• Journal of Korean Ophthalmic Optics Society
• /
• v.8 no.2
• /
• pp.25-29
• /
• 2003

Nickel-ferrite $Ni_xFe_{3-x}O_4$ thin films with several composition for Ni on glass substrate was prepared by ferrite plating method in order to make sunglass which cut off ultraviolet and shield electromagnetic field. It has single phase of polycrystalline spinel structure and has gloss as mirror and has high hardness which is no scratch while scraping by using nail. The transmittance of nickel-ferrite thin film is lowered to zero below 400 nm manifestly. And it shows that the nickel-ferrite thin film in nickel composition rate x = 0.09 was most cut oil ultraviolet when compared with goods of other company in the cut off effect of ultraviolet. Therefore, sunglasses coated with $Ni_xFe_{3-x}O_4$ thin film can be used in removing ultraviolet and electromagnetic field.

• Current Photovoltaic Research
• /
• v.8 no.1
• /
• pp.33-38
• /
• 2020

Single-phased SnS thin films have been prepared by RF magnetron sputtering at various deposition pressures. The effect of deposition pressure on the structural and optical properties of polycrystalline SnS thin films was studied using X-ray diffraction (XRD), field-emission scanning electron microscopy (FE-SEM), X-ray photoelectron spectroscopy (XPS) and ultraviolet-visible-near infrared (UV-Vis-NIR) spectrophotometer. The XRD analysis revealed the orthorhombic structure of the SnS thin films oriented along the (111) plane direction. As the deposition pressure was increased from 5 mTorr to 15 mTorr, the intensity of the peak on the (111) plane increased, and the intensity decreased under the condition of 20 mTorr. The binding energy difference at the Sn 3d_5/2 and S 2p_3/2 core levels was about 324.5 eV, indicating that the SnS thin film was prepared as a pure Sn-S phase. The optical properties of the SnS thin films indicate the presence of direct allowed transitions with corresponding energy band gap in the rang 1.47-1.57 eV.

• Korean Journal of Materials Research
• /
• v.20 no.7
• /
• pp.374-378
• /
• 2010

$MgTiO_3$ thin films were prepared by r.f. magnetron sputtering in order to prepare miniaturized NPO type MLCCs. $MgTiO_3$ films showed a polycrystalline structure of ilmenite characterized by the appearance of (110) and (202) peaks. The intensity of the peaks decreased with an increase in the chamber pressure due to the decrease of crystallinity which resulted from the decrease of kinetic energy of the sputtered atoms. The films annealed at $600^{\circ}C$ for 60min. showed a fine grained microstructure without micro-cracks. The grain size and roughness of the $MgTiO_3$ films decreased with the increase of chamber pressure. The average surface roughness was 1.425~0.313 nm for $MgTiO_3$ films prepared at 10~70 mTorr. $MgTiO_3$ films showed a dielectric constant of 17~19.7 and a dissipation factor of 2.1~4.9% at 1MHz. The dielectric constant of the films is similar to that of bulk ceramics. The dielectric constant and the dissipation factor decreased with the increase of the chamber pressure due to the decrease of grain size and crystallinity. The leakage current density was $10^{-5}\sim10^{-7}A/cm^2$ at 200kV/cm and this value decreased with the increase of the chamber pressure. The small grain size and smooth surface microstructure of the films deposited at high chamber pressure resulted in a low leakage current density. $MgTiO_3$ films showed a near zero temperature coefficient and satisfied the specifications for NPO type materials. The dielectric properties of the $MgTiO_3$ thin films prepared by sputtering suggest the feasibility of their application for MLCCs.

• Korean Journal of Materials Research
• /
• v.5 no.1
• /
• pp.3-11
• /
• 1995

$(TiO_{2})$ thin films were deposited on p-Si(100) substrate by APMOCVD using titanium isopropoxide as a source material. The deposition mechanism was well explained by the simple boundary layer theory and the apparent activation energy of the chemical reaction controlled process was 18.2kcal /mol. The asdeposited films were polycrystalline anatase phase and were transformed into rutile phase after postannealing. The postannealing time and the film thikness as well as the postannealing temperature also affected the phase transition. The C-V plot exhibited typical charateristics of MOS diode, from which the dielectric constant of about 80 was obtained. The capacitance of the annealed film was decreased but those of the Nb or Sr doped films were not changed. I-V characteristics revealed that the conduction mechanism was hopping conduction. The postannealing and the doping of Nb or Sr cause to decrease the leakage current and to increase the breakdown voltage.

• Journal of the Korean Chemical Society
• /
• v.26 no.3
• /
• pp.128-134
• /
• 1982

The electrical conductivity of n-type polycrystalline MnOx-Ti$O_2$ system containing 0.40, 0.80, and 1.60 mol % of manganese oxide has been measured from 100 to 400$^{\circ}$C and 1100 to 1300$^{\circ}$C under oxygen partial pressures of$10^{-8}\;to\;10^{-1}$ atm. Plots of log conductivity vs. reciprocals of absolute temperature at constant $Po_2$'s are found to be linear with an inflection, and the activation energies obtained from the slopes appear to be an enough average 0.18eV for the extrinsic and 3.70eV for the intrinsic. The log $\sigma$ vs. log $Po_2$ are found to be linear at $Po_2$'s of $10^{-8}\;to\;10^{-1}$atm. The conductivity dependences on $Po_2$at the two temperature regions are closely approximated by $\sigma{\propto}$Po_2$-1}6$ for the extrinsic and $${\sigma}{\propto}Po_2^{-1}4}$$ for the intrinsic, respectively. The predominant defects are believed to be Vo-2e' and $Ti^3$${\cdot}$interstitial at the extrinsic and intrinsic. From the interpretations of conductivity dependences on temperature and$Po_2$ , the conduction mechanisms and possible band models are proposed.

• Journal of the Korean Magnetics Society
• /
• v.1 no.1
• /
• pp.1-5
• /
• 1991

The magnetic properties of the polycrystalline ${(Fe_{2}O_{3})}_{1-x-y}{(In_{2}O_{3})}_{x}{(Eu_{2}O_{3})}_{y}$(x=0.01, y=0.02과 x=0.02, y=0.03) have been studied by the methods of X-ray diffraction, $M\"{o}ssbauer$ effect, and magnetic hysteresis measurement. The X-ray diffraction patterns show that the samples have a same crystal structure as $\alpha-Fe_{2}O_{3}$. From the analysis of the temperature dependence of the quadrupole splitting and average half-width, it is found that the Morin transition occurs in the sample of x=0.01 and y=0.02 and the spin angle defined as the angle between the [111] crystal axis and antiferromagnetic vector, changes from about $35^{\circ}$ to the (111) plane as increasing the temperature in the sample of x=0.02 and y=O.03. The temperature dependence of magnetic hyperfine field is analyzed by using the spin-wave theory. The isomer shift values at room temperature are found to be given by about 0.35mm/s for the samples which means that the Fe ions belong to $3^{+}ion$. The temperature dependence of isomer shift was analyzed by using the Debye model.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.19 no.12
• /
• pp.1092-1098
• /
• 2006

The influence of the concentration of precursor solution and the number of solution coatings on the densification of the $Pb(Zr_xTi_{1-x})O_3$ (PZT) thick films was studied. PZT powder and PZT precursor solution were prepared by3 sol-gel method and PZT thick films were fabricated by the screen-printing method on the alumina substrates. The composition of powder and precursor solution were PZT(70/30) and PZT(30/70), respectively. The PZT precursor solution was spin-coated on the PZT thick films. A concentration of a coating solution was 0.5 to 2.0 mol/L[M] and the number of coating was repeated from 0 to 6. The XRD patterns of all PZT thick films shelved typical perovskite polycrystalline structure. The porosity of the thick films was decreased with increasing the number of coatings and 6-time coated films with 1.5 M showed the dense microstructure and thickness of about $60{\mu}m$. The relative dielectric constant of the PZT thick film was increased with increasing the number of solution coatings and the thick films with 1.5 M, 6-time coated showed the 698. The remanent polarization the 1.5 M and 6-time coated PZT thick films was $38.3{\mu}C/cm^2$.

• The Transactions of the Korean Institute of Electrical Engineers C
• /
• v.48 no.12
• /
• pp.761-767
• /
• 1999

Poly-Si TFTs(polycrystalline silicon thin film transistors) fabricated on a low cost glass substrate have attracted a considerable amount of attention for pixel elements and peripheral driving circuits in AMLCS(active matrix liquid crystal display). In order to apply poly-Si TFTs for high resolution AMLCD, a high operating frequency and reliable circuit performances are desired. A new poly-Si TFT with CLBT(counter doped lateral body terminal) is proposed and fabricated to suppress kink effects and to improve the device stability. And this proposed device with BC(buried channel) is fabricated to increase ON-current and operating frequency. Although the troublesome LDD structure is not used in the proposed device, a low OFF-current is successfully obtained by removing the minority carrier through the CLBT. We have measured the dynamic properties of the poly-Si TFT device and its circuit. The reliability of the TFTs and their circuits after AC stress are also discussed in our paper. Our experimental results show that the BC enables the device to have high mobility and switching frequency (33MHz at $V_{DD}$ = 15 V). The minority carrier elimination of the CLBT suppresses kink effects and makes for superb dynamic reliability of the CMOS circuit. We have analyzed the mechanism in order to see why the ring oscillators do not operate by analyzing AC stressed device characteristics.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.25 no.7
• /
• pp.506-510
• /
• 2012

In this study, lead-free $(Na_{0.465}K_{0.465}Bi_{0.07})(Nb_{0.93}Ti_{0.07})O_3-0.08MnO_2$ ceramics were fabricated by conventional mixed oxide method. Structural and electrical properties of lead-free $(Na_{0.465}K_{0.465}Bi_{0.07})(Nb_{0.93}Ti_{0.07})O_3-0.08MnO_2$ ceramics with the variation of sintering temperature were investigated. As results of x-ray diffraction analysis, all specimens showed a typical polycrystalline perovskite structure without presence of the second phase. Sintered density increased with an increases of sintering temperature and the specimen sintered at $1,020^{\circ}C$ showed the maximum value of 4.5 $g/cm^3$. The average grain size of the $(Na_{0.465}K_{0.465}Bi_{0.07})(Nb_{0.93}Ti_{0.07})O_3-0.08MnO_2$ specimen sintered at $1,020^{\circ}C$ is about 0.83 ${\mu}m$. Electromechanical coupling factor, relative dielectric constant and dielectric loss of $(Na_{0.465}K_{0.465}Bi_{0.07})(Nb_{0.93}Ti_{0.07})O_3-0.08MnO_2$ specimens sintered at $1,020^{\circ}C$ were 0.252, 741 and 0.043% respectively.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2008.11a
• /
• pp.456-456
• /
• 2008

In the past few years, the deposition and characterization of cadmium sulfide semiconducting thin films has received a considerable amount of interest due to their potential application in the area of electronic and opto-electronic devices fabrications. Polycrystalline CdS thin films posses good optical transmittance, wide band-gap and electrical properties makes it as one of the ideal material for their application to solar cell fabrication. Cadmium sulfate thin films were deposited by the chemical bath deposition method using tartaric acid and triethanolamine as a complexing agent. Deposition parameters such as pH, temperature, deposition time and concentration of the reactant species were optimized so as to obtain reflecting, good adherent uniform thin films on the glass substrate. Reaction mechanism of the thin film formation is also reported. The crystallographic structure and the crystallite size were studied by the X-ray diffraction pattern. The optical band-gap of deposited film is identified by measuring the transmittance in the visible region. Temperature dependence of resistivity confirmed the semiconducting behavior of the film. Scanning electron micrographs (SEM) showed the presence of grain particles of size 50 nm.