Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 1994.07b
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- Pages.1400-1402
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- 1994
A study on the resist characteristics of polystyrene by plasma polymerization( II )
플라즈마 중합법에 의해 제작된 폴리스틸렌의 레지스트 특성 조사(II)
- Jung, S.Y. (Busan Junior Col.) ;
- Jin, K.S. (Ulsan Junior Col.) ;
- Kim, D.Y. (Inha Junior Col.) ;
- Park, J.K. (Inha Univ.) ;
- Park, S.G. (Inha Univ.) ;
- Lee, D.C. (Inha Univ.)
- Published : 1994.07.21
Abstract
Plasma polymerized thin films was prepared using an interelectrod inductively coupled gas-flow-type reactor. Styrene was chosen as the monomer to be used. This thin films were also delineated by the electron-beam apparatus with an acceleration voltage 30kV, and the pattern in the resist was developed with RIE 80 with argon gas mixture ratio, pressure and RF power. The molecular structure of thin films was investigated by GPC and FT-IR and then was discussed in relation to its quality as a resist. In the case of plasma polymerization, thickness of resist could be controlled by discharge duration and power. Also etch rate is increased as to growing pressure with RIE 80.
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