• Journal of the Korean Vacuum Society
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• v.19 no.2
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• pp.96-104
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• 2010

We suggest here a cost-effective replica fabrication method for transparent and hard molds for imprinting lithography such as NIL and S-FIL. The process starts with the use of a replica hard mold from a master, using a polymer copy as a carrier. The polymer copy as a carrier was treated by soluble process for forming anti-adhesion layer. Duplicated hard molds can eliminate direct contact between a hard master and a patterned polymer on a substrate and the generated contamination of a master during the imprinting process. The replica hard mold exhibits the glass-like properties introduced here, such as transparency and hardness, make it appropriate for nanoimprint lithography and step-and-flash imprint lithography.

• Polymer Science and Technology
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• v.18 no.5
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• pp.465-474
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• 2007

• Bulletin of the Korean Chemical Society
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• v.25 no.8
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• pp.1119-1120
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• 2004

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.34 no.4
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• pp.262-268
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• 2021

For the past several decades, various next-generation patterning methods have been developed to obtain well-designed nano-to-micro structures, such as imprint lithography, nanotransfer printing (nTP), directed self-assembly (DSA), E-beam lithography, and so on. Especially, nTP process has much attention due to its low processing cost, short processing time, and good compatibility with other patterning techniques in achieving the formation of high-resolution functional patterns. To transfer functional patterns onto desirable substrates, the use of soft materials is required for precise replication of master mold. Here, we introduce a simple and practical nTP method to create highly ordered structures using various polymeric replica materials. We found that polymethyl methacrylate (PMMA), polystyrene (PS), and polyvinylpyridine (PVP) are possible candidates for replica materials for reliable duplication of Si master mold based on systematic analysis of pattern visualization. Furthermore, we successfully obtained well-defined metal and oxide nanostructures with functionality on target substrates by using replica patterns, through deposition and transfer process. We expect that the several candidates of replica materials can be exploited for effective nanofabrication of complex electronic devices.

• Polymer(Korea)
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• v.28 no.4
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• pp.305-313
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• 2004

A vacuum pressure-difference technique for making a nano-precision replica is investigated for various applications. Master patterns for replication were fabricated using a nano-replication printing (nRP) process. In the nRP process, any picture and pattern can be replicated from a bitmap figure file in the range of several micrometers with resolution of 200nm. A liquid-state monomer is solidified by two-photon absorption (TPA) induced by a femto-second laser according to a voxel matrix scanning. After polymerization, the remaining monomers were removed simply by using ethanol droplets. And then, a gold metal layer of about 30nm thickness was deposited on the fabricated master patterns prior to polydimethylsiloxane molding for preventing bonding between the master and the polydimethylsiloxane mold. A few gold particles attached on the polydimethylsiloxane stamp during detaching process were removed by a gold selecting etchant. After fabricating the polydimethylsiloxane mold, a nano-precision polydimethylsiloxane replica was reproduced. More precise replica was produced by the vacuum pressure-difference technique that is proposed in this paper. Through this study, direct patterning on a glass plate, replicating a polydimethylsiloxane mold, and reproducing polydimethylsiloxane replica are demonstrated with a vacuum pressure-difference technique for various micro/nano-applications.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2008.11a
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• pp.127-127
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• 2008

The replica of highly ordered nano-sphere array patterns were fabricated using hot embossing method. The polymer replica was coated with silcon dioxide layer and self-assembled monolayer. Using UV nanoimprint lithography with the template, highly ordered nano-sphere array patterns were clearly fabricated on curved substrate.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2013.05a
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• pp.265-266
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• 2013

• Journal of the Korean Ceramic Society
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• v.51 no.6
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• pp.539-543
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• 2014

Foam type porous silicon carbide ceramics were fabricated by a polymer replica method using polyurethane foam, carbon black, phenol resin, and silicon powder as raw materials. The influence of the C/Si mole ratio of the ceramic slurry and heat treatment temperature on the porous silicon carbide microstructure was investigated. To characterize the microstructure of porous silicon carbide ceramics, BET, bulk density, X-ray Powder Diffraction (XRD), and Scanning Electron Microscope (SEM) analyses were employed. The results revealed that the surface area of the porous silicon carbide ceramics decreases with increased heat treatment temperature and carbon content at the $2^{nd}$ heat treatment stage. The addition of carbon to the ceramic slurry, which was composed of phenol resin and silicon powder, enhanced the direct carbonization reaction of silicon. This is ascribed to a consequent decrease of the wetting angles of carbon to silicon with increasing heat treatment temperature.

• Bulletin of the Korean Chemical Society
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• v.28 no.11
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• pp.2079-2082
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• 2007

Photonic crystals containing rugate structure result in a mirror with high reflectivity in a specific narrow spectral region and are prepared by applying a computer-generated pseudo-sinusoidal current waveform. Well defined 1-dimentional photonic polymer replicas showing a reflectivity at 534 nm have been successfully obtained by the removal of rugate porous silicon (PSi) template from the polystyrene composite film. XRD measurement indicates that the oxidized rugate PSi has been completely removed from the composite films. Polymer replicas exhibit a sharp resonance in the reflectivity spectrum. Optical characteristics of photonic polymer replicas indicate that the surface of polymer film has a negative structure of rugate PSi. These replicas are stable in aqueous solutions for several days without any degradation. The methods have been provided for the construction of photonic structures with polymers.

• Elastomers and Composites
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• v.51 no.4
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• pp.342-349
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• 2016

Characteristics of the swelling-induced wrinkles on the surfaces of natural rubber (NR) film were investigated. The wrinkle structure was generated by swelling of NR film pre-stretched and firmly bonded onto an aluminum substrate in hexane. A novel experimental method was adopted to replicate the swelling-induced wrinkles on the NR film using an epoxy-hardener system. To get insight into the wrinkle parameters; the wrinkle length (L), wrinkle distance (D), wrinkle height (H) and the angle between two consecutive wrinkles (${\theta}$), the cross-sections of the replicas obtained from saturated swollen NR film were examined using an optical microscopy (OM). From the OM images, the wrinkling parameters were measured as a function of the thickness of NR film from 0.42 to 1.76 mm. Also, it was evaluated that the effects of swelling time on the wrinkling parameters. The length (L), distance (D) and height (H) of wrinkles increased as the thickness of the NR film and the swelling time increased. However, the angle between the wrinkles (${\theta}$) showed a sharp decrease up to a swelling time of 200 minutes and slightly decreased afterwards.