• Journal of the Microelectronics and Packaging Society
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• v.22 no.4
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• pp.25-29
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• 2015

Demand for a low-cost, high-throughput, and high-resolution patterning method for fabricating devices continues to increase. The roll-to-roll (R2R) imprint lithography technique has received a great deal of attention as a means of fabricating next-generation devices. In this paper, we propose a fabrication method for polymeric planar lightwave circuit (PLC) devices that uses R2R imprint lithography. The proposed technique uses an elastomeric polydimethylsiloxane (PDMS) mold. A Si wafer with micro patterns is used as the Si master. The PDMS mold is then replicated from the Si master. By applying a precise web tension and at a given web speed, we fabricated a micro-patterned PLC device. The insertion losses were 4.0 dB for a $1{\times}2$ optical splitter. As such, the proposed method of fabricating a PLC device by the R2R process was shown to be an effective solution.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2005.10a
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• pp.91-94
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• 2005

With increasing demands for large-scale micro-optical components in the field of digital display, the establishment of large-scale fabrication technology fur polymeric patterns has become a priority. The starting point of any polymer replication process is the mold, and the mold often has flat surface. However, It is very hard to replicate large-scale micro patterns using the flat mold, because the cost of large-scale flat mold was very high, and some uniformity and releasing problems were often occurred in large scale flat molding process. In this study, a UV roll imprinting system to overcome the financial and fabrication issues of large-scale pattern replication process was designed and constructed. As a practical example of the system, a lenticular lens with radius of curvature of $223{\mu}m$ and pitch of $280{\mu}m$, which was used to provide wide viewing angle in projection TV, was designed and fabricated. The roll stamper was fabricated using direct machining process of aluminum roll base. Finally, the shape accuracy and uniformity of roll imprinted lenticular lens sheet were measured and analyzed.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2006.05a
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• pp.105-108
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• 2006

It has been issued to fabricate nano-scale patterns with large-scale in the field of digital display. Also, large-scale fabrication technology of nano pattern is very important not only for the field of digital display but also for the most of applications of the nano-scale patterns in the view of the productivity. Among the fabrication technologies, UV nano imprinting process is suitable for replicating polymeric nano-scale patterns. However, in case of conventional UV nano imprinting process using flat mold, it is not easy to replicate large areal nano patterns. Because there are several problems such as releasing, uniformity of the replica, mold fabrication and so on. In this study, to overcome the limitation of the conventional UV nano imprinting process, we proposed a continuous UV nano imprinting process using a pattern roll stamper. A pattern roll stamper that has nano-scale patterns was fabricated by attaching thin metal stamper to a roll base. A continuous UV nano imprinting system was designed and constructed. As practical examples of the process, various nano patterns with pattern size of 500, 150 and 50nm were fabricated. Finally, geometrical properties of imprinted nano patterns were measured and analyzed.