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http://dx.doi.org/10.21218/CPR.2020.8.1.033

Influence of Deposition Pressure on Structural and Optical Properties of SnS Thin Films Grown by RF Magnetron Sputtering  

Son, Seung-Ik (School of Materials Science and Engineering, Pusan National University)
Lee, Sang Woon (School of Materials Science and Engineering, Pusan National University)
Son, Chang Sik (Division of Materials Science and Engineering, Silla University)
Hwang, Donghyun (Division of Materials Science and Engineering, Silla University)
Publication Information
Current Photovoltaic Research / v.8, no.1, 2020 , pp. 33-38 More about this Journal
Abstract
Single-phased SnS thin films have been prepared by RF magnetron sputtering at various deposition pressures. The effect of deposition pressure on the structural and optical properties of polycrystalline SnS thin films was studied using X-ray diffraction (XRD), field-emission scanning electron microscopy (FE-SEM), X-ray photoelectron spectroscopy (XPS) and ultraviolet-visible-near infrared (UV-Vis-NIR) spectrophotometer. The XRD analysis revealed the orthorhombic structure of the SnS thin films oriented along the (111) plane direction. As the deposition pressure was increased from 5 mTorr to 15 mTorr, the intensity of the peak on the (111) plane increased, and the intensity decreased under the condition of 20 mTorr. The binding energy difference at the Sn 3d5/2 and S 2p3/2 core levels was about 324.5 eV, indicating that the SnS thin film was prepared as a pure Sn-S phase. The optical properties of the SnS thin films indicate the presence of direct allowed transitions with corresponding energy band gap in the rang 1.47-1.57 eV.
Keywords
SnS film; RF magnetron sputtering; Deposition pressure; Absorber layer; Solar cell;
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Times Cited By KSCI : 2  (Citation Analysis)
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