• Title/Summary/Keyword: Polishing method

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A study of EPD for Shallow Trench Isolation CMP by HSS Application (HSS을 적용한 STI CMP 공정에서 EPD 특성)

  • Kim, Sang-Yong;Kim, Yong-Sik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.04b
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    • pp.35-38
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    • 2000
  • In this study, the rise throughput and the stability in fabrication of device can be obtained by applying of CMP process to STI structure in 0.l8um semiconductor device. Through reverse moat pattern process, reduced moat density at high moat density, STI CMP process with low selectivity could be to fit polish uniformity between low moat density and high moat density. Because this reason, in-situ motor current end point detection method is not fit to the current EPD technology with the reverse moat pattern. But we use HSS without reverse moat pattern on STI CMP and take end point current sensing signal.[1] To analyze sensing signal and test extracted signal, we can to adjust wafer difference within $110{\AA}$.

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A study on EPD of STI CMP Process with Reverse Moat Pattern (Reverse Moat Pattern을 가진 STI CMP 공정에서 EPD 고찰)

  • Lee, Kyung-Tae;Kim, Sang-Yong;Seo, Yong-Jin;Kim, Chang-Il;Chang, Eui-Goo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.04b
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    • pp.14-17
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    • 2000
  • The rise throughput and the stability in fabrication of device can be obtained by applying of CMP process to STI structure in 0.18um semiconductor device. To employ in STI CMP, the reverse moat process has been added thus the process became complex and the defects were seriously increased. Removal rates of each thin films in STi CMP was not equal hence the devices must to be effected, that is, the damage was occured in the device dimension in the case of excessive CMP process and the nitride film was remained on the device dimension in the case of insufficient CMP process than these defects affect the device characteristics. We studied the current sensing method in STI-CMP with the reverse moat pattern.

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Wear Patterns and Mechanisms of Cutting Tool in Cutting of Machinable Ceramics (가공성 세라믹 절삭에서 공구의 마멸 패턴과 메카니즘)

  • Jang, Sung-Min;Baek, Seung-Yub
    • Journal of the Korean Society of Safety
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    • v.25 no.5
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    • pp.1-6
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    • 2010
  • When the ceramic material is being machined, micro crack and brittle fracture dominate the process of material removal. Generally, ceramics are very difficult-to-cut materials and machined using conventional method such as grinding and polishing. However, such processes are generally cost-expensive and have low material removal rate. Machinable ceramics used in this study contain BN powder to overcome these problem and for productivity elevation. This paper focuses on machinability evaluation during end mill process with CNC machining center in this study. Experiment for this purpose is performed for tool wear patterns and mechanism.

Optimization of CMP Process Parameter using Semi-empirical DOE (Design of Experiment) Technique (반경험적인 실험설계 기법을 이용한 CMP 공정 변수의 최적화)

  • 이경진;김상용;서용진
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.15 no.11
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    • pp.939-945
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    • 2002
  • The rise throughput and the stability in the device fabrication can be obtained by applying chemical mechanical polishing (CMP) process in 0.18 $\mu\textrm{m}$ semiconductor device. However, it still has various problems due to the CMP equipment. Especially, among the CMP components, process variables are very important parameters in determining the removal rate and non-uniformity. In this paper, we studied the DOE (design of experiment) method in order to get the optimized CMP equipment variables. Various process parameters, such as table and head speed, slurry flow rate and down force, have investigated in the viewpoint of removal rate and non-uniformity. Through the above DOE results, we could set-up the optimal CMP process parameters.

Thinning of SDB SOI by electrochemical etch-stop (전기화학적 식각정지에 의한 SDB SOI의 박막화)

  • Chung, Yun-Sik;Chung, Gwiy-Sang
    • Proceedings of the KIEE Conference
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    • 2001.07c
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    • pp.1369-1371
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    • 2001
  • This paper describes on thinning SDB SOI substrates by SDB technology and Electro-chemical etch-stop. The surface of the fabricated SDB SOI substrates is more uniform than that grinding or polishing by mechanical method, and this process is possible to accurate SOI thickness control. During Electrochemical etch-stop, leakage current versus voltage curves were measured for analysis of the open current potential (OCP) point and the passivation potential (PP) poin and determinated to anodic passivation potential. The surface roughness and selectively controlled thickness of the fabricated SOI substrates were analyzed by using AFM and SEM, respectively.

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The Effect of Drawing Conditions on the Tensile Strength of Optical Fiber (광섬유의 인장강도에 미치는 Drawing Condition의 영향)

  • 한택상;최상삼
    • Journal of the Korean Ceramic Society
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    • v.19 no.1
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    • pp.44-50
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    • 1982
  • Drawing optical fibers in a graphite furnace is one of the most convenient and economical means of producing optical fiber. Since the flaw formation on optical fiber is mainly due to dust contaminations during drawing and surface corrosion by water vapor penetration through coating layer, the tensile strength of optical fiber drawn in a graphite furnace is greatly inflenced by the drawing conditions. The important factors found in this investigation were preform treatment (fire polishing), furnace interior environment (dust contamination, inert gas flows), primary coating condition (resin curing temperature, coating materials, method, thickness) and fiber pulling condition (furnace temperature, drawing speed, pulling tension). The tensile strength at optimum drawing conditions turned out to be 5 ~ 6 GPa.

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A Study on the Electrochemical Mechanism using Liner Sweep Voltammetry (LSV) Method (LSV법을 이용한 전기화학적 메커니즘 연구)

  • Lee, Young-Kyun;Han, Sang-Jun;Seo, Yong-Jin;Lee, Woo-Sun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.164-164
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    • 2008
  • 금속배선공정에서 높은 전도율과 재료의 값이 싸다는 이유로 최근 Cu를 사용하였으나, 디바이스의 구조적 특성을 유지하기 위해 높은 압력으로 인한 새로운 다공성 막(low-k)의 파괴와, 디싱과 에로젼 현상으로 인한 문제점이 발생하게 되었다. 이러한 문제점을 해결하고자, 본 논문에서는 Cu 표면에 Passivation layer를 형성 및 제거하는 개념으로 공정시 연마제를 사용하지 않으며, 낮은 압력조건에서 공정을 수행하기 위해, 전해질의 농도 변화에 따른 Liner sweep voltammetry 법을 사용하여 전압활성화에 의한 전기화학적 반응이 Cu전극에 어떤 영향을 미치는지 연구하였으며, 표면 조성을 알아보기 위하여 Energy Dispersive Spectroscopy (EDS) 분석을 하였고, Cu disk의 결정성과 배향성 관찰을 위해 X-Ray diffraction (XRD)로 금속 표면을 비교하여 실험 결과로 얻어진 데이터를 통하여 ECMP 공정에 적합한 전해액 선정과 농도를 선택하였다.

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Nano-turning of single crystal silicon (단결정 실리콘의 초정밀가공)

  • 김건희;도철진;홍권희;유병주;원종호;박상진;안병민
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2000.11a
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    • pp.939-942
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    • 2000
  • Single point diamond turning technique for optical crystals is reported in this paper. The main factors influencing the machined surface quality are discovered and regularities of machining process are drawn. Optical crystals have found more and more important applications in the field of modern optics. Optical crystals are mostly brittle materials of poor machinability. The traditional machining method is polishing which has many shortcomings such as low production efficiency, poor ability to be automatically controlled and edge effect of the workpiece. The purpose of our research is to find the optimum machining conditions for ductile cutting of optical crystals and apply the SPDT technique to the manufacturing of ultra precision optical components of brittle material.

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The Characteristics of Ultra Precision Machining of Optical Crystal (광학소자의 초정밀절삭 특성에 관한 연구)

  • 김주환;박원규;김건희;원종호
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2003.06a
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    • pp.529-532
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    • 2003
  • Machining technique for optical crystals with single point diamond turning tool is reported in this paper. The main factors influencing the machined surface quality are discovered and regularities of machining process are drawn. Optical crystals have found more and more important applications in the field of modern optics. Optical crystals are mostly brittle materials of poor machinability. The traditional machining method is polishing which has many shortcomings such as low production efficiency. poor ability to be automatically controlled and edge effect of the workpiece. The purpose of our research is to find the optimum machining conditions for ductile cutting of optical crystals and apply the SPDT technique to the manufacturing of ultra precision optical components of brittle materials. As a result. the surface roughness is good when spindle speed is 200m/min. and teed rate is small. The influence of depth of cut is very small.

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마찰가공에 있어서의 분위기 영향에 관한 연구 제 1장

  • ;Sohn, Myung-Whan
    • Transactions of the Korean Society of Mechanical Engineers
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    • v.5 no.4
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    • pp.338-346
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    • 1981
  • Honing, lapping, polishing and superfinishing are applied for a precision machining to finish the metal surface, but these precision machining are micro-cutting by hard and micro-abrasive grains. Frictional machining is the new method to finish mirrorlike surface without using those abrasive grains. The frictional machining produces high pressure and high temperature instantly by compressing a tool material against the metal surface in sliding motion. The metal surface is given plastic deformation and plastic flow by the above mentioned frictional motion, but the surface roughness of the metal surface is influenced by physical and chemical reaction in surrounding atmosphere. Therefore, the atmosphere around the metal optimum atmosphere in the frictional machining. The part 1 of the study was performed in liquid atmospheres. Diesel oil, lubricant, grease, lard oil, bean oil and cutting fluid were used as such atmospheres. Medium carbon steel SM 50 C was used as a workpiece and ceramic tip was applied as a frictional tool. The result of the experiment showed characteristic machining conditions to generate the best surface roughness in each atmospheres.