated.

• Bulletin of the Korean Chemical Society
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• v.33 no.10
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• pp.3196-3202
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• 2012

Post-synthesis is used to synthesize organic hybrid inorganic mesoporous sieves. In this method, the activity and structure of the base sieve are crucial to obtain the definable hybrid materials. The chemical and physical properties of the base can be largely changed either by the final step of its synthesizing processes, by template removal which is accomplished with the oxidative thermal decomposition (burning) method or by solvent extraction method. In this paper we compared two methods for the post-synthesis of organic hybrid MCM-48. When the template was extracted with HCl/alcohol mixture, the final product showed larger pore size, larger pore volume and better crystallinity compared to the case of the thermal decomposition. The reactivity of the surface silanol group of template free MCM-48 was also checked with an alkylsilylation reagent $CH_2=CHSi(OC_2H_5)_3$. Raman and $^{29}Si$ NMR spectra of MCM-48 in the test reaction indicated that more of the organic group was grafted to the surface of the sample after the template was removed with the solvent extraction method. Direct synthesis of vinyl-MCM-48 was also investigated and its characteristics were compared with the case of post-synthesis. From the results, it was suggested that the structure and chemical reactivity can be maintained in the solvent extraction method and that organic grafting after the solvent extraction can be a good candidate to synthesize a definable hybrid porous material.

• Restorative Dentistry and Endodontics
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• v.42 no.4
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• pp.324-331
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• 2017

Objectives: This study evaluated smear layer removal by different chemical solutions used with or without ultrasonic activation after post preparation. Materials and Methods: Forty-five extracted uniradicular human mandibular premolars with single canals were treated endodontically. The cervical and middle thirds of the fillings were then removed, and the specimens were divided into 9 groups: G1, saline solution (NaCl); G2, 2.5% sodium hypochlorite (NaOCl); G3, 2% chlorhexidine (CHX); G4, 11.5% polyacrylic acid (PAA); G5, 17% ethylenediaminetetraacetic acid (EDTA). For the groups 6, 7, 8, and 9, the same solutions used in the groups 2, 3, 4, and 5 were used, respectively, but activated with ultrasonic activation. Afterwards, the roots were analyzed by a score considering the images obtained from a scanning electron microscope. Results: EDTA achieved the best performance compared with the other solutions evaluated regardless of the irrigation method (p < 0.05). Conclusions: Ultrasonic activation did not significantly influence smear layer removal.

• Journal of the Semiconductor & Display Technology
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• v.16 no.2
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• pp.55-60
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• 2017

The supercritical $CO_2$ (sc-$CO_2$) mixture and the sc-$CO_2$-based Photoresist(PR) stripping(SCPS) process were applied to the removal of the post etch/ash PR residue on aluminum patterned wafers and the results were observed by scanning of electron microscope(SEM). In the case of MDII wafers, the carbonized PR was able to be effectively removed without pre-stripping by oxygen plasma ashing by using sc-$CO_2$ mixture containing the optimum formulated additives at the proper pressure and temperature, and the same result was also able to be obtained in the case of HDII wafer. It was found that the efficiency of SCPS of ion implanted wafer improved as the temperature of SCPS was high, so a very large amount of MEA in the sc-$CO_2$ mixture could be reduced if the temperature could be increased at condition that a process permits, and the ion implanted photoresist(IIP) on the wafer was able to be removed completely without pre-treatment of plasma ashing by using the only 1 step SCPS process. By using SCPS process, PR polymers formed on sidewalls of metal conductive layers such as aluminum films, titanium and titanium nitride films by dry etching and ashing processes were removed effectively with the minimization of the corrosion of the metal conductive layers.

• Analytical Science and Technology
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• v.19 no.2
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• pp.121-130
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• 2006

In this study, silver pre-treated activated carbons are transformed using sulfuric acid. From the results of adsorption, each isotherm shows a distinct knee band, which is characteristic of microporous adsorbents with capillary condensation in micropores. In order to reveal the causes of the differences in adsorption capacity and specific surface area after the samples were washed with various strengths of sulfuric acid, surface morphology and external pore structure were investigated by SEM. X-ray diffraction patterns indicated that Ag-activated carbons show better performance for silver and silver compounds removal by post-treatment with acid. The FT-IR spectra of silver-activated carbon samples show that the acid post-treatment was consequently associated with the removal of silver with an increased surface functional group containing oxygen of the activated carbon. The type and quality of oxygen groups are determined on the method proposed by Boehm. For the chemical composition microanalysis of silver-activated carbons transformed by post-treatment with sulfuric acid, samples were analyzed by EDX.