• Title/Summary/Keyword: Poly-Ethylene-Naphthalate (PEN)

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Experimental Study on Fabrication of AZO Transparent Electrode for Organic Solar Cell Using Selective Low-Temperature Atomic Layer Deposition (저온 선택적 원자층 증착공정을 이용한 유기태양전지용 AZO 투명전극 제조에 관한 실험적 연구)

  • Kim, Ki-Cheol;Song, Gen-Soo;Kim, Hyung-Tae;Yoo, Kyung-Hoon;Kang, Jeong-Jin;Hwang, Jun-Young;Lee, Sang-Ho;Kang, Kyung-Tae;Kang, Heui-Seok;Cho, Young-June
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.37 no.6
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    • pp.577-582
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    • 2013
  • AZO (aluminum-doped zinc oxide) is one of the best candidate materials to replace ITO (indium tin oxide) for TCOs (transparent conductive oxides) used in flat panel displays, organic light-emitting diodes (OLEDs), and organic solar cells (OSCs). In the present study, to apply an AZO thin film to the transparent electrode of an organic solar cell, a low-temperature selective atomic layer deposition (ALD) process was adopted to deposit an AZO thin film on a flexible poly-ethylene-naphthalate (PEN) substrate. The reactive gases for the ALD process were di-ethyl-zinc (DEZ) and tri-methyl-aluminum (TMA) as precursors and H2O as an oxidant. The structural, electrical, and optical characteristics of the AZO thin film were evaluated. From the measured results of the electrical and optical characteristics of the AZO thin films deposited on the PEN substrates by ALD, it was shown that the AZO thin film appeared to be comparable to a commercially used ITO thin film, which confirmed the feasibility of AZO as a TCO for flexible organic solar cells in the near future.

Enhanced characteristics of TCO films with $(SiO_2)_3(ZnO)_7$ gas barrier layer on various plastic substrates (다양한 플라스틱 기판위에 $(SiO_2)_3(ZnO)_7$ 보호층을 갖는 투명 전도성 박막들의 특성 향상)

  • Kwon, Oh-Jeong;Kim, Dong-Yung;Ryu, Sung-Won;Sohn, Sun-Young;Hong, Woo-Pyo;Kim, Hwa-Min;Hong, Jae-Suk
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.283-284
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    • 2008
  • Electrical and optical characteristics of indium tin oxide (ITO) and indium zinc oxide (IZO) films without and with $(SiO_2)_3(ZnO)_7$ at.% (SZO) film deposited on poly(ethylene naphthalate) (PEN) and poly(ethylene terephthalate (PET) substrates as a gas barrier layer for flexible display were studied. The ITO and IZO films with SZO gas barrier layer showed the improved properties which were both the high transmittance of average 80% in the visible light range and the decreased sheet resistance as compared to those of ITO and IZO films without SZO layer. Particularly, the PEN substrate with only SZO gas barrier layer had a low water vapor transmission rate (WVTR) of $\sim10^{-3}g/m^2$/day. Thus, we suggest that the SZO film with protection ability against the water vapor permeation can be applied to gas barrier layer for flexible display.

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Fabrication of a Transparent Electrode for a Flexible Organic Solar Cell in Atomic Layer Deposition (ALD 공정을 이용한 플렉시블 유기태양전지용 투명전극 형성)

  • Song, Gen-Soo;Kim, Hyoung-Tae;Yoo, Kyung-Hoon
    • 한국신재생에너지학회:학술대회논문집
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    • 2011.05a
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    • pp.121.2-121.2
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    • 2011
  • Aluminum-doped Zinc Oxide (AZO) is considered as an excellent candidate to replace Indium Tin Oxide (ITO), which is widely used as transparent conductive oxide (TCO) for electronic devices such as liquid crystal displays (LCDs), organic light emitting diodes (OLEDs) and organic solar cells (OSCs). In the present study, AZO thin film was applied to the transparent electrode of a channel-shaped flexible organic solar cell using a low-temperature selective-area atomic layer deposition (ALD) process. AZO thin films were deposited on Poly-Ethylene-Naphthalate (PEN) substrates with Di-Ethyl-Zinc (DEZ) and Tri-Methyl-Aluminum (TMA) as precursors and $H_2O$ as an oxidant for the atomic layer deposition at the deposition temperature of $130^{\circ}C$. The pulse time of TMA, DEZ and $H_2O$, and purge time were 0.1 second and 20 second, respectively. The electrical and optical properties of the AZO films were characterized as a function of film thickness. The 300 nm-thick AZO film grown on a PEN substrate exhibited sheet resistance of $87{\Omega}$/square and optical transmittance of 84.3% at a wavelength between 400 and 800 nm.

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Properties of $(SiO_2)_x(ZnO)_y$ gas barrier films using facing target sputtering system with low temperature deposition process for flexible displays (플렉서블 디스플레이용 저온공정을 갖는 대향 타겟식 스퍼터링 장치를 이용한 $ZrO_2$ 보호막의 특성)

  • Cho, Do-Hyun;Kim, Ji-Hwan;Lee, Jae-Hwan;Ryu, Sung-Won;Sohn, Sun-Young;Park, Sung-Hwan;Kim, Jong-Jae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.48-49
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    • 2008
  • 본 실험에서는 대향 타겟식 스퍼터링 (face target sputtering, FTS) 장비를 사용하여 플렉서블 디스플레이용 poly ethylene naphthalate (PEN) 플라스틱 기판 위에 보호층으로 사용된 $ZrO_2$ 박막의 특성들에 대해 연구하였다. FTS에 의해 3 시간동안 증착된 $ZrO_2$ 박막의 기판 온도는 $69^{\circ}C$ 로 낮은 증착 온도를 나타내었으며, 이는 유리전이온도가 낮은 PEN 과 같은 플라스틱 기판위에 박막 증착시 적용하기에 적합하다. 제작된 $ZrO_2$ 박막에서 기판 중심으로부터 거리의 함수로 측정된 박막의 두께 차이는 약 4.5%로 매우 균일한 두께를 갖는 것으로 측정되었다.

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