• Journal of the Korean Applied Science and Technology
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• v.23 no.2
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• pp.169-176
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• 2006

Acrylic adhesives for automobiles protection were prepared by emulsion polymerization. Monomers used were n-butyl acrylate(BA), acrylonitrile (AN), butyl methacrylate(BMA), glycidyl methacrylate(GMA), and acrylic acid (AA). Emulsifiers used were sodium lauryl sulfate and polyoxyethylene lauryl ether, which are an anionic emulsifier and a nonionic emulsifier respectively. Potassium persulfate was used as an initiator and polyvinyl alcohol was used as a stabilizer. Emulsion polymerization was carried out in a semi-batch reactor at $70^{\circ}C$ and agitation speed was kept at 200 rpm. Water resistance, heat resistance, acid resistance, alkali resistance and smoke resistance were examined. As a result, when each 0.03 mole of GMA and AA was introduced, the adhesion properties and various above mentioned resistances of the prepared adhesives were satisfied the standard for automobiles.

• Journal of the Korean Applied Science and Technology
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• v.22 no.4
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• pp.332-338
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• 2005

This study was conducted to prepare acrylic removable protective coatings by emulsion polymerization. Monomers used were n-butyl acrylate, acrylonitrile, butyl methacrylate. Emulsifiers used were sodium lauryl sulfate and polyoxyethylene lauryl ether, which are an anionic emulsifier and a nonionic emulsifier respectively. Potassium persulfate was used as an initiator and polyvinyl alcohol was used as a stabilizer. Emulsion polymerization was carried out in a semi-batch reactor at $70^{\circ}C$ and agitation speed was 200 rpm. Tensile strength, extension, peel strength, viscosity, and solid contents of the synthesized coatings were examined. The coatings prepared with BA:AN = 60:20 (in weight ratio) satisfied the standard for automobile in terms of extension and peel strength. When the concentration of BMA was in a range of $18{\sim}23$ wt%, the prepared coatings satisfied the standard for automobile in terms of peel strength and water resistance.

• Proceedings of the KIEE Conference
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• 2002.07c
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• pp.1419-1421
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• 2002

Plasma polymerization of thiophene was carried out in a vacuum reactor with capacitively coupled electrode. This paper describes the dependence of molecular structure and electrical properties on the polymerization conditions such as plasma energy, mass flow rate and pressure. The plasma polymerized thiophene films were chracterized by FT-IR spectroscopy and SEM. The IR analysis revealed the thiophene rings are broken by the discharge energy.

• Textile Coloration and Finishing
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• v.7 no.2
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• pp.55-62
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• 1995

Plasma polymerization of Perfiuoropropene(PFP) and n-Hexane was carried out in a tubular type reactor by means of 13.56MHz radio frequency generator at the fixed RF discharge power of 25W and at the pressures of 100mTorr, 140mTorr and 200mTorr. The thin films were deposited on PAN fabrics in order to improve the dimemsional stability of woven states in hot water laundry. IR spectroscopy was used for the analysis of the structures of the thin films deposited and SEM for examination of surfaces of the fabrics. the PAN fabrics, which were coated by thin films at several experimental conditions, were immersed in boiling water for 2 hours and then the dimension stability of woven states were evaluated. In spite of very thin films, the results of surface modification were satisfactory. In general the performace of thin films by PFP was superior to that of n-Hexane.

• Proceedings of the KIEE Conference
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• 1994.07b
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• pp.1400-1402
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• 1994

Plasma polymerized thin films was prepared using an interelectrod inductively coupled gas-flow-type reactor. Styrene was chosen as the monomer to be used. This thin films were also delineated by the electron-beam apparatus with an acceleration voltage 30kV, and the pattern in the resist was developed with RIE 80 with argon gas mixture ratio, pressure and RF power. The molecular structure of thin films was investigated by GPC and FT-IR and then was discussed in relation to its quality as a resist. In the case of plasma polymerization, thickness of resist could be controlled by discharge duration and power. Also etch rate is increased as to growing pressure with RIE 80.

• Journal of Industrial Technology
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• v.25 no.A
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• pp.141-149
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• 2005

We investigated numerically the evolutions of several chemical species which are important for film growth and particle generation in the pulsed $SiH_4$ plasmas. During the plasma-on, the $SiH_x$ concentration increases with time mainly by the generation reaction from $SiH_4$, but, during the plasma-off, decreases because of the hydrogen adsorption reaction. During the plasma-on, the concentrations of negative ions increase with time by the polymerization reactions of negative ions and those become almost zero in the sheath regions because of the electrostatic repulsion. During the plasma-off, the concentrations of negative ions decrease with time by the neutralization reactions with positive ions and some negative ions can diffuse toward the sheath regions because there is no electric field inside the reactor. The polymerized negative ions of higher mass can be reduced successfully by using the pulsed plasma process.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1994.05a
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• pp.138-140
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• 1994

Plasma polymerized thin film was prepared using an interelectrod inductively coupled gas-flow-type reactor. Styrene was chosen as the monomer to be used. This thin films were also delineated by the electron-beam apparatus with an acceleration voltage 30kV, and the pattern in the resist was developed with RIE 80 with argon gas mixture ratio, pressure and RF power. The effect of charge of discharge power on growth rate and etching rate of the thin films were studied. The molecular structure of thin films were investigated by FIR and then was discussed in relation to its quality as a resist. In the case of Plasma polymerization, thickness of resist could be controlled by discharge duration and power. Also etch rate is increased as to growing argon gas and RF power with RIE 80.

• Elastomers and Composites
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• v.31 no.5
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• pp.327-334
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• 1996

A correlative analysis has been carried out to predict the average particle size of rubber dispersed phase In high impact polystyrene manufactured by bulk polymerization. To do the correlation, a mechanistic model suggested previously by the author was used for describing the size of stabilizing particles agitated under the turbulent viscous shear subranges in a prepolymerization reactor, where the rubber particles were assumed to be formed at the time of phase inversion in the reactor. Viscosities required for the model were postulated to describe the overall behavior of butadiene rubber and polystyrene mixture along the wide range of conversion. The good agreement between the model and the experimental data from a plant was quite satisfactory for the prediction of the average rubber particle size of high impact polystyrene.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1994.11a
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• pp.152-155
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• 1994

The purpose of this paper is to develope an electron beam resist by the plasma polymerization. Plasma co-polymerized resist was prepared using an interelectrode gas-flow-type reactor. And then delineated pattern in the resist was developed with gas flow type reactor using Ar and O$_2$ gas as etching gas. We study about the effects of discharge power and mixing rate of the copolymerized thin film. The characteristics of molecular structure of thin film was investigated by FT-lR, DSC and GPC, and then was discussed in relation to its quality as a resist.

• Proceedings of the KIEE Conference
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• 1991.07a
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• pp.198-200
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• 1991

In this study we fabricated thin organic polymer films on the comb-electrode by plasma polymerization methode in electrode gas flow type reactor. The dielectric constant of polymer films were increased by increasing relative humidity and we used free volume theory in order to explain the mechanism of water absorption phenomena of polymer films.